COATING APPARATUS AND COATING SYSTEM
    52.
    发明公开

    公开(公告)号:US20230330694A1

    公开(公告)日:2023-10-19

    申请号:US18340909

    申请日:2023-06-26

    CPC classification number: B05C11/1018 B05C1/02

    Abstract: Provided are a coating apparatus and a coating system, where the coating apparatus includes: a coating module, the coating module including a coating roller and a coating die, where the coating roller is configured to drive, when rotating, a substrate to move toward the coating die, and the coating die is configured to apply a coating onto the substrate; an error acquisition module having a predetermined distance to the coating roller and configured to acquire a circular run-out error of rotation of the coating roller and transmit the circular run-out error to a linkage module; and the linkage module configured to adjust position of the coating die in real time according to the circular run-out error transmitted to the linkage module, so as to keep a distance between the coating roller and the coating die unchanged.

    Edge-coating a panel with a coating medium

    公开(公告)号:US11779951B2

    公开(公告)日:2023-10-10

    申请号:US17913243

    申请日:2021-03-24

    Inventor: Yavuz Madanoglu

    CPC classification number: B05C5/0204 B05C11/1039

    Abstract: The disclosure relates to a coating device for edge-coating a panel with a coating medium, the device comprising at least one medium line, for guiding a coating medium, which comprises an inlet and an outlet, wherein the medium line comprises a recess for introducing a panel into a coating-medium stream, and wherein the medium line and the recess are designed such that the coating medium can be applied to the edge of the panel by means of suction in the flow direction of the medium. The present disclosure also relates to a coating system for edge-coating a panel with a coating medium.

    COATING PRODUCTION DEVICE FOR OPTICAL FILM
    55.
    发明公开

    公开(公告)号:US20230302486A1

    公开(公告)日:2023-09-28

    申请号:US18188264

    申请日:2023-03-22

    CPC classification number: B05C11/1005 B05C9/14

    Abstract: A coating production device for an optical film includes a base plate. Supporting rods are fixed on a top at both front and rear sides of the base plate. A transverse plate is jointly fixed on outer walls at opposite surfaces of the two supporting rods by a fixing rod. A Y-shaped tube is mounted on a bottom of the transverse plate. The Y-shaped tube includes a vertical tube and branch tubes communicating with outer walls at two sides of the vertical tube. Tops of the two branch tubes are respectively mounted on the bottom at two sides of the transverse plate by a mounting rod.

    Substrate processing apparatus and apparatus cleaning method

    公开(公告)号:US11745213B2

    公开(公告)日:2023-09-05

    申请号:US17068964

    申请日:2020-10-13

    Abstract: A substrate processing apparatus includes a processing tub, a liquid recovery unit, a liquid recovery unit drain line, a storage, a first and a second liquid supply lines, a discharge line, a first and a second liquid flow rate controllers. The liquid recovery unit receives a processing liquid overflown from the processing tub. The liquid recovery unit drain line drains the processing liquid from the liquid recovery unit. The first and the second liquid supply lines supply a first and a second liquids, respectively. The cleaning liquid contains the first liquid and the second liquid, and removes a precipitate from the processing liquid. The discharge line discharges the cleaning liquid, the first liquid or the second liquid toward the liquid recovery unit. The first and the second liquid flow rate controllers are provided at the first and the second liquid supply lines, and adjust flow rates thereof, respectively.

    SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

    公开(公告)号:US20230207339A1

    公开(公告)日:2023-06-29

    申请号:US18087619

    申请日:2022-12-22

    Abstract: A substrate processing apparatus includes: a first module used in a substrate processing process; a second module used in a substrate processing process after the first module; a nozzle provided in the second module and configured to supply a target treatment liquid; a temperature detector that detects a temperature of a treatment liquid inside the nozzle or a temperature of the nozzle; a substrate detection sensor that detects a position of a substrate; and a controller that controls discharge of the target treatment liquid from the nozzle performed before the substrate is conveyed to the second module according to the temperature of the treatment liquid detected by the temperature detector and the position of the substrate.

    HOME POT AND AN APPARATUS FOR TREATING A SUBSTRATE

    公开(公告)号:US20230201865A1

    公开(公告)日:2023-06-29

    申请号:US18145928

    申请日:2022-12-23

    CPC classification number: B05C11/1039 B05C5/02

    Abstract: Provided is a home port in which a nozzle supplying a treating liquid to a substrate waits. The home port includes a drain cup, a housing provided to cover the drain cup and having an exhaust space exhausting a fume generated from the treating liquid, and an insertion body placed between an upper wall of the housing and the drain cup in the housing. A first exhaust passage guiding the fume to the exhaust space is formed between the insertion body and the drain cup, and a second exhaust passage guiding the fume to the exhaust space is formed between the insertion body and the housing.

Patent Agency Ranking