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51.发明申请公开(公告)号：US20220110204A1
公开(公告)日：2022-04-07
申请号：US17465595
申请日：2021-09-02
Applicant: Gigaphoton Inc.
Inventor： Fumio IWAMOTO
Abstract: An extreme ultraviolet light generation apparatus may include a chamber; a droplet generator configured to sequentially supply a first droplet of target substance to a plasma generation region in the chamber; and a gas flow generation device having a gas outlet for causing gas to flow along a travel direction of the first droplet around at least a part of a trajectory of the first droplet. Here, the droplet generator includes a vibrating element configured to generate, by applying vibration to a nozzle through which the target substance is output, a plurality of second droplets each having smaller volume than the first droplet and to cause the second droplets to be combined to generate the first droplet, and the gas outlet is located downstream, on a trajectory direction of the first droplet, of a position where the second droplets are combined and the first droplet is generated.
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公开(公告)号：US20220091515A1
公开(公告)日：2022-03-24
申请号：US17457514
申请日：2021-12-03
Applicant: Gigaphoton Inc.
Inventor： Makoto TANAKA , Yosuke Fujimaki , Takashi Ito , Yousuke Kawagoe
Abstract: A laser chamber of a discharge-excitation-type gas laser apparatus may include a container which contains laser gas therein; a pair of discharge electrodes arranged in the container; a cross flow fan configured to supply the laser gas to a discharge space between the discharge electrodes, the cross flow fan including a rotation shaft with which the cross flow fan rotates in a predetermined rotation direction and a plurality of blades, each longitudinal direction of which is parallel to an axial direction of the rotation shaft; and a stabilizer arranged outside a rotation trajectory of the cross flow fan, and arranged such that a difference between a maximum position and a minimum position of an end portion in the rotation direction on a side opposite to the rotation direction is larger than 0 and is smaller than an interval of two blades adjacent to each other among the plurality of blades.
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公开(公告)号：US11271360B2
公开(公告)日：2022-03-08
申请号：US16731408
申请日：2019-12-31
Applicant: Gigaphoton Inc.
Inventor： Atsushi Fuchimukai , Osamu Wakabayashi , Yoichi Sasaki
Abstract: A wavelength converter including: A. a crystal holder configured to hold a nonlinear crystal configured to convert a wavelength of a laser beam incident thereon and output the wavelength-converted laser beam; B. a first container configured to accommodate the crystal holder and include a light incident window so provided as to intersect an optical path of the laser beam incident on the nonlinear crystal and a light exiting window so provided as to intersect the optical path of the laser beam having exited out of the nonlinear crystal; C. a second container configured to accommodate the first container; D. a position adjusting mechanism configured to adjust at least a position of the first container; and E. an isolation mechanism configured to spatially isolate the light incident window and the light exiting window from the position adjusting mechanism.
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公开(公告)号：US11229112B2
公开(公告)日：2022-01-18
申请号：US17227912
申请日：2021-04-12
Applicant: Gigaphoton Inc.
Inventor： Toru Abe
Abstract: An extreme ultraviolet light generation apparatus may include a target supply unit configured to output a target; an actuator configured to change a trajectory of the target; an illumination device configured to illuminate the target; a first trajectory sensor configured to detect the trajectory in a first direction; a second trajectory sensor configured to detect the trajectory in a second direction; and a processor configured, when the trajectory of the target is detected by the first trajectory sensor but is not detected by the second trajectory sensor, to perform a first search and determine whether or not to repeat the first search based on a signal intensity of the first trajectory sensor, the first search including changing the trajectory of the target into a third direction by controlling the actuator, and then determining whether or not the second trajectory sensor is capable of detecting the trajectory of the target.
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公开(公告)号：US11228156B2
公开(公告)日：2022-01-18
申请号：US16534806
申请日：2019-08-07
Applicant: Gigaphoton Inc.
Inventor： Yoshifumi Ueno , Yuta Takashima
Abstract: A laser system according to the present disclosure includes: a laser apparatus configured to emit a laser beam; a transmission optical system disposed on a path between the laser apparatus and a target supplied into an EUV chamber in which EUV light is generated; a reflection optical system configured to reflect, toward the target, the laser beam from the transmission optical system; a first sensor configured to detect the laser beam traveling from the laser apparatus toward the reflection optical system; a second sensor configured to detect return light of the laser beam reflected by the reflection optical system and traveling backward to the laser apparatus; and a control unit configured to determine that the reflection optical system is damaged when no anomaly of the laser beam is detected and a light amount of the return light exceeds a predetermined light amount value.
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Patent Agency Ranking
公开(公告)号：US20210410262A1
公开(公告)日：2021-12-30
申请号：US17314775
申请日：2021-05-07
Applicant: Gigaphoton Inc.
Inventor： Yuta TAKASHIMA , Yuichi NISHIMURA , Takayuki YABU , Yoshifumi UENO
Abstract: An extreme ultraviolet light generation system may include an irradiation position adjustment mechanism adjusting an irradiation position of the laser light; an extreme ultraviolet light sensor measuring energy of extreme ultraviolet light; a return light sensor measuring energy of return light traveling backward on the laser light path; and a processor controlling the irradiation position adjustment mechanism. The processor stores measurement results of the extreme ultraviolet light energy and the return light energy in association with each of the irradiation positions, limits a shift region of the irradiation position based on comparison between the return light energy and a threshold, and determines a target irradiation position based on the association between the irradiation position and the extreme ultraviolet light energy in a region where the return light energy does not exceed the threshold, and controlling the irradiation position adjustment mechanism in accordance with the target irradiation position.
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公开(公告)号：US11194255B2
公开(公告)日：2021-12-07
申请号：US16812784
申请日：2020-03-09
Applicant: Gigaphoton Inc.
Inventor： Koji Kakizaki , Masakazu Kobayashi , Akira Suwa , Osamu Wakabayashi
Abstract: A laser processing method of performing laser processing on a transparent material that is transparent to ultraviolet light by using a laser processing system includes: performing relative positioning of a transfer position of a transfer image and the transparent material in an optical axis direction of a pulse laser beam so that the transfer position is set at a position inside the transparent material at a predetermined depth ΔZsf from a surface of the transparent material in the optical axis direction; and irradiating the transparent material with the pulse laser beam having a pulse width of 1 ns to 100 ns inclusive and a beam diameter of 10 μm to 150 μm inclusive at the transfer position.
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公开(公告)号：US20210366710A1
公开(公告)日：2021-11-25
申请号：US17392926
申请日：2021-08-03
Inventor： Kaname IMOKAWA , Ryoichi NOHDOMI , Osamu WAKABAYASHI , Hiroshi IKENOUE
Abstract: A method for manufacturing a semiconductor crystalline thin film according to a viewpoint of the present disclosure includes radiating first pulsed laser light having a first pulse duration to an amorphous semiconductor to poly-crystallize the amorphous semiconductor and radiating second pulsed laser light having a second pulse duration shorter than the first pulse duration to an area of a semiconductor crystal having undergone the poly-crystallization to lower the height of ridges of the semiconductor crystal.
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公开(公告)号：US20210364927A1
公开(公告)日：2021-11-25
申请号：US17228000
申请日：2021-04-12
Applicant: Gigaphoton Inc.
Inventor： Tsukasa HORI , Yutaka SHIRAISHI , Toshihiro NISHISAKA , Hiroshi SOMEYA , Yukio WATANABE
Abstract: A target supply device may include a first container configured to contain a target substance, a second container configured to contain the target substance supplied from the first container, a first valve disposed between the first container and the second container, a first pipe connected to the second container and configured to supply pressurized gas to the second container, a third container configured to contain the target substance supplied from the second container, a second valve disposed between the second container and the third container, a second pipe connected to the third container and configured to supply pressurized gas to the third container, and a nozzle configured to output the target substance supplied from the third container.
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60.发明申请公开(公告)号：US20210336404A1
公开(公告)日：2021-10-28
申请号：US17372210
申请日：2021-07-09
Applicant: Gigaphoton Inc.
Inventor： Takuya ISHII , Takashi ITO , Ryota KUJIRA
Abstract: A laser chamber apparatus may include a pipe, an inner electrode extending along a longitudinal direction of the pipe and disposed in a through hole in the pipe, an outer electrode including a contact plate extending along the longitudinal direction of the pipe and being in contact with an outer circumferential surface of the pipe and a ladder section formed of bar members each having one end connected to the contact plate and juxtaposed along a longitudinal direction of the contact plate, and a leaf spring extending along the longitudinal direction of the pipe and configured to press the outer electrode against the pipe. The leaf spring may include leaf spring pieces separated by slits, and the leaf spring pieces may each include a bent section bent along the edge and are configured to press the bar members in a position shifted from the bent sections toward the edge.
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