公开(公告)号：US5095207A

公开(公告)日：1992-03-10

申请号：US638351

申请日：1991-01-07

Applicant: David S. Y. Tong

Inventor： David S. Y. Tong

IPC: G01Q90/00 ,  G03H5/00 ,  H01J37/295

CPC classification number: G03H5/00 ,  H01J37/295 ,  H01J2237/228 ,  H01J2237/2614

Abstract: A method of three-dimensional imaging of the atomic environment of atoms near the surface of the sample involves forming a localized source electron diffraction pattern, detecting the intensity of the distribution of the pattern, and generating data corresponding to the intensity distribution. The intensity data is normalized and corrected for a phase shift error to produce data corresponding to a hologram. The process may be repeated at a several predetermined emitted electron energies, and the data at each energy is combined to yield a composite image intensity having improved resolution. The method of the invention can provide a lenseless electron microscope having a resolution better than one angstrom and which overcomes distortions caused by multiple scattering.

Abstract translation: 对样品表面附近的原子的原子环境进行三维成像的方法包括形成局部源电子衍射图案，检测图案分布的强度，并产生对应于强度分布的数据。 强度数据对于相移误差进行归一化和校正，以产生对应于全息图的数据。 该过程可以以几个预定的发射电子能量重复，并且将每个能量处的数据组合以产生具有改进的分辨率的合成图像强度。 本发明的方法可以提供一种分辨率高于一埃的无镜电子显微镜，并克服了由多重散射引起的失真。

公开(公告)号：US07923685B2

公开(公告)日：2011-04-12

申请号：US12324937

申请日：2008-11-28

Applicant: Ken Harada ,  Hiroto Kasai

Inventor： Ken Harada ,  Hiroto Kasai

IPC: H01J37/04

CPC classification number: H01J37/295 ,  H01J37/26 ,  H01J2237/0492 ,  H01J2237/1514 ,  H01J2237/1523 ,  H01J2237/228 ,  H01J2237/2588 ,  H01J2237/2614

Abstract: A multi-biprism electron interferometer is configured so as to arrange a plurality of biprisms in an imaging optical system of a specimen. An upper electron biprism is arranged upstream of the specimen in the traveling direction of the electron beam, and an image of the electron biprism is formed on the specimen (object plane) using an imaging action of a pre-field of the objective lens. A double-biprism interference optical system is constructed of a lower electron biprism disposed downstream of the objective lens up to the first image plane of the specimen.

Abstract translation: 多双棱镜电子干涉仪被配置为在样本的成像光学系统中布置多个双棱镜。 在电子束的行进方向上，在样本的上游设置上部电子双棱镜，并且使用物镜的前场的成像动作在被检体（物体面）上形成电子双棱镜的图像。 双二棱镜干涉光学系统由设置在物镜的下游直到样品的第一像面的较低电子双棱镜构成。

公开(公告)号：US07872755B2

公开(公告)日：2011-01-18

申请号：US11883568

申请日：2006-01-27

Applicant: Ken Harada ,  Tetsuya Akashi ,  Yoshihiko Togawa ,  Tsuyoshi Matsuda ,  Noboru Moriya

Inventor： Ken Harada ,  Tetsuya Akashi ,  Yoshihiko Togawa ,  Tsuyoshi Matsuda ,  Noboru Moriya

IPC: G01B9/02

CPC classification number: H01J37/295 ,  G01N23/00 ,  G02B19/0014 ,  G02B19/0047 ,  G03H5/00 ,  H01J37/04 ,  H01J2237/1514 ,  H01J2237/228 ,  H01J2237/2614

Abstract: A double-biprism electron interferometer is an optical system which dramatically increases the degree of freedom of a conventional one-stage electron interferometer. The double biprism interferometer, however, is the same as the optical system of the single electron biprism in terms of the one-dimensional shape of an electron hologram formed by filament electrodes, the direction of an interference area, and the azimuth of the interference fringes. In other words, the longitudinal direction of the interference area is determined corresponding to the direction of the filament electrodes, and the azimuth of the interference fringes only coincides with and is in parallel with the longitudinal direction of the interference area. An interferometer according to the present invention has upper-stage and lower-stage electron biprisms, and operates with an azimuth angle Φ between filament electrodes of the upper-stage and lower-stage electron biprisms to arbitrarily control an interference area and an azimuth θ of the interference fringes formed therein.

Abstract translation: 双二棱镜电子干涉仪是一种显着提高常规一级电子干涉仪自由度的光学系统。 然而，双棱镜干涉仪与由单丝电极组成的电子全息图的一维形状，干涉区域的方向和干涉条纹的方位角的单电子双棱镜的光学系统相同 。 换句话说，干扰区域的长度方向根据灯丝电极的方向确定，并且干涉条纹的方位角仅与干涉区域的纵向方向一致并且平行。 根据本发明的干涉仪具有上级和下级电子双极，并且在上级和下级电子双极之间的灯丝电极之间以方位角Φ操作以任意地控制干涉区域和方位角; 的干涉条纹。

公开(公告)号：US07750298B2

公开(公告)日：2010-07-06

申请号：US11884680

申请日：2006-01-27

Applicant: Ken Harada ,  Tetsuya Akashi ,  Yoshihiko Togawa ,  Tsuyoshi Matsuda ,  Noboru Moriya

Inventor： Ken Harada ,  Tetsuya Akashi ,  Yoshihiko Togawa ,  Tsuyoshi Matsuda ,  Noboru Moriya

IPC: G21G5/00

CPC classification number: H01J37/04 ,  G01N23/00 ,  G02B19/0014 ,  G02B19/0047 ,  G03H5/00 ,  H01J37/295 ,  H01J2237/1514 ,  H01J2237/228 ,  H01J2237/2614

Abstract: An interferometer is disclosed which has upper-stage, intermediate-stage, and lower-stage electron biprisms. The disclosed interferometer operates with an azimuth angle Φ among filament electrodes of the three electron biprisms to arbitrarily control an interference area and an azimuth θ of the interference fringes formed therein, eliminates Fresnel fringes generation, and allows independent control of an interference fringe spacing s and the azimuth θ of the interference fringes.

Abstract translation: 公开了一种具有上级，中级和低级电子双极性的干涉仪。 所公开的干涉仪在三电子双棱镜的细丝电极之间以方位角Φ操作以任意地控制干涉区域和方位角; 其中形成的干涉条纹消除了菲涅尔条纹生成，并允许干涉条纹间距s和方位角的独立控制; 的干涉条纹。

公开(公告)号：US20060124850A1

公开(公告)日：2006-06-15

申请号：US11294470

申请日：2005-12-06

Applicant: Takao Matsumoto ,  Masanari Koguchi

Inventor： Takao Matsumoto ,  Masanari Koguchi

IPC: G21K7/00

CPC classification number: H01J37/28 ,  G03H5/00 ,  H01J37/023 ,  H01J37/244 ,  H01J2237/1502 ,  H01J2237/1514 ,  H01J2237/225 ,  H01J2237/228 ,  H01J2237/2447 ,  H01J2237/24495 ,  H01J2237/24564 ,  H01J2237/2487 ,  H01J2237/2614 ,  H01J2237/2802 ,  H01J2237/2803

Abstract: The conventional detection technique has the following problems in detecting interference fringes: (1) Setting and adjustment are complex and difficult to conduct; (2) A phase image and an amplitude image cannot be displayed simultaneously; and (3) Detection efficiency of electron beams is low. The invention provides a scanning interference electron microscope which is improved in detection efficiency of electron beam interference fringes, and enables the user to observe electric and magnetic information easily in a micro domain of a specimen as a scan image of a high S/N ratio under optimum conditions.

Abstract translation: 常规检测技术在检测干涉条纹方面存在以下问题：（1）设置和调整复杂，难以进行; （2）相位图像和振幅图像不能同时显示; （3）电子束的检测效率低。 本发明提供了扫描干涉电子显微镜，其提高了电子束干涉条纹的检测效率，并且使得用户能够在样本的微区域中容易地观察电磁信息作为高S / N比的扫描图像 最佳条件。

公开(公告)号：US09748073B2

公开(公告)日：2017-08-29

申请号：US15247133

申请日：2016-08-25

Applicant: FUJITSU LIMITED

Inventor： Takashi Yamazaki

IPC: H01J37/00 ,  H01J37/22 ,  H01J37/21 ,  H01J37/244 ,  H01J37/26 ,  H01J37/28

CPC classification number: H01J37/222 ,  H01J37/21 ,  H01J37/22 ,  H01J37/244 ,  H01J37/265 ,  H01J37/28 ,  H01J2237/1534 ,  H01J2237/223 ,  H01J2237/228 ,  H01J2237/2802

Abstract: An analysis method using an electron microscope, detects by a first electronography detector an electron beam transmitted through or scattered by a sample to detect an ADF image of the sample, detects by a second electronography detector the electron beam passing through the first electronography detector to detect an MABF image, adjusts a focal point of the electron beam to be located on the film of the sample to obtain first and second electronographies by the second and first electronography detectors, respectively, adjusts the focal point of the electron beam to be located on the substrate of the sample to obtain third and fourth electronographies by the second and first electronography detectors, respectively, aligns positions of the second and fourth electronographies based on the first and third electronographies, and after the aligning, subtracts the fourth electronography from the second electronography to obtain an image of the film.

公开(公告)号：US20090273789A1

公开(公告)日：2009-11-05

申请号：US11883568

申请日：2006-01-27

Applicant: Ken Harada ,  Tetsuya Akashi ,  Yoshihiko Togawa ,  Tsuyoshi Matsuda ,  Noboru Moriya

Inventor： Ken Harada ,  Tetsuya Akashi ,  Yoshihiko Togawa ,  Tsuyoshi Matsuda ,  Noboru Moriya

IPC: G01B9/02 ,  H01J3/14

CPC classification number: H01J37/295 ,  G01N23/00 ,  G02B19/0014 ,  G02B19/0047 ,  G03H5/00 ,  H01J37/04 ,  H01J2237/1514 ,  H01J2237/228 ,  H01J2237/2614

Abstract: A double-biprism electron interferometer is an optical system which dramatically increases the degree of freedom of a conventional one-stage electron interferometer. The double biprism interferometer, however, is the same as the optical system of the single electron biprism in terms of the one-dimensional shape of an electron hologram formed by filament electrodes, the direction of an interference area, and the azimuth of the interference fringes. In other words, the longitudinal direction of the interference area is determined corresponding to the direction of the filament electrodes, and the azimuth of the interference fringes only coincides with and is in parallel with the longitudinal direction of the interference area. An interferometer according to the present invention has upper-stage and lower-stage electron biprisms, and operates with an azimuth angle Φ between filament electrodes of the upper-stage and lower-stage electron biprisms to arbitrarily control an interference area and an azimuth θ of the interference fringes formed therein.

Abstract translation: 双二棱镜电子干涉仪是一种显着提高常规一级电子干涉仪自由度的光学系统。 然而，双棱镜干涉仪与由单丝电极组成的电子全息图的一维形状，干涉区域的方向和干涉条纹的方位角的单电子双棱镜的光学系统相同 。 换句话说，干扰区域的长度方向根据灯丝电极的方向确定，并且干涉条纹的方位角仅与干涉区域的纵向方向一致并且平行。 根据本发明的干涉仪具有上级和下级电子双极性，并且在上级和下级电子双极之间的细丝电极之间的方位角Φi操作，以任意地控制干扰区域和方位角θ 其中形成的干涉条纹。

公开(公告)号：US5432347A

公开(公告)日：1995-07-11

申请号：US148082

申请日：1993-11-04

Applicant: Willem M. J. M. Coene

Inventor： Willem M. J. M. Coene

IPC: G03H5/00 ,  G06T1/00 ,  H01J37/22 ,  H01J37/26

CPC classification number: H01J37/26 ,  G03H5/00 ,  H01J37/222 ,  H01J2237/1514 ,  H01J2237/228 ,  H01J2237/2614

Abstract: A method for image reconstruction in a high-resolution electron microscope. The Fourier transform (29) of an electron hologram (28) is obtained which is composed of a central frequency domain CB=I.sub.hol,0 (G) and two sidebands SB+=I.sub.hol,+ (G) and SB-=I.sub.hol,- (G). The two sidebands represent the linear image information. By making use of the frequencies in the central frequency domain in the image reconstruction, a non-linear image reconstruction is performed having a resolution which is considerably higher than the achievable information limit in linear image reconstruction using only the sidebands.

Abstract translation: 一种高分辨率电子显微镜图像重建方法。 得到电子全息图（28）的傅里叶变换（29），其由中心频域CB = Ihol，0（＆upbar＆G）和两个边带SB + = Ihol，+（＆upbar＆G）和SB- = Ihol组成， - （＆upbar＆G）。 两个边带表示线性图像信息。 通过利用图像重建中的中心频域中的频率，执行非线性图像重建，其具有比仅使用边带的线性图像重建中可实现的信息限制明显更高的分辨率。

公开(公告)号：US5192867A

公开(公告)日：1993-03-09

申请号：US697576

申请日：1991-05-09

Applicant: Nobuyuki Osakabe ,  Junji Endo ,  Akira Tonomura ,  Masahiro Tomita ,  Tadao Furutsu

Inventor： Nobuyuki Osakabe ,  Junji Endo ,  Akira Tonomura ,  Masahiro Tomita ,  Tadao Furutsu

IPC: H01J37/147 ,  H01J37/20 ,  H01J37/26 ,  H01J37/29

CPC classification number: H01J37/20 ,  H01J37/147 ,  H01J37/26 ,  H01J37/29 ,  H01J2237/1514 ,  H01J2237/228 ,  H01J2237/2614

Abstract: In an electron holography apparatus having an electron source, a specimen holder, an electron lens system, and an electron biprism, the electron biprism is so constructed as to be rotatable about the electron optics axis. The rotation angle about the electron optics axis is commanded by the operator of the electron holography apparatus. A central wire of the electron biprism is allowed to be translated in a direction orthogonal to the electron optics axis, thus permitting the application of the fringe scanning method. The center of an aperture is selectively allowed to be aligned with that of the electron biprism to ensure that the measurement apparatus can be used selectively as either the electron holography apparatus or an electron microscope.

Abstract translation: 在具有电子源，样本保持器，电子透镜系统和电子双棱镜的电子全息设备中，电子双棱镜被构造成可围绕电子光轴旋转。 围绕电子光轴的旋转角度由电子全息设备的操作者命令。 允许电子双棱镜的中心线在与电子光轴垂直的方向上平移，从而允许施加边缘扫描方法。 选择性地允许孔的中心与电子双棱镜的中心对准，以确保测量装置可以选择性地用作电子全息设备或电子显微镜。

公开(公告)号：US20160365220A1

公开(公告)日：2016-12-15

申请号：US15247133

申请日：2016-08-25

Applicant: FUJITSU LIMITED

Inventor： Takashi Yamazaki

IPC: H01J37/22 ,  H01J37/26 ,  H01J37/28 ,  H01J37/21 ,  H01J37/244

CPC classification number: H01J37/222 ,  H01J37/21 ,  H01J37/22 ,  H01J37/244 ,  H01J37/265 ,  H01J37/28 ,  H01J2237/1534 ,  H01J2237/223 ,  H01J2237/228 ,  H01J2237/2802

Abstract: An analysis method using an electron microscope, detects by a first electronography detector an electron beam transmitted through or scattered by a sample to detect an ADF image of the sample, detects by a second electronography detector the electron beam passing through the first electronography detector to detect an MABF image, adjusts a focal point of the electron beam to be located on the film of the sample to obtain first and second electronographies by the first and second electronography detectors, respectively, adjusts the focal point of the electron beam to be located on the substrate of the sample to obtain third and fourth electronographies by the first and second electronography detectors, respectively, aligns positions of the second and fourth electronographies based on the first and third electronographies, and after the aligning, subtracts the fourth electronography from the second electronography to obtain an image of the film.

Abstract translation: 使用电子显微镜的分析方法，通过第一电子摄影检测器检测由样品透射或散射的电子束以检测样品的ADF图像，由第二电子摄影检测器检测通过第一电子摄影检测器的电子束以检测 MABF图像调整位于样品膜上的电子束的焦点，以分别由第一和第二电子摄影检测器获得第一和第二电子照相，调节位于第一和第二电子照相检测器上的电子束的焦点 通过第一和第二电子摄影检测器分别获得第三和第四电子照相的样品的衬底分别基于第一和第三电子照相对准第二和第四电子摄影的位置，并且在对准之后，将第二电子照相从第二电子照相中减去 获得影片的形象。