Abstract:
This invention relates to an electron source and an image forming apparatus each of which particularly comprises a surface conduction type electron emitting element as an electron emitting element, a method of manufacturing an electron source and an image forming apparatus, in which the energization forming treatment step of the surface conduction type electron emitting element is performed by applying a voltage to an electron emitting portion formation thin film via a nonlinear element connected in series with the thin film and having nonlinear voltage/current characteristics, an electron source and an image forming apparatus in each of which the nonlinear element is connected in series with the surface conduction type electron emitting element, and a method of driving the same.
Abstract:
In an image-forming apparatus which includes, on a substrate, an electron beam source comprises plurality of electron-emitting devices, and image-forming members for forming an image upon irradiation of electron beams emitted from the electron-emitting devices, the image-forming members are stripe-shaped members, and the plurality of electron-emitting devices each comprise a negative electrode, an electron-emitting region and a positive electrode which are arranged on the substrate surface side by side in a direction vertical to the direction in which the stripe-shaped members are extending. With the present apparatus, deterioration of image quality is prevented even when the positional relationship between the electron-emitting devices such as cold cathode devices and the image-forming members such as fluorescent substances is deviated from predetermined one during assembly.
Abstract:
An image forming apparatus, according to the present invention, comprises a first substrate whereon are provided a functional element and electric wiring that is connected to the functional element, and a second substrate whereon is an area where an image is to be formed, and wherein, with the first substrate and the second substrate being located opposite to each other, space between the first substrate and the second substrate is kept in a pressure-reduced state so as to form an image in the area on the second substrate, and wherein the electric wiring is formed of a laminated conductive material by a process that plates a printed pattern, which is initially deposited by a printing process.
Abstract:
A matrix addressable flat panel display includes a flat cathode operable for emitting electrons to an anode when an electric field is produced across the surface of the flat cathode by two electrodes placed on each side of the flat cathode. The flat cathode may consist of a cermet or amorphic diamond or some other combination of a conducting material and an insulating material such as a low effective work function material. The electric field produced causes electrons to hop on the surface of the cathode at the conducting-insulating interfaces. An electric field produced between the anode and the cathode causes these electrons to bombard a phosphor layer on the anode.
Abstract:
In a solution for forming electron-emitting regions of electron-emitting devices, the solution contains a metal carboxylate expressed by the following general formula (I), an organic solvent and/or water; (R(COO).sub.k).sub.m M (I) where k=numeral from 1 to 4, m=numeral from 1 to 4, and R=C.sub.n X.sub.2n+1-k where X=hydrogen or halogen (total number of hydrogen and halogen atoms is 2n+1), n=integer from 0 to 30, and M=metal. In a manufacture method of electron-emitting devices each provided between electrodes with a conductive film including an electron-emitting region, a process of forming the conductive film includes a step of coating and calcining the above solution. An image-forming apparatus is manufactured by using the electron-emitting devices. Variations in sheet resistance values of electron-emitting region-forming thin films and characteristics of the electron-emitting devices are reduced.
Abstract:
An electron-emitting device comprises a pair of oppositely disposed electrodes and an electroconductive film inclusive of an electron-emitting region arranged between the electrodes. The electric resistance of the electroconductive film is reduced after forming the electron-emitting region in the course of manufacturing the electron-emitting device.
Abstract:
An electron emitting device causes electron emission by a current supply in a coarse resistor film. The coarse thin resistor film is composed at least of a coarse thin silicon film.
Abstract:
An electron source or electron beam apparatus comprises an electron-emitting device and a shield member disposed above the electron-emitting device. The electron-emitting device generates an electric field component, when energized, that is parallel to a substrate surface on which the electron-emitting device is disposed, while the shield member has an aperture which allows electrons emitted from the electron-emitting device to pass therethrough, but blocks off charged particles flying toward the electron emitting device.
Abstract:
A multi-electron source has a plurality of electron emitting portions arranged on a substrate. Each electron emitting portion comprises a conductive film containing a crack with an average width of 0.05 .mu.m to 1 .mu.m. The electron emitting portions are prepared by subjecting conductive films, preferably of fine particles, to a pulse voltage application treatment.
Abstract:
An electron emitting device causes electron emission by a current supply in a coarse resistor film. The coarse thin resistor film is composed at least of a coarse thin silicon film.