中科微点-全球专利检索

  1. Login
  2. Sign Up

Search Results

39 records (took 0.014 seconds)

    Imaging system and method employing beam folding
    31.
    发明授权
    Imaging system and method employing beam folding 失效
    使用光束折叠的成像系统和方法

    公开(公告)号：US07405806B2

    公开(公告)日：2008-07-29

    申请号：US11106204

    申请日：2005-04-14

    Applicant: Rajesh Menon ,  Henry I. Smith

    Inventor： Rajesh Menon ,  Henry I. Smith

    IPC: G03B27/42 ,  G03B27/54

    CPC classification number: G03F7/70291 ,  G03F7/70383

    Abstract: A maskless lithography system is disclosed that includes a spatial light modulator, first and second imaging areas, and first folding optics. The spatial light modulator receives illumination from an illumination source and provides a modulated illumination beam having a first cross-sectional line length in a length-wise direction and a first cross-sectional width in a width-wise direction that is substantially smaller than said first cross-sectional length. The first imaging area receives a first portion of the modulated illumination beam. The first folding optics provides a second portion of the modulated illumination beam that is adjacent the first portion of the modulated illumination beam in the length-wise direction at a second imaging area that is not adjacent the first imaging area in the length-wise direction.

    Abstract translation: 公开了一种无掩模光刻系统，其包括空间光调制器，第一和第二成像区域以及第一折叠光学器件。 空间光调制器从照明源接收照明，并且提供调制照明光束，该调制照明光束在长度方向上具有第一横截面线长度，并且在宽度方向上具有基本上小于所述第一宽度方向的第一横截面宽度 截面长度。 第一成像区域接收调制照明光束的第一部分。 第一折叠光学器件提供调制照明光束的第二部分，该第二部分在长度方向上与第一成像区域不相邻的第二成像区域沿长度方向相邻于调制照明光束的第一部分。

    System and method for fabrication and replication of diffractive optical elements for maskless lithography
    32.
    发明授权
    System and method for fabrication and replication of diffractive optical elements for maskless lithography 失效
    用于无掩模光刻的衍射光学元件的制造和复制的系统和方法

    公开(公告)号：US07348104B2

    公开(公告)日：2008-03-25

    申请号：US10677173

    申请日：2003-10-02

    Applicant: Dario Gil ,  Jeffrey T. Hastings ,  James G. Goodberlet ,  Rajesh Menon ,  David J. Carter ,  Henry I. Smith

    Inventor： Dario Gil ,  Jeffrey T. Hastings ,  James G. Goodberlet ,  Rajesh Menon ,  David J. Carter ,  Henry I. Smith

    IPC: G02B27/44 ,  G02B27/42 ,  G02B5/18

    CPC classification number: G03F7/70291 ,  G03F7/0005 ,  G03F7/0757 ,  G03F7/2059 ,  G03F7/70275

    Abstract: A method is disclosed for forming an array of focusing elements for use in a lithography system. The method involves varying an exposure characteristic over an area to create a focusing element that varies in thickness in certain embodiments. In further embodiments, the method includes the steps of providing a first pattern via lithography in a substrate, depositing a conductive absorber material on the substrate, applying an electrical potential to at least a first portion of the conductive absorber material, leaving a second portion of the conductive material without the electrical potential, and etching the second portion of the conductive material to provide a first pattern on the substrate that is aligned with the first portion of the conductive absorber material.

    Abstract translation: 公开了一种用于形成用于光刻系统的聚焦元件阵列的方法。 该方法包括改变区域上的曝光特性以产生在某些实施例中厚度变化的聚焦元件。 在另外的实施例中，该方法包括以下步骤：通过在衬底中的光刻提供第一图案，在衬底上沉积导电吸收材料，将电位施加到导电吸收材料的至少第一部分，留下第二部分 所述导电材料没有电位，并且蚀刻所述导电材料的第二部分以在所述基底上提供与所述导电吸收材料的所述第一部分对准的第一图案。

    ULTRA-HIGH EFFICIENCY MULTI-JUNCTION SOLAR CELLS USING POLYCHROMATIC DIFFRACTIVE CONCENTRATORS
    37.
    发明申请
    ULTRA-HIGH EFFICIENCY MULTI-JUNCTION SOLAR CELLS USING POLYCHROMATIC DIFFRACTIVE CONCENTRATORS 有权
    超高效率多功能太阳能电池使用多色差分浓度

    公开(公告)号：US20100095999A1

    公开(公告)日：2010-04-22

    申请号：US12253626

    申请日：2008-10-17

    Applicant: Rajesh Menon

    Inventor： Rajesh Menon

    IPC: H01L31/042 ,  H01L31/00

    CPC classification number: G02B5/1814 ,  F24S23/30 ,  H01L31/0543 ,  H01L31/0547 ,  H01L31/0549 ,  Y02E10/52

    Abstract: A photovoltaic cell is provided. The photovoltaic cell includes a concentrator optic structure separating the solar spectrum of light into a plurality of spectral bands. The concentrator optic structure focuses these spectral bands into a plurality of concentric tightly focused ring-shaped spots and a central round spot. A multitude of circular sub-cells are each approximately positioned at a ring-shaped spot associated with a respective spectral band produced by the concentrator optic structure. Each of the sub-cells stores the energy produced at the respective spectral band

    Abstract translation: 提供光电池。 光伏电池包括将太阳光谱分离成多个光谱带的聚光器光学结构。 集中器光学结构将这些光谱带聚焦成多个同心紧密聚焦的环形斑点和中心圆形斑点。 多个圆形子单元各自大致位于与由聚光器光学结构产生的相应光谱带相关联的环形光点处。 每个子单元存储在相应光谱带处产生的能量

    Phase-shift masked zone plate array lithography
    38.
    发明申请
    Phase-shift masked zone plate array lithography 审中-公开
    相移屏蔽区板阵列光刻

    公开(公告)号：US20060186355A1

    公开(公告)日：2006-08-24

    申请号：US11347138

    申请日：2006-02-03

    Applicant: Henry Smith ,  George Barbastathis ,  Rajesh Menon

    Inventor： Henry Smith ,  George Barbastathis ,  Rajesh Menon

    IPC: G21K5/10

    CPC classification number: G03F7/70291 ,  G03F7/70275 ,  G03F7/70283 ,  G03F7/70316 ,  G03F7/70358

    Abstract: A lithography system includes a source of radiation energy and a zone plate array to focus the radiation energy to create an array of images in order to produce a permanent pattern on a substrate. A phase-shift mask is optically located between the source of radiation energy and the zone plate array. The modulated wavefront produced by the phase-shift mask alters the field diffracted by the zone plate array, and the center lobe of the point-spread function narrows as a result.

    Abstract translation: 光刻系统包括辐射能量源和区板阵列，以聚焦辐射能量以产生图像阵列，以便在衬底上产生永久性图案。 相移掩模光学地位于辐射能源和区板阵列之间。 由相移掩模产生的调制波前改变由区域阵列衍射的场，结点是扩散函数的中心波瓣变窄。

    System and method for contrast enhanced zone plate array lithography
    39.
    发明申请
    System and method for contrast enhanced zone plate array lithography 失效
    对比增强区板阵列光刻的系统和方法

    公开(公告)号：US20060183058A1

    公开(公告)日：2006-08-17

    申请号：US11154352

    申请日：2005-06-16

    Applicant: Rajesh Menon ,  Henry Smith

    Inventor： Rajesh Menon ,  Henry Smith

    IPC: G03F7/00

    CPC classification number: G03F7/70291 ,  G03F7/091

    Abstract: A lithography system is disclosed that includes an array of focusing elements for directing focused illumination toward a recording medium, and a reversible contrast-enhancement material disposed between the recording medium and the array of focusing elements.

    Abstract translation: 公开了一种光刻系统，其包括用于将聚焦照明引向记录介质的聚焦元件阵列，以及设置在记录介质和聚焦元件阵列之间的可逆对比度增强材料。

Patent Agency Ranking