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41.发明授权公开(公告)号：US10731210B2
公开(公告)日：2020-08-04
申请号：US15886511
申请日：2018-02-01
Applicant: SEAGATE TECHNOLOGY LLC
Inventor： Kim Yang Lee , Thomas Young Chang , David S. Kuo , ShuaiGang Xiao , Xiaomin Yang , Koichi Wago
IPC: G01N27/327 , C12Q1/6869 , B81C1/00 , G01N27/447 , B01L3/00
Abstract: A DNA sequencing device and related methods, wherein the device includes a substrate, a nanochannel formed in the substrate, a first electrode positioned on a first side of the nanochannel, and a second electrode. The second electrode is positioned on a second side of the nanochannel opposite the first electrode, and is spaced apart from the first electrode to form an electrode gap that is exposed in the nanochannel. At least a portion of first electrode is movable relative to the second electrode to decrease a size of the electrode gap.
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公开(公告)号：US10529366B2
公开(公告)日：2020-01-07
申请号：US15484647
申请日：2017-04-11
Applicant: Seagate Technology LLC
Inventor： Austin P. Lane , Xiaomin Yang , ShuaiGang Xiao , Kim Yang Lee , David S. Kuo
Abstract: A data storage medium may have increased data capacity by being configured with first and second patterned pedestals that are each separated from a substrate by a seed layer. A first polymer brush layer can be positioned between the first and second patterned pedestals atop the seed layer and a second polymer brush layer may be positioned atop each patterned pedestal. The first and second polymer brush layers may be chemically different and a block copolymer can be deposited to self-assemble into separate magnetic domains aligned with either the first or second polymer brush layers.
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公开(公告)号：US09837274B2
公开(公告)日：2017-12-05
申请号：US15055303
申请日：2016-02-26
Applicant: Seagate Technology LLC
Inventor： XiaoMin Yang , Shuaigang Xiao , Yautzong Hsu , Zhaoning Yu , Kim Y. Lee , David S. Kuo
IPC: H01L21/00 , H01L21/033 , G03F7/00 , G11B5/74
CPC classification number: H01L21/0338 , G03F7/0002 , G11B5/746 , H01L21/0332 , H01L21/0335 , H01L21/0337
Abstract: Provided is an apparatus that includes a substrate; a first hard-mask pattern that includes a number of first features disposed over a top surface of the substrate; and a second hard-mask pattern disposed over the first hard-mask layer. The second hard-mask pattern includes a number of second features overlapping one or more of the first features.
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公开(公告)号：US09809887B2
公开(公告)日：2017-11-07
申请号：US15052701
申请日：2016-02-24
Applicant: Seagate Technology LLC
Inventor： Michael R. Feldbaum , Justin Jia-Jen Hwu , David S. Kuo , Gennady Gauzner , Kim Yang Lee , Li-Ping Wang
CPC classification number: C23F4/00 , B82Y10/00 , B82Y40/00 , G03F7/0002 , G11B5/855 , Y10T428/265
Abstract: The embodiments disclose a method of fabricating a stack, including replacing a metal layer of a stack imprint structure with an oxide layer, patterning the oxide layer stack using chemical etch processes to transfer the pattern image and cleaning etch residue from the stack imprint structure to substantially prevent contamination of the metal layers.
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公开(公告)号：US09797924B2
公开(公告)日：2017-10-24
申请号：US14783403
申请日：2013-04-17
Applicant: SEAGATE TECHNOLOGY LLC
Inventor： Gennady Gauzner , Zhaoning Yu , Nobuo Kurataka , David S. Kuo , Kim Y Lee , Yautzong Hsu , Hong Ying Wang
CPC classification number: G01Q40/02 , G01N21/01 , G01N2201/13 , G01Q40/00 , G03F7/0002 , H01J37/261 , H01J37/263 , H01J2237/2602 , H01J2237/2826
Abstract: Provided herein in an apparatus, including a substrate; a functional layer, wherein the functional layer has a composition characteristic of a workpiece of an analytical apparatus; and pre-determined features configured to calibrate the analytical apparatus. Also provided herein is an apparatus, including a functional layer overlying a substrate; and pre-determined features for calibration of an analytical apparatus configured to measure the surface of a workpiece, wherein the functional layer has a composition similar to the workpiece. Also provided herein is a method, including providing a lithographic calibration standard having a functional layer to an analytical apparatus, wherein the functional layer has a composition characteristic of a workpiece of the analytical apparatus; providing calibration standard specifications to a computer interfaced with the analytical apparatus; and calibrating the analytical apparatus in accordance with calibration standard readings and the calibration standard specifications.
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Patent Agency Ranking
公开(公告)号：US20170084300A1
公开(公告)日：2017-03-23
申请号：US15233277
申请日：2016-08-10
Applicant: Seagate Technology LLC
Inventor： ShuaiGang Xiao , XiaoMin Yang , David S. Kuo , Kim Yang Lee , Yautzong Hsu
CPC classification number: G11B5/855 , G11B5/59633 , G11B20/1217 , G11B2020/1281
Abstract: Provided herein is a method including forming a data zone guiding pattern and forming a servo zone guiding pattern. A servo pattern and a data pattern are simultaneously formed. Directed self-assembly of block copolymers is guided by the data zone guiding pattern and the servo zone guiding pattern.
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公开(公告)号：US20170025140A1
公开(公告)日：2017-01-26
申请号：US14824995
申请日：2015-04-16
Applicant: SEAGATE TECHNOLOGY LLC
Inventor： Shuaigang Xiao , David S. Kuo , XiaoMin Yang , Kim Y. Lee , Yautzong Hsu , David Koichi
CPC classification number: G11B5/59638 , G11B5/59655 , G11B5/746 , G11B5/84 , G11B5/855 , G11B20/1217 , G11B2020/1281
Abstract: Provided herein is an apparatus, including a first region of a substrate corresponding to a data region in a patterned recording medium; a first set of protrusions etched out of the first region of the substrate, wherein the protrusions of the first set of protrusions are rectangle shaped; a second region of the substrate corresponding to a servo region in a patterned recording medium; and a second set of protrusions etched out of the second region of the substrate, wherein the second set of protrusions includes radial lines etched into the substrate across chevrons etched out of the substrate.
Abstract translation: 本文提供了一种装置，包括对应于图案化记录介质中的数据区的基板的第一区域; 从所述基板的第一区域蚀刻出的第一组突起，其中所述第一组突起的突起是矩形的; 所述衬底的第二区域对应于图案化记录介质中的伺服区域; 以及从衬底的第二区域蚀刻出的第二组突起，其中所述第二组突起包括在从所述衬底蚀刻出的人字形上蚀刻到所述衬底中的径向线。
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公开(公告)号：US09460747B2
公开(公告)日：2016-10-04
申请号：US14830534
申请日：2015-08-19
Applicant: Seagate Technology LLC
Inventor： Yuan Xu , Kim Y. Lee , David S. Kuo , Koichi Wago , Wei Hu
CPC classification number: G11B5/84 , G11B5/746 , G11B5/855 , Y10T428/24479 , Y10T428/24802
Abstract: A method for nano-patterning includes imprinting features in a resist with an imprint mold to form one or more topographic surface patterns on the imprinted resist. A block copolymer (“BCP”) material is deposited on the imprinted resist, wherein a molecular dimension L0 of the BCP material correlates by an integer multiple to a spacing dimension of the one or more topographic surface patterns on the imprinted resist. The deposited BCP is annealed and at least a portion of the annealed BCP is removed, forming a template having discrete domains.
Abstract translation: 纳米图案的方法包括在抗蚀剂中用压印模具压印特征以在印刷抗蚀剂上形成一个或多个形貌表面图案。 在印刷抗蚀剂上沉积嵌段共聚物（“BCP”）材料，其中BCP材料的分子尺寸L0与印迹抗蚀剂上的一个或多个形貌表面图案的间隔尺寸相关联。 将沉积的BCP退火，并且去除退火的BCP的至少一部分，形成具有离散区域的模板。
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公开(公告)号：US09349402B2
公开(公告)日：2016-05-24
申请号：US14618992
申请日：2015-02-10
Applicant: SEAGATE TECHNOLOGY LLC
Inventor： Xi Chen , Ganping Ju , Yingguo Peng , Timothy J. Klemmer , Yukiko Kubota , Jan-Ulrich Thiele , David S. Kuo , Kai-Chieh Chang , Kangkang Wang , Li Gao , Yinfeng Ding
CPC classification number: G11B5/66 , G11B5/746 , G11B5/8404 , G11B5/855 , G11B2005/0021
Abstract: Provided herein is an apparatus comprising a substrate; a continuous layer over the substrate comprising a first heat sink layer; and a plurality of features over the continuous layer comprising a second heat sink layer, a first magnetic layer over the second heat sink layer, and a second magnetic layer, wherein the first and second magnetic layers are configured to provide a temperature-dependent, exchange spring mechanism.
Abstract translation: 本文提供了一种包括基底的装置; 在衬底上的连续层，包括第一散热层; 以及连续层上的多个特征，包括第二散热层，第二散热层上的第一磁性层和第二磁性层，其中第一和第二磁性层被配置成提供温度依赖性的交换 弹簧机构。
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公开(公告)号：US09245566B2
公开(公告)日：2016-01-26
申请号：US14154018
申请日：2014-01-13
Applicant: Seagate Technology LLC
Inventor： Shuaigang Xiao , Thomas Young Chang , Yingguo Peng , David S. Kuo , Kaizhong Gao , Thomas P. Nolan , Ganping Ju
CPC classification number: G11B5/7325 , G11B5/84 , G11B5/855
Abstract: A perpendicular magnetic media includes a substrate, a patterned template, a seed layer and a magnetic layer. The patterned template is formed on the substrate and includes a plurality of growth sites that are evenly spaced apart from each other. The seed layer is formed over the patterned template and the exposed areas of the substrate. Magnetic material is sputter deposited onto the seed layer with one grain of the magnetic material nucleated over each of the growth sites. The grain size distribution of the magnetic material is reduced by controlling the locations of the growth sites which optimizes the performance of the perpendicular magnetic media.
Abstract translation: 垂直磁性介质包括衬底，图案化模板，种子层和磁性层。 图案化模板形成在基板上并且包括彼此均匀间隔开的多个生长位点。 种子层形成在图案化模板和基板的暴露区域上。 将磁性材料溅射沉积到种子层上，其中一颗磁性材料成核在每个生长位点上。 通过控制优化垂直磁性介质性能的生长部位的位置来减小磁性材料的粒度分布。
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