中科微点-全球专利检索

  1. Login
  2. Sign Up

Search Results

38 records (took 0.016 seconds)

    Phase-shift masked zone plate array lithography
    3.
    发明申请
    Phase-shift masked zone plate array lithography 审中-公开
    相移屏蔽区板阵列光刻

    公开(公告)号：US20060186355A1

    公开(公告)日：2006-08-24

    申请号：US11347138

    申请日：2006-02-03

    Applicant: Henry Smith ,  George Barbastathis ,  Rajesh Menon

    Inventor： Henry Smith ,  George Barbastathis ,  Rajesh Menon

    IPC: G21K5/10

    CPC classification number: G03F7/70291 ,  G03F7/70275 ,  G03F7/70283 ,  G03F7/70316 ,  G03F7/70358

    Abstract: A lithography system includes a source of radiation energy and a zone plate array to focus the radiation energy to create an array of images in order to produce a permanent pattern on a substrate. A phase-shift mask is optically located between the source of radiation energy and the zone plate array. The modulated wavefront produced by the phase-shift mask alters the field diffracted by the zone plate array, and the center lobe of the point-spread function narrows as a result.

    Abstract translation: 光刻系统包括辐射能量源和区板阵列，以聚焦辐射能量以产生图像阵列，以便在衬底上产生永久性图案。 相移掩模光学地位于辐射能源和区板阵列之间。 由相移掩模产生的调制波前改变由区域阵列衍射的场，结点是扩散函数的中心波瓣变窄。

    System and method for contrast enhanced zone plate array lithography
    4.
    发明申请
    System and method for contrast enhanced zone plate array lithography 失效
    对比增强区板阵列光刻的系统和方法

    公开(公告)号：US20060183058A1

    公开(公告)日：2006-08-17

    申请号：US11154352

    申请日：2005-06-16

    Applicant: Rajesh Menon ,  Henry Smith

    Inventor： Rajesh Menon ,  Henry Smith

    IPC: G03F7/00

    CPC classification number: G03F7/70291 ,  G03F7/091

    Abstract: A lithography system is disclosed that includes an array of focusing elements for directing focused illumination toward a recording medium, and a reversible contrast-enhancement material disposed between the recording medium and the array of focusing elements.

    Abstract translation: 公开了一种光刻系统，其包括用于将聚焦照明引向记录介质的聚焦元件阵列，以及设置在记录介质和聚焦元件阵列之间的可逆对比度增强材料。

    Imaging system and method employing beam folding
    5.
    发明申请
    Imaging system and method employing beam folding 失效
    使用光束折叠的成像系统和方法

    公开(公告)号：US20060232755A1

    公开(公告)日：2006-10-19

    申请号：US11106204

    申请日：2005-04-14

    Applicant: Rajesh Menon ,  Henry Smith

    Inventor： Rajesh Menon ,  Henry Smith

    IPC: G03B27/42

    CPC classification number: G03F7/70291 ,  G03F7/70383

    Abstract: A maskless lithography system is disclosed that includes a spatial light modulator, first and second imaging areas, and first folding optics. The spatial light modulator receives illumination from an illumination source and provides a modulated illumination beam having a first cross-sectional line length in a length-wise direction and a first cross-sectional width in a width-wise direction that is substantially smaller than said first cross-sectional length. The first imaging area receives a first portion of the modulated illumination beam. The first folding optics provides a second portion of the modulated illumination beam that is adjacent the first portion of the modulated illumination beam in the length-wise direction at a second imaging area that is not adjacent the first imaging area in the length-wise direction.

    Abstract translation: 公开了一种无掩模光刻系统，其包括空间光调制器，第一和第二成像区域以及第一折叠光学器件。 空间光调制器从照明源接收照明，并且提供调制照明光束，该调制照明光束在长度方向上具有第一横截面线长度，并且在宽度方向上具有基本上小于所述第一宽度方向的第一横截面宽度 截面长度。 第一成像区域接收调制照明光束的第一部分。 第一折叠光学器件提供调制照明光束的第二部分，该第二部分在长度方向上与第一成像区域不相邻的第二成像区域沿长度方向相邻于调制照明光束的第一部分。

    System and method for proximity effect correction in imaging systems
    6.
    发明申请
    System and method for proximity effect correction in imaging systems 失效
    成像系统中邻近效应校正的系统和方法

    公开(公告)号：US20050224725A1

    公开(公告)日：2005-10-13

    申请号：US10823458

    申请日：2004-04-13

    Applicant: Rajesh Menon ,  Dario Gil ,  George Barbastathis ,  Henry Smith

    Inventor： Rajesh Menon ,  Dario Gil ,  George Barbastathis ,  Henry Smith

    IPC: G03F1/14 ,  G03F7/20 ,  H01J37/304

    CPC classification number: H01J37/304 ,  G03F1/78 ,  G03F7/70383 ,  G03F7/70441 ,  G03F7/70558 ,  H01J2237/31769

    Abstract: A system and method are disclosed for providing error correction in an imaging system. The system includes an error determination unit for determining an amount of error associated with a spot at (x,y) in a binary pattern to be imaged, a determination unit for determining the location of a nearest exposed spot at (xi, yi) for each spot at (x,y), and a dose modification unit for modifying an exposure dose at the nearest exposed spot at (xi, yi) for each spot at (x,y).

    Abstract translation: 公开了一种用于在成像系统中提供纠错的系统和方法。 该系统包括：误差确定单元，用于确定与待成像的二进制图案中的（x，y）处的斑点相关联的误差量;确定单元，用于确定最近的曝光光斑在（x i）处的位置， （x，y）处的每个斑点的剂量修改单元，以及用于修改在（x，y）处最近的曝光点的曝光剂量的剂量修改单元 （x，y）的每个点的平均值。

    Patterning via optical-saturable transitions
    8.
    发明授权
    Patterning via optical-saturable transitions 有权
    通过光学饱和转换进行图案化

    公开(公告)号：US09164369B2

    公开(公告)日：2015-10-20

    申请号：US12749960

    申请日：2010-03-30

    Applicant: Rajesh Menon ,  Trisha L. Andrew ,  Francesco Stellacci

    Inventor： Rajesh Menon ,  Trisha L. Andrew ,  Francesco Stellacci

    IPC: G03F7/20 ,  G03B27/00

    CPC classification number: G03B27/00

    Abstract: An optical material system for nanopatterning is provided that includes one or more material systems having spectrally selective reversible and irreversible transitions by saturating one of the spectrally selective reversible transitions with an optical node retaining a single molecule in a configuration and exposing the single molecule to its spectrally irreversible transitions to form a pattern.

    Abstract translation: 提供了一种用于纳米图案的光学材料系统，其包括具有光谱选择性可逆和不可逆转变的一个或多个材料系统，其通过将光谱选择性可逆转换中的一个与保留单个分子的配置中的光学节点饱和，并将单个分子暴露于其光谱 不可逆转的过渡形成一种模式。

    Nanoscale imaging via absorption modulation
    9.
    发明授权
    Nanoscale imaging via absorption modulation 有权
    通过吸收调制进行纳米成像

    公开(公告)号：US08143601B2

    公开(公告)日：2012-03-27

    申请号：US12186968

    申请日：2008-08-06

    Applicant: Rajesh Menon ,  Henry I. Smith

    Inventor： Rajesh Menon ,  Henry I. Smith

    IPC: G01J1/58

    CPC classification number: G01Q60/22 ,  G03F1/50 ,  G03F1/84 ,  G03F7/2014

    Abstract: An imaging system is provided. The imaging system includes a sample to be scanned by the imaging system. An absorbance modulation layer (AML) is positioned in close proximity to the sample and is physically separate from the sample. One or more sub-wavelength apertures are generated within the AML, whose size is determined by the material properties of the AML and the intensities of the illuminating wavelengths. A light source transmits an optical signal through the one or more sub-wavelength apertures generating optical near-fields that are collected for imaging.

    Abstract translation: 提供成像系统。 成像系统包括要由成像系统扫描的样品。 吸收调制层（AML）位于样品附近，物理上与样品分开。 在AML内产生一个或多个亚波长孔径，其尺寸由AML的材料特性和照明波长的强度决定。 光源通过一个或多个子波长孔径传输光信号，产生用于成像的光学近场。

Patent Agency Ranking