中科微点-全球专利检索

  1. Login
  2. Sign Up

Search Results

78 records (took 0.015 seconds)

    Heated showerhead assembly
    52.
    发明授权
    Heated showerhead assembly 有权
    加热花洒组件

    公开(公告)号：US09570275B2

    公开(公告)日：2017-02-14

    申请号：US14531831

    申请日：2014-11-03

    Applicant: Applied Materials, Inc.

    Inventor： James D. Carducci ,  Olga Regelman ,  Kallol Bera ,  Douglas A. Buchberger, Jr. ,  Paul Brillhart

    IPC: B05B1/14 ,  B05B1/24 ,  H01J37/32 ,  C23C16/44 ,  C23C16/455 ,  B32B43/00

    CPC classification number: H01J37/3244 ,  B32B43/00 ,  C23C16/4412 ,  C23C16/45565 ,  C23C16/4557 ,  C23C16/45591 ,  H01J37/32449 ,  H01J37/32724 ,  H01J2237/3343 ,  Y10T29/49815

    Abstract: The present disclosure generally comprises a heated showerhead assembly that may be used to supply processing gases into a processing chamber. The processing chamber may be an etching chamber. When processing gas is evacuated from the processing chamber, the uniform processing of the substrate may be difficult. As the processing gas is pulled away from the substrate and towards the vacuum pump, the plasma, in the case of etching, may not be uniform across the substrate. Uneven plasma may lead to uneven etching. To prevent uneven etching, the showerhead assembly may be separated into two zones each having independently controllable gas introduction and temperature control. The first zone corresponds to the perimeter of the substrate while the second zone corresponds to the center of the substrate. By independently controlling the temperature and the gas flow through the showerhead zones, etching uniformity of the substrate may be increased.

    Abstract translation: 本公开通常包括可用于将处理气体供应到处理室中的加热喷头组件。 处理室可以是蚀刻室。 当处理气体从处理室排出时，衬底的均匀处理可能是困难的。 当处理气体从衬底被拉离并且朝向真空泵时，在蚀刻的情况下，等离子体在衬底上可能不均匀。 不均匀的等离子体可能导致不均匀的蚀刻。 为了防止不均匀的蚀刻，喷头组件可以分成两个区域，每个区域具有独立可控的气体引入和温度控制。 第一区域对应于衬底的周边，而第二区域对应于衬底的中心。 通过独立地控制温度和通过喷头区域的气体流动，可以增加基板的蚀刻均匀性。

    SHOWERHEAD INSULATOR AND ETCH CHAMBER LINER
    56.
    发明申请
    SHOWERHEAD INSULATOR AND ETCH CHAMBER LINER 有权

    公开(公告)号：US20130327480A1

    公开(公告)日：2013-12-12

    申请号：US13649913

    申请日：2012-10-11

    Applicant: Applied Materials, Inc.

    Inventor： James D. Carducci ,  Olga Regelman

    IPC: C23F1/08

    CPC classification number: H01J37/32633 ,  H01J37/3244 ,  H01J37/32449 ,  H01J37/32477

    Abstract: The present invention generally comprises a showerhead insulator for electrically isolating a showerhead assembly from a processing chamber wall, a chamber liner assembly for lining a processing chamber, a lower chamber liner for lining an evacuation area of a processing chamber, and a flow equalizer for ensuring a uniform evacuation of a processing chamber. When processing a substrate within an etching chamber, the showerhead needs to be electrically isolated from ground. A showerhead insulator may insulate the showerhead from ground while also preventing plasma from entering the volume that it occupies. A chamber liner may protect the chamber walls from contamination and reduce chamber cleaning. A flow equalizer will permit processing gases to be evenly pulled into the evacuation channel rather than a disproportionate flow into the evacuation channel. A lower liner can aid in uniformly drawing the vacuum and protecting the chamber walls from contamination.

    Continuous liner for use in a processing chamber
    57.
    发明授权
    Continuous liner for use in a processing chamber 有权

    公开(公告)号：US12163218B2

    公开(公告)日：2024-12-10

    申请号：US18370750

    申请日：2023-09-20

    Applicant: APPLIED MATERIALS, INC.

    Inventor： James D. Carducci ,  Kenneth S. Collins ,  Kartik Ramaswamy

    IPC: C23C16/44 ,  C23C16/455 ,  C23C16/458

    Abstract: A processing chamber includes a chamber body defining an interior volume and including an access port. A cathode assembly is configured to generate a plasma within the interior volume. A chamber liner includes one or more inner notch structures to engage with one or more components of the chamber body. The chamber liner is configured to move between a loading position and an operation position. When the chamber liner is in the loading position, the interior volume is accessible by the access port. When the chamber liner is in the operation position, the chamber liner at least partially encloses the interior volume.

    Plasma reactor with electrode filaments extending from ceiling
    59.
    发明授权
    Plasma reactor with electrode filaments extending from ceiling 有权

    公开(公告)号：US11424104B2

    公开(公告)日：2022-08-23

    申请号：US15630833

    申请日：2017-06-22

    Applicant: Applied Materials, Inc.

    Inventor： Kenneth S. Collins ,  Michael R. Rice ,  Kartik Ramaswamy ,  James D. Carducci

    IPC: H01L21/00 ,  C23C16/00 ,  H01J37/32 ,  C23C16/507 ,  C23C16/54 ,  C23C16/509 ,  C23C16/455 ,  H01L21/67 ,  H01L21/683 ,  H01L21/687

    Abstract: A plasma reactor includes a chamber body having an interior space that provides a plasma chamber and having a ceiling, a gas distributor to deliver a processing gas to the plasma chamber, a pump coupled to the plasma chamber to evacuate the chamber, a workpiece support to hold a workpiece, and an intra-chamber electrode assembly. The intra-chamber electrode assembly includes an insulating frame, a first plurality of coplanar filaments that extend laterally through the plasma chamber between the ceiling and the workpiece support along a first direction, and a second plurality of coplanar filaments that extend in parallel through the plasma chamber along a second direction perpendicular to the first direction. Each filament of the first and second plurality of filaments includes a conductor at least partially surrounded by an insulating shell. A first RF power source supplies a first RF power to the conductor of the intra-chamber electrode assembly.

    CONTINUOUS LINER FOR USE IN A PROCESSING CHAMBER
    60.
    发明申请
    CONTINUOUS LINER FOR USE IN A PROCESSING CHAMBER 有权

    公开(公告)号：US20220186366A1

    公开(公告)日：2022-06-16

    申请号：US17117514

    申请日：2020-12-10

    Applicant: Applied Materials, Inc.

    Inventor： James D. Carducci ,  Kenneth S. Collins ,  Kartik Ramaswamy

    IPC: C23C16/44 ,  C23C16/458 ,  C23C16/455

    Abstract: Certain embodiments of the present disclosure relate to chamber liners, processing chambers that include chamber liners, and methods of using the same. In one embodiment, a processing chamber comprises a chamber body defining an interior volume and comprising an access port for inserting a substrate into the interior volume; a cathode assembly configured to generate a plasma within the interior volume; and a chamber liner comprising a smooth interior surface that is radially symmetric about a vertical axis of the chamber body. The chamber liner is configured to move between a loading position and an operation position.

Patent Agency Ranking