Abstract:
Microshells for encapsulation of devices such as MEMS and microelectronics. In an embodiment, the microshells include a planar perforated pre-sealing layer, below which a non-planar sacrificial layer is accessed, and a sealing layer to close the perforation in the pre-sealing layer after the sacrificial material is removed. The sealing layer may include a nonhermetic layer to physically occlude the perforation and a hermetic layer over the nonhermetic occluding layer to seal the perforation as a function of the dimension of the perforation to form cavities having different vacuum levels on the same substrate.
Abstract:
Multi-layered, planar microshells having low stress for encapsulation of devices such as MEMS and microelectronics. The microshells may include a perforated pre-sealing layer, below which a sacrificial layer is accessed, and a sealing layer to close the perforation in the pre-sealing layer after the sacrificial material is removed. The sealing layer may further include a nonhermetic layer to physically occlude the perforation and a hermetic layer over the nonhermetic occluding layer to seal the perforation. The various layers may be formed employing processes having opposing stresses to tune the residual stress of the multi-layered microshell. In an embodiment, the hermetic layer is a metal which is deposited with a process tuned to impart a tensile stress to lower the residual stress in the microshell below the magnitude of cumulative stress present in sealing layer and pre-sealing layer.
Abstract:
In fabricating a microelectromechanical structure (MEMS), a method of forming a narrow gap in the MEMS includes a) depositing a layer of sacrificial material on the surface of a supporting substrate, b) photoresist masking and at least partially etching the sacrificial material to form at least one blade of sacrificial material, c) depositing a structural layer over the sacrificial layer, and d) removing the sacrificial layer including the blade of the sacrificial material with a narrow gap remaining in the structural layer where the blade of sacrificial material was removed.
Abstract:
Disclosed is an oscillator that relies on redundancy of similar resonators integrated on chip in order to fulfill the requirement of one single quartz resonator. The immediate benefit of that approach compared to quartz technology is the monolithic integration of the reference signal function, implying smaller devices as well as cost and power savings.
Abstract:
A microfabricated gyroscope to measure rotation about an axis parallel to the surface of the substrate. A voltage differential may be applied between pairs of electrode fingers to reduce the quadrature error. A microfabricated gyroscope includes a vibratory structure and interdigited electrodes having a high aspect ratio.
Abstract:
A micromechanical filter having planar components, and manufacturable using very large scale integrated circuit microfabrication techniques. The input and output transducers are interdigitated comb electrodes. The mechanical coupling between the input and output transducers includes planar flexures, displacement of the electrodes producing bending of the elements of the flexures. By sealing micromechanical filters in a vacuum and providing on-board circuitry, high signal-to-noise ratios and quality factors are achievable. Construction of a real-time spectrum analyzer using many micromechanical resonators, provides a device with high accuracy and a short sample time.
Abstract:
A micromachined force sensor containing separate sensing and actuator structures. A member is suspended above the substrate so that it is movable along an axis in response to a force. The member includes a set of parallel sense fingers and a separate set of parallel force fingers. The sense fingers are positioned between fingers of two sense plates, to form a first differential capacitor, whose capacitance changes when the member moves in response to a force along the axis. The change in capacitance induces a sense signal on the member, which permits the measurement of the magnitude and duration of the force. The force fingers are positioned between fingers of two actuator plates, to form a second differential capacitor. The sense signal can be used to provide feedback to the second differential capacitor to generate different electrostatic forces between the force fingers and the two actuator plates, to offset the force applied along the preferred axis. Limit stops limit the movement of the member to less than the distance between the electrodes of the differential capacitors, to prevent contact between the electrodes. Additional fingers be positioned around the differential capacitors to minimize parasitic capacitances.
Abstract:
A suspended microstructure fabrication process. Photoresist pedestals are inserted in a sacrificial layer between the suspended microstructure and the substrate and photoresist spacers are inserted in the microstructure layer between non contacting portions of the suspended microstructure so that the photoresist pedestals and spacers support the microstructure bridge during the wet etching and drying process used to remove the sacrificial layer.
Abstract:
An electrostatic micromotor employs a side drive design. The stator operates in a plane above a substract and a moveable member lies and moves in the plane of the stator. An electrostatic field of operational strength is generated and sustained without breakdown in the plane between the stator and edges of the moveable member. Three fabrication processes enable formation of a moveable member in the plane of operation of the stator and spaced apart from the stator by a micron amount. One fabrication process deposits and patterns a structural layer to form the stator and moveable member over a sacrificial layer. A second fabrication process etches channels in a first structural layer to outline a stator, moveable member, and if desired, a bearing. A substrate is connected to the side of the structural layer through which the channels are etched and the opposite side is ground down to the ends of the channels to form salient stator, rotor and, if desired, bearing structures. The third fabrication process grows a sacrificial layer by local oxidation in an etched cavity of the substrate. A structural layer is then deposited and patterned over the substrate and sacrificial layer to form the stator and moveable member in a common plane. A harmonic side drive micromotor is also provided by the fabrication processes.
Abstract:
An electrostatically driven microactuator is micromachined in a monolithic process. Sacrificial layers are placed between a moving element and stator structural layers. Removal of the sacrificial layers leaves a free standing moving element and micron wide air gaps within a stator. An electric field of about 100 Mv/m and higher is supported across the micron wide gap without breakdown and enables high energy torque densities to be produced between the stator and the moving element. One electrostatic drive scheme involves a series of stator electrodes attached to the stator and a series of electrodes attached to the moving element charged in sequence to attract each other in a direction of movement and to oppose each other in a direction normal to movement. A bearing is aligned with the moving element within the stator during the layering of a sacrificial layer over an edge of the moving element structural layer. The bearing and stator laterally stabilize the moving element. Vertical stability is through aerodynamic shaping of the moving element, electronic circuits, or bushings. Applications of the microactuator include a linearly sliding shutter, an optical modulator, a gyroscope and an air pump.