公开(公告)号：US20240266155A1

公开(公告)日：2024-08-08

申请号：US18442177

申请日：2024-02-15

Applicant: ATONARP INC.

Inventor： Naoki TAKAHASHI ,  Prakash Sreedhar MURTHY

IPC: H01J37/32 ,  H01J49/10

CPC classification number: H01J37/32981 ,  H01J37/321 ,  H01J37/32348 ,  H01J37/32449 ,  H01J37/32963 ,  H01J49/105 ,  H01J2237/057 ,  H01J2237/332 ,  H01J2237/334 ,  H01J2237/335

Abstract: There is provided a gas analyzer apparatus including: a sample chamber which is equipped with a dielectric wall structure and into which only sample gas to be measured is introduced; a plasma generation mechanism that generates plasma inside the sample chamber, which has been depressurized, using an electric field and/or a magnetic field applied through the dielectric wall structure; and an analyzer unit that analyzes the sample gas via the generated plasma. By doing so, it is possible to provide a gas analyzer apparatus capable of accurately analyzing sample gases, even those including corrosive gas, over a long period of time.

公开(公告)号：US20240232470A9

公开(公告)日：2024-07-11

申请号：US18547874

申请日：2022-02-23

Applicant: mi2-factory GmbH

Inventor： Florian KRIPPENDORF ,  Constantin CSATO

IPC: G06F30/20 ,  G06F111/08 ,  H01J37/317

CPC classification number: G06F30/20 ,  H01J37/3171 ,  G06F2111/08 ,  H01J2237/057 ,  H01J2237/31705

Abstract: A computer-implemented method for the simulation of an energy-filtered ion implantation (EFII) is provided, including: Determining at least one part of an energy filter; determining at least one part of an ion beam source; determining a simulation area in a substrate: implementing the determined at least one part of the energy filter, the determined at least one part of the ion beam source, the determined simulation area in the substrate; Determining a minimum distance between the implemented at least one part of the energy filter and the implemented substrate for enabling a desired degree of a lateral homogenization of the energy distribution in a doping depth profile of the implemented substrate; determining a maximum expected scattering angle of the energy filter by simulating an energy-angle spectrum for the energy filter; and defining a total simulation volume.

公开(公告)号：US20240135066A1

公开(公告)日：2024-04-25

申请号：US18547874

申请日：2022-02-23

Applicant: mi2-factory GmbH

Inventor： Florian KRIPPENDORF ,  Constantin CSATO

IPC: G06F30/20 ,  G06F111/08 ,  H01J37/317

CPC classification number: G06F30/20 ,  H01J37/3171 ,  G06F2111/08 ,  H01J2237/057 ,  H01J2237/31705

Abstract: A computer-implemented method for the simulation of an energy-filtered ion implantation (EFII) is provided, including: Determining at least one part of an energy filter; determining at least one part of an ion beam source; determining a simulation area in a substrate: implementing the determined at least one part of the energy filter, the determined at least one part of the ion beam source, the determined simulation area in the substrate; Determining a minimum distance between the implemented at least one part of the energy filter and the implemented substrate for enabling a desired degree of a lateral homogenization of the energy distribution in a doping depth profile of the implemented substrate; determining a maximum expected scattering angle of the energy filter by simulating an energy-angle spectrum for the energy filter; and defining a total simulation volume.

公开(公告)号：US11942312B2

公开(公告)日：2024-03-26

申请号：US18065656

申请日：2022-12-14

Applicant: ATONARP INC.

Inventor： Naoki Takahashi ,  Prakash Sreedhar Murthy

IPC: H01J37/32 ,  H01J49/10

CPC classification number: H01J37/32981 ,  H01J37/321 ,  H01J37/32348 ,  H01J37/32449 ,  H01J37/32963 ,  H01J49/105 ,  H01J2237/057 ,  H01J2237/332 ,  H01J2237/334 ,  H01J2237/335

Abstract: There is provided a gas analyzer apparatus including: a sample chamber which is equipped with a dielectric wall structure and into which only sample gas to be measured is introduced; a plasma generation mechanism that generates plasma inside the sample chamber, which has been depressurized, using an electric field and/or a magnetic field applied through the dielectric wall structure; and an analyzer unit that analyzes the sample gas via the generated plasma. By doing so, it is possible to provide a gas analyzer apparatus capable of accurately analyzing sample gases, even those including corrosive gas, over a long period of time.

公开(公告)号：US11929229B2

公开(公告)日：2024-03-12

申请号：US18196548

申请日：2023-05-12

Applicant: mi2-factory GmbH

Inventor： Florian Krippendorf ,  Constantin Csato

IPC: H01J37/317 ,  C23C14/18 ,  C23C14/48 ,  H01J37/05 ,  H01J37/147 ,  H01J37/20 ,  H01L21/04 ,  H01L29/32

CPC classification number: H01J37/05 ,  C23C14/18 ,  C23C14/48 ,  H01J37/1477 ,  H01J37/20 ,  H01J37/317 ,  H01J37/3171 ,  H01L21/046 ,  H01L29/32 ,  H01J2237/024 ,  H01J2237/057 ,  H01J2237/1518 ,  H01J2237/20214

Abstract: A semiconductor wafer includes a first surface and an implantation area adjacent to the first surface and a certain distance away from the first surface, the implantation area including implanted particles and defects. A defect concentration in the implantation area deviates by less than 5% from a maximum defect concentration in the implantation area.

公开(公告)号：US20240047168A1

公开(公告)日：2024-02-08

申请号：US18266733

申请日：2021-12-07

Applicant: mi2-factory GmbH

Inventor： Constantin Csato ,  Florian Krippendorf ,  André Zowalla

IPC: H01J37/05 ,  H01J37/317 ,  H01J37/147

CPC classification number: H01J37/05 ,  H01J37/3171 ,  H01J37/1474 ,  H01J2237/057

Abstract: An energy filter assembly (1, 100, 200, 300) for ion implantation system is provided comprising an energy filter (25), a first filter frame (40), and at least one coupling element (50). The energy filter (25) has at least one filter element (25a) absorbing the beam energy of an ion beam (10). The at least one coupling element (50) elastically connects the first filter frame (40) with the energy filter (25).

公开(公告)号：US11837430B2

公开(公告)日：2023-12-05

申请号：US17491963

申请日：2021-10-01

Applicant: mi2-factory GmbH

Inventor： Florian Krippendorf ,  Constantin Csato

IPC: H01J37/05 ,  H01J37/317 ,  H01J37/147

CPC classification number: H01J37/05 ,  H01J37/1472 ,  H01J37/317 ,  H01J37/3171 ,  H01J37/3172 ,  H01J2237/002 ,  H01J2237/047 ,  H01J2237/057 ,  H01J2237/3171 ,  H01J2237/31705

Abstract: A method of doping a wafer includes implanting ions into a wafer by irradiating the wafer with an ion beam using an implantation device. The implantation device includes a filter frame and a filter held by the filter frame, wherein the filter is irradiated by the ion beam passing through the filter to the wafer, and the filter is arranged such that protruding microstructures of the filter face away from the wafer and towards the ion beam.

公开(公告)号：US11756761B2

公开(公告)日：2023-09-12

申请号：US17586706

申请日：2022-01-27

Applicant: Zhongke Jingyuan Electron Limited, Beijing (CN)

Inventor： Qinglang Meng ,  Weiqiang Sun ,  Yan Zhao

IPC: H01J37/147 ,  H01J37/10 ,  H01J37/244 ,  H01J37/28

CPC classification number: H01J37/1475 ,  H01J37/10 ,  H01J37/1477 ,  H01J37/244 ,  H01J37/28 ,  H01J2237/057 ,  H01J2237/1516 ,  H01J2237/1534

Abstract: A Wien filter and a charged particle beam imaging apparatus are provided. The Wien filter Wien filter, including a Wien filter body which includes: an electrostatic deflector, including at least one pair of electrodes, respective two electrodes in each pair of which are opposite to each other, each electrode including an electrode body constructed in an arc-shaped form, and respective electrode bodies of respective two electrodes in each pair of the at least one pair of electrodes being arranged concentrically with and opposite to each other in a diameter direction, and the at least one pair of electrodes being configured to generate respective electric fields by cooperation of the respective two electrodes in each pair of the at least one pair of electrodes, in the condition of respective bias voltages applied individually thereon; and a magnetic deflector, including at least one pair of magnetic poles, respective two magnetic poles in each pair of which are opposite to each other, each magnetic pole including a magnetic pole body constructed in an arc-shaped form, and respective magnetic pole bodies of respective two magnetic poles in each pair of the at least one pair of magnetic poles being arranged concentrically with and opposite to each other in the diameter direction, and the magnetic pole bodies of the at least one pair of magnetic poles in the magnetic deflector and the electrode bodies of the at least one pair of electrodes in the electrostatic deflector being arranged concentrically and spaced apart from each other in a circumferential direction, and the at least one pair of magnetic poles being configured to generate respective magnetic fields by cooperation of respective two magnetic poles in each pair of the at least one pair of magnetic poles; a resultant electric field formed collectively by all of the respective electric fields is perpendicular to a resultant magnetic field formed collectively by all of the respective magnetic fields; and each electrode is also provided with a respective first protrusion extending radially inwards from a radial inner side of the respective electrode body thereof, and each magnetic pole is also provided with a second protrusion extending radially inwards from a radial inner side of the respective magnetic pole body thereof.

公开(公告)号：US20180301315A1

公开(公告)日：2018-10-18

申请号：US15952989

申请日：2018-04-13

Applicant: JEOL Ltd.

Inventor： Masaki Mukai

IPC: H01J37/153 ,  H01J37/22 ,  H01J37/21 ,  H01J37/05 ,  H01J37/14 ,  H01J37/12

CPC classification number: H01J37/153 ,  H01J37/05 ,  H01J37/12 ,  H01J37/14 ,  H01J37/21 ,  H01J37/22 ,  H01J2237/057 ,  H01J2237/1532 ,  H01J2237/24578 ,  H01J2237/24585

Abstract: An electron microscope includes a monochromator, an image acquiring portion for obtaining an electron microscope image containing interference fringes of the electron beam formed by an aperture located behind the monochromator, a line profile acquiring portion for obtaining a plurality of line profiles passing through the center of the aperture on the EM image, an energy dispersion direction identifying portion for identifying the direction of energy dispersion of the monochromator on the basis of the line profiles obtained by the line profile acquiring portion, and an optics controller for controlling an optical system on the basis of a line profile in the direction of energy dispersion to bring the focal plane for the electron beam exiting from the monochromator into coincidence with the achromatic plane.

公开(公告)号：US20170207059A1

公开(公告)日：2017-07-20

申请号：US15411194

申请日：2017-01-20

Applicant: Gatan, Inc.

Inventor： Colin Trevor ,  Matthew Lent ,  Alexander Jozef Gubbens ,  Edward James ,  Ray Dudley Twesten ,  Roice Joseph ,  SanJay Parekh ,  Thomas Sha

IPC: H01J37/05 ,  H01J37/244 ,  H01J37/22 ,  H01J37/26

CPC classification number: H01J37/05 ,  H01J37/222 ,  H01J37/244 ,  H01J37/256 ,  H01J37/26 ,  H01J37/28 ,  H01J2237/0432 ,  H01J2237/05 ,  H01J2237/057 ,  H01J2237/2446 ,  H01J2237/24485 ,  H01J2237/24495 ,  H01J2237/24585 ,  H01J2237/2802

Abstract: An electron energy loss spectrometer is described having a direct detection sensor, a high speed shutter and a sensor processor wherein the sensor processor combines images from individual sensor read-outs and converts a two dimensional image from said sensor into a one dimensional spectrum and wherein the one dimensional spectrum is output to a computer and operation of the high speed shutter is integrated with timing of imaging the sensor. The shutter is controlled to allow reduction in exposure of images corresponding to the individual sensor readouts. A plurality of images are exposed by imaging less than the full possible exposure and wherein the plurality of images are combined to form a composite image. The plurality of images can be comprised of images created by exposing the sensor for different exposure times.