公开(公告)号：US08482817B2

公开(公告)日：2013-07-09

申请号：US12766462

申请日：2010-04-23

Applicant: Kenji Kubozono ,  Yasuyuki Shinada

Inventor： Kenji Kubozono ,  Yasuyuki Shinada

IPC: H04N1/04 ,  H04N1/21 ,  H04N1/46 ,  H04N1/36 ,  H04N1/393 ,  G06F3/12 ,  H04B10/00 ,  G03G9/08 ,  B41J2/435 ,  G01J1/32 ,  H01J3/14 ,  G05F3/04

CPC classification number: H04N1/02815 ,  H04N1/00978 ,  H04N1/00997 ,  H04N1/0282 ,  H04N1/02835 ,  H04N1/40056

Abstract: An image reading apparatus capable of reading documents includes a reading unit including a light emitting element, a mechanism configured to move the reading unit, and a control unit configured to control the reading unit and the mechanism both to carry out reading by turning on the light emitting element and moving the reading unit and to temporarily stop moving the reading unit upon occurrence of a predetermined factor. The control unit sets a first current value which is caused to flow through the light emitting element when reading is carried out and sets a second current value which is less than the first current value and which is caused to flow through the light emitting element when the reading unit is temporarily stopped.

Abstract translation: 能够读取文件的图像读取装置包括：读取单元，包括发光元件，被配置为移动读取单元的机构;以及控制单元，被配置为控制读取单元和机构，以通过打开光来执行读取 并且在发生预定因素时移动读取单元并暂时停止移动读取单元。 控制单元设置在执行读取时被引导通过发光元件的第一电流值，并且设定小于第一电流值的第二电流值，并且当第二电流值流过发光元件时 阅读单位暂时停止。

公开(公告)号：US08481959B2

公开(公告)日：2013-07-09

申请号：US13028188

申请日：2011-02-15

Applicant: John Ruffell

Inventor： John Ruffell

IPC: H01J37/256 ,  H01J3/14 ,  H01J3/18 ,  H01J3/26

CPC classification number: H01L21/68764 ,  H01J37/1474 ,  H01J37/3171 ,  H01J2237/026 ,  H01J2237/049 ,  H01J2237/057 ,  H01J2237/1503 ,  H01J2237/20207 ,  H01J2237/30472 ,  H01L21/68771

Abstract: Systems and methods of an ion implant apparatus include an ion source for producing an ion beam along an incident beam axis. The ion implant apparatus includes a beam deflecting assembly coupled to a rotation mechanism that rotates the beam deflecting assembly about the incident beam axis and deflects the ion beam. At least one wafer holder holds target wafers and the rotation mechanism operates to direct the ion beam at one of the at least one wafer holders which also rotates to maintain a constant implant angle.

Abstract translation: 离子注入装置的系统和方法包括用于沿入射束轴产生离子束的离子源。 离子注入装置包括耦合到旋转机构的光束偏转组件，其使射束偏转组件围绕入射光束轴线旋转并偏转离子束。 至少一个晶片保持器保持目标晶片，并且旋转机构操作以将离子束引导到至少一个晶片保持器中的一个，其也旋转以保持恒定的注入角度。

公开(公告)号：US08466407B2

公开(公告)日：2013-06-18

申请号：US12900193

申请日：2010-10-07

Applicant: Chadwick B. Martin ,  David J. Knapp ,  Richard A. Funk

Inventor： Chadwick B. Martin ,  David J. Knapp ,  Richard A. Funk

IPC: H01J3/14 ,  G01J1/04

CPC classification number: G02B27/0018 ,  F41G7/2213 ,  F41G7/2253 ,  F41G7/2293 ,  G02B27/0025

Abstract: Asymmetric rotating stray light baffles are provided for conformal dome two-axis seekers having arch corrector optics mounted on the outer gimbal. A pair of side skirt baffles are mounted on opposite sides of the arch corrector optics on the outer gimbal extending forward beyond the transparent arch adjacent but not touching the inner surface of the dome and extending aft beyond the forward most receiver optic for all fields of regard (FOR). The optical system may also include: (a) an annular objective baffle mounted on and around the receiver optics on the inner gimbal and between the pair of side skirt baffles, the objective baffle extending forward of the receiver optics without interfering with the receiver optics' FOV and without interfering with the transparent arch as the inner gimbal rotates, (b) a plurality of fin baffles mounted between the side skirt baffles on the outer gimbal that extend forward adjacent but not touching the inner surface of the dome and aft of the transparent arch, each fin baffle positioned to reduce the cross-section seen by the receiver optic when rotated in the direction of that fin baffle and (c) central baffles (short or long) along the axis of symmetry that obscure a portion of the receiver optics' FOV at a zero degree angle of rotation about the second axis.

Abstract translation: 提供不对称的旋转杂散光挡板，用于具有安装在外万向节上的拱形校正器光学元件的适形圆顶两轴搜索器。 一对侧裙挡板安装在外部万向架上的拱形校正器光学器件的相对侧上，向外延伸超过相邻的透明拱顶，但不接触圆顶的内表面，并延伸到超过最前面的接收器光学器件的所有领域 （对于）。 光学系统还可以包括：（a）安装在内部万向架上的接收器光学器件上和周围的环形物镜挡板，并且在一对侧裙板挡板之间，物镜挡板延伸到接收器光学器件前方，而不会干扰接收器光学元件“ FOV并且当内部万向架旋转时不干扰透明拱顶，（b）多个翅片挡板安装在外万向架上的侧裙板之间，其相邻但不接触圆顶的内表面并且透明的后部延伸 拱形，每个翅片挡板定位成当沿着该翅片挡板的方向旋转时减小由接收器光学器件看到的横截面，以及（c）沿对称轴的中心挡板（短或长），其遮蔽了接收器光学器件的一部分 在相对于第二轴的零度旋转角度处的FOV。

公开(公告)号：US08461554B1

公开(公告)日：2013-06-11

申请号：US13313078

申请日：2011-12-07

Applicant: Peter F. Kurunczi ,  Christopher J. Leavitt ,  Daniel Distaso ,  Timothy J. Miller

Inventor： Peter F. Kurunczi ,  Christopher J. Leavitt ,  Daniel Distaso ,  Timothy J. Miller

IPC: H01J3/14

CPC classification number: H01J37/32146 ,  G21K1/14 ,  H01J37/026 ,  H01J37/3171 ,  H01J37/32412 ,  H01J37/32422 ,  H01J2237/0044

Abstract: A processing system may include a plasma source for providing a plasma and a workpiece holder arranged to receive ions from the plasma. The processing system may further include a pulsed bias circuit electrically coupled to the plasma source and operable to switch a bias voltage supplied to the plasma source between a high voltage state in which the plasma source is biased positively with respect to ground and a low voltage state in which the plasma source is biased negatively with respect to the ground.

Abstract translation: 处理系统可以包括用于提供等离子体的等离子体源和布置成接收来自等离子体的离子的工件夹持器。 处理系统还可以包括电耦合到等离子体源的脉冲偏置电路，并且可操作以在提供给等离子体源的高电压状态之间切换偏置电压，其中等离子体源相对于地面被正偏置，而低电压状态 其中等离子体源相对于地面被负偏压。

公开(公告)号：US20130140450A1

公开(公告)日：2013-06-06

申请号：US13312704

申请日：2011-12-06

Applicant: Anthony Graupera ,  Charles Otis

Inventor： Anthony Graupera ,  Charles Otis

IPC: G21K5/02 ,  H01J3/14

CPC classification number: H01J37/05 ,  H01J37/08 ,  H01J37/317 ,  H01J2237/006 ,  H01J2237/049 ,  H01J2237/057 ,  H01J2237/08 ,  H01J2237/0817 ,  H01J2237/0827 ,  H01J2237/303 ,  H01J2237/31749

Abstract: An inductively coupled plasma source having multiple gases in the plasma chamber provides multiple ion species to a focusing column. A mass filter allows for selection of a specific ion species and rapid changing from one species to another.

Abstract translation: 在等离子体室中具有多个气体的电感耦合等离子体源向聚焦柱提供多个离子物质。 质量过滤器允许选择特定的离子种类并从一个物种快速变化到另一个物种。

公开(公告)号：US20130112858A1

公开(公告)日：2013-05-09

申请号：US13290608

申请日：2011-11-07

Applicant: ALEXANDER ROSIEWICZ

Inventor： ALEXANDER ROSIEWICZ

IPC: H01J3/14

CPC classification number: G01M11/3181

Abstract: A polarization diversity detector includes at least one optical fiber having a first end for receiving a beam of light and a second end for transmitting the beam of light. A collimator receives the beam of the light from the optical fiber and outputs a collimated beam. A polarization diversity element includes a birefringent material which is positioned for receiving the collimated beam and resolving the collimated beam into a first beam having a first polarization and a second beam having a second polarization different from the first polarization. The first beam and second beam are angled relative to one another. At least one photodetector array pair includes a first photodetector array positioned to receive the first beam and a second photodetector array positioned to receive the second beam.

Abstract translation: 极化分集检测器包括至少一个光纤，其具有用于接收光束的第一端和用于传输光束的第二端。 准直器从光纤接收光束并输出准直光束。 偏振分集元件包括双折射材料，其被定位用于接收准直光束并且将准直光束解析成具有第一偏振的第一光束和具有不同于第一偏振的第二偏振的第二光束。 第一梁和第二梁相对于彼此成角度。 至少一个光电检测器阵列对包括定位成接收第一光束的第一光电检测器阵列和定位成接收第二光束的第二光电检测器阵列。

公开(公告)号：US20130105704A1

公开(公告)日：2013-05-02

申请号：US13373029

申请日：2011-11-02

Applicant: Alex Deyhim ,  Eric Van Every

Inventor： Alex Deyhim ,  Eric Van Every

IPC: H01J3/14

CPC classification number: H05H7/00 ,  H05H2007/008

Abstract: A white beam slit. The embodiment of this unit consists of vertical and horizontal slit mechanisms, a vacuum vessel which houses them, stepper motors, limit switches, electrical connections for a drain current measurement system and a stand for the vacuum chamber to attach to. For the base design, the fully scanable aperture can be up to 35 mm square with a maximum aperture of 50 mm square. For custom designs, the aperture can be significantly larger. A cooling assembly is incorporated within to maintain temperature of moveable slit components.

Abstract translation: 白色光束狭缝。 该单元的实施例包括垂直和水平狭缝机构，容纳它们的真空容器，步进电机，限位开关，漏极电流测量系统的电连接和用于真空室附接的支架。 对于基座设计，完全可扫描的光圈可以达到35毫米正方形，最大光圈为50平方毫米。 对于定制设计，光圈可以明显更大。 将冷却组件并入其中以保持可移动狭缝部件的温度。

公开(公告)号：US20130087716A1

公开(公告)日：2013-04-11

申请号：US13646037

申请日：2012-10-05

Applicant: Carl Zeiss Microscopy GmbH

Inventor： Wolfram Buhler ,  Matthias Langer ,  Xiong Liu

IPC: H01J27/26 ,  H01J3/20 ,  H01J3/14

CPC classification number: G21K5/00 ,  H01J27/022 ,  H01J27/26

Abstract: A charged particle source comprises at least one gas inlet configured to supply gas particles, at least one tip having a tip apex being biased to provide an electrical field for generating charged particles, and at least one ionization area to which gas particles are supplied. The gas particles are ionized in the ionization area due to the electrical field. Additionally, the charged particle source comprises at least one first electrode configured to accelerate charged particles and at least one light emitting device providing a light beam. The light beam is focused to a focus point in the ionization area, specifically, to a focus volume such that the ionization area is at least partly positioned in the focus volume. The ionization area is arranged between the tip apex and the first electrode. The distance between the ionization area and the tip apex may be from 0.1 nm to 1 nm.

Abstract translation: 带电粒子源包括构造成供应气体颗粒的至少一个气体入口，至少一个具有尖端顶点的尖端被偏置以提供用于产生带电粒子的电场以及供应气体颗粒的至少一个电离区域。 由于电场，气体粒子在电离区域被离子化。 另外，带电粒子源包括构造成加速带电粒子的至少一个第一电极和提供光束的至少一个发光器件。 光束被聚焦到电离区域中的焦点，具体地聚焦到聚焦体积，使得电离区域至少部分地位于焦点体积中。 电离区域设置在尖端顶点和第一电极之间。 电离区域与尖端顶点之间的距离可以为0.1nm至1nm。

公开(公告)号：US08405026B2

公开(公告)日：2013-03-26

申请号：US12554275

申请日：2009-09-04

Applicant: Tomoyasu Shojo ,  Muneyuki Fukuda ,  Naomasa Suzuki ,  Noritsugu Takahashi

Inventor： Tomoyasu Shojo ,  Muneyuki Fukuda ,  Naomasa Suzuki ,  Noritsugu Takahashi

IPC: H01J3/14 ,  G01N23/00

CPC classification number: H01J37/153 ,  H01J37/04 ,  H01J37/28

Abstract: Disclosed herewith is a charged particle beam apparatus capable of controlling each of the probe current and the objective divergence angle to obtain a desired probe current and a desired objective divergence angle in accordance with the diameter of the subject objective aperture. The apparatus is configured to include an objective aperture between first and second condenser lenses to calculate and set a control value of a first condenser lens in accordance with the diameter of the hole of the objective aperture so as to obtain a desired probe current and calculate a control value of a second condenser lens setting device in accordance with the diameter of the hole of the objective divergence angle and the control value of the second condenser lens setting device, thereby setting the calculated control value for the second condenser lens setting device to control the objective divergence angle.

Abstract translation: 本文公开了一种带电粒子束装置，其能够根据目标物镜孔径来控制探针电流和物镜发散角度，以获得所需的探针电流和期望的物体发散角。 该装置被配置为在第一和第二聚光透镜之间包括物镜孔，以根据物镜孔的直径来计算和设置第一聚光透镜的控制值，以获得所需的探针电流，并计算 根据目标发散角的孔的直径和第二聚光透镜设定装置的控制值的第二聚光透镜设定装置的控制值，由此设定计算出的第二聚光透镜设定装置的控制值， 客观发散角。

公开(公告)号：US20130068962A1

公开(公告)日：2013-03-21

申请号：US13607925

申请日：2012-09-10

Applicant: Takayuki Kawamoto

Inventor： Takayuki Kawamoto

IPC: H01J3/14 ,  H01J3/26

CPC classification number: H01J37/3177 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/3007 ,  H01J37/304 ,  H01J2237/31761 ,  H01J2237/31793

Abstract: A drawing apparatus include: a charged particle optical system configured to generate M×N charged particle beams; a limiting device configured to limit number of charged particle beams that the charged particle optical system emits toward a substrate; and a controller configured, if an abnormal beam that does not satisfy a use condition is present among the M×N charged particle beams, to control the limiting device such that only m rows, each of the m rows including n charged particle beams that are successive without intervention of the abnormal beam.

Abstract translation: 一种绘图装置，包括：带电粒子光学系统，被配置为产生M×N个带电粒子束; 限制装置，被配置为限制带电粒子光学系统朝向衬底发射的带电粒子束的数量; 以及控制器，如果在所述M×N个带电粒子束中存在不满足使用条件的异常光束，则控制所述限制装置，使得仅m行，每行m行包括n个带电粒子束 连续不经异常波束的干预。