公开(公告)号：US08502143B2

公开(公告)日：2013-08-06

申请号：US12680078

申请日：2008-09-17

Applicant: Martin Hytch ,  Etienne Snoeck ,  Florent Houdellier ,  Florian Hue

Inventor： Martin Hytch ,  Etienne Snoeck ,  Florent Houdellier ,  Florian Hue

IPC: G01N23/00

CPC classification number: H01J37/26 ,  H01J37/295 ,  H01J2237/151 ,  H01J2237/1514 ,  H01J2237/2614 ,  H01L22/12 ,  H01L2924/0002 ,  H01L2924/00

Abstract: A method is provided that includes the steps of i) providing a specimen in the form of a wafer having a measurement area and a reference area, assumed to be without deformations and coplanar with the measurement area; ii) illuminating one face of the specimen with an electron beam (Fin); iii) superposing a beam (F1B) of radiation diffracted by the measurement area (B) with a beam (F1A) of the radiation diffracted by the reference so as to cause these two beams to interfere; iv) measuring the spatial periodicity and the orientation of the fringes of the interference pattern (FI); and v) deducing from this a difference in the lattice parameter and/or the orientation between the reference and measurement areas, which is indicative of a state of deformation of the latter at the nanoscale. A device and system for implementing the method is also provided.

Abstract translation: 提供了一种方法，其包括以下步骤：i）提供具有测量区域和参考区域的晶片形式的样本，假设为没有变形并且与测量区域共面; ii）用电子束（Fin）照射样品的一个面; iii）将由所述测量区域（B）衍射的辐射的光束（F1B）叠加到被所述基准线衍射的所述辐射的光束（F1A），以使所述两束光束干涉; iv）测量干涉图案（FI）边缘的空间周期和取向; 和v）从此推导出参考和测量区域之间的晶格参数和/或取向的差异，其指示后者在纳米尺度上的变形状态。 还提供了一种用于实现该方法的设备和系统。

公开(公告)号：US08481931B2

公开(公告)日：2013-07-09

申请号：US12482577

申请日：2009-06-11

Applicant: Simon Page

Inventor： Simon Page

IPC: G21K5/00 ,  H01J37/26

CPC classification number: H01J37/05 ,  G01N23/2273 ,  H01J37/08 ,  H01J37/295 ,  H01J37/30 ,  H01J2237/05 ,  H01J2237/08 ,  H01J2237/0815

Abstract: The present invention provides an electron spectroscopy apparatus (12) comprising a high energy particle source (12) for irradiating a sample, an electron detector system (16) (e.g. including a delay line detector) for detecting electrons emitted from the sample and an ion gun (8) for delivering a polycyclic aromatic hydrocarbon (PAH) ion beam to the sample, wherein the ion gun comprises a polycyclic aromatic hydrocarbon ion source, for example comprising coronene. In an embodiment, the PAH is located in a heated chamber (22) and vaporised to produce gas phase PAH. The gas phase PAH molecules are then ionised by electron impact, extracted from the ion source via an extraction field and focussed using ion optics. The PAH ion beam can be used for surface cleaning and depth analysis.

Abstract translation: 本发明提供了一种包括用于照射样品的高能粒子源（12），用于检测从样品发射的电子的电子检测器系统（16）（例如包括延迟线检测器）的电子能谱装置（12） 用于将多环芳烃（PAH）离子束输送到样品的枪（8），其中所述离子枪包括多环芳族烃离子源，例如包含芳烃。 在一个实施方案中，PAH位于加热室（22）中并蒸发以产生气相PAH。 气相PAH分子然后通过电子轰击电离，通过提取场从离子源提取，并使用离子光学聚焦。 PAH离子束可用于表面清洁和深度分析。

公开(公告)号：US08436302B2

公开(公告)日：2013-05-07

申请号：US13462140

申请日：2012-05-02

Applicant: Rasmus Schröder ,  Bastian Barton ,  Gerd Benner ,  Harald Rose

Inventor： Rasmus Schröder ,  Bastian Barton ,  Gerd Benner ,  Harald Rose

IPC: G01N23/00

CPC classification number: H01J37/26 ,  H01J37/295 ,  H01J2237/041 ,  H01J2237/0453 ,  H01J2237/1534 ,  H01J2237/2455 ,  H01J2237/2614 ,  H01J2237/2802 ,  H01J2237/2809

Abstract: A phase-shifting element for shifting a phase of at least a portion of a particle beam is described, as well as a particle beam device having a phase-shifting element of this type. In the phase-shifting element and the particle beam device having a phase-shifting element, components shadowing the particle beam are avoided, so that proper information content is achieved and in which the phase contrast is essentially spatial frequency-independent. The phase-shifting element may have at least one means for generating a non-homogeneous or anisotropic potential. The particle beam device according to the system described herein may be provided with the phase-shifting element.

Abstract translation: 描述了用于移动粒子束的至少一部分的相位的相移元件，以及具有这种类型的相移元件的粒子束装置。 在具有相移元件的相移元件和粒子束装置中，避免了影响粒子束的分量，使得实现适当的信息内容，并且相位对比度基本上与空间频率无关。 相移元件可以具有至少一个用于产生非均匀或各向异性电位的装置。 根据本文所述的系统的粒子束装置可以设置有相移元件。

公开(公告)号：US07923685B2

公开(公告)日：2011-04-12

申请号：US12324937

申请日：2008-11-28

Applicant: Ken Harada ,  Hiroto Kasai

Inventor： Ken Harada ,  Hiroto Kasai

IPC: H01J37/04

CPC classification number: H01J37/295 ,  H01J37/26 ,  H01J2237/0492 ,  H01J2237/1514 ,  H01J2237/1523 ,  H01J2237/228 ,  H01J2237/2588 ,  H01J2237/2614

Abstract: A multi-biprism electron interferometer is configured so as to arrange a plurality of biprisms in an imaging optical system of a specimen. An upper electron biprism is arranged upstream of the specimen in the traveling direction of the electron beam, and an image of the electron biprism is formed on the specimen (object plane) using an imaging action of a pre-field of the objective lens. A double-biprism interference optical system is constructed of a lower electron biprism disposed downstream of the objective lens up to the first image plane of the specimen.

Abstract translation: 多双棱镜电子干涉仪被配置为在样本的成像光学系统中布置多个双棱镜。 在电子束的行进方向上，在样本的上游设置上部电子双棱镜，并且使用物镜的前场的成像动作在被检体（物体面）上形成电子双棱镜的图像。 双二棱镜干涉光学系统由设置在物镜的下游直到样品的第一像面的较低电子双棱镜构成。

公开(公告)号：US20110049363A1

公开(公告)日：2011-03-03

申请号：US12549029

申请日：2009-08-27

Applicant: Christoph T. KOCH

Inventor： Christoph T. KOCH

IPC: G01N23/20 ,  G21K1/00

CPC classification number: G01N23/20058 ,  H01J37/26 ,  H01J37/295 ,  H01J2237/1506 ,  H01J2237/2614

Abstract: The invention relates to a method and a device for measuring electron diffraction of a sample, including the steps of illuminating the sample with an incident electron beam which is deflected from a sample axis to hit the sample at an angle of incidence relative to the sample axis, at least partially subjecting the incident electron beam to diffraction by the sample, subjecting the diffracted and undiffracted electron beams transmitted through the sample to a partial deflection compensation, detecting the intensity of the diffracted and undiffracted electron beams transmitted through the sample in dependency on the angle of incidence and a scattering angle of the diffracted beam. The invention also relates to a computer program for controlling a transmission electron microscope for carrying out the inventive method.

Abstract translation: 本发明涉及一种用于测量样品的电子衍射的方法和装置，包括以入射电子束照射样品的步骤，入射电子束从样品轴线偏转，以相对于样品轴线的入射角撞击样品 至少部分地使入射的电子束受到样品的衍射，对通过样品透射的衍射和未衍射的电子束进行部分偏转补偿，根据所述样品检测衍射和未衍射的电子束的强度 入射角和衍射光束的散射角。 本发明还涉及一种用于控制透射电子显微镜用于实施本发明的方法的计算机程序。

公开(公告)号：US07872755B2

公开(公告)日：2011-01-18

申请号：US11883568

申请日：2006-01-27

Applicant: Ken Harada ,  Tetsuya Akashi ,  Yoshihiko Togawa ,  Tsuyoshi Matsuda ,  Noboru Moriya

Inventor： Ken Harada ,  Tetsuya Akashi ,  Yoshihiko Togawa ,  Tsuyoshi Matsuda ,  Noboru Moriya

IPC: G01B9/02

CPC classification number: H01J37/295 ,  G01N23/00 ,  G02B19/0014 ,  G02B19/0047 ,  G03H5/00 ,  H01J37/04 ,  H01J2237/1514 ,  H01J2237/228 ,  H01J2237/2614

Abstract: A double-biprism electron interferometer is an optical system which dramatically increases the degree of freedom of a conventional one-stage electron interferometer. The double biprism interferometer, however, is the same as the optical system of the single electron biprism in terms of the one-dimensional shape of an electron hologram formed by filament electrodes, the direction of an interference area, and the azimuth of the interference fringes. In other words, the longitudinal direction of the interference area is determined corresponding to the direction of the filament electrodes, and the azimuth of the interference fringes only coincides with and is in parallel with the longitudinal direction of the interference area. An interferometer according to the present invention has upper-stage and lower-stage electron biprisms, and operates with an azimuth angle Φ between filament electrodes of the upper-stage and lower-stage electron biprisms to arbitrarily control an interference area and an azimuth θ of the interference fringes formed therein.

Abstract translation: 双二棱镜电子干涉仪是一种显着提高常规一级电子干涉仪自由度的光学系统。 然而，双棱镜干涉仪与由单丝电极组成的电子全息图的一维形状，干涉区域的方向和干涉条纹的方位角的单电子双棱镜的光学系统相同 。 换句话说，干扰区域的长度方向根据灯丝电极的方向确定，并且干涉条纹的方位角仅与干涉区域的纵向方向一致并且平行。 根据本发明的干涉仪具有上级和下级电子双极，并且在上级和下级电子双极之间的灯丝电极之间以方位角Φ操作以任意地控制干涉区域和方位角; 的干涉条纹。

公开(公告)号：US07851757B2

公开(公告)日：2010-12-14

申请号：US12084478

申请日：2006-11-01

Applicant: Kuniaki Nagayama

Inventor： Kuniaki Nagayama

IPC: G01N23/00

CPC classification number: H01J37/295 ,  H01J37/26 ,  H01J2237/1514 ,  H01J2237/2614

Abstract: A phase plate for an electron microscope in which a portion of a magnetic thin-wire ring or a magnetic thin-wire rod spans an opening of a support member having the opening, the magnetic thin-wire ring or magnetic thin-wire rod generates a vector potential, and a phase difference is formed between electron beams that pass through left and right sides of a spanning portion of the magnetic thin-wire ring or the magnetic thin-wire rod. The phase plate prevents the electron beam loss more effectively, can be applied at an accelerating voltage within a wide rage from a low voltage to a high voltage, causes no difficulties in production, has good utility, and makes it possible to obtain a high-contrast image.

Abstract translation: 一种用于电子显微镜的相位板，其中磁性细线环或磁性细线的一部分跨越具有开口的支撑构件的开口，磁性细线环或磁性细线产生 并且在穿过磁性细线环或磁性细线的跨越部分的左侧和右侧的电子束之间形成相位差。 相位板可以更有效地防止电子束损失，可以在从低电压到高电压的广泛范围内的加速电压下施加，不会产生生产困难，具有很好的效用， 对比图像。

公开(公告)号：US07750298B2

公开(公告)日：2010-07-06

申请号：US11884680

申请日：2006-01-27

Applicant: Ken Harada ,  Tetsuya Akashi ,  Yoshihiko Togawa ,  Tsuyoshi Matsuda ,  Noboru Moriya

Inventor： Ken Harada ,  Tetsuya Akashi ,  Yoshihiko Togawa ,  Tsuyoshi Matsuda ,  Noboru Moriya

IPC: G21G5/00

CPC classification number: H01J37/04 ,  G01N23/00 ,  G02B19/0014 ,  G02B19/0047 ,  G03H5/00 ,  H01J37/295 ,  H01J2237/1514 ,  H01J2237/228 ,  H01J2237/2614

Abstract: An interferometer is disclosed which has upper-stage, intermediate-stage, and lower-stage electron biprisms. The disclosed interferometer operates with an azimuth angle Φ among filament electrodes of the three electron biprisms to arbitrarily control an interference area and an azimuth θ of the interference fringes formed therein, eliminates Fresnel fringes generation, and allows independent control of an interference fringe spacing s and the azimuth θ of the interference fringes.

Abstract translation: 公开了一种具有上级，中级和低级电子双极性的干涉仪。 所公开的干涉仪在三电子双棱镜的细丝电极之间以方位角Φ操作以任意地控制干涉区域和方位角; 其中形成的干涉条纹消除了菲涅尔条纹生成，并允许干涉条纹间距s和方位角的独立控制; 的干涉条纹。

公开(公告)号：US20090309023A1

公开(公告)日：2009-12-17

申请号：US12482577

申请日：2009-06-11

Applicant: Simon Page

Inventor： Simon Page

IPC: G01N23/00

CPC classification number: H01J37/05 ,  G01N23/2273 ,  H01J37/08 ,  H01J37/295 ,  H01J37/30 ,  H01J2237/05 ,  H01J2237/08 ,  H01J2237/0815

Abstract: The present invention provides an electron spectroscopy apparatus (12) comprising a high energy particle source (12) for irradiating a sample, an electron detector system (16) (e.g. including a delay line detector) for detecting electrons emitted from the sample and an ion gun (8) for delivering a polycyclic aromatic hydrocarbon (PAH) ion beam to the sample, wherein the ion gun comprises a polycyclic aromatic hydrocarbon ion source, for example comprising coronene. In an embodiment, the PAH is located in a heated chamber (22) and vaporised to produce gas phase PAH. The gas phase PAH molecules are then ionised by electron impact, extracted from the ion source via an extraction field and focussed using ion optics. The PAH ion beam can be used for surface cleaning and depth analysis.

Abstract translation: 本发明提供了一种包括用于照射样品的高能粒子源（12），用于检测从样品发射的电子的电子检测器系统（16）（例如包括延迟线检测器）的电子分光装置（12） 用于将多环芳烃（PAH）离子束输送到样品的枪（8），其中所述离子枪包括多环芳族烃离子源，例如包含芳烃。 在一个实施方案中，PAH位于加热室（22）中并蒸发以产生气相PAH。 气相PAH分子然后通过电子轰击电离，通过提取场从离子源提取，并使用离子光学聚焦。 PAH离子束可用于表面清洁和深度分析。

公开(公告)号：US20080302965A1

公开(公告)日：2008-12-11

申请号：US11547054

申请日：2005-03-07

Applicant: Ken Harada ,  Tetsuya Akashi ,  Yoshihiko Togawa ,  Tsuyoshi Matsuda

Inventor： Ken Harada ,  Tetsuya Akashi ,  Yoshihiko Togawa ,  Tsuyoshi Matsuda

IPC: G01N23/00

CPC classification number: H01J37/295 ,  H01J37/26 ,  H01J2237/1514 ,  H01J2237/2614

Abstract: In an electron beam interference system using an electron biprism, which is capable of independently controlling each of the interference fringe spacing s and the interference width W, both of which are important parameters for an interferometer and for an interferogram acquired by the interferometer, an optical system used in a two-stage electron biprism interferometer is adopted. The optical system uses two stages of electron biprisms in an optical axis direction to give the flexibility to the relative magnification relative to a specimen image and that relative to an image of a filament electrode of the electron biprism. In addition, as a two-stage configuration in which two objective lenses (51, 52) are combined, independently controlling the focal length of each objective lens makes it possible to set the relative magnification relative to a specimen image and that relative to an image of the filament electrode of the electron biprism at arbitrary values.

Abstract translation: 在使用电子双棱镜的电子束干涉系统中，其能够独立地控制每个干涉条纹间距s和干涉宽度W，这两者都是干涉仪和干涉仪获取的干涉图的重要参数，光学 采用两级电子双棱镜干涉仪中使用的系统。 光学系统在光轴方向上使用两阶段的电子双棱镜，以相对于标本图像相对于相对放大率以及相对于电子双棱镜的细丝电极的图像具有灵活性。 另外，作为组合了两个物镜（51,52）的两级配置，独立地控制每个物镜的焦距使得可以相对于标本图像和相对于图像设置相对放大率 的电子双棱镜的灯丝电极的任意值。