公开(公告)号：US20180197713A1

公开(公告)日：2018-07-12

申请号：US15849389

申请日：2017-12-20

Applicant: FEI Company

Inventor： Yakov Bobrov ,  Cecelia Anne Campochiaro

IPC: H01J37/18 ,  H01J37/28 ,  H01J37/20 ,  H01J37/244

CPC classification number: H01J37/18 ,  H01J37/20 ,  H01J37/244 ,  H01J37/28 ,  H01J2237/0245 ,  H01J2237/162 ,  H01J2237/2006 ,  H01J2237/2448 ,  H01J2237/24564

Abstract: Provided are new techniques for fault analysis in IC semiconductor devices, including system designs and methods to enable the probing of circuitry within an IC device under test (DUT) using electron beam (e-beam) techniques while the DUT is being stimulated electrically, or while the device is active on its own or within a host system mounted in a circuit board or other module. The DUT could be a packaged IC, or an IC in some unpackaged form. To create a local evacuated volume immediately outside the e-beam tool, a sealing element is sealed against or around the DUT for a localized seal. Such an arrangement obviates the need for vacuum feedthroughs of possibly thousands of signals required to operate and monitor the DUT, and further enables probing of a DUT while it is operating in its normal environment, such as installed on a circuit board in its system, or on a tester.

公开(公告)号：US09997330B2

公开(公告)日：2018-06-12

申请号：US15359781

申请日：2016-11-23

Applicant: Protochips, Inc.

Inventor： Daniel Stephen Gardiner ,  Franklin Stampley Walden, II ,  John Damiano, Jr.

IPC: H01J37/26

CPC classification number: H01J37/261 ,  B01L9/52 ,  B01L2200/0636 ,  F16J15/022 ,  F16J15/062 ,  F16J15/064 ,  F16J15/104 ,  H01J37/20 ,  H01J2237/2003 ,  H01J2237/2006 ,  H01J2237/2007

Abstract: A support for an electron microscope sample includes a body defining a void for receiving a first micro-electronic device, and a first gasket positioned about the first surface. The first gasket further defines an arm extending at an angle away from a horizontal extending through the first micro-electronic device. In operation, the first micro-electronic device is installed onto the first gasket and the arm engages an outer facing side of the first micro-electronic device to grip the first micro-electronic device.

公开(公告)号：US20170098526A1

公开(公告)日：2017-04-06

申请号：US15359781

申请日：2016-11-23

Applicant: Protochips, Inc.

Inventor： Daniel Stephen Gardiner ,  Franklin Stampley Walden, II ,  John Damiano, Jr.

IPC: H01J37/26

CPC classification number: H01J37/261 ,  B01L9/52 ,  B01L2200/0636 ,  F16J15/022 ,  F16J15/062 ,  F16J15/064 ,  F16J15/104 ,  H01J37/20 ,  H01J2237/2003 ,  H01J2237/2006 ,  H01J2237/2007

Abstract: A support for an electron microscope sample includes a body defining a void for receiving a first micro-electronic device, and a first gasket positioned about the first surface. The first gasket further defines an arm extending at an angle away from a horizontal extending through the first micro-electronic device. In operation, the first micro-electronic device is installed onto the first gasket and the arm engages an outer facing side of the first micro-electronic device to grip the first micro-electronic device.

公开(公告)号：US09373480B2

公开(公告)日：2016-06-21

申请号：US14782695

申请日：2014-03-05

Applicant: Hitachi High-Technologies Corporation

Inventor： Shinsuke Kawanishi ,  Yusuke Ominami ,  Masahiko Ajima ,  Hiroyuki Suzuki

IPC: H01J37/16 ,  H01J37/18 ,  H01J37/20 ,  H01J37/02 ,  H01J37/26

CPC classification number: H01J37/16 ,  H01J37/026 ,  H01J37/18 ,  H01J37/20 ,  H01J37/26 ,  H01J2237/0213 ,  H01J2237/022 ,  H01J2237/2003 ,  H01J2237/2006

Abstract: In a SEM device which enables observations under an atmospheric pressure, in the event that a diaphragm is damaged during an observation of a sample, air flows into a charged particle optical barrel from the vicinity of the sample, due to the differential pressure between the inside of the charged particle optical barrel under vacuum and the vicinity of the sample under the atmospheric pressure. At this time, the sample may be sucked into the charged particle optical barrel. In this case, a charged particle optical system and a detector are contaminated thereby, which causes performance degradation or failures of the charged particle microscope. For coping therewith, it is necessary to prevent the charged particle optical barrel from being contaminated, without inducing a time lag, with a simple structure. In a charged particle beam device adapted to place a sample in a non-vacuum environment, there is provided a filter member which is placed on the path of a primary charged particle beam at least in a state where the primary charged particle beam is directed to the sample and, further, is adapted to transmit or pass, therethrough, the primary charged particle beam and secondary charged particles derived from the sample, while intercepting at least a portion of a scattering substance which is scattered in the event of a fracture of the diaphragm.

Abstract translation: 在能够在大气压下进行观察的SEM装置中，在样品观察期间膜片损伤的情况下，由于内部的压差，空气从样品附近流入带电粒子光学镜筒 的带电粒子光学筒在真空下和样品在大气压附近。 此时，样品可以被吸入带电粒子光学筒中。 在这种情况下，带电粒子光学系统和检测器被污染，导致带电粒子显微镜的性能下降或失效。 为了应对，需要以简单的结构防止带电粒子光学筒被污染，而不会引起时间滞后。 在适于将样品置于非真空环境中的带电粒子束装置中，设置有过滤构件，其至少在初级带电粒子束被引导到 样品，并且还适于透射或通过从样品衍生的初级带电粒子束和二次带电粒子，同时截留至少一部分在发生断裂的情况下散射的散射物质 隔膜

公开(公告)号：US20150318143A1

公开(公告)日：2015-11-05

申请号：US14646159

申请日：2013-11-26

Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION

Inventor： Yusuke OMINAMI ,  Takashi OHSHIMA ,  Sukehiro ITO

IPC: H01J37/20 ,  H01J37/18 ,  H01J37/28

CPC classification number: H01J37/16 ,  H01J37/18 ,  H01J37/20 ,  H01J37/228 ,  H01J37/244 ,  H01J37/28 ,  H01J2237/2003 ,  H01J2237/2004 ,  H01J2237/2006 ,  H01J2237/2007 ,  H01J2237/201 ,  H01J2237/20235 ,  H01J2237/2445 ,  H01J2237/24455 ,  H01J2237/24475 ,  H01J2237/2608 ,  H01J2237/2801

Abstract: This charged particle beam device irradiates a primary charged particle beam generated from a charged particle microscope onto a sample arranged on a light-emitting member that makes up at least a part of a sample base, and, in addition to obtaining charged particle microscope images by the light-emitting member detecting charged particles transmitted through or scattered inside the sample, obtains optical microscope images by means of an optical microscope while the sample is still arranged on the sample platform.

Abstract translation: 该带电粒子束装置将由带电粒子显微镜产生的初级带电粒子束照射到构成至少一部分试样基底的发光部件上的试样上，除了通过以下方式获得带电粒子显微镜图像 检测通过或散射在样品内的带电粒子的发光部件在样品仍然配置在样品平台上的同时通过光学显微镜获得光学显微镜图像。

公开(公告)号：US20150206705A1

公开(公告)日：2015-07-23

申请号：US14423367

申请日：2013-07-11

Applicant: Hitachi High-Technologies Corporation

Inventor： Noriyuki Sakuma ,  Yusuke Ominami

IPC: H01J37/20 ,  H01J37/18 ,  H01J37/28

CPC classification number: H01J37/20 ,  H01J37/16 ,  H01J37/18 ,  H01J37/28 ,  H01J2237/0203 ,  H01J2237/063 ,  H01J2237/164 ,  H01J2237/166 ,  H01J2237/18 ,  H01J2237/1825 ,  H01J2237/2006 ,  H01J2237/202 ,  H01J2237/2605 ,  H01J2237/2608 ,  H01J2237/2801

Abstract: A member for a charged particle beam device (56), which is used for a charged particle beam device (1c), includes a frame (55) to be attached to a frame (3c), and a diaphragm element (18a) provided in the frame (55). In the diaphragm element (18a), a diaphragm (19), which air-tightly separates the inside and the outside of a vacuum chamber (4a) from each other in a state where the pressure inside the vacuum chamber (4a) partitioned by the frame (3c) and the frame (55) is reduced more than the pressure outside the vacuum chamber (4a), and allows a charged particle beam to be transmitted therethrough, is formed. Moreover, in the diaphragm element (18a), a buffer film (33) for preventing a sample (12) and the diaphragm (19) from coming into contact with each other is formed so as to be positioned on a sample stage (22) side rather than on the diaphragm (19).

Abstract translation: 用于带电粒子束装置（1c）的带电粒子束装置（56）的构件包括：被附接到框架（3c）的框架（55）和设置在框架 框架（55）。 在隔膜元件（18a）中，隔膜（19）在真空室（4a）内分隔的真空室（4a）内的压力的状态下将真空室（4a）的内部和外部气密地分离 框架（3c）和框架（55）比真空室（4a）外面的压力还原，并且允许带电粒子束透过。 此外，在隔膜元件（18a）中，形成用于防止样品（12）和隔膜（19）相互接触的缓冲膜（33），位于样品台（22）上， 而不是在隔膜（19）上。

公开(公告)号：US08987682B2

公开(公告)日：2015-03-24

申请号：US14101460

申请日：2013-12-10

Applicant: JEOL Ltd.

Inventor： Mitsuru Hamochi

IPC: H01J37/20 ,  G21K5/08 ,  G21K5/10 ,  H01J37/26

CPC classification number: H01J37/20 ,  H01J37/26 ,  H01J2237/0216 ,  H01J2237/2006 ,  H01J2237/202 ,  H01J2237/204

Abstract: A specimen positioning device (100) is for use in or with a charged particle beam system having a specimen chamber (1) and has: a base (10) provided with a hole (12) in operative communication with the specimen chamber (1); a specimen holder (20) movably mounted in the hole (12) and having a first portion (22) and a second portion (24); and a first portion support portion (40) supporting the first portion (22) in the specimen chamber (1). The second portion (24) supports the first portion (22) via a resilient member (34).

Abstract translation: 一种试样定位装置（100）用于具有试样室（1）的带电粒子束系统中或与其一起使用，具有：具有与试样室（1）可操作连通的孔（12）的基座（10） ; 可移动地安装在孔（12）中并且具有第一部分（22）和第二部分（24）的样本保持器（20）; 以及支撑所述标本室（1）中的所述第一部分（22）的第一部分支撑部分（40）。 第二部分（24）经由弹性构件（34）支撑第一部分（22）。

公开(公告)号：US20130094008A1

公开(公告)日：2013-04-18

申请号：US13612496

申请日：2012-09-12

Applicant: Jerry Johannes Martinus Peijster

Inventor： Jerry Johannes Martinus Peijster

IPC: G03B27/58 ,  H02K41/02

CPC classification number: G03B27/58 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/70716 ,  G03F7/70725 ,  G03F7/70758 ,  G03F7/70841 ,  H01J37/20 ,  H01J37/3177 ,  H01J2237/0266 ,  H01J2237/16 ,  H01J2237/2006 ,  H01J2237/20221 ,  H01J2237/20285 ,  H02K41/02

Abstract: A target positioning device, in particular for a lithography system, comprising a carrier for carrying a target, and a stage for carrying and moving the carrier along a first direction (X). The stage comprising two X-stage bases, both arranged on top of a common base plate, each X-stage base carries an X-stage carriage, and a Y-beam comprising a Y-stage for carrying said carrier and moving the carrier said carrier in a second direction (Y). The Y-beam bridges the space between the X-stage carriages and is connected to the X-stage carriages via a flexible coupling. The device further comprises two motors each for driving a corresponding X-stage carriage along its corresponding X-stage base. The two motors are arranged at least substantially below the stage. Each motor of said two motors is coupled to an eccentric cam or crank which is connected to the corresponding X-stage carriage via a crank shaft.

Abstract translation: 特别是用于光刻系统的目标定位装置，包括用于承载目标的载体，以及用于沿着第一方向（X）承载和移动载体的载物台。 该平台包括两个X平台，两者都布置在公共基板的顶部上，每个X级底座承载X级托架，Y形梁包括Y级，用于承载所述托架并使托架移动 载体在第二方向（Y）上。 Y型梁桥接X级滑架之间的空间，并通过柔性联轴器连接到X级滑架。 该装置还包括两个电动机，每个电动机用于沿其相应的X级基座驱动相应的X档架。 这两个电动机至少在平台的下方布置。 所述两个电动机的每个电动机联接到偏心凸轮或曲柄，所述偏心凸轮或曲柄通过曲柄轴连接到相应的X档架上。

公开(公告)号：US20110204255A1

公开(公告)日：2011-08-25

申请号：US12932246

申请日：2011-02-22

Applicant: Yoshihisa Ooae ,  Youichi Shimizu

Inventor： Yoshihisa Ooae ,  Youichi Shimizu

IPC: H01J37/20

CPC classification number: F16C29/025 ,  F16C32/0614 ,  F16C2300/62 ,  F16C2360/45 ,  G03F7/70716 ,  G03F7/70816 ,  H01J37/20 ,  H01J2237/2006 ,  H01J2237/202 ,  H01J2237/3175

Abstract: A stage device to be used in a vacuum includes: a gas supply unit for generating a gas; a base member having four of upper, lower, right, and left surfaces; a slider formed in a frame shape surrounding the base member and having surfaces facing the respective surfaces of the base member, and disposed to be movable; and an air bearing configured to float the slider by supplying the gas to a space between the base member and the slider. The slider includes: an air chamber provided on the surface facing the base member for accumulating air, and the base member includes thereinside a slider-moving air flow passage configured to supply the gas from an inlet port for letting in the gas generated by the gas supply unit to an outlet port for supplying the gas to the air chamber of the slider.

Abstract translation: 在真空中使用的平台装置包括：用于产生气体的气体供应单元; 具有上，下，右和左表面四个的基部构件; 滑块，其形成为围绕所述基座构件且具有面向所述基座构件的各个表面的表面并且被设置为可移动的框架形状; 以及空气轴承，其构造成通过将气体供给到基部构件和滑块之间的空间来浮动滑块。 滑块包括：设置在面向基部构件的表面上用于积聚空气的空气室，并且基座构件包括滑块移动空气流动通道，该滑动器移动空气流动通道构造成从用于从气体产生的气体中的入口端口供应气体 供给单元到用于将气体供应到滑块的空气室的出口。

公开(公告)号：US07642523B1

公开(公告)日：2010-01-05

申请号：US11797364

申请日：2007-05-02

Applicant: Andrew J. Devitt

Inventor： Andrew J. Devitt

IPC: G01F23/00 ,  G21K5/08 ,  G21K5/10 ,  G01K5/08 ,  G01K5/10

CPC classification number: H01J37/18 ,  H01J37/185 ,  H01J37/20 ,  H01J2237/2006 ,  H01J2237/201 ,  H01J2237/20207 ,  H01J2237/20221 ,  H01J2237/20292 ,  H01J2237/204

Abstract: A stage for processing a substrate, especially useful for vacuum applications, has a recess just large enough to hold a substantially flat substrate and a chuck or holder, but not much more. The perimeter of both top and bottom of the stage has air bearing surfaces separated from the recess by differentially pumped grooves and seal lands. The air bearing lands are guided between two reference surfaces and the seal lands, being substantially coplanar, create a resistance to flow between the bearings and the recess. On the other side of one of the reference plates mounts the radiation source or process. The opposite reference plate may have a large aperture, non-contact pumping port. This improves vacuum capability and stage precision. The stage may operate in a vacuum environment itself or can provide multiple stages moving between processes or inspection steps within the same tool or process sequence.

Abstract translation: 用于处理衬底的阶段，特别适用于真空应用，具有足够大以容纳基本平坦的衬底和卡盘或保持器的凹部，但不是更多。 舞台的顶部和底部的周边具有通过差分泵浦凹槽和密封平台与凹槽分离的空气轴承表面。 空气轴承平台在两个参考表面之间引导，并且密封平台基本上共面，从而产生轴承和凹槽之间的流动阻力。 在其中一个参考板的另一侧安装辐射源或过程。 相对的参考板可以具有大孔径非接触式泵送端口。 这提高了真空能力和阶段精度。 该阶段可以在真空环境中操作，或者可以在相同的工具或过程顺序内的过程或检查步骤之间提供多个阶段的移动。