Abstract:
A semiconductor device with its package size close to its chip size has a stress absorbing layer, allows a patterned flexible substrate to be omitted, and allows a plurality of components to be fabricated simultaneously. There is: a step of forming electrodes (12) on a wafer (10); a step of providing a resin layer (14) as a stress relieving layer on the wafer (10), avoiding the electrodes (12); a step of forming a chromium layer (16) as wiring from electrodes (12) over the resin layer (14); a step of forming solder balls as external electrodes on the chromium layer (16) over the resin layer (14); and a step of cutting the wafer (10) into individual semiconductor chips; in the steps of forming the chromium layer (16) and solder balls, metal thin film fabrication technology is used during the wafer process.
Abstract:
This is a semiconductor device, a method of the same, a circuit board, and a flexible substrate that are easy to handle, enable quality assurance, and also enable batch connection of a flexible substrate to the electrodes of a semiconductor chip. A gap preservation member 16 is provided on a surface, of a flexible substrate 12, on which connection portions 24 to electrodes 14 of a semiconductor chip 10 are disposed. The semiconductor chip 10 and the flexible substrate 12 are arranged in a state in which the gap preservation member 16 is interposed therebetween. The connection portions 24 provided on the flexible substrate 12 are connected to the electrodes 14 of the semiconductor chip 10, and a molding material is injected to provide a stress absorption layer 26.
Abstract:
A method of manufacturing a semiconductor device comprising the steps of: forming a bump projecting from a first surface of a semiconductor chip; and forming a conductive layer so that part of the conductive layer is exposed at a position depressed from a second surface of the semiconductor chip opposite to the first surface, wherein the exposed part of the conductive layer and the bump become electrical connecting sections.
Abstract:
The present invention is a semiconductor device with improved adhesion properties of a resin with a wiring pattern, comprising a film fragment 14 having a patterned wiring pattern 16 including a projection 17, a semiconductor chip 12 having electrodes 13 bonded to the projection 17, and a resin 19 provided to the wiring pattern 16 in the region other than that of the projection 17; and the wiring pattern 16 has its surface of contact with the resin 19 roughened.
Abstract:
The present invention is a semiconductor device capable of relieving thermal stress without breaking wire. It comprises a semiconductor chip (12), a solder ball (20) for external connection, wiring (18) for electrically connecting the semiconductor chip (12) and the solder ball (20), a stress relieving layer (16) provided on the semiconductor chip (12), and a stress transmission portion (22) for transmitting stress from the solder ball (20) to the stress relieving layer (16) in a peripheral position of an electrical connection portion (24a) of the solder ball (20) and wiring (18).
Abstract:
A wiring board comprises a substrate (10) in which an opening (14) is formed, a wiring pattern (20) formed on one surface of the substrate (10) and having a bent portion (22) intruding into the opening (14) and protruding from the other surface of the substrate (10), and a resin 26 with which an inside of the bent portion (22) is filled and allowing deformation to a certain degree while preventing large deformation, and the bent portion (22) forms the external terminals of the semiconductor device.
Abstract:
A semiconductor device with its package size close to its chip size has a stress absorbing layer, allows a patterned flexible substrate to be omitted, and allows a plurality of components to be fabricated simultaneously. There is: a step of forming electrodes (12) on a wafer (10); a step of providing a resin layer (14) as a stress relieving layer on the wafer (10), avoiding the electrodes (12); a step of forming a chromium layer (16) as wiring from electrodes (12) over the resin layer (14); a step of forming solder balls as external electrodes on the chromium layer (16) over the resin layer (14); and a step of cutting the wafer (10) into individual semiconductor chips; in the steps of forming the chromium layer (16) and solder balls, metal thin film fabrication technology is used during the wafer process.
Abstract:
A semiconductor device comprising an insulating film having a device hole, a plurality of bumps formed on the insulating film, a plurality of first leads having end faces thereof exposed on an outline edge of the insulating film, each of the first leads being electroplated and connected with one of the bumps, a plurality of second leads having end portions thereof protruding into the device hole, each of the second leads being electroplated and connected with one of the bumps, and a semiconductor chip connected with the end portions of the second leads in the device hole. The insulating film is outlined to have a cut in a region including each of the exposed end faces of the first leads.
Abstract:
The invention relates to a semiconductor device formed by using a film carrier tape and having a package size that is close to the chip size, and also to a semiconductor device and a making method therefor which facilitates the injection of resin for sealing. A film carrier tape 32 comprises a plurality of connection leads (24); portions defining holes (29, 31) formed by punching out connection portions, where any one of the connection leads (24) are connected together, and by punching out an intersection portion; and portions defining rectangular holes (11, 15). Resin is injected through rectangular holes (11, 15), rectangular holes (12, 14) stop the spreading of the resin, and holes (29, 31) allow air to escape from the resin.
Abstract:
Method of fabricating semiconductor devices comprising the steps of: mounting a plurality of semiconductor chips on a film carrier tape; sealing each one of the semiconductor chips mounted on the film carrier type with epoxy resin; attaching an individual stiffener to the film carrier tape at a position corresponding to each one of the semiconductor chips; forming a plurality of bumps on the film carrier tape at a position corresponding to each one of the semiconductor chips; and punching out the film carrier tape into separate pieces of insulating film after above-described steps. In this method, each step is carried out on the film carrier tape running between supply and take-up reels.