公开(公告)号：US11695248B2

公开(公告)日：2023-07-04

申请号：US17665087

申请日：2022-02-04

Applicant: Gigaphoton Inc.

Inventor： Keisuke Ishida

IPC: H01S3/134 ,  H01S3/102 ,  H01S3/094 ,  H01S3/10

CPC classification number: H01S3/1024 ,  H01S3/094076 ,  H01S3/10015

Abstract: A laser device may include a laser resonator; a chamber arranged on an optical path of the laser resonator; a pair of electrodes arranged in the chamber; a power source applying a voltage to the electrodes; a storage unit storing a voltage value; and a control unit configured to set an application voltage value of the voltage applied to the electrodes as setting the application voltage value for outputting a pulse whose pulse number is equal to or larger than 1 and smaller than i based on the voltage command value and the voltage value stored in the storage unit, and setting the application voltage for outputting a pulse whose pulse number is equal to or larger than i and smaller than j based on the voltage command value and an offset value corresponding to the voltage command value, where i>1 and j>i.

公开(公告)号：US20230208094A1

公开(公告)日：2023-06-29

申请号：US18177088

申请日：2023-03-01

Applicant: Gigaphoton Inc.

Inventor： Takahito KUMAZAKI ,  Osamu WAKABAYASHI

IPC: H01S3/137 ,  H01S3/13 ,  G03F7/20

CPC classification number: H01S3/137 ,  H01S3/1305 ,  G03F7/70025

Abstract: A laser device includes a first actuator configured to adjust an oscillation wavelength of pulse laser light; a second actuator configured to adjust a spectral line width of the pulse laser light; and a processor configured to determine a target spectral line width by reading data specifying a number of irradiation pulses of the pulse laser light with which one location of an irradiation receiving object is irradiated and a difference between a shortest wavelength and a longest wavelength, control the second actuator based on the target spectral line width, and control the first actuator so that the oscillation wavelength periodically changes every number of the irradiation pulses between the shortest wavelength and the longest wavelength.

公开(公告)号：US11682877B2

公开(公告)日：2023-06-20

申请号：US17237471

申请日：2021-04-22

Applicant: Gigaphoton Inc.

Inventor： Takashi Onose

IPC: H01S3/00 ,  G02B27/09 ,  G02B27/10 ,  H01S3/10 ,  H01S3/23 ,  H01S5/00 ,  H01S3/225

CPC classification number: H01S3/0085 ,  G02B27/0983 ,  G02B27/10 ,  H01S3/0057 ,  H01S3/10 ,  H01S3/2308 ,  H01S5/005 ,  H01S3/2251 ,  H01S2301/08 ,  H01S2301/20

Abstract: A laser system including: A. a laser apparatus configured to output a pulse laser beam; B. an optical pulse stretcher including a delay optical path for expanding a pulse width of the pulse laser beam; and C. a phase optical element included in the delay optical path and having a function of spatially and randomly shifting a phase of the pulse laser beam. The phase optical element includes a plurality of types of cells providing different amounts of phase shift to the pulse laser beam and arranged irregularly in any direction.

公开(公告)号：US20230187896A1

公开(公告)日：2023-06-15

申请号：US18167611

申请日：2023-02-10

Applicant: Gigaphoton Inc.

Inventor： Junichi MAEKAWA ,  Hiroshi FURUSATO

IPC: H01S3/137 ,  H01S3/08 ,  H01S3/13 ,  G03F7/20

CPC classification number: H01S3/137 ,  G03F7/70025 ,  H01S3/1305 ,  H01S3/08004 ,  H01S3/225

Abstract: A line narrowing module includes an enclosure, a prism which is disposed in an internal space of the enclosure and through which light passes, a mounter which is disposed in the internal space and on which the prism is mounted, a fixing unit which is disposed in the internal space and fixes the prism to the mounter, and a light blocking member. The light blocking member is disposed in the internal space and blocks scattered light in the internal space, the scattered light produced from the light and traveling to the fixing unit.

公开(公告)号：US20230155343A1

公开(公告)日：2023-05-18

申请号：US18149986

申请日：2023-01-04

Applicant: Gigaphoton Inc.

Inventor： Junichi FUJIMOTO ,  Takahito KUMAZAKI ,  Akiyoshi SUZUKI

IPC: H01S3/139 ,  H01S3/097 ,  H01S3/13 ,  G01B11/26 ,  G01D5/26 ,  G03F7/20

CPC classification number: H01S3/139 ,  H01S3/097 ,  H01S3/1305 ,  G01B11/26 ,  G01D5/26 ,  G03F7/7055 ,  H01S3/11

Abstract: A laser apparatus includes a first optical element, a second optical element, a first actuator configured to change a first wavelength component included in a pulse laser beam by changing a posture of the first optical element, a second actuator configured to change a second wavelength component included in the pulse laser beam by changing a posture of the second optical element, a first encoder configured to measure a position of the first actuator, a second encoder configured to measure a position of the second actuator, and a processor. The processor reads a first relation and a second relation and performs control of the first actuator based on the first relation and the position of the first actuator measured by the first encoder and control of the second actuator based on the second relation and the position of the second actuator measured by the second encoder.

公开(公告)号：US20230142875A1

公开(公告)日：2023-05-11

申请号：US17934469

申请日：2022-09-22

Applicant: Gigaphoton Inc.

Inventor： Fumio IWAMOTO ,  Yutaka SHIRAISHI

IPC: H05G2/00 ,  G01N21/88 ,  G03F7/20

CPC classification number: H05G2/006 ,  H05G2/008 ,  G01N21/88 ,  G03F7/70033 ,  G03F7/70608

Abstract: An EUV light generation apparatus to generate EUV light by irradiating a target with pulse laser light to turn the target into plasma includes a chamber, a target supply unit configured to supply the target to a plasma generation region in the chamber, a pulse laser device configured to generate pulse laser light to be radiated to the target, and a processor configured to change a generation frequency of the target generated by the target supply unit to a natural number multiple of an irradiation frequency of the pulse laser light based on a size of the target or related information related to the size of the target.

公开(公告)号：US20230071592A1

公开(公告)日：2023-03-09

申请号：US18053737

申请日：2022-11-08

Applicant: Gigaphoton Inc.

Inventor： Akira SUWA ,  Kouji KAKIZAKI ,  Masakazu KOBAYASHI ,  Junichi FUJIMOTO ,  Yasufumi KAWASUJI

IPC: H05K3/46 ,  H05K3/40 ,  B23K26/066

Abstract: A laser processing method according to a viewpoint of the present disclosure includes radiating ultraviolet pulse laser light onto a workpiece having a stacked structure in which a conductor layer, an insulating layer, and a sacrificial layer are stacked on each other in the presented order, the pulse laser light radiated from the side facing the sacrificial layer, to change a laser ablation processing mode in the sacrificial layer and form a through hole in the sacrificial layer, radiating the pulse laser light onto the insulating layer through the through hole to form an opening in the insulating layer, and removing the sacrificial layer after the formation of the opening.

公开(公告)号：US11586032B2

公开(公告)日：2023-02-21

申请号：US16435986

申请日：2019-06-10

Applicant: Gigaphoton Inc.

Inventor： Hiroyuki Ito ,  Hiroshi Tanaka

IPC: H05G2/00 ,  H01S3/00 ,  G02B26/08 ,  G02B27/10 ,  G02B27/14 ,  H01S3/223 ,  H01S3/23 ,  H01S3/10 ,  B23K26/00

Abstract: A laser apparatus may include: a mirror configured to reflect a laser beam; an actuator configured to operate the mirror; and a controller configured to transmit a movement instruction to the actuator, wherein the controller predicts a movement completion time of the actuator, and transmits a polling signal so that the actuator receives the polling signal after expiration of the predicted movement completion time.

公开(公告)号：US11553583B2

公开(公告)日：2023-01-10

申请号：US17468395

申请日：2021-09-07

Applicant: Gigaphoton Inc.

Inventor： Takayuki Yabu ,  Yoshifumi Ueno

IPC: G03F7/20 ,  H05G2/00 ,  G21K1/06

Abstract: An extreme ultraviolet light generation system may include a laser device configured to emit pulse laser light, an EUV light concentrating mirror configured to reflect and concentrate extreme ultraviolet light generated by irradiating a target with the pulse laser light, and a processor configured to receive a first energy parameter of the extreme ultraviolet light and control an irradiation frequency of the pulse laser light with which the target is irradiated so that change in a second energy parameter related to energy per unit time of the extreme ultraviolet light reflected by the EUV light concentrating mirror is suppressed.

公开(公告)号：US11532920B2

公开(公告)日：2022-12-20

申请号：US16865803

申请日：2020-05-04

Applicant: Gigaphoton Inc.

Inventor： Seiji Nogiwa

IPC: H01S3/13 ,  H01S3/131 ,  H01S3/0941 ,  H05G2/00 ,  H01S3/06 ,  H01S3/16 ,  H01S3/08

Abstract: A laser apparatus according to the present disclosure includes an excitation light source configured to output excitation light, a laser crystal disposed on an optical path of the excitation light, a first monitor device disposed on an optical path of transmitted excitation light after having transmitted through the laser crystal to monitor the transmitted excitation light, a temperature adjustment device configured to adjust a temperature of the excitation light source to a constant temperature based on a temperature command value, and a controller configured to change the temperature command value based on a result of monitoring by the first monitor device.