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公开(公告)号：US20170229278A1
公开(公告)日：2017-08-10
申请号：US15017559
申请日：2016-02-05
Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
Inventor： Chwen YU , Chih-Ming TSAO
CPC classification number: H05K9/00 , G12B17/00 , G12B17/02 , H01J37/09 , H01J37/3002 , H01J2237/0264 , H05K9/0001 , H05K9/0003
Abstract: A board includes a first magnetic conductive plate and a second magnetic conductive plate. The first magnetic conductive plate has a first magnetic conductive direction. The second magnetic conductive plate overlaps with the first magnetic conductive plate. The second magnetic conductive plate has a second magnetic conductive direction. The first magnetic conductive direction and the second magnetic conductive direction cross.
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公开(公告)号：US09601302B2
公开(公告)日：2017-03-21
申请号：US14813768
申请日：2015-07-30
Applicant: EBARA CORPORATION
Inventor： Shoji Yoshikawa , Kiwamu Tsukamoto , Takeshi Murakami , Masahiro Hatakeyama , Tsutomu Karimata
CPC classification number: H01J37/023 , G01N21/9501 , G01N23/2204 , H01J37/09 , H01J37/16 , H01J37/20 , H01J37/285 , H01J2237/022 , H01J2237/0264 , H01J2237/1501 , H01J2237/166 , H01J2237/20 , H01J2237/2007 , H01J2237/20221 , H01J2237/20278 , H01J2237/26
Abstract: An inspection apparatus capable of facilitating reduction in cost of the apparatus is provided. The inspection apparatus includes: beam generation means for generating any of charged particles and electromagnetic waves as a beam; a primary optical system that guides the beam into an inspection object held on a movable stage in a working chamber and irradiates the inspection object with the beam; a secondary optical system that detects secondary charged particles occurring from the inspection object; and an image processing system that forms an image on the basis of the detected secondary charged particles. The inspection apparatus further includes: a linear motor that drives the movable stage; and a Helmholtz coil that causes a magnetic field for canceling a magnetic field caused by the linear motor when the movable stage is driven.
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公开(公告)号：US09508526B2
公开(公告)日：2016-11-29
申请号：US14568596
申请日：2014-12-12
Applicant: EBARA CORPORATION
Inventor： Matsutaro Miyamoto
CPC classification number: H01J37/16 , H01J37/18 , H01J37/20 , H01J2237/0264 , H01J2237/20292 , H01J2237/26 , H01J2237/3175
Abstract: A top opening-closing mechanism for opening and closing a top of a container including a container body and the top includes a rolling element rotatably provided at the top and positioned on the outside of the container body in a planar view, a rail, a jack for lifting the rail, and a top resting table disposed adjacent to the container and mounting the top thereon. When the top is opened, the jack lifts the rail, the rail lifts the rolling element from below, and thereby the top is lifted up from the container body. Then, the rolling element rolls on the rail and the top resting table to move the top from above the container body to the top resting table.
Abstract translation: 用于打开和关闭包括容器主体和顶部的容器的顶部的顶部打开 - 关闭机构包括滚动元件，该滚动元件可旋转地设置在顶部并且在平面图中位于容器主体的外侧，轨道，千斤顶 用于提升导轨，以及邻近容器设置的顶部搁置台，并将顶部安装在其上。 当顶部打开时，千斤顶提升轨道，轨道从下方提起滚动元件，从而顶部从容器体上提起。 然后，滚动元件在轨道和顶部静止台上滚动以将顶部从容器主体上方移动到顶部静止台。
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公开(公告)号：US09484138B2
公开(公告)日：2016-11-01
申请号：US14389972
申请日：2012-07-17
Applicant: Guoqiang Yu , Peng Guo , Xiufeng Han , Chaohui Guo , Xiaoyu Sun , Xiangqian Zhou
Inventor： Guoqiang Yu , Peng Guo , Xiufeng Han , Chaohui Guo , Xiaoyu Sun , Xiangqian Zhou
CPC classification number: H01J37/09 , G01R33/093 , G01R33/096 , H01F7/202 , H01F7/204 , H01F41/00 , H01J37/141 , H01J2237/0262 , H01J2237/0264 , H01J2237/28 , H01J2237/31754 , H01L43/12
Abstract: A nano-patterned system comprises a vacuum chamber, a sample stage and a magnetic-field applying device. The magnetic-field applying device comprises a power supply, magnetic poles, and a magnetic-field generation device having a magnetic conductive soft iron core and a coil connected to the power supply and wound on the soft iron core to generate a magnetic field. The soft iron core is a semi-closed frame structure and the magnetic poles are respectively disposed at the two ends of the semi-closed frame structure. The sample stage is inside the vacuum chamber. The magnetic poles are opposite one another inside the vacuum chamber with respect to the sample stage. The coil and soft iron core are outside the vacuum chamber. The soft iron core leads the magnetic field generated by the coil into the vacuum chamber. The magnetic poles locate a sample on the sample stage and apply a local magnetic field.
Abstract translation: 纳米图案系统包括真空室，样品台和磁场施加装置。 磁场施加装置包括电源，磁极和具有导电软铁芯的磁场产生装置和连接到电源的线圈并缠绕在软铁芯上以产生磁场的磁场产生装置。 软铁芯是半封闭框架结构，磁极分别设置在半封闭框架结构的两端。 样品台位于真空室内。 磁极相对于样品台在真空室内彼此相对。 线圈和软铁芯在真空室外。 软铁芯将线圈产生的磁场引入真空室。 磁极将样品定位在样品台上并施加局部磁场。
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35.发明授权公开(公告)号：US08476607B2
公开(公告)日：2013-07-02
申请号：US13534044
申请日：2012-06-27
Applicant: Tomonori Ishikawa , Nobushige Korenaga
Inventor： Tomonori Ishikawa , Nobushige Korenaga
IPC: H01J37/304
CPC classification number: H01J37/20 , B82Y10/00 , B82Y40/00 , H01J37/09 , H01J37/3177 , H01J2237/0264 , H01J2237/20221
Abstract: The drawing apparatus includes an optical system housing configured to emit a charged particle beam toward the substrate, a stage configured to hold the substrate and be moved at least in a direction perpendicular to an axis of the optical system housing, a detection device including a detector and a support for supporting the detector such that the detector faces a side surface of the stage, and configured for measuring a position of the stage, and a magnetic shield member provided to the stage and configured to shield an opening of the optical system housing that faces a top surface of the stage from a magnetic field. Here, the magnetic shield member is provided to the stage at a region, in a direction of the axis, other than a region where the detection device is provided.
Abstract translation: 所述绘制装置包括构造成向所述基板发射带电粒子束的光学系统壳体，被配置为保持所述基板并且至少沿垂直于所述光学系统壳体的轴线的方向移动的台架;检测装置，包括检测器 以及用于支撑所述检测器的支撑件，使得所述检测器面向所述台的侧表面并且被配置为用于测量所述台的位置;以及磁屏蔽构件，其设置在所述台上并且被配置为屏蔽所述光学系统壳体的开口， 从磁场面向舞台的顶面。 这里，除了设置有检测装置的区域以外，在轴的方向上的区域设置有磁屏蔽构件。
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Patent Agency Ranking
公开(公告)号：US20130043414A1
公开(公告)日：2013-02-21
申请号：US13397703
申请日：2012-02-16
Applicant: Alon ROSENTHAL
Inventor： Alon ROSENTHAL
CPC classification number: G03F7/70858 , B82Y10/00 , B82Y40/00 , G03F7/708 , H01J37/09 , H01J37/1475 , H01J37/3174 , H01J37/3177 , H01J2237/0264 , H01J2237/31754 , H01J2237/31774 , H01J2237/31793 , H01L21/6719 , H01L21/67213
Abstract: The invention relates to a system for magnetically shielding a charged particle lithography apparatus. The system comprises a first chamber, a second chamber and a set of two coils. The first chamber has walls comprising a magnetic shielding material, and, at least partially, encloses the charged particle lithography apparatus. The second chamber also has walls comprising a magnetic shielding material, and encloses the first chamber. The set of two coils is disposed in the second chamber on opposing sides of the first chamber. The two coils have a common axis.
Abstract translation: 本发明涉及一种用于磁屏蔽带电粒子光刻设备的系统。 该系统包括第一室，第二室和一组两个盘管。 第一室具有包括磁屏蔽材料的壁，并且至少部分地包围带电粒子光刻设备。 第二室还具有包括磁屏蔽材料的壁，并且包围第一室。 该组两个线圈被布置在第二腔室中的第一腔室的相对侧上。 两个线圈具有公共轴。
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公开(公告)号：US20130020195A1
公开(公告)日：2013-01-24
申请号：US13543330
申请日：2012-07-06
Applicant: Kenji Yamamoto , Satoshi Hirota
Inventor： Kenji Yamamoto , Satoshi Hirota
IPC: C23C14/35
CPC classification number: C23C14/3492 , C23C14/325 , C23C14/352 , C23C14/505 , H01J37/32055 , H01J37/3402 , H01J37/3447 , H01J2237/0264
Abstract: Disclosed is a vacuum deposition apparatus which suppresses mutual interference of magnetic fields generated by multiple magnetic-field applying mechanisms for evaporation sources. The vacuum deposition apparatus includes a deposition chamber; a magnetic-field applying mechanism of sputtering evaporation source disposed in the deposition chamber; a magnetic-field applying mechanism of arc evaporation source disposed in the same deposition chamber; and magnetic-field shielding units arranged so as to cover partially or entirely at least one of these magnetic-field applying mechanisms for evaporation sources (preferably the magnetic-field applying mechanism of sputtering evaporation source). Portions (portions to face a target material upon dosing) of openable units of magnetic-field shielding units are preferably made from a non-magnetic material.
Abstract translation: 公开了一种真空沉积装置，其抑制由用于蒸发源的多个磁场施加机构产生的磁场的相互干扰。 真空沉积设备包括沉积室; 设置在所述沉积室中的溅射蒸发源的磁场施加机构; 设置在同一沉积室中的电弧蒸发源的磁场施加机构; 以及磁场屏蔽单元，被布置成部分地或全部地覆盖这些用于蒸发源的磁场施加机构（优选地是溅射蒸发源的磁场施加机构）中的至少一个。 磁场屏蔽单元的可开启单元的部分（在计量时面向目标材料的部分）优选地由非磁性材料制成。
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38.发明申请公开(公告)号：US20130011797A1
公开(公告)日：2013-01-10
申请号：US13534044
申请日：2012-06-27
Applicant: Tomonori Ishikawa , Nobushige Korenaga
Inventor： Tomonori Ishikawa , Nobushige Korenaga
CPC classification number: H01J37/20 , B82Y10/00 , B82Y40/00 , H01J37/09 , H01J37/3177 , H01J2237/0264 , H01J2237/20221
Abstract: The drawing apparatus of the present invention includes an optical system housing configured to emit a charged particle beam toward the substrate; a stage configured to hold the substrate and be moved at least in a direction perpendicular to an axis of the optical system housing; a detection device including a detector and a support for supporting the detector such that the detector faces a side surface of the stage, and configured for measuring a position of the stage; and a magnetic shield member provided to the stage and configured to shield an opening of the optical system housing that faces a top surface of the stage from a magnetic field. Here, the magnetic shield member is provided to the stage at a detection region, in a direction of the axis, other than a region where the detection device is provided.
Abstract translation: 本发明的绘图装置包括一个配置成向基片发射带电粒子束的光学系统壳体; 其被配置为保持所述基板并且至少沿垂直于所述光学系统壳体的轴线的方向移动; 检测装置，包括检测器和用于支撑所述检测器的支撑件，使得所述检测器面向所述台的侧表面，并且被配置用于测量所述台的位置; 以及磁屏蔽构件，其设置在所述平台上并被配置为将所述光学系统壳体的面向所述平台顶表面的开口与磁场隔离。 这里，除了设置有检测装置的区域以外，在轴的方向上的检测区域处将磁屏蔽构件设置在台架上。
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39.发明申请LOW-INTERFERENCE SENSOR HEAD FOR A RADIATION DETECTOR, AS WELL AS A RADIATION DETECTOR WHICH CONTAINS THIS LOW-INTERFERENCE SENSOR HEAD 有权用于辐射检测器的低干扰传感器头，作为包含该低干扰传感器头的辐射检测器公开(公告)号：US20120132818A1
公开(公告)日：2012-05-31
申请号：US13378218
申请日：2010-06-15
Applicant: Meiken Falke , Robert Kroemer
Inventor： Meiken Falke , Robert Kroemer
CPC classification number: H01J37/244 , G01T1/24 , G01T1/244 , H01J37/256 , H01J37/28 , H01J2237/0264 , H01J2237/2442
Abstract: The invention relates to a low interference sensor head for a radiation detector and a radiation detector containing said low interference sensor head. Preferably, the radiation detector according to the invention is an X-ray detector. The invention further relates to the use of the low interference sensor head or the radiation detector, in particular of the X-ray detector for radiation analysis, in particular for (energy dispersive) X-ray analysis in microscopy using optics for charged particles.
Abstract translation: 本发明涉及一种用于辐射检测器的低干扰传感器头和包含所述低干扰传感器头的辐射检测器。 优选地，根据本发明的辐射检测器是X射线检测器。 本发明还涉及使用低干涉传感器头或辐射检测器，特别是用于辐射分析的X射线检测器，特别是使用用于带电粒子的光学器件的显微镜中的（能量色散）X射线分析。
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40.发明授权公开(公告)号：US07372027B2
公开(公告)日：2008-05-13
申请号：US11247263
申请日：2005-10-12
Applicant: Atsushi Ando , Katsuhide Watanabe
Inventor： Atsushi Ando , Katsuhide Watanabe
IPC: G01N23/00
CPC classification number: H01J37/09 , H01J37/24 , H01J2237/0264 , H01J2237/26 , H01J2237/3175
Abstract: A sample chamber and a column are connected to each other and comprise a magnetic substance. An exhaust section controls a pressure in the sample chamber and the column. A stage controller controls a stage, above which a sample is placed, in the sample chamber. An electron beam source power supply supplies power to an electron beam source, which emits an electron beam to the sample. A power supply supplies voltage to electron optic system, which controls the electron beam. The sample chamber, exhaust section, stage controller, electron beam source power supply and power supply are grounded by a first, second, third, fourth and fifth grounding point, respectively. The electron beam source and the electron optic system are electrically insulated from the sample chamber, column, exhaust section and stage. One of the first, second and third grounding point is different from the fourth or fifth grounding point.
Abstract translation: 样品室和色谱柱彼此连接并包含磁性物质。 排气部分控制样品室和柱中的压力。 舞台控制器控制在样品室中放置样品的阶段。 电子束源电源向电子束源供电，该电子束向样品发射电子束。 电源将电压供给控制电子束的电子光学系统。 样品室，排气段，载物台控制器，电子束源电源和电源分别由第一，第二，第三，第四和第五接地点接地。 电子束源和电子光学系统与样品室，色谱柱，排气部分和电极电绝缘。 第一，第二和第三接地点之一与第四或第五接地点不同。
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