公开(公告)号：US11204559B2

公开(公告)日：2021-12-21

申请号：US17054313

申请日：2019-05-02

Applicant: ASML Holding N.V.

Inventor： David Taub ,  Joseph Ashwin Franklin ,  Jeffrey John Kowalski

IPC: G03F7/20 ,  G03F9/00 ,  G02B6/36 ,  G02B7/00

Abstract: A lithography system comprises an illumination system configured to produce abeam of radiation, a support configured to support a patterning device configured to impart a pattern on the beam, a projection system configured to project the patterned beam onto a substrate, and an alignment system comprising an illuminator. The illuminator comprises an optical fiber, an optical fiber protector (714), an optical fiber support (700) comprising a first support arm assembly configured to support the optical fiber protector, an optical system, and an optical system support comprising a second support arm assembly configured to support the optical system.