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    METHOD AND SYSTEM FOR DETERMINING ULTRAVIOLET FLUENCE RECEIVED BY A FLUID
    41.
    发明申请
    METHOD AND SYSTEM FOR DETERMINING ULTRAVIOLET FLUENCE RECEIVED BY A FLUID 有权
    用于确定流体接收的超紫外线流体的方法和系统

    公开(公告)号：US20160258811A1

    公开(公告)日：2016-09-08

    申请号：US15036962

    申请日：2014-11-12

    Applicant: TROJAN TECHNOLOGIES

    Inventor： Mark Adrian Kustermans ,  Michael Sasges ,  Ankit Patras ,  Trisevgeni Trissa Kantzas

    IPC: G01J1/58 ,  A61L2/00 ,  G01N33/483 ,  A61L2/10 ,  G01N33/49 ,  G01N33/15

    CPC classification number: G01J1/58 ,  A61L2/0005 ,  A61L2/0047 ,  A61L2/10 ,  A61L2202/11 ,  C02F1/008 ,  C02F1/32 ,  G01J1/429 ,  G01N21/64 ,  G01N33/15 ,  G01N33/4833 ,  G01N33/49 ,  G01N2201/13

    Abstract: There is described a method of determining the UV fluence received by a fluid. The method comprises the steps of: (a) irradiating the fluid at an unknown UV fluence; (b) measuring the fluorescence of a test sample of the fluid after irradiation in Step (a) to produce a test signal proportional to the concentration of a prescribed fluorescent composition of matter comprised in the test sample; and (c) determining the value of the unknown UV fluence by comparing the test signal to a calibration curve of a control signal proportional to concentration of the prescribed fluorescent composition of matter in the fluid as a function of applied UV fluence. There is also described a system for determining the UV fluence received by a fluid being treated in UV fluid treatment system comprising at least one UV source. The system comprises: (a) a radiation-transparent vessel for receiving a test sample of the fluid after irradiation of the fluid at an unknown UV fluence; (b) a fluorometer for measuring the fluorescence of the test sample received in the radiation-transparent vessel to produce a test signal proportional to the concentration of a prescribed fluorescent composition of matter comprised in the test sample; and (c) a controller configured to determine the value of the unknown UV fluence by comparing the test signal to a calibration curve of a control signal proportional to concentration of the prescribed fluorescent composition of matter in the fluid as a function of applied UV fluence.

    Abstract translation: 描述了确定流体接收的UV注量的方法。 该方法包括以下步骤：（a）以未知的UV注量照射流体; （b）在步骤（a）中测量照射后的流体的测试样品的荧光，以产生与测试样品中包含的物质的规定的荧光组合物的浓度成比例的测试信号; 并且（c）通过将测试信号与作为所施加的UV注量的函数的与流体中规定的荧光成分的浓度成比例的控制信号的校准曲线进行比较来确定未知UV注量的值。 还描述了一种用于确定由包含至少一个UV源的UV流体处理系统中被处理的流体接收的UV注量的系统。 该系统包括：（a）辐射透明容器，用于在未知的紫外线注量流量的流体照射后接收流体的测试样品; （b）荧光计，用于测量接受在辐射透明容器中的测试样品的荧光，以产生与测试样品中包含的物质的规定荧光组合物的浓度成比例的测试信号; 以及（c）控制器，被配置为通过将测试信号与作为所施加的UV注量的函数的流体中规定的荧光成分的浓度成比例的控制信号的校准曲线进行比较来确定未知的UV注量的值。

    SOLAR DISINFECTION OF FLUID
    42.
    发明申请
    SOLAR DISINFECTION OF FLUID 有权
    流体的太阳能消毒

    公开(公告)号：US20160251238A1

    公开(公告)日：2016-09-01

    申请号：US14983267

    申请日：2015-12-29

    Applicant: PotaVida, Inc.

    Inventor： Charles Bruce Matlack ,  Tyler Blake Davis ,  Jacqueline Callihan Linnes

    IPC: C02F1/32 ,  G01J1/42 ,  C02F1/00

    CPC classification number: A61F2/2412 ,  A61F2/2409 ,  A61F2/2418 ,  A61F2250/0059 ,  A61F2250/0063 ,  C02F1/008 ,  C02F1/02 ,  C02F1/325 ,  C02F2201/009 ,  C02F2201/3228 ,  C02F2209/02 ,  C02F2209/11 ,  C02F2209/44 ,  C02F2303/04 ,  G01J1/0271 ,  G01J1/429 ,  Y02A20/212

    Abstract: A system for solar disinfection of fluid. One most preferred version of the system includes: (a) A UVTC, made of a polyethylene laminate film material with a “cut and weld” process, shaped generally like a pillow with an approximately rectangular plan, providing: a. A first compartment. b. A second compartment for holding fluid, with a port to fill and dispense, the second compartment proximate to the first compartment. (b) A Disinfection Monitor Module (“DMM”) located in the first compartment which: a. Includes at least one sensor to measure radiation (e.g. solar UV light) intensity. b. Provides at least one user interface including: i. “Start” and “stop” pushbuttons, switches or the like. ii. “Wait” and “Safe” visual indicators, such as LEDs. c. Contains a wireless communication interface. d. Operates according to a process that ensures sufficient cumulative exposure of the contained fluid to solar UV to achieve adequate solar disinfection. Alternative embodiments may also include one or more additional sensors to detect additional characteristics, such as fluid properties including transmittance, turbidity, “combined transmittance,” and/or temperature.

    Abstract translation: 一种用于太阳能消毒液体的系统。 该系统的一个最优选版本包括：（a）由具有“切割和焊接”工艺的聚乙烯层压薄膜材料制成的UVTC，其通常类似于具有大致矩形平面图的枕头，其提供：a。 第一个隔间 b。 用于保持流体的第二隔室，具有用于填充和分配的端口，邻近第一隔室的第二隔室。 （b）位于第一隔间的消毒监测模块（“DMM”）：a。 包括至少一个用于测量辐射（例如太阳紫外光）强度的传感器。 b。 提供至少一个用户界面，包括：i。 “开始”和“停止”按钮，开关等。 ii。 “等待”和“安全”视觉指示器，如LED。 C。 包含无线通讯接口。 d。 根据确保充分累积暴露于太阳紫外线以达到足够的太阳能消毒的过程来操作。 替代实施例还可以包括一个或多个额外的传感器来检测附加特性，例如包括透射率，浊度，“组合透射率”和/或温度的流体特性。

    Device and method for determining the degree of disinfection of a liquid
    43.
    发明授权
    Device and method for determining the degree of disinfection of a liquid 有权

    公开(公告)号：US09383257B2

    公开(公告)日：2016-07-05

    申请号：US14689072

    申请日：2015-04-17

    Applicant: Martin Wesian

    Inventor： Martin Wesian

    IPC: G01J1/42 ,  C02F1/32

    CPC classification number: G01J1/429 ,  C02F1/32 ,  C02F1/325 ,  C02F2201/009 ,  C02F2201/32 ,  C02F2201/326 ,  C02F2209/00 ,  C02F2209/005 ,  C02F2209/02 ,  C02F2303/04 ,  C02F2307/02 ,  C02F2307/04 ,  Y02A20/211 ,  Y02A20/212

    Abstract: The invention relates to a device and also a method for determining the degree of disinfection, and for determining the time point when a defined degree of disinfection is reached by a liquid, in particular drinking water, that is situated in a container which is light-permeable at least in a UV range. The device comprises in this case a UV measuring appliance for measuring the intensity of the UV radiation in the region of the container, a data analysis unit to which the values of the UV intensity which are measured by the UV measuring device are fed, and wherein the data analysis unit converts the UV intensity values measured at the start of a measurement at defined time points to form a characteristic, and wherein the data analysis unit compares the characteristics determined at defined time points with a predetermined characteristic, which predetermined characteristic corresponds to a defined degree of disinfection of the liquid, and wherein the device comprises at least one signal output appliance which, in the event that the determined characteristics reaches or exceeds the value of the predetermined characteristic, provides the signal output.

    Measuring device for measuring an illumination property
    44.
    发明授权
    Measuring device for measuring an illumination property 有权
    用于测量照明特性的测量装置

    公开(公告)号：US09377415B2

    公开(公告)日：2016-06-28

    申请号：US14501220

    申请日：2014-09-30

    Applicant: Carl Zeiss SMT GmbH

    Inventor： Michael Arnz ,  Markus Deguenther

    IPC: G01N21/95 ,  G01J1/00 ,  G01J1/42 ,  G01N21/88 ,  G03F1/84

    CPC classification number: G01N21/95 ,  G01J1/00 ,  G01J1/4257 ,  G01J1/429 ,  G01N21/8806 ,  G01N21/9501 ,  G03F1/84

    Abstract: A measuring device (40) for measuring an illumination property of an illumination system (12), which is configured for two-dimensional irradiation of a substrate (24) arranged in an illumination plane (21) with illumination radiation (20). Two differing measurement beam paths (52, 54) are formed in the measuring device, each arranged to guide the illumination radiation emitted by the illumination system onto a spatially resolving intensity detector (42) of the measuring device. A first (52) of the measurement beam paths is arranged to measure an intensity distribution in the illumination plane and the second (54) of the measurement beam paths is arranged to measure an intensity distribution in a pupil of the illumination system. The measuring device also includes an imaging optical unit (44) arranged in the first measurement beam path (52) such that the illumination radiation guided in the first measurement beam path passes through the imaging optical unit.

    Abstract translation: 一种用于测量照明系统（12）的照明特性的测量装置（40），其被配置为用照射辐射（20）布置在照明平面（21）中的基板（24）的二维照射。 两个不同的测量光束路径（52,54）形成在测量装置中，每个测量光束路径被布置成将照明系统发射的照射辐射引导到测量装置的空间分辨强度检测器（42）上。 测量光束路径的第一（52）布置成测量照明平面中的强度分布，并且第二测量光束路径（54）被布置成测量照明系统的光瞳中的强度分布。 测量装置还包括配置在第一测量光束路径（52）中的成像光学单元（44），使得在第一测量光束路径中引导的照明辐射通过成像光学单元。

    Wearable radiation detector
    46.
    发明授权
    Wearable radiation detector 有权

    公开(公告)号：US09285268B2

    公开(公告)日：2016-03-15

    申请号：US14639117

    申请日：2015-03-04

    Applicant: Shahid Aslam ,  Karin Edgett

    Inventor： Shahid Aslam ,  Karin Edgett

    IPC: G01J1/42 ,  G01J1/02

    CPC classification number: G01J1/429 ,  G01J1/0204 ,  G01J1/0233 ,  G01J1/0247 ,  G01J2001/0261

    Abstract: Provided herein are a wearable radiation detector and a method of controlling thereof, the detector including: the radiation collection unit operable to collect light and output a signal corresponding to the light collected; a memory; a display unit; a processor operable to receive the signal output by the radiation collection unit, to store a value in the memory corresponding to the signal output by the radiation collection unit, to output an output signal based at least on the signal corresponding to the light collected by the radiation collection unit and to control the display unit to display an indication corresponding to the output signal, wherein the determining includes continually calculating the maximum exposure level based on the light being received by the radiation collection unit.

    Exposure amount evaluation method and photomask
    48.
    发明授权
    Exposure amount evaluation method and photomask 有权

    公开(公告)号：US09250512B2

    公开(公告)日：2016-02-02

    申请号：US14795923

    申请日：2015-07-10

    Applicant: Kabushiki Kaisha Toshiba

    Inventor： Satoshi Tanaka

    IPC: G03F1/24

    CPC classification number: G03F1/24 ,  G01J1/429 ,  G03F1/84 ,  G03F7/70625 ,  G03F7/7085 ,  G03F7/70941

    Abstract: According to the exposure amount evaluation method of the embodiment, a photomask including a long-wavelength light reflective film and a mask pattern is set in an EUV exposure apparatus. The long-wavelength light reflective film reflects long-wavelength light having a wavelength longer than that of EUV light and absorbs the EUV light. The mask pattern is formed by an absorption film which is arranged on the upper side of the long-wavelength light reflective film and absorbs the EUV light and the long-wavelength light. A substrate on which resist is coated are set in the EUV exposure apparatus. Exposure light reflected by the photomask is irradiated to the substrate, and a light amount distribution of the long-wavelength light irradiated to the substrate is measured on the basis of an exposure amount of the exposure light irradiated to the substrate.

    Systems and Methods for Laser Beam Direct Measurement and Error Budget
    49.
    发明申请
    Systems and Methods for Laser Beam Direct Measurement and Error Budget 审中-公开
    激光束直接测量和误差预算的系统和方法

    公开(公告)号：US20160022492A1

    公开(公告)日：2016-01-28

    申请号：US14808851

    申请日：2015-07-24

    Applicant: AMO Manufacturing USA, LLC

    Inventor： Ihor Berezhnyy ,  Anatoly Fabrikant ,  Guangming Dai ,  Benjamin Logan ,  Anthony Tang ,  Henry Price ,  Stephen Calebotta

    IPC: A61F9/008 ,  G01J11/00

    CPC classification number: A61F9/00802 ,  A61B2018/00577 ,  A61B2018/00684 ,  A61B2018/00738 ,  A61B2018/00767 ,  A61B2018/00779 ,  A61B2018/2035 ,  A61F9/00804 ,  A61F9/00814 ,  A61F2009/00844 ,  A61F2009/00855 ,  A61F2009/00878 ,  A61F2009/00882 ,  A61F2009/00897 ,  G01J1/10 ,  G01J1/4228 ,  G01J1/4257 ,  G01J1/429 ,  G01J1/58 ,  G01J11/00

    Abstract: Embodiments of the present invention generally describe systems, devices, and methods for directly measuring pulse profiles during pulse delivery. In some embodiment, the pulse profiles may be measured while the pulse is delivered to ablate a material. Embodiments, may calculate ablation spot parameters based on the pulse profiles and may refine one or more subsequent laser pulses based on deviations from the calculated ablation spot parameters from desired ablation spot parameters. In some embodiments, a fluence profiler is provided. The fluence profiler may measure a pulse profile of a laser pulse from a portion of the laser pulse. The fluence profiler may utilize a UV radiation energy sensor device and a camera-based imager. The measurements from the UV radiation energy sensor device and the camera-based imager may be combined and scaled to provide a measured pulse profile that corresponds to the delivered pulse.

    Abstract translation: 本发明的实施例一般描述了用于在脉冲传送期间直接测量脉冲轮廓的系统，装置和方法。 在一些实施例中，可以在输送脉冲以消融材料的同时测量脉冲分布。 实施例可以基于脉冲轮廓来计算消融点参数，并且可以基于来自所需消融点参数的计算的消融点参数的偏差来细化一个或多个后续激光脉冲。 在一些实施例中，提供注量分析器。 注量分析器可以从激光脉冲的一部分测量激光脉冲的脉冲分布。 注量分析器可以利用UV辐射能量传感器装置和基于相机的成像器。 可以组合和缩放来自UV辐射能量传感器装置和基于相机的成像器的测量值，以提供对应于传送脉冲的测量脉冲分布。

    EXPOSURE AMOUNT EVALUATION METHOD AND PHOTOMASK
    50.
    发明申请
    EXPOSURE AMOUNT EVALUATION METHOD AND PHOTOMASK 有权
    曝光量评估方法和照片

    公开(公告)号：US20150331308A1

    公开(公告)日：2015-11-19

    申请号：US14795923

    申请日：2015-07-10

    Applicant: Kabushiki Kaisha Toshiba

    Inventor： Satoshi Tanaka

    IPC: G03F1/24

    CPC classification number: G03F1/24 ,  G01J1/429 ,  G03F1/84 ,  G03F7/70625 ,  G03F7/7085 ,  G03F7/70941

    Abstract: According to the exposure amount evaluation method of the embodiment, a photomask including a long-wavelength light reflective film and a mask pattern is set in an EUV exposure apparatus. The long-wavelength light reflective film reflects long-wavelength light having a wavelength longer than that of EUV light and absorbs the EUV light. The mask pattern is formed by an absorption film which is arranged on the upper side of the long-wavelength light reflective film and absorbs the EUV light and the long-wavelength light. A substrate on which resist is coated are set in the EUV exposure apparatus. Exposure light reflected by the photomask is irradiated to the substrate, and a light amount distribution of the long-wavelength light irradiated to the substrate is measured on the basis of an exposure amount of the exposure light irradiated to the substrate.

    Abstract translation: 根据本实施例的曝光量评估方法，在EUV曝光装置中设置包括长波长光反射膜和掩模图案的光掩模。 长波长光反射膜反射长于EUV光的波长的长波长的光并吸收EUV光。 掩模图案由布置在长波长光反射膜的上侧并吸收EUV光和长波长光的吸收膜形成。 在EUV曝光装置中设置涂布有抗蚀剂的基板。 照射到光掩模的曝光光照射到基板上，并且基于照射到基板的曝光光的曝光量来测量照射到基板的长波长光的光量分布。

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