公开(公告)号：US20040033318A1

公开(公告)日：2004-02-19

申请号：US10376253

申请日：2003-03-03

Applicant: SEIKO EPSON CORPORATION ,  YOUTEC CO., LTD.

Inventor： Takeshi Kijima ,  Eiji Natori ,  Mitsuhiro Suzuki

IPC: C08F002/46 ,  C08J007/00 ,  C08F002/48 ,  G21H001/00 ,  B05D003/00 ,  C08J007/18 ,  G21H005/00 ,  B06B001/00 ,  B01J019/08 ,  B01J019/10 ,  B05C005/00 ,  B05B007/00 ,  B05C015/00 ,  B05B005/025 ,  B05C009/08

CPC classification number: C23C18/1216 ,  B01J3/008 ,  B01J19/0013 ,  B01J19/123 ,  B01J19/125 ,  B01J19/1887 ,  B01J2219/00058 ,  B05D1/025 ,  B05D2401/90 ,  C23C18/12 ,  C23C18/1283 ,  C23C18/1287 ,  C23C18/14 ,  Y02P20/544

Abstract: To provide an apparatus and method for forming a thin-film using raw material fluid containing a film ingredient and supercritical fluid or liquid. An apparatus according to the present invention is used for forming a thin-film using raw material fluid containing alcohol, supercritical fluid or liquid carbon dioxide, and a condensation polymer containing an element of a target metal oxide compound. This apparatus includes a substrate holder 2 for retaining a substrate 3, a film-forming chamber 1 for housing the substrate holder, a feeding means for feeding the raw material fluid to the substrate surface, and a lamp heater 4 for heating the substrate 3 retained to the substrate holder 2. Thereby, the thin-film can be formed using the raw material fluid containing a film ingredient and the supercritical fluid or liquid.

Abstract translation: 提供使用含有膜成分和超临界流体或液体的原料流体形成薄膜的装置和方法。 根据本发明的装置用于使用含有醇，超临界流体或液体二氧化碳的原料流体和含有目标金属氧化物化合物元素的缩聚物形成薄膜。 该装置包括用于保持基板3的基板保持件2，用于容纳基板保持件的成膜室1，用于将原料流体供给到基板表面的进给装置和用于加热保持的基板3的灯加热器4 由此，可以使用含有膜成分和超临界流体或液体的原料液形成薄膜。

公开(公告)号：US06652920B2

公开(公告)日：2003-11-25

申请号：US10207294

申请日：2002-07-29

Applicant: Ruben G. Carbonell ,  Joseph M. DeSimone ,  Brian J. Novick

Inventor： Ruben G. Carbonell ,  Joseph M. DeSimone ,  Brian J. Novick

IPC: B05D118

CPC classification number: D06B1/08 ,  B05D1/18 ,  B05D2401/90 ,  D06B3/10 ,  D06M23/00 ,  D06M23/10 ,  D06M23/105

Abstract: A method of coating a substrate comprises immersing a surface portion of a substrate in a first phase comprising carbon dioxide and a coating component comprising a polymeric precursor; then withdrawing the substrate from the first phase into a distinct second phase so that the coating component is deposited on the surface portion; and then subjecting the substrate to conditions sufficient to polymerize the polymeric precursor and form a polymerized coating.

Abstract translation: 涂覆基材的方法包括将基材的表面部分浸入包含二氧化碳的第一相和包含聚合物前体的涂料组分; 然后将衬底从第一相中提取到不同的第二相中，使得涂层组分沉积在表面部分上; 然后使基底经受足以使聚合物前体聚合并形成聚合涂层的条件。

公开(公告)号：US20030134049A1

公开(公告)日：2003-07-17

申请号：US10207294

申请日：2002-07-29

Inventor： Ruben G. Carbonell ,  Joseph M. DeSimone ,  Brian J. Novick

IPC: B05D001/18

CPC classification number: D06B1/08 ,  B05D1/18 ,  B05D2401/90 ,  D06B3/10 ,  D06M23/00 ,  D06M23/10 ,  D06M23/105

Abstract: A method of coating a substrate comprises immersing a surface portion of a substrate in a first phase comprising carbon dioxide and a coating component comprising a polymeric precursor; then withdrawing the substrate from the first phase into a distinct second phase so that the coating component is deposited on the surface portion; and then subjecting the substrate to conditions sufficient to polymerize the polymeric precursor and form a polymerized coating.

Abstract translation: 涂覆基材的方法包括将基材的表面部分浸入包含二氧化碳的第一相和包含聚合物前体的涂料组分; 然后将衬底从第一相中提取到不同的第二相中，使得涂层组分沉积在表面部分上; 然后使基底经受足以使聚合物前体聚合并形成聚合涂层的条件。

公开(公告)号：US20030064149A1

公开(公告)日：2003-04-03

申请号：US10241999

申请日：2002-09-12

Inventor： Seth A. Miller

IPC: B05D005/06

CPC classification number: G02B26/0841 ,  B05D1/025 ,  B05D2401/90 ,  B81B3/0005 ,  B81C1/0096 ,  B81C2201/112 ,  B81C2201/117

Abstract: A method of coating one or more surfaces of a micromechanical device. The coating is applied as a material dissolved in CO2. The CO2 is used a carrier solvent, with the coating being applied as a spray or in liquid form, to form a film on the surface. The CO2 may be used in supercritical form to dissolve the material.

Abstract translation: 一种涂覆微机械装置的一个或多个表面的方法。 将涂层作为溶解在二氧化碳中的材料施加。 使用CO 2作为载体溶剂，涂层以喷雾或液体形式施用，以在表面上形成膜。 CO2可以以超临界形式使用，以溶解材料。

公开(公告)号：US20020164419A1

公开(公告)日：2002-11-07

申请号：US10005175

申请日：2001-12-03

Inventor： Hitoshi Fukushima ,  Satoru Miyashita ,  Masaya Ishida ,  Andrew Holmes ,  Wilhelm Huck

IPC: C23C016/00

CPC classification number: B82Y30/00 ,  B05D1/185 ,  B05D2401/90 ,  B82Y40/00 ,  H01L51/0075 ,  Y02P30/48

Abstract: A self-assembled monolayer (SAM) is fabricated using either a semi-fluorinated sulphur containing compound, or a sem-fluorinated silane derivative and compressed carbon dioxide (CO2) as the solvent medium. The temperature and/or pressure of the compressed CO2 may be varied during the fabrication process to improve the molecular packing density of the monolayer. By using compressed CO2 as the solvent medium, monolayers with good molecular packing density can be fabricated relatively quickly without the use of environmentally unfriendly solvents.

公开(公告)号：US20020025384A1

公开(公告)日：2002-02-28

申请号：US09921376

申请日：2001-08-02

Inventor： James B. McClain ,  Timothy J. Romack ,  James P. DeYoung

IPC: B05D001/18

CPC classification number: B05D1/18 ,  B05D2401/90 ,  C23C26/00 ,  C23C30/00 ,  D06M15/277 ,  D06M15/643 ,  D06M23/10 ,  D06M23/105 ,  D06M2101/06 ,  D06M2101/08 ,  D06M2101/12 ,  D06M2101/32 ,  D06M2101/34 ,  D06M2200/12

Abstract: A method of treating a substrate comprises contacting a surface of said substrate, with a pressurized fluid comprising carbon dioxide and a surface treatment component, the surface treatment component being entrained in the pressurized fluid and contacting the surface so that the surface treatment component lowers the surface tension of the surface of the substrate and treats the substrate. The contacting step is preferably carried out by immersion, the fluid is preferably a liquid or supercritical fluid, the substrate is preferably a metal or fabric substrate, and the surface treatment component is preferably a fluoroacrylate polymer.

Abstract translation: 处理基材的方法包括使所述基材的表面与包含二氧化碳和表面处理组分的加压流体接触，所述表面处理组分被夹带在加压流体中并与表面接触，使得表面处理组分降低表面 衬底表面的张力并处理衬底。 接触步骤优选通过浸渍进行，流体优选为液体或超临界流体，基底优选为金属或织物基底，并且表面处理组分优选为氟代丙烯酸酯聚合物。

公开(公告)号：US20020018815A1

公开(公告)日：2002-02-14

申请号：US09858998

申请日：2001-05-16

Inventor： Robert E. Sievers ,  Uwe Karst

IPC: A61K009/14 ,  B29B009/00

CPC classification number: A61K9/008 ,  A61K9/124 ,  A61K9/1688 ,  A61M15/00 ,  B01F3/0092 ,  B01F3/06 ,  B01F3/068 ,  B01F5/02 ,  B01F5/0287 ,  B01F2003/0064 ,  B01F2003/061 ,  B01F2215/0032 ,  B01J3/008 ,  B05B7/32 ,  B05B12/1418 ,  B05D1/025 ,  B05D2401/90 ,  Y02P20/544

Abstract: Methods and apparatuses are provided for forming fine particles of a desired substance comprising dissolving said substance in a fluid such as water to form a solution and mixing the solution with a second fluid such as supercritical carbon dioxide which becomes a gas upon rapid pressure release, and with which the first fluid is at least partially immiscible, and releasing the pressure to form an air-borne dispersion or aerosol comprising particles having an average diameter between about 0.1 and about 6.5 nullm.

Abstract translation: 提供了用于形成所需物质的细颗粒的方法和装置，包括将所述物质溶解在诸如水的流体中以形成溶液，并将溶液与快速释放时成为气体的第二流体例如超临界二氧化碳混合，以及 其中第一流体至少部分地不混溶，并释放压力以形成包含平均直径在约0.1至约6.5μm之间的颗粒的空气传播分散体或气溶胶。

公开(公告)号：US20010009713A1

公开(公告)日：2001-07-26

申请号：US09765987

申请日：2001-01-19

Inventor： Maureen M. Lein ,  Ellen M. Lord ,  Richard C. Eisfeller ,  Mark E. Dukeshire ,  Richard W. Finch ,  Alfred T. Poliquin ,  Gerard L. Vachon ,  John B. Clark ,  Stephen P. McLaughlin ,  Robert D. Sparling

IPC: B32B007/02

CPC classification number: B05D5/068 ,  B05D1/025 ,  B05D2401/90 ,  C23C14/20 ,  C23C28/00 ,  Y10T428/24802 ,  Y10T428/24851 ,  Y10T428/24868 ,  Y10T428/24942 ,  Y10T428/31678 ,  Y10T428/31681

Abstract: A process for manufacturing a metallized substrate using the island coating method, includes depositing a coating layer containing a radiation curable non-volatile film former. The coated part is then vacuum metallized to form the metal islands of the present invention. A layer of clear resinous protective dielectric topcoat containing a radiation curable non-volatile film former is then deposited to completely cover the layer of metal islands while maintaining the aesthetic properties of the metallizing island coating system at a reduced cost and with minimal variability among parts.

Abstract translation: 使用岛涂法制造金属化基板的方法包括沉积包含可辐射固化的非挥发性成膜剂的涂层。 然后将涂覆的部分真空金属化以形成本发明的金属岛。 然后沉积包含可辐射固化的非挥发性成膜剂的透明树脂保护性电介质顶涂层，以完全覆盖金属岛的层，同时以降低的成本并且在部件之间具有最小的变化性的同时保持金属化岛涂层系统的美学特性。

公开(公告)号：US06187383B1

公开(公告)日：2001-02-13

申请号：US09479566

申请日：2000-01-07

Applicant: James B. McClain ,  Timothy J. Romack ,  James P. DeYoung

Inventor： James B. McClain ,  Timothy J. Romack ,  James P. DeYoung

IPC: B05D100

CPC classification number: C23C30/00 ,  B05D1/18 ,  B05D2401/90 ,  C23C26/00 ,  D06M15/277 ,  D06M15/643 ,  D06M23/10 ,  D06M23/105 ,  D06M2101/06 ,  D06M2101/08 ,  D06M2101/12 ,  D06M2101/32 ,  D06M2101/34 ,  D06M2200/12

Abstract: A method of treating a substrate comprises contacting a surface of said substrate, with a pressurized fluid comprising carbon dioxide and a surface treatment component, the surface treatment component being entrained in the pressurized fluid and contacting the surface so that the surface treatment component lowers the surface tension of the surface of the substrate and treats the substrate. The contacting step is preferably carried out by immersion, the fluid is preferably a liquid or supercritical fluid, the substrate is preferably a metal or fabric substrate, and the surface treatment component is preferably a fluoroacrylate polymer.

Abstract translation: 处理基材的方法包括使所述基材的表面与包含二氧化碳和表面处理组分的加压流体接触，所述表面处理组分被夹带在加压流体中并与表面接触，使得表面处理组分降低表面 衬底表面的张力并处理衬底。 接触步骤优选通过浸渍进行，流体优选为液体或超临界流体，基底优选为金属或织物基底，并且表面处理组分优选为氟代丙烯酸酯聚合物。

公开(公告)号：US6132653A

公开(公告)日：2000-10-17

申请号：US293030

申请日：1999-04-16

Applicant: Andrew T. Hunt ,  Helmut G. Hornis

Inventor： Andrew T. Hunt ,  Helmut G. Hornis

IPC: H05H1/24 ,  B05D1/02 ,  B22F9/28 ,  C01B13/34 ,  C23C16/44 ,  C23C16/448 ,  C23C16/453 ,  B29B9/00

CPC classification number: C23C16/453 ,  B22F9/28 ,  C01B13/34 ,  C23C16/4486 ,  B05D1/08 ,  B05D2401/90 ,  Y02P20/544 ,  Y02T50/67 ,  Y10T428/25 ,  Y10T428/256 ,  Y10T428/265

Abstract: A method for chemical vapor deposition using a very fine atomization or vaporization of a reagent containing liquid or liquid-like fluid near its supercritical temperature, where the resulting atomized or vaporized solution is entered into a flame or a plasma torch, and a powder is formed or a coating is deposited onto a substrate. The combustion flame can be stable from 10 torr to multiple atmospheres, and provides the energetic environment in which the reagent contained within the fluid can be reacted to form the desired powder or coating material on a substrate. The plasma torch likewise produces the required energy environment, but, unlike the flame, no oxidizer is needed so materials stable in only very low oxygen partial pressures can be formed. Using either the plasma torch or the combustion plasma, coatings can be deposited and powders formed in the open atmosphere without the necessity of a reaction chamber, but a chamber may be used for various reasons including process separation from the environment and pressure regulation.