公开(公告)号：US09390888B2

公开(公告)日：2016-07-12

申请号：US14720122

申请日：2015-05-22

Applicant: Industrial Technology Research Institute

Inventor： Wen-Li Wu ,  Yun-San Chien ,  Wei-En Fu ,  Yen-Song Chen ,  Hsin-Chia Ho

IPC: H01J37/00 ,  H01J37/29 ,  H01J37/06 ,  H01J37/145 ,  H01J37/04 ,  H01J37/295 ,  G01N23/20

CPC classification number: H01J37/29 ,  G01N23/20058 ,  H01J37/04 ,  H01J37/06 ,  H01J37/145 ,  H01J37/295 ,  H01J2237/0492 ,  H01J2237/255

Abstract: An apparatus and methods for small-angle electron beam scattering measurements in a reflection or a backscattering mode are provided. The apparatus includes an electron source, electron collimation optics before a sample, electron projection optics after the sample, a sample stage capable of holding the sample, and a electron detector module. The electrons emitted from the source are collimated and positioned to impinge nanostructures on the sample. The signals resulting from the interactions between the impinging electrons and the nanostructures are further magnified by the electron projection optics to reach a sufficient angular resolution before recorded by the electron detector module.

Abstract translation: 提供了一种用于反射或后向散射模式的小角度电子束散射测量的装置和方法。 该装置包括电子源，样品前的电子准直光学器件，样品后的电子投影光学器件，能够保持样品的样品台，以及电子检测器模块。 从源发射的电子被准直并定位成将纳米结构撞击在样品上。 由撞击电子和纳米结构之间的相互作用产生的信号被电子投影光学器件进一步放大，以在由电子检测器模块记录之前达到足够的角度分辨率。

公开(公告)号：US20160196952A1

公开(公告)日：2016-07-07

申请号：US14916529

申请日：2014-05-16

Applicant: HIitachi High-Technologies Corporation

Inventor： Hiroaki MATSUMOTO ,  Takeshi SATO ,  Yoshifumi TANIGUCHI ,  Ken HARADA

IPC: H01J37/10 ,  H01J37/147 ,  H01J37/05 ,  H01J37/285

CPC classification number: H01J37/10 ,  G01N23/20058 ,  G01N2223/418 ,  H01J37/04 ,  H01J37/05 ,  H01J37/09 ,  H01J37/147 ,  H01J37/1472 ,  H01J37/153 ,  H01J37/24 ,  H01J37/244 ,  H01J37/26 ,  H01J37/261 ,  H01J37/28 ,  H01J37/285 ,  H01J37/295 ,  H01J2237/21 ,  H01J2237/2614

Abstract: The present invention relates to a lens-less Foucault method wherein a transmission electron microscope objective lens (5) is turned off, an electron beam crossover (11, 13) is matched with a selected area aperture (65), and the focal distance of a first imaging lens (61) can be changed to enable switching between a sample image observation mode and a sample diffraction pattern observation mode, characterized in that a deflector (81) is disposed in a stage following the first imaging lens (61), and conditions for an irradiating optical system (4) can be fixed after conditions for the imaging optical system have been determined. This allows a lens-less Foucault method to be implemented in a common general-use transmission electron microscope with no magnetic shielding lens equipped, without burdening the operator.

Abstract translation: 本发明涉及一种无透镜Foucault方法，其中透射电子显微镜物镜（5）被关闭，电子束交叉（11,13）与所选区域孔径（65）匹配，并且焦距 可以改变第一成像透镜（61）以在样本图像观察模式和样本衍射图案观察模式之间切换，其特征在于，偏转器（81）设置在跟随第一成像透镜（61）的阶段中，以及 可以在确定成像光学系统的条件之后固定照射光学系统（4）的条件。 这样就可以在没有磁屏蔽透镜的公共通用透射电子显微镜中实现无镜头福柯方法，而不会对操作者造成负担。

公开(公告)号：US20160041064A1

公开(公告)日：2016-02-11

申请号：US14706308

申请日：2015-05-07

Applicant: JEOL Ltd.

Inventor： Shigeyuki Morishita

IPC: G01M11/02 ,  H01J37/26

CPC classification number: H01J37/26 ,  G01M11/0257 ,  G01M11/0292 ,  H01J37/153 ,  H01J37/295 ,  H01J2237/153 ,  H01J2237/1532 ,  H01J2237/282

Abstract: An aberration computing device (100) includes a fitting section (48) for fitting line profiles of a diffractogram taken in radial directions to a fitting function and finding fitting parameters of the fitting function and a computing section (49) for finding at least one of an amount of defocus and two-fold astigmatism, based on the fitting parameters.

Abstract translation: 像差计算装置（100）包括：装配部分（48），用于将沿径向取向的衍射图的线轮廓拟合成拟合函数，并找到拟合函数的拟合参数;以及计算部分（49），用于找到 基于拟合参数的散焦量和双重散光量。

公开(公告)号：US09208990B2

公开(公告)日：2015-12-08

申请号：US14129261

申请日：2012-05-22

Applicant: Hirokazu Tamaki ,  Yoshio Takahashi ,  Hiroto Kasai ,  Hiroyuki Kobayashi

Inventor： Hirokazu Tamaki ,  Yoshio Takahashi ,  Hiroto Kasai ,  Hiroyuki Kobayashi

IPC: H01J37/09 ,  H01J37/295 ,  H01J37/147 ,  H01J37/26

CPC classification number: H01J37/147 ,  H01J37/09 ,  H01J37/26 ,  H01J37/263 ,  H01J37/295 ,  H01J2237/2614

Abstract: Provided is a phase plate for use in an electron microscope which lessens the problem of image information loss caused by interruption of an electron beam and ameliorates the problem of anisotropic potential distributions. This phase plate comprises openings (23) connected into a single opening, and multiple electrodes (11) arranged in the opening from the outer portion of the opening towards the center of the opening. The cross sections of the electrodes (11) are configured such that a voltage application layer (24) comprising a conductor or a semiconductor is covered by a shield layer comprising a conductor or a semiconductor with an intermediate insulating layer. By this means, this phase plate is capable of lessening electron beam interruption due to the electrodes (11), and of ameliorating the problem of anisotropic potential distributions.

Abstract translation: 提供一种用于电子显微镜的相位板，其减少了由电子束的中断引起的图像信息损失的问题，并且改善了各向异性势分布的问题。 该相板包括连接到单个开口中的开口（23）和从开口的外部部分朝向开口的中心布置在开口中的多个电极（11）。 电极（11）的横截面被构造成使得包括导体或半导体的电压施加层（24）被包括具有中间绝缘层的导体或半导体的屏蔽层覆盖。 通过这种方式，该相位板能够减少由于电极（11）引起的电子束中断，并且能够改善各向异性势分布的问题。

公开(公告)号：US20140224988A1

公开(公告)日：2014-08-14

申请号：US14129261

申请日：2012-05-22

Applicant: Hirokazu Tamaki ,  Yoshio Takahashi ,  Hiroto Kasai ,  Hiroyuki Kobayashi

Inventor： Hirokazu Tamaki ,  Yoshio Takahashi ,  Hiroto Kasai ,  Hiroyuki Kobayashi

IPC: H01J37/147 ,  H01J37/26

CPC classification number: H01J37/147 ,  H01J37/09 ,  H01J37/26 ,  H01J37/263 ,  H01J37/295 ,  H01J2237/2614

Abstract: Provided is a phase plate for use in an electron microscope which lessens the problem of image information loss caused by interruption of an electron beam and ameliorates the problem of anisotropic potential distributions. This phase plate comprises openings (23) connected into a single opening, and multiple electrodes (11) arranged in the opening from the outer portion of the opening towards the center of the opening. The cross sections of the electrodes (11) are configured such that a voltage application layer (24) comprising a conductor or a semiconductor is covered by a shield layer comprising a conductor or a semiconductor with an intermediate insulating layer. By this means, this phase plate is capable of lessening electron beam interruption due to the electrodes (11), and of ameliorating the problem of anisotropic potential distributions.

Abstract translation: 提供一种用于电子显微镜的相位板，其减少了由电子束的中断引起的图像信息损失的问题，并且改善了各向异性势分布的问题。 该相板包括连接到单个开口中的开口（23）和从开口的外部部分朝向开口的中心布置在开口中的多个电极（11）。 电极（11）的横截面被构造成使得包括导体或半导体的电压施加层（24）被包括具有中间绝缘层的导体或半导体的屏蔽层覆盖。 通过这种方式，该相位板能够减少由于电极（11）引起的电子束中断，并且能够改善各向异性势分布的问题。

公开(公告)号：US08785851B2

公开(公告)日：2014-07-22

申请号：US13900589

申请日：2013-05-23

Applicant: Riken

Inventor： Toshiaki Tanigaki ,  Shinji Aizawa ,  Tsuyoshi Matsuda ,  Ken Harada ,  Yoshio Takahashi

IPC: H01J37/26 ,  H01J37/04 ,  G01B15/00

CPC classification number: H01J37/261 ,  H01J37/295 ,  H01J2237/026 ,  H01J2237/1514 ,  H01J2237/2614

Abstract: In an interference electron microscope, a first electron biprism is disposed between an acceleration tube and an illumination-lens system, a mask is disposed between the acceleration tube and the first electron biprism, and the first electron biprism is arranged in a shadow that the mask forms. Current densities of first and second electron beams on a parabolic surface of an objective lens system where a sample is positioned are controlled by a control system by an optical action of the illumination-lens system, the mask is imaged on the parabolic surface of the objective lens system, and an electro-optical length between the first electron biprism and the parabolic surface of the objective lens where the sample is positioned is controlled without generating Fresnel fringes on a sample surface from the mask and the first electron biprism.

Abstract translation: 在干涉电子显微镜中，第一电子双棱镜设置在加速管与照明透镜系统之间，掩模设置在加速管与第一电子双棱镜之间，第一电子双棱镜被布置成荫罩 形式。 通过照明透镜系统的光学作用由控制系统控制样品所在的物镜系统的抛物面上的第一和第二电子束的电流密度，掩模被成像在物镜的抛物线表面上 透镜系统，并且控制样品所在的第一电子双棱镜和物镜的抛物线表面之间的电光长度，而不在掩模和第一电子双棱镜的样品表面上产生菲涅尔条纹。

公开(公告)号：US08772715B2

公开(公告)日：2014-07-08

申请号：US13869999

申请日：2013-04-25

Applicant: Riken ,  Hitachi, Ltd.

Inventor： Toshiaki Tanigaki ,  Shinji Aizawa ,  Tsuyoshi Matsuda ,  Ken Harada ,  Yoshio Takahashi

IPC: H01J37/26 ,  H01J37/04 ,  G01B15/00

CPC classification number: H01J37/22 ,  H01J37/295 ,  H01J2237/2614

Abstract: An electron beam device includes a first electron biprism between an acceleration tube and irradiation lens systems, and an electron biprism in the image forming lens system. The first electron biprism splits the electron beam into first and second electron beams, radiated to differently positioned first and second regions on an objective plane of an objective lens system having a specimen perpendicular to an optical axis. The first and second electron beams are superposed on the observation plane by the electron biprism of the image forming lens system. The superposed region is observed or recorded. Optical action of the irradiation lens system controls each current density of the first and second electron beams on the objective plane having the specimen, and distance on electron optics between the first electron biprism and the objective plane of the objective lens system having the specimen.

Abstract translation: 电子束装置包括加速管和照射透镜系统之间的第一电子双棱镜，以及成像透镜系统中的电子双棱镜。 第一电子双棱镜将电子束分裂成第一和第二电子束，辐射到具有垂直于光轴的样本的物镜系统的物镜平面上的不同位置的第一和第二区域。 第一和第二电子束通过图像形成透镜系统的电子双棱镜重叠在观察平面上。 观察或记录重叠区域。 照射透镜系统的光学作用控制具有样本的物镜上的第一和第二电子束的每个电流密度，以及在具有该样本的物镜系统的第一电子双棱镜和物镜平面之间的电子光学上的距离。

公开(公告)号：US08766214B2

公开(公告)日：2014-07-01

申请号：US13919656

申请日：2013-06-17

Applicant: FEI Company

Inventor： Brian Roberts Routh, Jr. ,  Peter Christiaan Tiemeijer ,  Bart Jozef Janssen ,  Thomas G. Miller ,  David Foord ,  Ivan Lazić

IPC: H01J37/26 ,  H01J37/28 ,  H01J37/295

CPC classification number: H01J37/28 ,  B82Y35/00 ,  G01Q10/04 ,  H01J37/26 ,  H01J37/295 ,  H01J37/3056 ,  H01J2237/2067 ,  H01J2237/208 ,  H01J2237/226 ,  H01J2237/2442 ,  H01J2237/24455 ,  H01J2237/2447 ,  H01J2237/2611 ,  H01J2237/2614 ,  H01J2237/31749

Abstract: The invention relates to a method of preparing and imaging a sample using a particle-optical apparatus, equipped with an electron column and an ion beam column, a camera system, a manipulator. The method comprises the steps of deriving a first ptychographic image of the sample from a first electron image, thinning the sample, and forming a second ptychographic image of the sample. In an embodiment of the invention the seed image used for the second image is the first ptychographic image. In another embodiment the second ptychographic image is the image of the layer removed during the thinning. In another embodiment the inner potential of the sample is determined and dopant concentrations are determined.

Abstract translation: 本发明涉及使用装备有电子柱和离子束柱的粒子光学装置，相机系统，机械手来制备和成像样品的方法。 该方法包括以下步骤：从第一电子图像导出样本的第一ptychographic图像，使样本变薄，并形成样品的第二ptychographic图像。 在本发明的实施例中，用于第二图像的种子图像是第一图像图像。 在另一个实施例中，第二ptychographic图像是在稀化期间去除的层的图像。 在另一个实施方案中，确定样品的内部电位并确定掺杂剂浓度。

公开(公告)号：US08278813B2

公开(公告)日：2012-10-02

申请号：US12481995

申请日：2009-06-10

Applicant: Yong Woon Park ,  Hyotcherl Ihee ,  Chang Bum Kim ,  In Soo Ko

Inventor： Yong Woon Park ,  Hyotcherl Ihee ,  Chang Bum Kim ,  In Soo Ko

IPC: H01J29/46

CPC classification number: H01J37/045 ,  H01J3/18 ,  H01J37/063 ,  H01J37/073 ,  H01J37/295 ,  H01J2237/0432 ,  H01J2237/06333

Abstract: An apparatus and method for generating femtosecond electron beam are disclosed. The apparatus for generating electron beam by discharging an electron generated via a cathode to an anode includes a transmission window provided at one side of the cathode to allow incident laser to pass therethrough, a pinhole formed on the anode such that the pinhole corresponds to the position of the electron generated from the transmission window, and a focusing unit provided at one side of the cathode and generating an electric field to accelerate and at the same time concentrate the electron to the pinhole. Electrons are simultaneously concentrated and accelerated to the pinhole by an electric field generated by the focusing unit positioned at the cathode to generate femtosecond electron beam.

Abstract translation: 公开了一种用于产生飞秒电子束的装置和方法。 通过将通过阴极发射的电子放电到阳极来产生电子束的装置包括设置在阴极的一侧以允许入射激光通过的透射窗口，形成在阳极上的针孔，使得针孔对应于位置 的发射窗产生的电子，以及设置在阴极一侧的聚焦单元，产生电场以加速并同时将电子集中到针孔。 通过由位于阴极处的聚焦单元产生的电场，电子同时集中并加速到针孔，以产生飞秒电子束。

公开(公告)号：US08193494B2

公开(公告)日：2012-06-05

申请号：US12850961

申请日：2010-08-05

Applicant: Ken Harada ,  Akira Sugawara

Inventor： Ken Harada ,  Akira Sugawara

IPC: H01J37/26 ,  H01J37/04 ,  G01B15/00

CPC classification number: H01J37/28 ,  H01J37/295 ,  H01J2237/1514 ,  H01J2237/2611 ,  H01J2237/2614

Abstract: A first electron biprism is disposed in a condenser optical system and an observation region of a specimen is irradiated simultaneously with two electron beams of different angles. The two electron beams that have simultaneously transmitted the specimen are spatially separated and focused with a second electron biprism disposed in an imaging optical system and two electron microscopic images of different irradiation angles are obtained. The two picture images are obtained by a detecting unit. Based on the two picture images, a stereoscopic image or two images having different kinds of information of the specimen is/are produced and displayed on a display device.

Abstract translation: 第一电子双棱镜设置在聚光镜系统中，并且与两个不同角度的电子束同时照射样本的观察区域。 同时透射样品的两个电子束在空间上分离并且与设置在成像光学系统中的第二电子双棱镜聚焦，并且获得两个不同照射角度的电子显微镜图像。 两个图像由检测单元获得。 基于两个图像，产生并显示具有样本的不同种类的信息的立体图像或两个图像并显示在显示装置上。