公开(公告)号：US20200006165A1

公开(公告)日：2020-01-02

申请号：US16488967

申请日：2018-02-27

Applicant: NOVA MEASURING INSTRUMENTS LTD.

Inventor： IGOR TUROVETS

IPC: H01L21/66 ,  G01R31/28 ,  G01N21/47 ,  G01B11/06 ,  G01B11/26 ,  G11C29/38

Abstract: A test site and method are herein disclosed for predicting E-test structure (in-die structure) and/or device performance. The test site comprises an E-test structure and OCD-compatible multiple structures in the vicinity of the E-test structure to allow optical scatterometry (OCD) measurements. The OCD-compatible multiple structures are modified by at least one modification technique selected from (a) multiplication type modification technique, (b) dummification type modification technique, (c) special Target design type modification technique, and (d) at least one combination of (a), (b) and (c) for having a performance equivalent to the performance of the E-test structure.

公开(公告)号：US20190393016A1

公开(公告)日：2019-12-26

申请号：US16488974

申请日：2018-02-27

Applicant: NOVA MEASURING INSTRUMENTS LTD.

Inventor： VLADIMIR MACHAVARIANI ,  MICHAEL SHIFRIN ,  DANIEL KANDEL ,  VICTOR KUCHEROV ,  IGOR ZISELMAN ,  RONEN URENSKI ,  MATTHEW SENDELBACH

IPC: H01J37/26 ,  G06T7/00 ,  G06T7/60 ,  H01J37/22

Abstract: A control system is presented for use in measuring one or more parameters of a three-dimensional patterned structure. The control system is configured as a computer system comprising a data processor configured to receive and process raw measured TEM image data, TEMmeas, and generate output data indicative of one or more parameters of a patterned structure. The data processor comprises an optimization module configured and operable to utilize data indicative of one or more parameters of TEM measurement mode and perform a fitting procedure between the raw measured TEM image data, TEMmeas, and a predetermined simulated TEM image data, TEMsimui based on a parametrized three-dimensional model of features of the patterned structure, and generate simulated image data corresponding to a best fit condition, to thereby enable determination therefrom of the one or more parameters of the structure.

公开(公告)号：US10365231B2

公开(公告)日：2019-07-30

申请号：US15866768

申请日：2018-01-10

Applicant: NOVA MEASURING INSTRUMENTS LTD.

Inventor： Gilad Barak ,  Dror Shafir ,  Yanir Hainick ,  Shahar Gov

IPC: G01N21/956 ,  G03F7/20 ,  G01N21/95

Abstract: A method and system are presented for use in optical measurements on patterned structures. The method comprises performing a number of optical measurements on a structure with a measurement spot configured to provide detection of light reflected from an illuminating spot at least partially covering at least two different regions of the structure. The measurements include detection of light reflected from said at least part of the at least two different regions comprising interference of at least two complex electric fields reflected from said at least part of the at least two different regions, and being therefore indicative of a phase response of the structure, carrying information about properties of the structure.

公开(公告)号：US10226852B2

公开(公告)日：2019-03-12

申请号：US15108855

申请日：2014-07-31

Applicant: NOVA MEASURING INSTRUMENTS LTD.

Inventor： Igor Turovets

IPC: B24B37/20 ,  H01L21/321 ,  H01L21/67 ,  B24B37/015 ,  B24B37/04 ,  H01L21/268 ,  H01L21/3105 ,  H01L21/311 ,  H01L21/66

Abstract: A surface planarization system is presented. The system comprises an external energy source for generating a localized energy distribution within a processing region, and a control unit for operating the external energy source to create, by the localized energy distribution, a predetermined temperature pattern within the processing region such that different locations of the processing region are subjected to different temperatures. This provides that when a sample (e.g. semiconductor wafer) during its interaction with an etching material composition is located in the processing region, the temperature pattern at different locations of the sample's surface creates different material removal rates by the etching material composition (different etch rates).

公开(公告)号：US20180372645A1

公开(公告)日：2018-12-27

申请号：US16062127

申请日：2016-12-15

Applicant: NOVA MEASURING INSTRUMENTS LTD.

Inventor： GILAD BARAK ,  YANIR HAINICK ,  YONATAN OREN

IPC: G01N21/65 ,  G01N21/95 ,  G01B11/06 ,  H01L21/66 ,  G03F7/20

Abstract: A method and system are presented for use in measuring characteristic(s) of patterned structures. The method utilizes processing of first and second measured data, wherein the first measured data is indicative of at least one Raman spectrum obtained from a patterned structure under measurements using at least one selected optical measurement scheme each with a predetermined configuration of illuminating and/or collected light conditions corresponding to the characteristic(s) to be measured, and the second measured data comprises at least one spectrum obtained from the patterned structure in Optical Critical Dimension (OCD) measurement session. The processing comprises applying model-based analysis to the at least one Raman spectrum and the at least one OCD spectrum, and determining the characteristic(s) of the patterned structure under measurements.

公开(公告)号：US20180372644A1

公开(公告)日：2018-12-27

申请号：US16062114

申请日：2016-12-15

Applicant: NOVA MEASURING INSTRUMENTS LTD.

Inventor： GILAD BARAK ,  YANIR HAINICK ,  YONATAN OREN ,  VLADIMIR MACHAVARIANI

IPC: G01N21/65 ,  G01L1/24 ,  G01B11/06

CPC classification number: G01N21/65 ,  G01B11/0666 ,  G01B2210/56 ,  G01L1/24 ,  G01N21/658 ,  G01N21/9501 ,  G03F7/70625 ,  H01L22/12

Abstract: A method and system are presented for use in measuring one or more characteristics of patterned structures. The method comprises: providing measured data comprising data indicative of at least one Raman spectrum obtained from a patterned structure under measurements using at least one selected optical measurement scheme each with a predetermined configuration of at least one of illuminating and collected light conditions corresponding to the characteristic(s) to be measured; processing the measured data, and determining, for each of the at least one Raman spectrum, a distribution of Raman-contribution efficiency (RCE) within at least a part of the structure under measurements, being dependent on characteristics of the structure and the predetermined configuration of the at least one of illuminating and collected light conditions in the respective optical measurement scheme; analyzing the distribution of Raman-contribution efficiency and determining the characteristic(s) of the structure.

公开(公告)号：US10054423B2

公开(公告)日：2018-08-21

申请号：US14655791

申请日：2013-12-26

Applicant: NOVA MEASURING INSTRUMENTS LTD.

Inventor： Dror Shafir ,  Gilad Barak ,  Shay Wolfling

IPC: G01B11/02 ,  G01N21/47 ,  G01N21/956 ,  G02B21/36

CPC classification number: G01B11/02 ,  G01B2210/56 ,  G01N21/4738 ,  G01N21/956 ,  G01N2201/06113 ,  G01N2201/12 ,  G02B21/365

Abstract: Method and system for measuring one or more parameters of a patterned structure, using light source producing an input beam of at least partially coherent light in spatial and temporal domains, a detection system comprising a position sensitive detector for receiving light and generating measured data indicative thereof, an optical system configured for focusing the input light beam onto a diffraction limited spot on a sample's surface, collecting an output light returned from the illuminated spot, and imaging the collected output light onto a light sensitive surface of the position sensitive detector, where an image being indicative of coherent summation of output light portions propagating from the structure in different directions.

公开(公告)号：US20170227474A1

公开(公告)日：2017-08-10

申请号：US15502329

申请日：2015-08-06

Applicant: NOVA MEASURING INSTRUMENTS LTD.

Inventor： Gilad BARAK ,  Oded COHEN

IPC: G01N21/956 ,  G01R31/309 ,  H01L23/544 ,  G01B11/14 ,  H01L21/66

CPC classification number: G01N21/956 ,  G01B11/14 ,  G01B2210/56 ,  G01R31/309 ,  H01L22/30 ,  H01L23/544

Abstract: A test structure is presented for use in metrology measurements of a sample pattern. The test structure comprises a main pattern, and one or more auxiliary patterns. The main pattern is formed by a plurality of main features extending along a first longitudinal axis and being spaced from one another along a second lateral axis. The one or more auxiliary patterns are formed by a plurality of auxiliary features associated with at least some of the main features such that a dimension of the auxiliary feature is in a predetermined relation with a dimension of the respective main feature. This provides that a change in a dimension of the auxiliary feature from a nominal value affects a change in non-zero order diffraction response from the test structure in a predetermined optical measurement scheme, and this change is indicative of a deviation in one or more parameters of the main pattern from nominal value thereof.

公开(公告)号：US20170061066A1

公开(公告)日：2017-03-02

申请号：US15119306

申请日：2015-02-16

Applicant: NOVA MEASURING INSTRUMENTS LTD.

Inventor： Gilad BARAK ,  Tal VERDENE ,  Michal YACHINI ,  Dror SHAFIR ,  Changman MOON ,  Shay WOLFLING

IPC: G06F17/50

CPC classification number: G06F17/5081 ,  G03F7/70633 ,  G03F7/70683 ,  G06F17/5072

Abstract: A sample comprising an overlay target is presented. The overlay target comprises at least one pair of patterned structures, the patterned structures of the pair being accommodated in respectively bottom and top layers of the sample with a certain vertical distance h between them, wherein a pattern in at least one of the patterned structures has at least one pattern parameter optimized for a predetermined optical overlay measurement scheme with a predetermined wavelength range.

Abstract translation: 呈现包括覆盖目标的样本。 所述覆盖目标包括至少一对图案化结构，所述对的图案化结构在样品的分别底部和顶层中以它们之间的一定垂直距离h容纳在其中，其中至少一个所述图案化结构中的图案具有 对于具有预定波长范围的预定光学覆盖测量方案优化的至少一个图案参数。

公开(公告)号：US20170023357A1

公开(公告)日：2017-01-26

申请号：US15124445

申请日：2015-03-10

Applicant: NOVA MEASURING INSTRUMENTS LTD.

Inventor： Igor TUROVETS

IPC: G01B11/27 ,  H01L21/033 ,  G01N21/95 ,  H01L21/66 ,  G01N21/956 ,  G01N21/47

CPC classification number: G01B11/272 ,  G01B2210/56 ,  G01N21/47 ,  G01N21/4788 ,  G01N21/9501 ,  G01N21/95607 ,  G01N2021/95615 ,  G01N2201/12753 ,  H01L21/0337 ,  H01L22/30

Abstract: An article is presented configured for controlling a multiple patterning process, such as a spacer self-aligned multiple patterning, to produce a target pattern. The article comprises a test site carrying a test structure comprising at least one pair of gratings, wherein first and second gratings of the pair are in the form of first and second patterns of alternating features and spaces and differ from the target pattern by respectively different first and second values which are selected to provide together a total difference such that a differential optical response from the test structure is indicative of a pitch walking effect.

Abstract translation: 呈现配置用于控制多个图案化工艺（例如间隔件自对准多重图案化）以产生目标图案的制品。 所述物品包括承载包括至少一对光栅的测试结构的测试位置，其中所述一对光栅中的第一和第二光栅具有交替特征和空间的第一和第二图案的形式，并且不同于目标图案分别不同的第一 以及第二值，其被选择以一起提供总差，使得来自测试结构的差分光学响应指示音调行走效果。