公开(公告)号：US06181927B2

公开(公告)日：2001-01-30

申请号：US09024985

申请日：1998-02-17

Applicant: James Brian Welling, Jr. ,  Sima Chiniwala ,  Stewart Hodde Maxwell ,  Thanh Pham ,  Anatoly Vaserfirer

Inventor： James Brian Welling, Jr. ,  Sima Chiniwala ,  Stewart Hodde Maxwell ,  Thanh Pham ,  Anatoly Vaserfirer

IPC: H04M342

CPC classification number: H04W4/06 ,  H04L67/04 ,  H04L67/18 ,  H04M3/42348 ,  H04M3/487 ,  H04M3/4878 ,  H04M15/8083 ,  H04M2207/18 ,  H04M2215/0184 ,  H04M2215/0192 ,  H04M2215/32 ,  H04Q3/0029 ,  H04Q2213/13524 ,  H04Q2213/13532 ,  H04Q2213/13546 ,  H04W4/02 ,  H04W76/10

Abstract: In a telecommunications system, a subscriber station invokes a sponsored-call application service program when the subscriber station originates a call. Based upon certain criteria, service logic determines whether the call is sponsored or not. If sponsored, additional service logic utilizes the location of the call origination (i.e., location of the subscriber station) and/or other attributes of the subscriber station to select an announcement from a plurality of announcements for transmission to the subscriber station. After the announcement is transmitted (i.e., played), the subscriber station is connected to the call's desired destination. If not sponsored, the call is handled as a normal call.

Abstract translation: 在电信系统中，当用户站发起呼叫时，用户台调用赞助呼叫应用服务程序。 根据某些标准，服务逻辑确定呼叫是否被赞助。 如果被赞助，附加服务逻辑利用呼叫发起的位置（即，用户台的位置）和/或用户台的其他属性来从多个通告中选择通知以传送到用户台。 在通知（即播放）之后，用户站连接到呼叫所需的目的地。 如果不赞助，则呼叫作为正常呼叫处理。

公开(公告)号：US6012600A

公开(公告)日：2000-01-11

申请号：US590030

申请日：1996-02-02

Applicant: Thanh Pham ,  Eugene Fukshansky ,  David Wanamaker

Inventor： Thanh Pham ,  Eugene Fukshansky ,  David Wanamaker

IPC: B65D45/18 ,  H01L21/687

CPC classification number: B65D45/18 ,  H01L21/687

Abstract: A method and apparatus is provided which secures the lid of a processing chamber in abutting engagement with the walls of the chamber to form an airtight processing environment and which provides for the release of pressure within the chamber in the event of a sudden change in pressure such as an over pressure excursion. The method and apparatus generally comprise a clamp member having a base portion for mounting the clamp to a first surface, a contact portion for contacting a second surface and maintaining a desired relationship between the first and second surfaces, and a deflecting portion which allows separation of the first and second surfaces to relieve pressure behind the first or second surface and return to the desired relationship between the first and second surfaces.

Abstract translation: 提供了一种方法和装置，其将处理室的盖与室的壁邻接地接合以形成气密处理环境，并且在压力突然变化的情况下提供室内压力的释放 作为过度压力的旅行。 所述方法和装置通常包括具有用于将夹具安装到第一表面的基部的夹持构件，用于接触第二表面并保持第一和第二表面之间期望的关系的接触部分和允许将第二表面分离的偏转部分 所述第一和第二表面以减轻所述第一或第二表面后面的压力并返回到所述第一和第二表面之间的所需关系。

公开(公告)号：US5866795A

公开(公告)日：1999-02-02

申请号：US819593

申请日：1997-03-17

Applicant: Yen-Kun Wang ,  Fong Chang ,  Thanh Pham ,  Jeff Plante

Inventor： Yen-Kun Wang ,  Fong Chang ,  Thanh Pham ,  Jeff Plante

IPC: G01L25/00

CPC classification number: G01F25/0007 ,  C23C16/4481 ,  G01F1/007 ,  G01F1/708 ,  G01F25/003 ,  G01F25/0038

Abstract: An apparatus for controlling the flow of a liquid precursor into a deposition chamber comprises a liquid injection system having a liquid injection outlet connected to a chamber inlet line upstream of the deposition chamber. The liquid injection system includes a liquid precursor supply, a purge gas supply, a carrier gas supply, a liquid flow meter, and a controller managing flows of the liquid precursor and carrier gas to the chamber. A purge line is connected between the purge gas supply and the liquid flow meter and is used to trap a known mass of liquid precursor. To calibrate the flow of the liquid precursor, the purge gas is used to push the trapped liquid precursor through the liquid flow meter at a steady rate. The elapsed time for evacuating the trapped liquid precursor from the purge line is measured. Calibration information is computed using the mass of the trapped liquid precursor and the measured elapsed time based on the direct liquid measurement approach. The calibration information is used to calibrate the controller to correct deviations in the liquid flow rate and achieve a target liquid precursor flow rate for improving wafer uniformity.

Abstract translation: 用于控制液体前体流入沉积室的装置包括具有连接到沉积室上游的室入口管的液体注入口的液体注入系统。 液体注入系统包括液体前体供应源，吹扫气体供应源，载气供应器，液体流量计和控制液体前体和载体气体流到腔室的控制器。 吹扫管线连接在净化气体供应源和液体流量计之间，用于捕集已知质量的液体前体。 为了校准液体前体的流动，吹扫气体以稳定的速率推动被捕获的液体前体通过液体流量计。 测量从清除管线排出被捕获的液体前体的经过时间。 基于直接液体测量方法，使用捕获的液体前体的质量和测量的经过时间计算校准信息。 校准信息用于校准控制器以校正液体流速中的偏差，并实现目标液体前体流速以改善晶片均匀性。

公开(公告)号：US20110249198A1

公开(公告)日：2011-10-13

申请号：US12758222

申请日：2010-04-12

Applicant: Samuel D'Alessio ,  Thanh Pham

Inventor： Samuel D'Alessio ,  Thanh Pham

IPC: H04N9/31 ,  H04N7/173 ,  G06F15/177

CPC classification number: H04N5/74 ,  H04W8/005

Abstract: A projector includes a network interface card, a basic input output system, and a service set identifier module. The network interface card is configured to communicate with a computer. The basic input output system is in communication with the network interface card, and is configured to store a model number and identification data for the projector. The service set identifier module is in communication with the basic input output system, and is configured to retrieve the model number and the identification data, and to utilize the model number and the identification data to create a unique service set identifier for the projector.

Abstract translation: 投影仪包括网络接口卡，基本输入输出系统和服务集识别器模块。 网络接口卡被配置为与计算机通信。 基本输入输出系统与网络接口卡通信，并配置为存储投影机的型号和识别数据。 服务集标识符模块与基本输入输出系统通信，并被配置为检索型号和识别数据，并利用型号和识别数据为投影机创建唯一的服务集标识符。

公开(公告)号：US07248491B1

公开(公告)日：2007-07-24

申请号：US11044746

申请日：2005-01-26

Applicant: Alvin Y. Ching ,  Raymond C. Pang ,  Steven P. Young ,  Thanh Pham

Inventor： Alvin Y. Ching ,  Raymond C. Pang ,  Steven P. Young ,  Thanh Pham

IPC: G11C15/00

CPC classification number: G11C15/04 ,  G11C7/1075

Abstract: According to one aspect of the invention, a circuit for accessing data in a memory is disclosed. The circuit generally comprises a first port having a read logic circuit and a first output which generates data from the memory. A second port has a read logic circuit and a write logic circuit. A second output is coupled to the second port, and also generates data from the memory. Circuits for separately selecting read and write widths for a port of a memory, such as a random access memory, are disclosed. Finally, other embodiments related to implementing a content addressable memory in a programmable logic device are disclosed. Further, a method of accessing data in a memory is disclosed.

Abstract translation: 根据本发明的一个方面，公开了一种用于访问存储器中的数据的电路。 电路通常包括具有读逻辑电路的第一端口和从存储器产生数据的第一输出。 第二端口具有读逻辑电路和写逻辑电路。 第二输出耦合到第二端口，并且还从存储器产生数据。 公开了用于单独选择存储器的端口（例如随机存取存储器）的读取和写入宽度的电路。 最后，公开了在可编程逻辑器件中实现内容可寻址存储器的其它实施例。 此外，公开了一种访问存储器中的数据的方法。

公开(公告)号：US20070048446A1

公开(公告)日：2007-03-01

申请号：US11552129

申请日：2006-10-23

Applicant: Sudhir Gondhalekar ,  Padmanabhan Krishnaraj ,  Tom Cho ,  Muhammad Rasheed ,  Hemant Mungekar ,  Thanh Pham ,  Zhong Hua

Inventor： Sudhir Gondhalekar ,  Padmanabhan Krishnaraj ,  Tom Cho ,  Muhammad Rasheed ,  Hemant Mungekar ,  Thanh Pham ,  Zhong Hua

IPC: C23C16/00 ,  B05D3/00

CPC classification number: H01L21/67017 ,  H01L21/67109

Abstract: The present invention is directed to improving defect performance in semiconductor processing systems. In specific embodiments, an apparatus for processing semiconductor substrates comprises a chamber defining a processing region therein, and a substrate support disposed in the chamber to support a semiconductor substrate. At least one nozzle extends into the chamber to introduce a process gas into the chamber through a nozzle opening. The apparatus comprises at least one heat shield, each of which is disposed around at least a portion of one of the at least one nozzle. The heat shield has an extension which projects distally of the nozzle opening of the nozzle and which includes a heat shield opening for the process gas to flow therethrough from the nozzle opening. The heat shield decreases the temperature of nozzle in the processing chamber for introducing process gases therein to reduce particles.

Abstract translation: 本发明旨在改善半导体处理系统中的缺陷性能。 在具体实施例中，用于处理半导体衬底的设备包括限定其中的处理区域的腔室和设置在腔室中以支撑半导体衬底的衬底支撑件。 至少一个喷嘴延伸到室中以通过喷嘴开口将工艺气体引入室中。 该装置包括至少一个隔热罩，每个隔热罩设置在至少一个喷嘴之一的至少一部分周围。 隔热罩具有向喷嘴的喷嘴开口向远侧突出的延伸部分，其包括用于工艺气体从喷嘴开口流过的隔热开口。 隔热罩降低了处理室中的喷嘴的温度，用于将工艺气体引入其中以减少颗粒。

公开(公告)号：US20060166515A1

公开(公告)日：2006-07-27

申请号：US11388657

申请日：2006-03-24

Applicant: M. Karim ,  DongQing Li ,  Jeong Byun ,  Thanh Pham

Inventor： M. Karim ,  DongQing Li ,  Jeong Byun ,  Thanh Pham

IPC: H01L21/31 ,  H01L21/469

CPC classification number: C23C16/402 ,  C23C16/045 ,  H01L21/02164 ,  H01L21/02274 ,  H01L21/31612 ,  H01L21/76837

Abstract: A process is provided for depositing an silicon oxide film on a substrate disposed in a process chamber. A process gas that includes a halogen source, a fluent gas, a silicon source, and an oxidizing gas reactant is flowed into the process chamber. A plasma having an ion density of at least 1011 ions/cm3 is formed from the process gas. The silicon oxide film is deposited over the substrate with a halogen concentration less than 1.0%. The silicon oxide film is deposited with the plasma using a process that has simultaneous deposition and sputtering components. The flow rate of the halogen source to the process chamber to the flow rate of the silicon source to the process chamber is substantially between 0.5 and 3.0.

Abstract translation: 提供了一种在设置在处理室中的衬底上沉积氧化硅膜的工艺。 包括卤素源，流动气体，硅源和氧化性气体反应物的处理气体流入处理室。 从处理气体形成离子密度为至少10×10 6离子/ cm 3的等离子体。 氧化硅膜以低于1.0％的卤素浓度沉积在衬底上。 使用具有同时沉积和溅射组分的工艺，用等离子体沉积氧化硅膜。 卤素源到处理室的流速与硅源到处理室的流速基本上在0.5和3.0之间。

公开(公告)号：US20050048801A1

公开(公告)日：2005-03-03

申请号：US10655230

申请日：2003-09-03

Applicant: M. Karim ,  DongQing Li ,  Jeong Byun ,  Thanh Pham

Inventor： M. Karim ,  DongQing Li ,  Jeong Byun ,  Thanh Pham

IPC: C23C16/04 ,  C23C16/40 ,  C23C16/50 ,  H01L21/316 ,  H01L21/31 ,  H01L21/469

CPC classification number: C23C16/402 ,  C23C16/045 ,  H01L21/02164 ,  H01L21/02274 ,  H01L21/31612 ,  H01L21/76837

Abstract: A process is provided for depositing an undoped silicon oxide film on a substrate disposed in a process chamber. A process gas that includes SiF4, H2, a silicon source, and an oxidizing gas reactant is flowed into the process chamber. A plasma having an ion density of at least 1011 ions/cm3 is formed from the process gas. The undoped silicon oxide film is deposited over the substrate with the plasma using a process that has simultaneous deposition and sputtering components. A temperature of the substrate during such depositing is greater than 450° C.

Abstract translation: 提供了一种用于在设置在处理室中的衬底上沉积未掺杂的氧化硅膜的工艺。 包括SiF4，H2，硅源和氧化性气体反应物的工艺气体流入处理室。 从工艺气体形成具有至少10 11 / cm 3离子密度的等离子体。 使用具有同时沉积和溅射组分的工艺，用等离子体在衬底上沉积未掺杂的氧化硅膜。 在这种沉积过程中，衬底的温度大于450℃

公开(公告)号：US5818815A

公开(公告)日：1998-10-06

申请号：US530686

申请日：1995-09-19

Applicant: Regis Carpentier ,  Rene Glaise ,  Francois Kermarec ,  Thanh Pham

Inventor： Regis Carpentier ,  Rene Glaise ,  Francois Kermarec ,  Thanh Pham

IPC: H04Q3/00 ,  H04L12/56 ,  H04Q11/04

CPC classification number: H04L12/5602 ,  H04Q11/0478 ,  H04L2012/5679 ,  H04L2012/568

Abstract: A method and an apparatus for shaping the output traffic in the transmit part of a network node adapter. The network node supports fixed length cell switching user information traffic between a source unit and a destination unit. The method and apparatus use two lookup tables called an active and a standby calendar per output line. Each entry in the calendars represents the position of one cell in the output cell stream. Three parameters tables are used to store the information on user traffic in the descending order of the user bandwidth share negotiated at traffic establishment time for the calendars. The active calendar is continuously read by a transmit device and the corresponding cells are sent onto the output line. Under control of a control device, a placement device places entries in the standby calendar reserved as changes occur in the traffic. Once filled up, the standby calendar is swapped to the active calendar and is read by the transmit device.

Abstract translation: 一种用于对网络节点适配器的发送部分中的输出业务进行整形的方法和装置。 网络节点在源单元和目的地单元之间支持固定长度的小区交换用户信息业务。 该方法和设备使用两个查询表，每个输出行称为活动和备用日历。 日历中的每个条目表示输出单元格流中一个单元格的位置。 三个参数表用于按照日历在交通建立时间协商的用户带宽份额的降序存储用户流量信息。 活动日历由发送设备连续读取，相应的小区被发送到输出线路上。 在控制设备的控制下，放置设备将备用日历中的条目放置在流量中发生更改时保留。 一旦装满，备用日历将交换到活动日历，并由发送设备读取。

公开(公告)号：US09167194B2

公开(公告)日：2015-10-20

申请号：US12758222

申请日：2010-04-12

Applicant: Samuel D'Alessio ,  Thanh Pham

Inventor： Samuel D'Alessio ,  Thanh Pham

IPC: H04N9/31 ,  H04N7/173 ,  G06F15/177 ,  H04N5/74 ,  H04W8/00

CPC classification number: H04N5/74 ,  H04W8/005

Abstract: A projector includes a network interface card, a basic input output system, and a service set identifier module. The network interface card is configured to communicate with a computer. The basic input output system is in communication with the network interface card, and is configured to store a model number and identification data for the projector. The service set identifier module is in communication with the basic input output system, and is configured to retrieve the model number and the identification data, and to utilize the model number and the identification data to create a unique service set identifier for the projector.

Abstract translation: 投影仪包括网络接口卡，基本输入输出系统和服务集识别器模块。 网络接口卡被配置为与计算机通信。 基本输入输出系统与网络接口卡通信，并配置为存储投影机的型号和识别数据。 服务集标识符模块与基本输入输出系统通信，并被配置为检索型号和识别数据，并利用型号和识别数据为投影机创建唯一的服务集标识符。