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    MANUFACTURING METHOD FOR ELECTROSTATIC DEFLECTOR AND ELECTROSTATIC DEFLECTOR
    1.
    发明公开
    MANUFACTURING METHOD FOR ELECTROSTATIC DEFLECTOR AND ELECTROSTATIC DEFLECTOR 审中-公开

    公开(公告)号：US20240153731A1

    公开(公告)日：2024-05-09

    申请号：US18039177

    申请日：2021-11-24

    Applicant: KYOCERA Corporation

    Inventor： Takeshi MUNEISHI

    IPC: H01J37/147

    CPC classification number: H01J37/147 ,  H01J2237/151

    Abstract: The manufacturing method for an electrostatic deflector includes: obtaining a plurality of first compacts having a sheet-like shape by molding a raw material containing a ceramic into each desired shape; obtaining a second compact by layering the plurality of first compacts; obtaining a tubular body by firing the second compact; and forming an internal electrode and an external electrode on an inner wall surface of the tubular body and on a surface other than the inner wall surface. In the obtaining the plurality of first compacts, a wiring layer serving as a connection conductor that electrically connects the internal electrode and the external electrode is formed on a surface of the first compact that is predetermined.

    Ion beam line
    4.
    发明授权
    Ion beam line 有权
    离子束线

    公开(公告)号：US09502213B2

    公开(公告)日：2016-11-22

    申请号：US14831225

    申请日：2015-08-20

    Applicant: Nissin Ion Equipment Co., Ltd.

    Inventor： Sami K. Hahto ,  Tetsuro Yamamoto

    IPC: H01J37/317 ,  H01J37/30

    CPC classification number: H01J37/3171 ,  H01J37/3007 ,  H01J2237/047 ,  H01J2237/04756 ,  H01J2237/10 ,  H01J2237/121 ,  H01J2237/151 ,  H01J2237/24542 ,  H01J2237/30472

    Abstract: In one aspect, an ion implantation system is disclosed, which comprises a deceleration system configured to receive an ion beam and decelerate the ion beam at a deceleration ratio of at least 2, and an electrostatic bend disposed downstream of the deceleration system for causing a deflection of the ion beam. The electrostatic bend includes three tandem electrode pairs for receiving the decelerated beam, where each electrode pair has an inner and an outer electrode spaced apart to allow passage of the ion beam therethrough. Each of the electrodes of the end electrode pair is held at an electric potential less than an electric potential at which any of the electrodes of the middle electrode pair is held and the electrodes of the first electrode pair are held at a lower electric potential relative to the electrodes of the middle electrode pair.

    Abstract translation: 一方面，公开了一种离子注入系统，其包括减速系统，该减速系统被配置为接收离子束并且以至少为2的减速比使离子束减速，以及设置在减速系统下游的静电弯曲件，用于引起偏转 的离子束。 静电弯曲包括用于接收减速梁的三个串联电极对，其中每个电极对具有间隔开的内电极和外电极，以允许离子束通过其中。 端电极对的每个电极被保持在比中间电极对的电极被保持的电位小的电位，并且第一电极对的电极相对于第一电极对的电位保持在较低的电位 中间电极对的电极。

    Angular scanning using angular energy filter
    5.
    发明授权
    Angular scanning using angular energy filter 有权
    角度扫描使用角能量滤波器

    公开(公告)号：US09455116B2

    公开(公告)日：2016-09-27

    申请号：US14692395

    申请日：2015-04-21

    Applicant: Axcelis Technologies, Inc.

    Inventor： Causon Ko-Chuan Jen ,  William Bintz

    IPC: H01J37/00 ,  H01J37/147 ,  H01J37/20 ,  H01J37/317

    CPC classification number: H01J37/1474 ,  H01J37/1478 ,  H01J37/20 ,  H01J37/3171 ,  H01J2237/08 ,  H01J2237/1506 ,  H01J2237/151 ,  H01J2237/152 ,  H01J2237/20207 ,  H01J2237/20214 ,  H01J2237/31701 ,  H01J2237/31708

    Abstract: An ion implantation system and method is provided for varying an angle of incidence of a scanned ion beam relative to the workpiece concurrent with the scanned ion beam impacting the workpiece. The system has an ion source configured to form an ion beam and a mass analyzer configured to mass analyze the ion beam. An ion beam scanner is configured to scan the ion beam in a first direction, therein defining a scanned ion beam. A workpiece support is configured to support a workpiece thereon, and an angular implant apparatus is configured to vary an angle of incidence of the scanned ion beam relative to the workpiece. The angular implant apparatus comprises one or more of an angular energy filter and a mechanical apparatus operably coupled to the workpiece support, wherein a controller controls the angular implant apparatus, thus varying the angle of incidence of the scanned ion beam relative to the workpiece concurrent with the scanned ion beam impacting the workpiece.

    Abstract translation: 提供离子注入系统和方法，用于与扫描的离子束同时冲击工件，改变扫描离子束相对于工件的入射角。 该系统具有构造成形成离子束的离子源和被配置为质量分析离子束的质量分析器。 离子束扫描器被配置成沿着第一方向扫描离子束，其中限定扫描的离子束。 工件支撑件构造成在其上支撑工件，并且角度注入装置被配置为改变扫描离子束相对于工件的入射角。 角植入装置包括角度能量过滤器和可操作地耦合到工件支撑件的机械装置中的一个或多个，其中控制器控制角度注入装置，从而改变扫描离子束相对于工件的入射角度，同时与 扫描的离子束撞击工件。

    Processing apparatus and method using a scanning electron microscope
    6.
    发明授权
    Processing apparatus and method using a scanning electron microscope 有权
    使用扫描电子显微镜的处理装置和方法

    公开(公告)号：US09177759B2

    公开(公告)日：2015-11-03

    申请号：US14301403

    申请日：2014-06-11

    Applicant: Hitachi High-Technologies Corporation

    Inventor： Wen Li ,  Ryo Kadoi ,  Hajime Kawano ,  Hiroyuki Takahashi

    IPC: H01J37/26 ,  H01J37/28 ,  H01J37/147

    CPC classification number: H01J37/28 ,  H01J37/1471 ,  H01J37/265 ,  H01J2237/1504 ,  H01J2237/151 ,  H01J2237/1536

    Abstract: The present invention provides a processing apparatus using a scanning electron microscope, which includes the scanning electron microscope having an electron optical system radiating and scanning a focused electron beam on a sample placed on a stage to image the sample, and an image processing/control section which controls the scanning electron microscope and processes the image obtained by imaging with the scanning electron microscope. The electron optical system of the scanning electron microscope has image shift electrodes comprised of electrostatic electrodes, the image shift electrodes moving a position at which to apply the focused electron beam onto the sample with the stage stopped to thereby shift a region in which the sample is to be imaged.

    Abstract translation: 本发明提供一种使用扫描型电子显微镜的处理装置，该扫描型电子显微镜具有扫描型电子显微镜，该扫描型电子显微镜具有电子光学系统，该放射线照射放置在载置台上的样品上以聚焦的电子束，以对图像进行成像，图像处理/ 其控制扫描电子显微镜并用扫描电子显微镜对通过成像获得的图像进行处理。 扫描电子显微镜的电子光学系统具有由静电电极构成的图像移动电极，图像移动电极移动将聚焦电子束施加到样品上的位置，停止载体，从而移动样品的区域 被成像。

    DECELERATION APPARATUS FOR RIBBON AND SPOT BEAMS
    7.
    发明申请
    DECELERATION APPARATUS FOR RIBBON AND SPOT BEAMS 有权
    RIBBON和SPOT BEA的减速装置

    公开(公告)号：US20150136967A1

    公开(公告)日：2015-05-21

    申请号：US14605985

    申请日：2015-01-26

    Applicant: Advanced Ion Beam Technology, Inc.

    Inventor： Nicholas WHITE ,  Zhimin WAN ,  Erik COLLART

    IPC: H01J37/05 ,  H01J37/147 ,  H01J37/30 ,  H01J37/317

    CPC classification number: H01J37/05 ,  H01J3/04 ,  H01J3/26 ,  H01J37/1472 ,  H01J37/3007 ,  H01J37/3171 ,  H01J2237/04756 ,  H01J2237/053 ,  H01J2237/057 ,  H01J2237/151 ,  H01J2237/303 ,  H01J2237/31701

    Abstract: A deceleration apparatus capable of decelerating a short spot beam or a tall ribbon beam is disclosed. In either case, effects tending to degrade the shape of the beam profile are controlled. Caps to shield the ion beam from external potentials are provided. Electrodes whose position and potentials are adjustable are provided, on opposite sides of the beam, to ensure that the shape of the decelerating and deflecting electric fields does not significantly deviate from the optimum shape, even in the presence of the significant space-charge of high current low-energy beams of heavy ions.

    Abstract translation: 公开了一种减速装置，能够使短点光束或高色带光束减速。 在任一种情况下，都会控制趋向于降低光束轮廓形状的效果。 提供了用于将离子束屏蔽到外部电位的盖子。 其位置和电位可调的电极设置在梁的相对两侧，以确保减速和偏转电场的形状不会显着偏离最佳形状，即使存在显着的空间电荷高 目前低能量的重离子束。

    Multi-beam source
    9.
    发明授权
    Multi-beam source 有权
    多光束源

    公开(公告)号：US08183543B2

    公开(公告)日：2012-05-22

    申请号：US12178153

    申请日：2008-07-23

    Applicant: Elmar Platzgummer

    Inventor： Elmar Platzgummer

    IPC: A61N5/00 ,  G21G5/00

    CPC classification number: H01J37/3177 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/12 ,  H01J37/3007 ,  H01J2237/0437 ,  H01J2237/0453 ,  H01J2237/04928 ,  H01J2237/1205 ,  H01J2237/1501 ,  H01J2237/151 ,  H01J2237/3045

    Abstract: A multi-beam source for generating a plurality of beamlets of energetic electrically charged particles. The multi-beam source includes an illumination system generating an illuminating beam of charged particles and a beam-forming system being arranged after the illumination system as seen in the direction of the beam, adapted to form a plurality of telecentric or homocentric beamlets out of the illuminating beam. The beam forming system includes a beam-splitter and an electrical zone device, the electrical zone having a composite electrode composed of a plurality of substantially planar partial electrodes, adapted to be applied different electrostatic potentials and thus influencing the beamlets.

    Abstract translation: 一种用于产生能量带电粒子的多个子束的多光束源。 多光束源包括产生带电粒子的照明光束的照明系统，以及沿着光束的方向被布置在照明系统之后的束形成系统，适于在多个远心或同心圆的子束之外形成 照明光束。 束形成系统包括分光器和电区装置，电区具有由多个基本上平面的部分电极组成的复合电极，其适于施加不同的静电电势并因此影响子束。

    PROJECTION LENS ARRANGEMENT
    10.
    发明申请
    PROJECTION LENS ARRANGEMENT 审中-公开
    投影镜头布置

    公开(公告)号：US20120061583A1

    公开(公告)日：2012-03-15

    申请号：US13304427

    申请日：2011-11-25

    Applicant: Marco Jan Jaco WIELAND ,  Bert Jan KAMPHERBEEK ,  Alexander Hendrik VAN VEEN ,  Pieter KRUIT ,  Stijn Willem Herman Karel STEENBRINK

    Inventor： Marco Jan Jaco WIELAND ,  Bert Jan KAMPHERBEEK ,  Alexander Hendrik VAN VEEN ,  Pieter KRUIT ,  Stijn Willem Herman Karel STEENBRINK

    IPC: H01J3/26 ,  H01J3/14

    CPC classification number: H01J37/12 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/3007 ,  H01J37/3177 ,  H01J2237/0435 ,  H01J2237/1205 ,  H01J2237/121 ,  H01J2237/151

    Abstract: The invention relates to a charged particle optical system comprising a beamlet generator for generating a plurality of charged particle beamlets, an electrostatic deflection system for deflecting the beamlets, and a projection lens system for directing the beamlets from the beamlet generator towards the target. The electrostatic deflection system comprises a first electrostatic deflector and a second electrostatic deflector for scanning charged particle beamlets over the target. The second electrostatic deflector is located behind the first electrostatic deflector so that, during operation of the system, a beamlet generated by the beamlet generator passes both of the electrostatic deflectors. During operation of the first and second electrostatic deflectors the system is adapted to apply voltages on the first electrostatic deflector and the second electrostatic deflector of opposite sign.

    Abstract translation: 本发明涉及一种带电粒子光学系统，其包括用于产生多个带电粒子子束的子束发生器，用于偏转子束的静电偏转系统，以及用于将子束从小波发生器引导到目标的投影透镜系统。 静电偏转系统包括用于在靶上扫描带电粒子束的第一静电偏转器和第二静电偏转器。 第二静电偏转器位于第一静电偏转器的后面，使得在系统操作期间，由小梁发生器产生的子束通过两个静电偏转器。 在第一和第二静电偏转器的操作期间，系统适于在第一静电偏转器和相反符号的第二静电偏转器上施加电压。

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