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    Optical phase measurement method and system
    41.
    发明授权
    Optical phase measurement method and system 有权

    公开(公告)号：US10161885B2

    公开(公告)日：2018-12-25

    申请号：US15300768

    申请日：2015-04-12

    Applicant: Nova Measuring Instruments Ltd.

    Inventor： Gilad Barak ,  Danny Grossman ,  Dror Shafir ,  Yoav Berlatzky ,  Yanir Hainick

    IPC: G01N21/956 ,  G01N9/02 ,  G01B11/06 ,  G01N21/88 ,  G01B9/02

    Abstract: A measurement system for use in measuring parameters of a patterned sample is presented. The system comprises: a broadband light source; an optical system configured as an interferometric system; a detection unit; and a control unit. The interferometric system defines illumination and detection channels having a sample arm and a reference arm comprising a reference reflector, and is configured for inducing an optical path difference between the sample and reference arms; the detection unit comprises a configured and operable for detecting a combined light beam formed by a light beam reflected from said reflector and a light beam propagating from a sample's support, and generating measured data indicative of spectral interference pattern formed by at least two spectral interference signatures. The control unit is configured and operable for receiving the measured data and applying a model-based processing to the spectral interference pattern for determining one or more parameters of the pattern in the sample.

    Assembly for producing a plurality of beam bundles
    42.
    发明授权
    Assembly for producing a plurality of beam bundles 有权

    公开(公告)号：US10113711B2

    公开(公告)日：2018-10-30

    申请号：US15038081

    申请日：2014-11-20

    Applicant: NOVA MEASURING INSTRUMENTS LTD.

    Inventor： Stefan Franz

    IPC: F21V7/10 ,  F21V7/06 ,  F21V7/04 ,  F21V7/08 ,  F21V7/05

    Abstract: A mirror assembly is provided for producing beam bundles from the beam of a light source, wherein the beam bundles includes a first beam bundle having a first main beam direction, a second beam bundle having a second main beam direction, and preferably further beam bundles having further main beam directions. The assembly includes a first mirror segment having a first focal point, which converts a first partial region of the beam of the light source into the first beam bundle, a second mirror segment having a second focal point, which converts a second partial region of the beam of the light source into the second beam bundle, and preferably further mirror segments having further focal points, which convert further partial regions of the beam of the light source into further beam bundles. The back side of the mirror segments have a curvature which is concentric to the light source.

    Process control using non-zero order diffraction
    43.
    发明授权
    Process control using non-zero order diffraction 有权

    公开(公告)号：US10048595B2

    公开(公告)日：2018-08-14

    申请号：US15430568

    申请日：2017-02-13

    Applicant: NOVA MEASURING INSTRUMENTS LTD.

    Inventor： Boaz Brill

    IPC: G01B11/04 ,  G03B27/32 ,  G03B27/74 ,  G03F7/20 ,  G01N21/47

    Abstract: A method of controlling a manufacturing process, the method including the steps of a) providing a testing area with a periodic structure, where the periodic structure includes a series of sets of patterned features, b) illuminating the periodic structure with a light, thereby producing a non-zero order diffraction signal, c) collecting the diffraction signal to produce a test signature, d) matching the test signature with a reference signature, where the reference signature was previously produced by performing steps a), b), and c) with respect to a reference structure that is at least similar to the periodic structure, and e) controlling a manufacturing process using a control setting set associated with the matching reference signature.

    Optical critical dimension metrology
    44.
    发明授权
    Optical critical dimension metrology 有权

    公开(公告)号：US10041838B2

    公开(公告)日：2018-08-07

    申请号：US15120847

    申请日：2015-02-23

    Applicant: NOVA MEASURING INSTRUMENTS LTD.

    Inventor： Gilad Barak ,  Dror Shafir ,  Danny Grossman

    IPC: G01J4/00 ,  G01J9/00 ,  G01J9/02 ,  G01B11/02 ,  G01N21/956 ,  G01N21/95 ,  G01N21/21

    Abstract: A metrology system is presented for measuring parameters of a structure. The system comprises: an optical system and a control unit. The optical system is configured for detecting light reflection of incident radiation from the structure and generating measured data indicative of angular phase of the detected light components corresponding to reflections of illuminating light components having different angles of incidence. The control unit is configured for receiving and processing the measured data and generating a corresponding phase map indicative of the phase variation along at least two dimensions, and analyzing the phase map using modeled data for determining one or more parameters of the structure.

    Method and system for improving optical measurements on small targets
    46.
    发明授权
    Method and system for improving optical measurements on small targets 有权

    公开(公告)号：US09927370B2

    公开(公告)日：2018-03-27

    申请号：US15285892

    申请日：2016-10-05

    Applicant: NOVA MEASURING INSTRUMENTS LTD.

    Inventor： Danny Grossman ,  Guy Selickter

    IPC: G01N21/00 ,  G01N21/88 ,  G01N21/956

    CPC classification number: G01N21/8806 ,  G01N21/956 ,  G01N2021/8848

    Abstract: A control system and method are provided for use in managing optical measurements on target structures. The control system comprises: data input utility for receiving input data indicative of a size of a target structure to be measured and input data indicative of illumination and collection channels of an optical measurement system; data processing utility for analyzing the input data, and an interplay of Point Spread Functions (PSFs) of the illumination and collection channels, and determining data indicative of optional tailoring of apertures to be used in the optical measurement system for optimizing ensquared energy for measurements on the given target structure, the optimal tailoring composing at least one of the following: an optimal ratio between numerical apertures of the illumination and collection channels; and an optimal orientation offset of physical apertures in the illumination and collection channels.

    METHOD AND SYSTEM FOR MEASURING PATTERNED STRUCTURES
    49.
    发明申请
    METHOD AND SYSTEM FOR MEASURING PATTERNED STRUCTURES 审中-公开

    公开(公告)号：US20160109225A1

    公开(公告)日：2016-04-21

    申请号：US14935806

    申请日：2015-11-09

    Applicant: NOVA MEASURING INSTRUMENTS LTD.

    Inventor： Moshe FINAROV ,  Boaz BRILL

    IPC: G01B11/24

    CPC classification number: G01B11/24 ,  G01B9/02087 ,  G01J3/45 ,  G01N21/21 ,  H01L22/12 ,  H01L22/20

    Abstract: A method and system are presented for determining a line profile in a patterned structure, aimed at controlling a process of manufacture of the structure. The patterned structure comprises a plurality of different layers, the pattern in the structure being formed by patterned regions and un-patterned regions. At least first and second measurements are carried out, each utilizing illumination of the structure with a broad wavelengths band of incident light directed on the structure at a certain angle of incidence, detection of spectral characteristics of light returned from the structure, and generation of measured data representative thereof. The measured data obtained with the first measurement is analyzed, and at least one parameter of the structure is thereby determined. Then, this determined parameter is utilized, while analyzing the measured data obtained with the second measurements enabling the determination of the profile of the structure

    OPTICAL SYSTEM AND METHOD FOR MEASUREMENT OF ONE OR MORE PARAMETERS OF VIA-HOLES
    50.
    发明申请
    OPTICAL SYSTEM AND METHOD FOR MEASUREMENT OF ONE OR MORE PARAMETERS OF VIA-HOLES 有权
    用于测量一个或多个通道参数的光学系统和方法

    公开(公告)号：US20140376006A1

    公开(公告)日：2014-12-25

    申请号：US14021010

    申请日：2013-09-09

    Applicant: Nova Measuring Instruments Ltd.

    Inventor： DAVID SCHEINER

    IPC: G01B11/00 ,  G01B11/22 ,  G01B11/02 ,  G01B11/08 ,  G01B11/24

    CPC classification number: G01B11/00 ,  G01B11/02 ,  G01B11/08 ,  G01B11/12 ,  G01B11/22 ,  G01B11/24 ,  G01B2210/56 ,  G01R31/2853 ,  G01R31/311 ,  G06T7/0004 ,  G06T2207/30148 ,  H01L22/12 ,  H01L2924/0002 ,  H01L2924/00

    Abstract: Obtaining at least one of a cross-section profile, depth, width, slope, undercut and other parameters of via-holes by a non-destructive technique using an optical system having an illumination system for producing at least one light beam and directing it on a sample in a region of the structure containing at least one via-hole, a detection system configured and operable to collect a pattern of light reflected from the illuminated region, the light pattern being indicative of one or more parameters of said via-hole, and, a control system connected to the detection system, the control system comprising a memory utility for storing a predetermined theoretical model comprising data representative of a set of parameters describing via-holes reflected pattern, and a data processing and analyzing utility configured and operable to receive and analyze image data indicative of the detected light pattern and determine one or more parameters of said via-hole.

    Abstract translation: 通过使用具有用于产生至少一个光束并将其导向的照明系统的光学系统的非破坏性技术来获得通孔的横截面轮廓，深度，宽度，斜率，底切和其他参数中的至少一个 所述结构的区域中的样品包含至少一个通孔，检测系统被配置和可操作以收集从所述被照射区域反射的光的图案，所述光图案指示所述通孔的一个或多个参数， 以及连接到所述检测系统的控制系统，所述控制系统包括用于存储预定理论模型的存储器实用程序，所述预定理论模型包括表示描述通孔反射模式的一组参数的数据，以及配置和可操作的数据处理和分析实用程序 接收和分析指示检测到的光图案的图像数据，并确定所述通孔的一个或多个参数。

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