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    Device for checking or calibrating the angle-dependent alignment of a high-precision test piece
    31.
    发明授权
    Device for checking or calibrating the angle-dependent alignment of a high-precision test piece 有权
    用于检查或校准高精度测试片的角度相关对准的装置

    公开(公告)号：US07359047B2

    公开(公告)日：2008-04-15

    申请号：US10565971

    申请日：2004-07-23

    Applicant: Heinz Lippuner

    Inventor： Heinz Lippuner

    IPC: G01J1/10

    CPC classification number: G01C1/02 ,  G01C25/00

    Abstract: The invention relates to checking or calibrating the angle-dependent alignment of a reference structure on a high-precision test-piece. A device comprises a plinth, and a retainer piece, rotatably mounted about a retainer piece axis, for retaining the test-piece and a measuring piece with a measuring piece bearing unit, to rotationally mount the measuring piece, about a measuring piece axis. An optical unit is mounted on the measuring piece, for receiving at least one test-piece beam, interacting with the reference structure on the test piece, running essentially in a measuring plane. The measuring piece bearing unit is arranged on the measuring plane or to one side thereof. The measuring piece includes a base that is, for example, axially symmetrical with the measuring piece axis encompassing or surrounding the intersection of the measuring piece axis with the retainer piece axis and hence also encompasses or surrounds the test-piece.

    Abstract translation: 本发明涉及检查或校准参考结构在高精度测试件上的与角度相关的对准。 一种装置包括一个底座和一个可围绕保持件轴线可旋转地安装的用于保持试件的保持件和一个具有测量件轴承单元的测量件，围绕测量件轴线旋转地安装测量件。 光学单元安装在测量件上，用于接收至少一个测试片，与测试片上的参考结构相互作用，基本上在测量平面中运行。 测量轴承单元布置在测量平面上或其一侧。 测量件包括例如与测量件轴线轴对称的基座，其包围或围绕测量件轴线与保持件轴线的交点，并且因此也包围或围绕测试件。

    Self Calibrating Measurement System
    32.
    发明申请
    Self Calibrating Measurement System 有权
    自校准测量系统

    公开(公告)号：US20070222980A1

    公开(公告)日：2007-09-27

    申请号：US11609110

    申请日：2006-12-11

    Applicant: Perry A. Palumbo

    Inventor： Perry A. Palumbo

    IPC: G01N21/00 ,  G01J1/10

    CPC classification number: G01N15/0227 ,  G01N21/276 ,  G01N21/532 ,  G01N2015/0294

    Abstract: A measurement system that can self calibrate is disclosed. The measurement system comprising a first light source directed along a first axis and configured to illuminate a sample volume. The measurement system has a sensor aligned along a second axis and is configured to detect scattered light in the sample volume. The measurement system has a second light source aligned along the second axis that is configured to illuminate the sensor during a calibration procedure.

    Abstract translation: 公开了可以进行自校准的测量系统。 测量系统包括沿着第一轴指向并被配置为照亮样本体积的第一光源。 测量系统具有沿着第二轴对准的传感器，并且被配置为检测样品体积中的散射光。 测量系统具有沿着第二轴对准的第二光源，该第二光源配置成在校准过程期间照亮传感器。

    Method of making a standard tool for calibrating stress analysis measuring devices and a set of the standard tools
    33.
    发明授权
    Method of making a standard tool for calibrating stress analysis measuring devices and a set of the standard tools 有权
    制造用于校准应力分析测量装置的标准工具的方法和一套标准工具

    公开(公告)号：US07236241B2

    公开(公告)日：2007-06-26

    申请号：US10907344

    申请日：2005-03-30

    Applicant: Mary Ann Johnson ,  David W. Johnston

    Inventor： Mary Ann Johnson ,  David W. Johnston

    IPC: G01J1/10 ,  G01B11/16

    CPC classification number: G01N21/23 ,  G01N21/278

    Abstract: A method of making a standard tool for calibrating polarimeters that analyze stress in photoelastic material, includes the steps of partially annealing a starting piece of tempered glass so that the starting piece has a retardance below 250 nm/cm, removing a peripheral portion of the starting piece (preferably, at least about 20% of its radial dimension) to leave a working piece, cutting a rectangular parallelepiped from the working piece, polishing two opposing faces of the rectangular parallelepiped where the two opposing faces are spaced apart by a measurement distance through which light passes during stress analysis in a polarimeter, and determining a birefringence of the rectangular parallelepiped across the measurement distance using a calibrated polarimeter. The standard tool is the rectangular parallelepiped having the determined birefringence for the measurement distance. The method can be used to make a set of the standard tools with different measurement distances.

    Abstract translation: 制造用于校准光弹性材料中的应力的偏振计的标准工具的方法包括以下步骤：对起始钢化玻璃进行部分退火，使起始部件具有低于250nm / cm的延迟，去除起始部分的周边部分 （优选地，其径向尺寸的至少约20％）以离开工件，从工件切下长方体，抛光长方体的两个相对的面，其中两个相对面间隔开测量距离通过 哪个光在偏振计的应力分析过程中通过，并且使用校准的偏振计确定整个测量距离上的长方体的双折射。 标准工具是具有测量距离的确定的双折射的长方体。 该方法可用于制作具有不同测量距离的一组标准工具。

    Photodetector, method of using the same, and image forming apparatus
    34.
    发明授权
    Photodetector, method of using the same, and image forming apparatus 失效
    光检测器，其使用方法和图像形成装置

    公开(公告)号：US07183534B2

    公开(公告)日：2007-02-27

    申请号：US10377643

    申请日：2003-03-04

    Applicant: Tohru Hisano

    Inventor： Tohru Hisano

    IPC: G01N21/47 ,  G01J1/10

    CPC classification number: G01N21/55 ,  G01N21/474 ,  G01N2021/4735 ,  G03G2215/00042

    Abstract: A photodetector includes a light emitting portion for applying light, a light receiving portion for sensing the light, and a light guiding member 3 for guiding the light from the light emitting portion to a surface to be measured and guiding detection light from the surface to be measured to the light receiving portion. The light guiding member has a sheet-like optical transmission medium, which is disposed at a portion facing to the surface to be measured and transmits the light by internal reflection. The sheet-like optical transmission member has an optical aperture facing to the surface to be measured.

    Abstract translation: 光检测器包括用于施加光的发光部分，用于感测光的光接收部分和用于将来自发光部分的光引导到待测表面的导光部件3，并将来自表面的检测光引导为 测量到光接收部分。 导光构件具有片状的光传输介质，该介质设置在面向待测表面的部分，并通过内部反射透射光。 片状光传输构件具有面向待测表面的光学孔。

    Method and device for calibrating a measuring system
    35.
    发明授权
    Method and device for calibrating a measuring system 有权
    用于校准测量系统的方法和装置

    公开(公告)号：US07180607B2

    公开(公告)日：2007-02-20

    申请号：US10713325

    申请日：2003-11-14

    Applicant: Stephen Kyle ,  Konrad von Arb

    Inventor： Stephen Kyle ,  Konrad von Arb

    IPC: G01J1/10 ,  G01C25/00 ,  G01B11/14

    CPC classification number: G01S17/023 ,  G01S5/163 ,  G01S7/497

    Abstract: A measuring system including a measuring device with a laser tracker and an opto-electronic sensor having fixed positions relative to one another and an auxiliary measuring tool with a reflector and at least three light spots, is calibrated. The auxiliary measuring tool is rigidly coupled with an arrangement of auxiliary reflectors and is moved around at least two different rotation axes. Reflector and auxiliary reflectors are registered by the laser tracker and the light spots are registered by the opto-electronic sensor. From the data of the laser tracker, positions and orientations of the reflector arrangement relative to the laser tracker and from the data of the opto-electronic sensor, positions and orientations of the light spot arrangement relative to the opto-electronic sensor are calculated and the two rotation axes relative to the reflector arrangement and the light spot arrangement are calculated. Calibration data are calculated by equating corresponding rotation axes.

    Abstract translation: 校准了包括具有激光跟踪器的测量装置和具有相对于彼此具有固定位置的光电传感器和具有反射器和至少三个光点的辅助测量工具的测量系统。 辅助测量工具与辅助反射器的布置刚性联接并且围绕至少两个不同的旋转轴线移动。 反射器和辅助反射器由激光跟踪器记录，光点由光电传感器记录。 根据激光跟踪器的数据，反射器装置相对于激光跟踪器的位置和取向以及光电传感器的数据，计算光点布置相对于光电传感器的位置和取向，并且 计算相对于反射器布置的两个旋转轴和光点布置。 通过将相应的旋转轴相等来计算校准数据。

    Defect inspection apparatus, sensitivity calibration method for the same, substrate for defect detection sensitivity calibration, and manufacturing method thereof
    36.
    发明申请
    Defect inspection apparatus, sensitivity calibration method for the same, substrate for defect detection sensitivity calibration, and manufacturing method thereof 审中-公开
    缺陷检查装置，其灵敏度校准方法，缺陷检测灵敏度校准用基板及其制造方法

    公开(公告)号：US20070035725A1

    公开(公告)日：2007-02-15

    申请号：US11287314

    申请日：2005-11-28

    Applicant: Naohiro Takahashi ,  Tamihide Yasumoto

    Inventor： Naohiro Takahashi ,  Tamihide Yasumoto

    IPC: G01N21/00 ,  G01J1/10

    CPC classification number: G01N21/93 ,  G01N21/9501

    Abstract: A reference substrate for defect detection sensitivity calibration has: patterns and programmed defective portions which are cone defects with different sizes and are formed at random on a silicon substrate. By using reference substrate for defect detection sensitivity calibration, it is possible to obtain an index, usable in manufacturing management, for determining sensitivity adjustment after a lamp is replaced in an illumination part of a defect inspection apparatus.

    Abstract translation: 用于缺陷检测灵敏度校准的参考衬底具有：具有不同尺寸的锥形缺陷的图案和编程缺陷部分，并且在硅衬底上随机形成。 通过使用用于缺陷检测灵敏度校准的参考基板，可以获得可用于制造管理中用于在缺陷检查装置的照明部分中更换灯后的灵敏度调节的指标。

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