Abstract:
Disclosed is a substrate processing system with a damage preventing function, comprising: a fluid tank which stores fluid; a chamber which receives the fluid from the fluid tank and provides a space where a substrate is processed; a pipe which connects the fluid tank and the chamber and through which the fluid flows; and a damage preventing unit which allows the fluid tank to be changed in position corresponding to thermal expansion caused in the pipe by receiving heat as the fluid flows in the pipe.With this, the substrate processing system with the damage preventing function for allowing the fluid tank to correspond to change in volume due to the thermal expansion of the pipe and preventing the fluid tank from damage is provided.
Abstract:
A pressure vessel and a drum rotatably arranged inside which has an inner space for material that is introduced into the pressure vessel. In various embodiments, a drive mechanism rotates the drum in relation to the pressure vessel. The drive mechanism can include a motor that can be located inside the pressure vessel in an interspace between the drum and the pressure vessel. Some embodiments include a door to close an opening of the pressure vessel and a part of the door can extend into an open end of the drum when the door is closed to keep the material in the drum and out of the interspace. In particular embodiments, a steam supply conduit extends into the drum at the closed end of the pressure vessel. In some embodiments, a helical agitation blade in the drum moves the material away from or toward the opening.
Abstract:
A waste treatment apparatus having an autoclave that includes a pressure vessel (11) having a first mouth part (20) to receive waste material and a second mouth part (19) to discharge treated material, with the autoclave being rotatable at a longitudinal axis to agitate the waste material during treatment and to discharge waste material from the autoclave.
Abstract:
Autoclaves with combined airflow to provide controllable heating or cooling of parts being processed are disclosed. Gas flow along the autoclave is provided in one or more duct areas (48,52), with a plurality of duct valves (50) along the duct (48,52) controllably diverting the gas into the working area of the autoclave. In a fully configured autoclave, duct valves (50) divert gas flowing from the fan or blower (38) from the ceiling, sides and floor of an autoclave to provide a controllable, three dimensional, air flow in the working area of the autoclave. Control of the duct valves (50) may be manual or automatic, with individual or ganged duct valve control. Computer control based on temperature sensor on parts in the working area of the autoclave may be used to provide uniform heating or cooling, or intentional non-uniform heating or cooling rates. Various embodiments are disclosed.
Abstract:
A lining particularly for performing oxidation processes and especially conventional and unconventional wet oxidation processes, which is substantially characterized by the presence of two separate portions, a first one made of titanium or alloys thereof and a second one made of at least one nickel alloy. The two portions of the lining are constituted by two layers, which are anchored on a substrate, generally steel, which is then shaped so as to provide the final apparatus. Advantageously, the apparatus is a wet oxidation reactor, plated internally with the lining as described above.
Abstract:
The present invention provides an apparatus and methods for controlling gas pressure within a semiconductor process chamber. The apparatus comprises a fluid conduit, and a throttle valve positioned downstream of the process chamber outlet for controlling gas flow therethrough. A filter is disposed between the inlet of the fluid conduit and the throttle valve for collecting gas particles flowing through the fluid conduit to inhibit gas deposition on the throttle valve. In addition, the filter functions as a flow restrictor to reduce the gas flow rate through the fluid conduit. This allows the throttle valve to operate in a more open position for a particular desired gas pressure, which usually reduces the amount of throttle valve surfaces exposed to gas passing therethrough. Accordingly, the amount of gas deposited on these surfaces is further reduced. This configuration minimizes any friction between valve surfaces, which increases the lifetime of the throttle valve and the throughput of the process.
Abstract:
An introduction system for introducing an atmosphere into an interior of an autoclave alters an existing atmosphere. The introduction system comprises at least one source of actuating gas; an actuating mechanism, a pressure barrier that separates an interior of the autoclave from ambient exterior atmosphere; and a containment vessel that is located at least partially in the interior of the autoclave. The containment vessel comprises a plurality of walls, at least one of the walls comprising a release wall structure of the containment vessel, a vapor producing material cavity, where the walls define the vapor producing material cavity; and an opening element. The opening element is movable by the opening actuator device. The release wall structure of the containment vessel is rapidly opened by the opening element to effect a rapid release of vapor producing material in the vapor producing material cavity into the interior of the autoclave. The autoclave is provided with at least an increased pressure, so a rapid release of vapor producing material in the vapor producing material cavity into the interior of the autoclave causes the vapor producing material to vaporize into a vapor, thus altering an atmosphere in the autoclave. The actuating mechanism comprises an opening actuator device. The at least one source of actuating gas in communication with the opening actuator device and flow from the at least one source of actuating gas is controlled by a control device.
Abstract:
The present invention concerns a device for measuring the pressure and temperature in at least one pressure-tight analysis vessel, that has been sealed by means of a lid, whereby heat is supplied to the analysis vessel by means of a microwave oven. The device comprises a measurement device that is connected to a unit for controlling the microwave oven. In this regard, the measurement device is arranged in a microwave-tight housing inside the microwave field that is produced by the microwave oven. The housing is constructed in such a way that it forms a shield that is impermeable for the microwave field. A microwave-free zone is produced inside the housing. Electronic, current-carrying components can be arranged in the microwave-tight housing without, as a result, generating interference in the microwave field.
Abstract:
A pressure vessel in which the air steam and liquid exhaust systems are combined and wherein all exhaust systems are directed through a water reservoir, using a single control valve and a temperature/pressure sensor in the system.
Abstract:
An inner lid is attached to a vacuum chamber, covering an inner region of the vacuum chamber. An outer lid, also attached to the vacuum chamber, covers the inner lid, leaving a region between the inner lid and the outer lid. A gas conduit allows gas to flow between the inner region of the vacuum chamber and the region between the inner lid and the outer lid. A filter is placed in or immediately outside the gas conduit to prevent particles from entering the inner region of the vacuum chamber from the region between the inner lid and the outer lid. Since the pressure is the same on the top and bottom of the inner lid, the inner lid does not flex and thus does not rub against the vacuum chamber when the vacuum chamber is pumped down or vented up.