公开(公告)号：US20040022945A1

公开(公告)日：2004-02-05

申请号：US10381690

申请日：2003-03-25

Inventor： Andrew Goodwin ,  Patrick Merlin ,  Jas Pal Badyal ,  Luke Ward

IPC: H05H001/24

CPC classification number: B05D1/62 ,  B05B5/00 ,  B05B17/0623 ,  B05D1/10 ,  C23C16/4486 ,  C23C16/503 ,  H05H1/2475 ,  H05H2001/2481 ,  H05H2240/10

Abstract: A method for forming a coating on a substrate using an atmospheric pressure plasma discharge. The method comprises introducing an atomized liquid and/or solid coating-forming material into an atmospheric pressure plasma discharge and/or an ionized gas stream resulting therefrom, and exposing the substrate to the atomized coating-forming material. The application also described a method for polymerizing a polymer forming material, and further to apparatus for forming a coating on a substrate.

Abstract translation: 使用大气压等离子体放电在基板上形成涂层的方法。 该方法包括将雾化的液体和/或固体涂层形成材料引入到由其产生的大气压等离子体放电和/或电离气流中，并将基底暴露于雾化涂层形成材料。 本申请还描述了聚合物形成材料的聚合方法，还描述了在基材上形成涂层的装置。

公开(公告)号：US06444138B1

公开(公告)日：2002-09-03

申请号：US09334408

申请日：1999-06-16

Applicant: James E. Moon ,  Timothy J. Davis ,  Gregory J. Galvin ,  Kevin A. Shaw ,  Paul C. Waldrop ,  Sharlene A. Wilson

Inventor： James E. Moon ,  Timothy J. Davis ,  Gregory J. Galvin ,  Kevin A. Shaw ,  Paul C. Waldrop ,  Sharlene A. Wilson

IPC: H01L2100

CPC classification number: B05B5/00 ,  H01J49/0018 ,  H01J49/167 ,  Y10S438/942

Abstract: Three fundamental and three derived aspects of the present invention are disclosed. The three fundamental aspects each disclose a process sequence that may be integrated in a full process. The first aspect, designated as “latent masking”, defines a mask in a persistent material like silicon oxide that is held abeyant after definition while intervening processing operations are performed. The latent oxide pattern is then used to mask an etch. The second aspect, designated as “simultaneous multi-level etching (SMILE)”, provides a process sequence wherein a first pattern may be given an advanced start relative to a second pattern in etching into an underlying material, such that the first pattern may be etched deeper, shallower, or to the same depth as the second pattern. The third aspect, designated as “delayed LOCOS”, provides a means of defining a contact hole pattern at one stage of a process, then using the defined pattern at a later stage to open the contact holes. The fourth aspect provides a process sequence that incorporates all three fundamental aspects to fabricate an integrated liquid chromatography (LC)/electrospray ionization (ESI) device. The fifth aspect provides a process sequence that incorporates two of the fundamental aspects to fabricate an ESI device. The sixth aspect provides a process sequence that incorporates two of the fundamental aspects to fabricate an LC device. The process improvements described provide increased manufacturing yield and design latitude in comparison to previously disclosed methods of fabrication.

Abstract translation: 公开了本发明的三个基本和三个派生方面。 三个基本方面各自公开了可以整合到完整过程中的过程序列。 第一方面，被指定为“潜屏蔽”，定义了在固定材料（例如氧化硅）中的掩模，该掩模在定义之后被保持为静止，而执行中间处理操作。 然后将潜在氧化物图案用于掩模蚀刻。 指定为“同时多级蚀刻（SMILE）”的第二方面提供了一种处理顺序，其中在蚀刻到下面的材料中第一图案可相对于第二图案被赋予高级开始，使得第一图案可以是 蚀刻成更深，更浅或与第二图案相同的深度。 指定为“延迟LOCOS”的第三方面提供了在过程的一个阶段定义接触孔图案的方法，然后在稍后阶段使用限定的图案来打开接触孔。 第四方面提供了一个整合三个基本方面来制造液相色谱（LC）/电喷雾离子化（ESI）装置的方法。 第五方面提供了一种结合两个基本方面来制造ESI装置的过程序列。 第六方面提供了一种结合两个基本方面来制造LC器件的过程序列。 与先前公开的制造方法相比，所描述的工艺改进提供了增加的制造产量和设计自由度。

公开(公告)号：US20020088397A1

公开(公告)日：2002-07-11

申请号：US10039377

申请日：2002-01-02

Inventor： Jeffrey A. Perkins ,  Charles L. Gatian III ,  Joseph G. Schroeder

IPC: G05B011/01

CPC classification number: B05B12/004 ,  B05B5/00 ,  B05B5/025 ,  B05B12/00

Abstract: Systems and methods for controlling, organizing, and viewing a plurality of electrostatic spray gun operating parameters from a centralized control panel are provided. In this regard, a master control panel is provided that can be shared by all the guns in the system. Each of the guns has an assigned gun control subpanel in the gun control area. Each subpanel includes a selector switch which can be used to monitor and control the gun associated with that subpanel on the master control panel. Each of the subpanels also has a limited display such as a bar graph which can be used to show the electrostatic performance of the guns. The subpanel displays are configured in a tight cluster so that the operator can easily simultaneously monitor the performance of all the guns in the system to identify any guns which are not performing properly.

Abstract translation: 提供了用于从集中控制面板控制，组织和观察多个静电喷枪操作参数的系统和方法。 在这方面，提供了可以由系统中的所有枪共享的主控制面板。 每个枪在喷枪控制区域都有一个分配的枪控子面板。 每个子面板包括一个选择器开关，可用于监视和控制与主控制面板上的该子面板相关的喷枪。 每个子面板还具有有限的显示，例如可用于显示枪的静电性能的条形图。 子面板显示器配置在紧密的群集中，以便操作员可以轻松地同时监视系统中所有枪支的性能，以识别任何不能正常执行的枪。

公开(公告)号：US20020084249A1

公开(公告)日：2002-07-04

申请号：US10003672

申请日：2001-11-02

Applicant: Kionix, Inc.

Inventor： James E. Moon ,  Timothy J. Davis ,  Gregory J. Galvin ,  Kevin A. Shaw ,  Paul C. Waldrop ,  Sharlene A. Wilson

IPC: B44C001/22

CPC classification number: B05B5/00 ,  H01J49/0018 ,  H01J49/167 ,  Y10S438/942

Abstract: Three fundamental and three derived aspects of the present invention are disclosed. The three fundamental aspects each disclose a process sequence that may be integrated in a full process. The first aspect, designated as nulllatent maskingnull, defines a mask in a persistent material like silicon oxide that is held abeyant after definition while intervening processing operations are performed. The latent oxide pattern is then used to mask an etch. The second aspect, designated as nullsimultaneous multi-level etching (SMILE)null, provides a process sequence wherein a first pattern may be given an advanced start relative to a second pattern in etching into an underlying material, such that the first pattern may be etched deeper, shallower, or to the same depth as the second pattern. The third aspect, designated as nulldelayed LOCOSnull, provides a means of defining a contact hole pattern at one stage of a process, then using the defined pattern at a later stage to open the contact holes. The fourth aspect provides a process sequence that incorporates all three fundamental aspects to fabricate an integrated liquid chromatography (LC)/electrospray ionization (ESI) device. The fifth aspect provides a process sequence that incorporates two of the fundamental aspects to fabricate an ESI device. The sixth aspect provides a process sequence that incorporates two of the fundamental aspects to fabricate an LC device. The process improvements described provide increased manufacturing yield and design latitude in comparison to previously disclosed methods of fabrication.

公开(公告)号：US06349668B1

公开(公告)日：2002-02-26

申请号：US09067166

申请日：1998-04-27

Applicant: James J. Sun ,  Benjamin Y. H. Liu ,  Virgil A. Marple

Inventor： James J. Sun ,  Benjamin Y. H. Liu ,  Virgil A. Marple

IPC: C23C1600

CPC classification number: C23C16/45595 ,  B05B5/00 ,  B05B5/03 ,  B05B7/0012 ,  B05B13/04 ,  B05D1/04 ,  C23C16/4486 ,  C23C16/453

Abstract: A thin film deposition apparatus is used for applying thin films onto substrates, such as large panel displays, as well as integrated circuit devices, and includes a source of an ionized gas that is intermixed with an aerosol prior to deposition. The ionized gas causes the aerosol particles to take on an electrical charge. The aerosol containing the charged particles is concentrated in a virtual impactor and then provided to a shower head or orifice that is used for depositing the aerosol material onto the substrate. The shower head can be moved in a selected pattern to uniformly deposit aerosol particles as a thin film on the substrate.

Abstract translation: 使用薄膜沉积装置将薄膜施加到诸如大型面板显示器的基板上，以及集成电路装置，并且包括在沉积之前与气溶胶混合的电离气体源。 电离气体导致气溶胶颗粒承受电荷。 将含有带电粒子的气溶胶集中在虚拟冲击器中，然后提供到用于将气溶胶材料沉积到基底上的喷头或孔口。 淋浴头可以以选定的图案移动，以将作为薄膜的气溶胶颗粒均匀地沉积在基底上。

公开(公告)号：US4977950A

公开(公告)日：1990-12-18

申请号：US322435

申请日：1989-03-13

Applicant: George J. Muench

Inventor： George J. Muench

IPC: B05B5/00 ,  B05B7/16 ,  B22D23/00 ,  B22F3/115 ,  B22F9/08

CPC classification number: B22F9/082 ,  B05B5/00 ,  B05B7/1606 ,  B22D23/003 ,  B22F3/115 ,  B22F9/08 ,  B22F2009/0808 ,  B22F2009/088 ,  B22F2009/0892 ,  B22F2998/00 ,  B22F2999/00

Abstract: A molten metal spray-depositing apparatus employs an ejection nozzle for receiving a molten metal stream and having a configuration for confining and imparting mechanically an angular momentum thereto which produces stream break-up into a metal particle spray when the stream becomes unconfined upon exiting the nozzle. There are stationary and rotating versions of the ejection nozzle. The stationary ejection nozzle has a flow channel with internal angular elements, such as spiral grooves, which engage the moving molten metal stream to impart angular momentum thereto as it passes through the channel. The rotating ejection nozzle may have internal elements within the flow channel, such as notches or serrations, which engage the moving molten stream and cause it to rotate with the nozzle as it passes through the channel. The two nozzles can also be combined to impart the angular momentum and accomplish melt stream break-up.

Abstract translation: 熔融金属喷射沉积设备采用喷射嘴来接收熔融金属流，并且具有用于限制和机械地赋予角度动量的构造，当流离开喷嘴时流体不受限制地产生气流分解成金属颗粒喷雾 。 有喷嘴的固定和旋转形式。 固定喷嘴具有带有诸如螺旋槽的内部角形元件的流动通道，其与移动的熔融金属流接合，以在其通过通道时向其施加角度动量。 旋转喷嘴可以在流动通道内具有内部元件，例如切口或锯齿，其接合移动的熔融流并使其随着喷嘴在通过通道时与喷嘴一起旋转。 两个喷嘴也可以组合以赋予角动量并实现熔体流分解。

公开(公告)号：US4907639A

公开(公告)日：1990-03-13

申请号：US322434

申请日：1989-03-13

Applicant: Sankaranarayanan Ashok ,  Thomas J. Melillo

Inventor： Sankaranarayanan Ashok ,  Thomas J. Melillo

IPC: B05B5/00 ,  B05B7/16 ,  B22D23/00 ,  B22F3/115 ,  B22F9/08

CPC classification number: B22F9/082 ,  B05B5/00 ,  B05B7/1606 ,  B22D23/003 ,  B22F3/115 ,  B22F9/08 ,  B22F2009/0808 ,  B22F2009/088 ,  B22F2009/0892 ,  B22F2998/00 ,  B22F2999/00

Abstract: A molten metal gas-atomizing spray-depositing apparatus employs an asymmetrical gas-atomizing device for generating one-sided shear forces for breaking-up and atomizing a stream of molten metal into metal particles in a divergent spray pattern of higher mass density at an upstream leading peripheral portion of the spray pattern, relative to the direction of movement of a substrate, than either of a center region or downstream trailing peripheral region of the pattern.

Abstract translation: 熔融金属气体雾化喷雾沉积装置采用不对称气体雾化装置，用于产生单侧剪切力，以在上游处以高质量密度的发散喷雾模式将熔融金属流分解和雾化成金属颗粒 相对于基板的移动方向，喷射图案的引导周边部分比图案的中心区域或下游尾部周边区域中的任何一个。

公开(公告)号：US4700262A

公开(公告)日：1987-10-13

申请号：US865861

申请日：1986-05-22

Applicant: Ion I. Inculet

Inventor： Ion I. Inculet

IPC: B01J8/00 ,  B05B5/00 ,  B65G54/02 ,  G21K1/00 ,  H05H1/00

CPC classification number: G21K1/00 ,  B01J8/0015 ,  B05B5/00 ,  B65G54/02

Abstract: The electrostatic conveyor consists of a duct having an inlet and an outlet, and apparatus for generating travelling, curvilinear, AC fields along the length of the duct. Charged particles, of conductive or non-conductive materials, under electrostatic forces, are exposed to unidirectional, centrifugal forces so that they are moved along the duct from the inlet to the outlet.

Abstract translation: 静电输送机包括具有入口和出口的管道，以及用于沿着管道的长度产生行进的，曲线的AC场的装置。 导电或非导电材料的带电粒子在静电力下暴露于单向的离心力，使得它们沿着管道从入口移动到出口。

公开(公告)号：US3630881A

公开(公告)日：1971-12-28

申请号：US3630881D

申请日：1970-01-22

Applicant: IBM

Inventor： LESTER WILLIAM C ,  NUCCIO CARLO ,  WARD ERNEST S

IPC: C23C14/40 ,  B05B5/00 ,  B41J2/005 ,  C23C14/35 ,  H01J37/34 ,  C23C15/00

CPC classification number: C23C14/35 ,  B05B5/00 ,  B05B5/001 ,  B41J2/005 ,  H01J37/34

Abstract: A TARGET OF A DIELECTRIC MATERIAL IS MOUNTED IN SPACED RELATION TO A CATHODE, WHICH IS ISOLATED FROM THE SPUTTERING CHAMBER AND THE ANODE IN THE SPUTTERING CHAMBER BY THE TARGET AND ITS MOUNTING STRUCTURE. RF ENERGY IS TRANSFERRED FROM THE CATHODE TO THE TARGET, WHICH HAS AT LEAST A PORTION PARALLEL TO THE ANODE, THROUGH THE SPACE BY A DIELECTRIC COOLANT, A LIQUID METAL, OR A METALLIC PASTE. WHEN EITHER THE METALLIC PASTE OR THE LIQUID METAL IS EMPLOYED, THE CATHODE IS COOLED BY CIRCULTING A COOLANT SUCH AS WATER THERETHROUGH.

公开(公告)号：US10060035B2

公开(公告)日：2018-08-28

申请号：US15404848

申请日：2017-01-12

Applicant: Alabama Specialty Products, Inc.

Inventor： Wayne M. Penn ,  Donald G. Johnson

IPC: G21H5/00 ,  C08J7/18 ,  B05D3/00 ,  C23C26/02 ,  C23C4/12 ,  C23C4/06 ,  B05B5/00 ,  B23K26/06 ,  B23K26/34 ,  B23K26/348 ,  G02B6/42 ,  B23K26/70 ,  B05B7/10 ,  B23K103/04 ,  B23K103/18

CPC classification number: C23C26/02 ,  B05B5/00 ,  B05B7/10 ,  B23K26/0643 ,  B23K26/0648 ,  B23K26/0665 ,  B23K26/34 ,  B23K26/348 ,  B23K26/703 ,  B23K2103/05 ,  B23K2103/26 ,  C23C4/06 ,  C23C4/12 ,  G02B6/4268

Abstract: The inventions disclosed by this application are for a cladding apparatus, a cladding head, and a method of cladding a relatively planar solid object such as a boiler waterwall. Cladding of non-horizontal surfaces is complicated by the effects of gravity as melted clad material trends to runoff the surface before the cladding material bonds to the appropriate location. The disclosed inventions overcome these limitations by controlling the relative angle of application by either rotating the workpiece or the cladding head through a pre-programmed sequence. Also presented in a compact design for a laser cladding head that facilitates such cladding by minimizing movement of the laser fiber and improves cladding speed over irregular shaped objects.