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    Apparatus for electron beam irradiation of objects
    51.
    发明授权
    Apparatus for electron beam irradiation of objects 失效
    用于物体的电子束照射的装置

    公开(公告)号：US4492873A

    公开(公告)日：1985-01-08

    申请号：US336393

    申请日：1981-12-21

    Applicant: Stanislav P. Dmitriev ,  Andrei S. Ivanov ,  Mikhail P. Sviniin ,  Mikhail T. Fedotov

    Inventor： Stanislav P. Dmitriev ,  Andrei S. Ivanov ,  Mikhail P. Sviniin ,  Mikhail T. Fedotov

    IPC: G21K1/08 ,  G21K5/04 ,  H01J33/02

    CPC classification number: G21K5/04

    Abstract: An apparatus for electron beam irradiation of objects comprises an electron beam shaper 1 providing a ribbon-shaped beam 7 and a deflecting electromagnet 8 with a frame-type magnetic circuit 9 to direct the beam 7 onto an irradiated object 6 substantially at an angle of 90.degree.. The deflecting electromagnet 8 has two poles 10, 11 extending over the width of the irradiated object 6 and two windings 12, 13 embracing the poles 10, 11 and connected to a direct current source 14, the deflecting electromagnet 8 being arranged so that the trajectories of the electrons within the area from the shaper 1 to the deflecting electromagnet 8 are inclined to the frame of its magnetic circuit 9.

    Abstract translation: PCT No.PCT / SU80 / 00065 Sec。 371日期1981年12月21日 102（e）日期1981年12月21日PCT提交1980年4月25日PCT公布。 第WO81 / 03104号公报 日期为1981年10月29日。用于物体的电子束照射的装置包括电子束整形器1，其提供带状束7和偏转电磁体8与框型磁路9以将束7引导到被照射物体上 6基本上以90°的角度。 偏转电磁体8具有在被照射物体6的宽度上延伸的两个极10,11和包围极10,11的两个绕组12,13，并且连接到直流电源14，偏转电磁体8被布置成使得轨迹 从整形器1到偏转电磁体8的区域内的电子与其磁路9的框架倾斜。

    FLEXIBLE ION GENERATOR DEVICE
    53.
    发明申请
    FLEXIBLE ION GENERATOR DEVICE 审中-公开

    公开(公告)号：US20200179557A1

    公开(公告)日：2020-06-11

    申请号：US16785995

    申请日：2020-02-10

    Applicant: Global Plasma Solutions, Inc.

    Inventor： Charles Houston WADDELL

    IPC: A61L9/22 ,  H01J33/02

    Abstract: A flexible ion generator device that includes a dielectric layer having a first end, a second end, a first side, a second side, a top side, and a bottom side, at least one trace positioned on the dielectric layer and having a plurality of emitters engaged to the at least one trace. A plurality of lights disposed on the dielectric layer.

    Apparatus and method for generating X-ray using electron cyclotron resonance ion source
    56.
    发明授权
    Apparatus and method for generating X-ray using electron cyclotron resonance ion source 失效
    使用电子回旋共振离子源产生X射线的装置和方法

    公开(公告)号：US08693637B2

    公开(公告)日：2014-04-08

    申请号：US13475465

    申请日：2012-05-18

    Applicant: Byoung Seob Lee ,  Mi Sook Won ,  Jang Hee Yoon ,  Jin Yong Park ,  Se Yong Choi

    Inventor： Byoung Seob Lee ,  Mi Sook Won ,  Jang Hee Yoon ,  Jin Yong Park ,  Se Yong Choi

    IPC: H01J33/02

    CPC classification number: H05G2/003

    Abstract: An apparatus for generating X-ray may include: a plasma chamber; a magnet unit for applying a magnetic field to the plasma chamber, the magnet unit configured to allow the control of the magnitude of the minimum magnetic field in the plasma chamber without change in structure; a microwave generator for applying microwaves to the plasma chamber; a reaction gas injected into the plasma chamber for generating X-ray through electron cyclotron resonance by the magnetic field and the microwaves; a variable guide for focusing the generated X-ray; and a variable extractor for outputting the focused X-ray from the plasma chamber.

    Abstract translation: 用于产生X射线的装置可以包括：等离子体室; 用于向等离子体室施加磁场的磁体单元，所述磁体单元被配置为允许在等离子体室中控制最小磁场的大小而不改变结构; 用于向等离子体室施加微波的微波发生器; 注入到等离子体室中的反应气体，用于通过磁场和微波通过电子回旋共振产生X射线; 用于聚焦生成的X射线的可变指南; 以及用于从等离子体室输出聚焦的X射线的可变提取器。

    Chamberless substrate handling
    58.
    发明授权
    Chamberless substrate handling 失效
    无腔基板处理

    公开(公告)号：US07550743B1

    公开(公告)日：2009-06-23

    申请号：US11690176

    申请日：2007-03-23

    Applicant: Douglas K. Masnaghetti

    Inventor： Douglas K. Masnaghetti

    IPC: H01J33/02 ,  H01J37/18

    CPC classification number: H01J37/16 ,  H01J37/18 ,  H01J37/28 ,  H01J2237/162 ,  H01J2237/2006 ,  H01J2237/2605

    Abstract: A particle beam system having a beam source for generating a particle beam and a vacuum air bearing. The beam source is mounted to a first side of the vacuum air bearing, with an active side of the vacuum air bearing disposed on an opposing second side of the vacuum air bearing. The active side is adapted to receive and retain a substrate. A beam port is formed completely through the vacuum air bearing from the first side to the second side. Means are provided for moving the substrate across the second side of the vacuum air bearing and positioning the substrate under the beam port. Means are also provided for sealing an interior of the beam source from exposure to atmosphere through the beam port.

    Abstract translation: 一种具有用于产生粒子束的束源和真空空气轴承的粒子束系统。 梁源被安装到真空空气轴承的第一侧，真空空气轴承的活动侧设置在真空空气轴承的相对的第二侧上。 活性侧适于接收和保持基底。 梁端口从第一侧到第二侧完全穿过真空空气轴承。 提供了用于使基板移动穿过真空空气轴承的第二侧并将基板定位在波束端口下方的装置。 还提供了用于将束源的内部密封通过射束端口暴露于大气的装置。

    Apparatus for irradiating a target volume
    59.
    发明授权
    Apparatus for irradiating a target volume 失效
    用于照射目标体积的装置

    公开(公告)号：US07307264B2

    公开(公告)日：2007-12-11

    申请号：US10513544

    申请日：2002-11-29

    Applicant: Caterina Brusasco ,  Bruno Marchand ,  Jean-François De Le Hoye ,  Damien Prieels

    Inventor： Caterina Brusasco ,  Bruno Marchand ,  Jean-François De Le Hoye ,  Damien Prieels

    IPC: H01J33/02

    CPC classification number: G21K1/087 ,  A61N5/10 ,  A61N5/1043 ,  A61N5/1048 ,  A61N2005/1087

    Abstract: An irradiation apparatus for irradiating by scanning a target volume according to a predetermined dose profile with a scanning beam of charged particles forming an irradiation spot on said target volume, said apparatus comprising: a beam generating device, a reference generator for computing, from said predetermined dose profile, through a dynamic inverse control strategy, the time evolution of commanded variables, these variables being the beam current I(t), the spot position settings x(t),y(t) and the scanning speed settings vx(t), vy(t), a monitor device having means for detecting at each time (t), the actual spot position as a measured position defined by the values xm(t),ym(t) on the target volume, characterised in that said irradiation apparatus further comprises means for determining the differences ex(t), ey(t) between the measured values xm(t), ym(t) and the spot position settings x(t) and y(t), and means for applying a correction to the scanning speed settings vx(t) and vy(t) depending on said differences ex(t), ey(t). The present invention is also related to a monitor for determining beam position in real-time.

    Abstract translation: 一种照射装置，用于通过用在所述目标体积上形成照射点的带电粒子的扫描光束根据预定剂量分布进行扫描来照射目标体积，所述装置包括：光束产生装置，用于从所述预定的 剂量曲线，通过动态反向控制策略，指令变量的时间演化，这些变量是光束电流I（t），光点位置设置x（t），y（t）和扫描速度设置v < （t），具有用于在每个时间（t）检测的装置的实际光斑位置作为由值x（t）定义的测量位置的监视装置， （t），y（m）（t），其特征在于，所述照射装置还包括用于确定差异的装置， （t），测量值x m（t），y（m）之间的距离（t）和点位置设置 x（t）和 y（t），以及用于对扫描速度设置v x（t）和v Y（t）进行校正的装置，其取决于所述差异e x （t），e（y）（t）。 本发明还涉及实时确定波束位置的监视器。

    SEALED ELECTRON BEAM SOURCE
    60.
    发明申请
    SEALED ELECTRON BEAM SOURCE 失效
    密封电子束源

    公开(公告)号：US20050123096A1

    公开(公告)日：2005-06-09

    申请号：US10707284

    申请日：2003-12-03

    Applicant: J. Price ,  Bruce Dunham

    Inventor： J. Price ,  Bruce Dunham

    IPC: A61B6/03 ,  H01J33/02 ,  H01J35/06 ,  H01J35/08 ,  H01J35/10 ,  H01J35/12

    CPC classification number: A61B6/032 ,  A61B6/4021 ,  A61B6/4488 ,  H01J33/02 ,  H01J35/06

    Abstract: A sealed electron beam source (12) for an imaging tube (16) is provided. The beam source (12) includes a source housing (50) with a source window (54) having a first voltage potential and a source electrode (52) having a second voltage potential. The source electrode (52) generates electrons and emits the electrons through the source window (54) to a target (32) that is external to the source housing (50). A method of supplying and directing electrons on the target (32) within the imaging tube (16) is also provided. The method includes forming the source housing (50) over the source electrode (52) and sealing the source housing (50). The electrons are generated and emitted from the source electrode (52) and directed through the source window (54) to the target (32).

    Abstract translation: 提供了一种用于成像管（16）的密封电子束源（12）。 光束源（12）包括具有第一电压电位的源极窗口（54）和具有第二电位电位的源极（52）的源极壳体（50）。 源极（52）产生电子并通过源极（54）将电子发射到源壳体（50）外部的靶（32）。 还提供了在成像管（16）内的靶（32）上提供和引导电子的方法。 该方法包括在源电极（52）上形成源壳体（50）并密封源壳体（50）。 电子从源极（52）产生并发射，并通过源极（54）引导到靶（32）。

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