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公开(公告)号:US11073431B2
公开(公告)日:2021-07-27
申请号:US16678945
申请日:2019-11-08
Applicant: SIGMA LABS, INC.
Inventor: Vivek R. Dave , Mark J. Cola , R. Bruce Madigan , Martin S. Piltch , Alberto Castro
IPC: G01J3/30 , G01K13/00 , G01N21/71 , G01J3/28 , G01J3/443 , B22F10/20 , B33Y10/00 , B33Y30/00 , B33Y50/00 , B23K26/342 , B23K26/70 , B23K9/04 , B23K9/095 , B23K10/02 , B23K15/00 , B22F10/30
Abstract: An optical manufacturing process sensing and status indication system is taught that is able to utilize optical emissions from a manufacturing process to infer the state of the process. In one case, it is able to use these optical emissions to distinguish thermal phenomena on two timescales and to perform feature extraction and classification so that nominal process conditions may be uniquely distinguished from off-nominal process conditions at a given instant in time or over a sequential series of instants in time occurring over the duration of the manufacturing process. In other case, it is able to utilize these optical emissions to derive corresponding spectra and identify features within those spectra so that nominal process conditions may be uniquely distinguished from off-nominal process conditions at a given instant in time or over a sequential series of instants in time occurring over the duration of the manufacturing process.
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公开(公告)号:US20210172800A1
公开(公告)日:2021-06-10
申请号:US16709199
申请日:2019-12-10
Applicant: PerkinElmer Health Sciences Canada, Inc.
Inventor: Abdul Al-Haimi , James McQuay , Hamid Badiei
IPC: G01J3/443
Abstract: Aspects of the disclosure relate to techniques for analyzing unknown sample compositions using a prediction model based on optical emission spectra. One method comprises: receiving first emission spectra corresponding to a training sample comprising a plurality of pure elements of known concentrations; determining, based on the first emission spectra, a plurality of spectral regions corresponding to the plurality of pure elements of known concentrations; determining, for each spectral region corresponding to each pure element of a known concentration, features associated with a signature peak of the spectral region; training a prediction model to predict unknown concentrations of a plurality of constituents of an unknown sample based on an emission spectra of the unknown sample; receiving second emission spectra corresponding to the unknown sample comprising a plurality of constituents of unknown concentrations; and generating, based on the application of the trained prediction model, a concentration for each of the constituents of the unknown sample.
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公开(公告)号:US20210166960A1
公开(公告)日:2021-06-03
申请号:US17105753
申请日:2020-11-27
Applicant: Tokyo Electron Limited
Inventor: Kippei SUGITA , Masaaki MIYAGAWA , Masashi YAMAGUCHI
IPC: H01L21/67 , H01J37/32 , C23C16/52 , C23C16/455 , G01J3/443
Abstract: A jig includes a base, light sources disposed on the base, the sources configured to emit light of different wavelengths, a controller disposed on the base, the controller being configured to cause the light sources to be turned on or off based on a given program, and a power source disposed on the base, the power source being configured to supply power to the light sources and the controller. The jig has a shape enabling a transfer device to transfer the jig, the transfer device being provided in a vacuum transfer module and configured to transfer a substrate.
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公开(公告)号:US20210148842A1
公开(公告)日:2021-05-20
申请号:US17095336
申请日:2020-11-11
Applicant: BRUKER NANO GMBH
Inventor: Ralf TERBORG
IPC: G01N23/2252 , G01J3/443
Abstract: A method comprises the steps of: (a) Obtaining a measured X-ray spectrum for the coated sample, for determining characteristics for the sample and for a coating material; (b) Determining a simulated X-ray spectrum for the sample based on an initial sample composition; (c) Determining an adapted sample composition that improves a match between the characteristics of the sample and an adapted simulated X ray spectrum; (d) Determining an adapted coating thickness for the coating material based on the adapted sample composition and characteristics of the coating; and (e) Repeating the steps (b) to (d) using the adapted sample composition and the adapted coating thickness of the coating material instead of the initial values, wherein the coating thickness is used for determining an absorption of X-rays.
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公开(公告)号:US10996173B2
公开(公告)日:2021-05-04
申请号:US15998391
申请日:2018-08-15
Applicant: Pablo Sobron
Inventor: Pablo Sobron
Abstract: Non-linear methods for quantitative elemental analysis and mineral classification using laser-induced breakdown spectroscopy are disclosed. According to one embodiment, a method, comprises calculating concentrations of elements in a sample using a laser-induced breakdown spectroscopy (LIBS) instrument. The LIBS instrument implements a kernel partial-least-squares regression (KPLSR) analysis. The method further comprises displaying the concentrations of the elements according to the KPLSR analysis.
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公开(公告)号:US10935429B2
公开(公告)日:2021-03-02
申请号:US16536944
申请日:2019-08-09
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor: Kyeonghun Kim , Jeongil Mun , Hyung Joo Lee , Jongwoo Sun
Abstract: A substrate processing module includes a process chamber configured to perform a treatment process on a substrate; a transfer chamber provided on a first side of the process chamber, the substrate being transferred between the process chamber and the transfer chamber; an optical emission spectroscopy (OES) system provided on a second side of the process chamber and configured to monitor the process chamber; and a reference light source disposed in the transfer chamber and configured to emit a reference light to calibrate the OES system.
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公开(公告)号:US20200348178A1
公开(公告)日:2020-11-05
申请号:US16963064
申请日:2018-10-10
Applicant: HAMAMATSU PHOTONICS K.K.
Inventor: Kengo SUZUKI , Shigeru EURA , Kazuya IGUCHI
Abstract: A spectrometry device includes a light source, an integrator configured to have an internal space in which a long afterglow emission material is disposed and output detection light from the internal space, a spectroscopic detector, an analysis unit configured to analyze a photoluminescence quantum yield of the long afterglow emission material, and a control unit configured to control switching between presence and absence of input of excitation light to the internal space and an exposure time in the spectroscopic detector. The control unit controls the light source so that the input of the excitation light to the internal space is maintained in a first period and the input of the excitation light to the internal space is stopped in a second period, and controls the spectroscopic detector so that an exposure time in the second period becomes longer than an exposure time in the first period.
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公开(公告)号:US10816402B2
公开(公告)日:2020-10-27
申请号:US16612469
申请日:2018-04-02
Applicant: HAMAMATSU PHOTONICS K.K.
Inventor: Kenichiro Ikemura , Kazuya Iguchi , Shigeru Eura , Akihiro Nakamura
Abstract: A spectrometry device includes: an integrating sphere which includes an inner wall surface and an attachment hole; an adapter which includes a guide hole guiding the measurement target light and is disposed in the integrating sphere; a plate which includes a first surface covering the guide hole from the outside of the integrating sphere and allowing a sample to be mounted thereon and a second surface and through which the measurement target light is transmitted; a holder which includes a concave portion mounting the plate thereon and is attached to the attachment hole; and a spectral detector configured to detect the measurement target light. The concave portion includes a bottom surface facing the second surface and a side surface surrounding the periphery of the plate. The bottom surface and the side surface are coated with a reflective material reflecting the measurement target light.
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公开(公告)号:US20200271517A1
公开(公告)日:2020-08-27
申请号:US16488165
申请日:2018-02-23
Applicant: Tailorlux GmbH
Inventor: Alex Deitermann
Abstract: A method is claimed for identifying and quantifying a material or mixture of materials, where the material or the mixture of materials comprises one or more components X identifiable by means of spectroscopic methods and/or with a hyperspectral camera. The method comprises the steps ofA. generating one or more signals by excitation with a radiation source in the range of 280-1100 nm and recording thereof by a suitable spectrometer system, a hyperspectral camera or a photodiode, B. evaluating the signal(s) and/or hyperspectral image(s) obtained and assigning the signal(s) and/or hyperspectral image(s) to a component X, and subsequently assigning the identified component X to a material or a mixture of materials, C. quantitatively determining the material or mixture of materials.
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公开(公告)号:US20200249099A1
公开(公告)日:2020-08-06
申请号:US16678945
申请日:2019-11-08
Applicant: SIGMA LABS, INC.
Inventor: Vivek R. Dave , Mark J. Cola , R. Bruce Madigan , Martin S. Piltch , Alberto Castro
IPC: G01K13/00 , G01N21/71 , G01J3/28 , G01J3/443 , B33Y10/00 , B33Y30/00 , B33Y50/00 , B23K26/342 , B23K26/70 , B22F3/105 , B23K9/04 , B23K9/095 , B23K10/02 , B23K15/00
Abstract: An optical manufacturing process sensing and status indication system is taught that is able to utilize optical emissions from a manufacturing process to infer the state of the process. In one case, it is able to use these optical emissions to distinguish thermal phenomena on two timescales and to perform feature extraction and classification so that nominal process conditions may be uniquely distinguished from off-nominal process conditions at a given instant in time or over a sequential series of instants in time occurring over the duration of the manufacturing process. In other case, it is able to utilize these optical emissions to derive corresponding spectra and identify features within those spectra so that nominal process conditions may be uniquely distinguished from off-nominal process conditions at a given instant in time or over a sequential series of instants in time occurring over the duration of the manufacturing process.
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