中科微点-全球专利检索

  1. Login
  2. Sign Up

Search Results

107 records (took 0.017 seconds)

    Method for making a micromechanical device by removing a sacrificial layer with multiple sequential etchants
    44.
    发明申请
    Method for making a micromechanical device by removing a sacrificial layer with multiple sequential etchants 审中-公开
    通过用多个顺序蚀刻剂去除牺牲层来制造微机械装置的方法

    公开(公告)号：US20050045276A1

    公开(公告)日：2005-03-03

    申请号：US10922565

    申请日：2004-08-19

    Applicant: Satyadev Patel ,  Andrew Huibers ,  Gregory Schaadt ,  Peter Heureux

    Inventor： Satyadev Patel ,  Andrew Huibers ,  Gregory Schaadt ,  Peter Heureux

    IPC: B81B3/00 ,  C23F1/00 ,  H01L21/00 ,  H01L21/302 ,  H01L21/306 ,  H01L21/461

    CPC classification number: B81C1/00476 ,  B81C1/00547 ,  B81C2201/0109 ,  B81C2201/0132 ,  B81C2201/0133 ,  B81C2201/112 ,  B82Y30/00

    Abstract: An etching method, such as for forming a micromechanical device, is disclosed. One embodiment of the method is for releasing a micromechanical structure, comprising, providing a substrate; providing a sacrificial layer directly or indirectly on the substrate; providing one or more micromechanical structural layers on the sacrificial layer; performing a first etch to remove a portion of the sacrificial layer, the first etch comprising providing an etchant gas and energizing the etchant gas so as to allow the etchant gas to physically, or chemically and physically, remove the portion of the sacrificial layer; performing a second etch to remove additional sacrificial material in the sacrificial layer, the second etch comprising providing a gas that chemically but not physically etches the additional sacrificial material. Another embodiment of the method is for etching a silicon material on or within a substrate, comprising: performing a first etch to remove a portion of the silicon, the first etch comprising providing an etchant gas and energizing the etchant gas so as to allow the etchant gas to physically, or chemically and physically, remove the portion of silicon; performing a second etch to remove additional silicon, the second etch comprising providing an etchant gas that chemically but not physically etches the additional silicon.

    Abstract translation: 公开了一种诸如用于形成微机械装置的蚀刻方法。 该方法的一个实施例是用于释放微机械结构，包括：提供衬底; 在衬底上直接或间接提供牺牲层; 在所述牺牲层上提供一个或多个微机械结构层; 执行第一蚀刻以去除牺牲层的一部分，所述第一蚀刻包括提供蚀刻剂气体并激发蚀刻剂气体，以允许蚀刻剂气体在物理或化学和物理上移除牺牲层的该部分; 执行第二蚀刻以去除牺牲层中的附加牺牲材料，第二蚀刻包括提供化学上但不物理蚀刻附加牺牲材料的气体。 该方法的另一实施例是用于在衬底上或衬底内蚀刻硅材料，包括：执行第一蚀刻以去除硅的一部分，第一蚀刻包括提供蚀刻剂气体并激发蚀刻剂气体以允许蚀刻剂 物理或化学和物理的气体去除硅的部分; 执行第二蚀刻以去除附加的硅，第二蚀刻包括提供蚀刻剂气体，其化学地但不物理地蚀刻附加的硅。

    Micromirror array device with a small pitch size
    45.
    发明申请
    Micromirror array device with a small pitch size 有权
    具有小间距尺寸的微镜阵列器件

    公开(公告)号：US20050018091A1

    公开(公告)日：2005-01-27

    申请号：US10627155

    申请日：2003-07-24

    Applicant: Satyadev Patel ,  Andrew Huibers

    Inventor： Satyadev Patel ,  Andrew Huibers

    IPC: G02B26/08 ,  H04N5/74

    CPC classification number: B82Y30/00 ,  G02B26/0841 ,  H04N5/7458

    Abstract: A spatial light modulator is disclosed, along with a method for making such a modulator that comprises an array of micromirror devices. The center-to-center distance and the gap between adjacent micromirror devices are determined corresponding to the light source being used so as to optimize optical efficiency and performance quality. The micromirror device comprises a hinge support formed on a substrate and a hinge that is held by the hinge support. A mirror plate is connected to the hinge via a contact, and the distance between the mirror plate and the hinge is determined according to desired maximum rotation angle of the mirror plate, the optimum gap and pitch between the adjacent micromirrors. In a method of fabricating such spatial light modulator, one sacrificial layer is deposited on a substrate followed by forming the mirror plates, and another sacrificial layer is deposited on the mirror plates followed by forming the hinge supports. The two sacrificial layers are removed via the small gap between adjacent mirror devices with spontaneous vapor phase chemical etchant. Also disclosed is a projection system that comprises such a spatial light modulator, as well as a light source, condensing optics, wherein light from the light source is focused onto the array of micromirrors, projection optics for projecting light selectively reflected from the array of micromirrors onto a target, and a controller for selectively actuating the micromirrors in the array.

    Abstract translation: 公开了一种空间光调制器，以及用于制造这样的调制器的方法，该调制器包括微镜器件阵列。 根据所使用的光源确定中心到中心的距离和相邻的微反射镜装置之间的间隙，以优化光学效率和性能质量。 微反射镜装置包括形成在基底上的铰链支撑件和由铰链支撑件保持的铰链。 镜板通过触点连接到铰链，并且根据镜板的期望的最大旋转角度，相邻微镜之间的最佳间隙和间距来确定镜板和铰链之间的距离。 在制造这种空间光调制器的方法中，将一个牺牲层沉积在衬底上，随后形成镜板，并且另一牺牲层沉积在镜板上，随后形成铰链支架。 通过具有自发气相化学蚀刻剂的相邻反射镜装置之间的小间隙去除两个牺牲层。 还公开了一种投影系统，其包括这样的空间光调制器以及光源，聚光光学器件，其中来自光源的光聚焦到微镜阵列上，用于投射从微镜阵列反射的光的投影光学器件 以及用于选择性地致动阵列中的微镜的控制器。

    Performance analyses of micromirror devices
    47.
    发明授权
    Performance analyses of micromirror devices 有权
    微镜器件的性能分析

    公开(公告)号：US07483126B2

    公开(公告)日：2009-01-27

    申请号：US10875760

    申请日：2004-06-23

    Applicant: Igor Volfman ,  Andrew Huibers ,  Satyadev Patel ,  Peter Richards ,  Leonid Frenkel ,  Jim Dunphy ,  Regis Grasser ,  Greg Schaadt

    Inventor： Igor Volfman ,  Andrew Huibers ,  Satyadev Patel ,  Peter Richards ,  Leonid Frenkel ,  Jim Dunphy ,  Regis Grasser ,  Greg Schaadt

    IPC: G01N21/88 ,  G02B26/00

    CPC classification number: G01N21/55 ,  G01N21/95

    Abstract: The invention provides a method and apparatus for evaluating the product quality and performances of micromirror array devices through measurements of the electromechanical responses of the individual micromirrors to the driving forces of electric fields. The electromechanical responses of the micromirrors according to the present invention are described in terms of the rotational angles associated with the operational states, such as the ON and OFF state angles of the ON and OFF state when the micromirror array device is operated in the binary-state mode, and the response speed (i.e. the time interval required for a micromirror device to transit form one state to another) of the individual micromirrors to the driving fields.

    Abstract translation: 本发明提供一种用于通过测量各个微镜对电场驱动力的机电响应来评估微镜阵列器件的产品质量和性能的方法和装置。 根据本发明的微反射镜的机电响应以与操作状态相关联的旋转角度进行描述，例如当微镜阵列器件在二进制编码器中操作时，ON和OFF状态的ON和OFF状态角， 状态模式以及各个微镜对驱动场的响应速度（即，微镜器件从一个状态转移到另一个状态所需的时间间隔）。

    Spatial light modulators with non-uniform pixels
    49.
    发明授权
    Spatial light modulators with non-uniform pixels 有权
    具有不均匀像素的空间光调制器

    公开(公告)号：US07158279B2

    公开(公告)日：2007-01-02

    申请号：US10969503

    申请日：2004-10-19

    Applicant: Satyadev Patel ,  Regis Grasser ,  Andrew Huibers ,  Peter Heureux

    Inventor： Satyadev Patel ,  Regis Grasser ,  Andrew Huibers ,  Peter Heureux

    IPC: G02B26/00 ,  G02B26/08

    CPC classification number: G02B26/0833 ,  G02B26/0841 ,  H04N9/3114 ,  Y10S359/904

    Abstract: A micromirror array comprises micromirrors of different properties for use particularly in display systems. Micromirrors of different properties can be arranged within the micromirror array according to a predetermined pattern, or randomly. However, it is advantageous to arrange the micromirrors with different properties within the micromirror array neither in complete order nor complete in random.

    Abstract translation: 微镜阵列包括用于特别在显示系统中的不同性质的微镜。 可以根据预定图案或随机地将不同性质的微镜布置在微镜阵列内。 然而，有利的是在微镜阵列内布置具有不同特性的微反射镜，既不是完全顺序的也不是随机完成的。

    Micromirror having offset addressing electrode
    50.
    发明授权
    Micromirror having offset addressing electrode 有权
    具有偏移寻址电极的微镜

    公开(公告)号：US07113322B2

    公开(公告)日：2006-09-26

    申请号：US10947005

    申请日：2004-09-21

    Applicant: Satyadev Patel

    Inventor： Satyadev Patel

    IPC: G02B26/00

    CPC classification number: G02B26/0841

    Abstract: The micromirror device of the present invention comprises a reflective deflectable mirror plate and an addressing electrode provided for deflecting the mirror plate, wherein the addressing electrode is displaced along a direction perpendicular to the length of the hinge such that a portion of the addressing electrode is extended beyond the mirror plate.

    Abstract translation: 本发明的微反射镜装置包括反射偏转镜板和用于偏转镜板的寻址电极，其中寻址电极沿垂直于铰链长度的方向移位，使得寻址电极的一部分延伸 超越镜面板。

Patent Agency Ranking