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公开(公告)号：US20210336403A1
公开(公告)日：2021-10-28
申请号：US17371930
申请日：2021-07-09
Applicant: Gigaphoton Inc.
Inventor： Daisuke TEI
Abstract: A gas laser apparatus includes a chamber; a window provided in the chamber; an optical path tube connected to the chamber; a gas supply port that supplies a purge gas into the optical path tube; an exhaust port that exhausts a gas in the optical path tube; and a control unit, the exhaust port including a main exhaust port provided in the optical path tube, and an auxiliary exhaust port provided in the optical path tube upstream of a flow of the gas in the optical path tube with respect to positions of the window and the main exhaust port, the control unit causing the gas to be exhausted through the main exhaust port before a laser beam is emitted from the chamber and causing the gas to be exhausted through the auxiliary exhaust port in at least a partial period when the laser beam is emitted.
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公开(公告)号：US20210298160A1
公开(公告)日：2021-09-23
申请号：US17156186
申请日：2021-01-22
Applicant: Gigaphoton Inc.
Inventor： Takayuki OSANAI , Atsushi UEDA , Koichiro KOGE , Akihiro OHSAWA , Toshiya SHINTANI , Yoshiaki YOSHIDA , Yuki ISHIDA , Yosuke TAKADA
Abstract: An extreme ultraviolet light generation apparatus may include a chamber device, a concentrating mirror, a central gas supply port configured to supply gas along a focal line passing through a first focal point and a second focal point from the center side of the reflection surface, and a first peripheral gas supply port disposed at a peripheral portion of the reflection surface and configured to supply gas in a direction from the outer side of the reflection surface toward the inner side of the reflection surface. The first peripheral gas supply port may supply gas, when viewed along the focal line, in an inclined direction inclined to a tangential direction side of the peripheral portion at the peripheral portion where the first peripheral gas supply port is located with respect to a first straight line passing through the first peripheral gas supply port and the focal line.
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公开(公告)号：US11119421B2
公开(公告)日：2021-09-14
申请号：US17004608
申请日：2020-08-27
Applicant: Gigaphoton Inc.
Inventor： Tomoyoshi Toida
Abstract: An extreme ultraviolet light condensation mirror includes: a substrate; a multi-layer reflective film on the substrate and configured to reflect extreme ultraviolet light having a wavelength of 13.5 nm; and a protective film on the multi-layer reflective film. The protective film includes an oxide silicon layer on the multi-layer reflective film and a titanium oxide layer on the oxide silicon layer having one surface exposed. When x represents the thickness of the titanium oxide layer, the phase of standing wave of the extreme ultraviolet light at the position of the one surface for the maximum reflectance of the extreme ultraviolet light is defined to be zero, and a direction from the one surface toward the multi-layer reflective film is defined to be negative, the position of the one surface is a position at which the phase y of standing wave satisfies the expression below. −0.313x3+1.44x2+2.57x−51.0≤y
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64.发明授权公开(公告)号：US11092896B2
公开(公告)日：2021-08-17
申请号：US16889596
申请日：2020-06-01
Applicant: Gigaphoton Inc.
Inventor： Yuta Takashima
Abstract: An extreme ultraviolet light generation apparatus may include: a chamber device including an internal space; a target supply unit disposed at the chamber device and configured to supply a droplet of a target substance to the internal space; a target collection unit disposed at the chamber device, communicated with the internal space through an opening provided to an inner wall of the chamber device, and configured to collect the droplet passing through the opening; a detection unit disposed at the chamber device and configured to detect the target substance accumulating in the vicinity of the opening of the inner wall; and a control unit configured to stop the target supply unit depending on a result of the detection by the detection unit.
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公开(公告)号：US11079686B2
公开(公告)日：2021-08-03
申请号：US16871758
申请日：2020-05-11
Applicant: Gigaphoton Inc.
Inventor： Keisuke Ishida , Masato Moriya , Natsuhiko Kouno , Takeshi Asayama , Takashi Kusama
Abstract: An excimer laser apparatus according to the present disclosure includes an etalon spectrometer configured to measure a fringe waveform of a laser beam; and a controller configured to obtain area of a first ratio in a spectral space obtained based on a result of the measurement by the etalon spectrometer, calculate a first spectral line width of the laser beam based on the obtained area of the first ratio, and calibrate a first spectral line width based on a correlation function representing correlation between the first spectral line width and a second spectral line width of the laser beam measured by a reference meter.
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Patent Agency Ranking
公开(公告)号：US11050210B2
公开(公告)日：2021-06-29
申请号：US16730065
申请日：2019-12-30
Applicant: Gigaphoton Inc.
Inventor： Hisakazu Katsuumi , Junichi Fujimoto , Satoshi Tanaka
IPC: H01S3/04 , H01S3/041 , H01G2/08 , H01S3/034 , H01S3/038 , H01S3/097 , H01S3/0975 , H01S3/032 , G03F7/20 , H01S3/134 , H01S3/036 , H01S3/0971
Abstract: To cool a capacitor including a first electrode and a second electrode, a capacitor cooling structure includes: a conducting part electrically connected with the first electrode; an insulating part that has a first surface including a first position and a second surface including a second position, and is connected with the conducting part at the first position; a first fastening part configured to fasten the conducting part and the insulating part to each other; and a cooling part connected with the second position facing the first position, the conducting part and the cooling part being electrically insulated from each other by the insulating part.
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67.发明授权公开(公告)号：US11036143B2
公开(公告)日：2021-06-15
申请号：US16849421
申请日：2020-04-15
Applicant: Gigaphoton Inc.
Inventor： Atsushi Ueda
Abstract: An extreme ultraviolet light generation apparatus that generates extreme ultraviolet light by irradiating a target with a pulse laser beam includes: a chamber; a magnet that is positioned outside the chamber and forms a magnetic field (70) inside the chamber; a discharge path (37a) that is opened at a position on an inner wall surface of the chamber where the inner wall surface intersects a central axis of the magnetic field (70) and through which gas inside the chamber is discharged; and a gas supply unit (10a) configured to supply gas into the discharge path (37a) through an inner wall surface of the discharge path.
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68.发明授权公开(公告)号：US11006511B2
公开(公告)日：2021-05-11
申请号：US16379511
申请日：2019-04-09
Applicant: Gigaphoton Inc.
Inventor： Motoki Niwano
IPC: H05G2/00 , H01S3/23 , H01S3/115 , H01S3/097 , H01S3/10 , H01S3/106 , G03F7/20 , H01S3/223 , H01S3/16
Abstract: A laser device includes: a master oscillator (100) configured to output a pulse laser beam (L) based on a light emission trigger signal (S21); a delay circuit (153) configured to generate a switching signal (S10) after a predetermined delay time has elapsed since reception of the light emission trigger signal (S21); a high voltage switch (304) configured to generate a high voltage pulse based on the switching signal (S10); an optical shutter (32k) positioned on the optical path of the pulse laser beam (L) and driven based on the high voltage pulse; and a high voltage monitor (151) configured to detect the high voltage pulse and transmit a high voltage pulse sensing signal (S6) to the delay circuit (153). The delay circuit (153) determines the delay time based on the light emission trigger signal (S21) and the high voltage pulse sensing signal (S6).
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公开(公告)号：US20210116294A1
公开(公告)日：2021-04-22
申请号：US17113759
申请日：2020-12-07
Applicant: Gigaphoton Inc.
Inventor： Yosuke WATANABE , Masato MORIYA
Abstract: An energy measuring apparatus according to one aspect of the present disclosure includes a first beam splitter, a second beam splitter, a third beam splitter, and a fourth beam splitter, which sequentially reflect part of a main beam and input the beam to an energy sensor. The first beam splitter, the second beam splitter, the third beam splitter, and the fourth beam splitter are each arranged to have such an incident angle and a folding direction of an optical path as to suppress a change in detection value of the energy sensor due to a change in incident angle and a change in polarization purity of the main beam.
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公开(公告)号：US10955760B2
公开(公告)日：2021-03-23
申请号：US16812831
申请日：2020-03-09
Applicant: Gigaphoton Inc.
Inventor： Masaki Nakano , Yutaka Shiraishi
Abstract: An extreme ultraviolet light generation device includes: a target supply unit including a nozzle through which a target substance in a liquid form is output into a chamber; a piezoelectric element configured to vibrate the nozzle under a droplet connection condition to regularly generate a droplet of the target substance; and a control unit configured to perform search processing of changing a drive condition of the piezoelectric element to search for a drive condition of the piezoelectric element corresponding to the droplet connection condition and configured to set a drive condition of the piezoelectric element used for generation of extreme ultraviolet light based on a result of the search processing. The control unit preliminarily drives the piezoelectric element before performing the search processing and starts the search processing after performing the preliminary drive.
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