公开(公告)号：US11904352B2

公开(公告)日：2024-02-20

申请号：US17595436

申请日：2020-05-14

Applicant: JIANGSU FAVORED NANOTECHNOLOGY CO., LTD.

Inventor： Jian Zong

IPC: B05D1/00 ,  B05D5/12 ,  H01L23/532 ,  C23C16/30

CPC classification number: B05D1/62 ,  B05D5/12 ,  C23C16/30 ,  H01L23/5329 ,  B05D2504/00 ,  B05D2506/10 ,  B05D2518/10

Abstract: Provided is a low dielectric constant film and a preparation method thereof, where epoxy alkanes, organosilicon compounds and fluorine-containing siloxane compounds are used as raw materials of the low dielectric constant film, and the low dielectric constant film is formed on a substrate surface by a plasma-enhanced chemical deposition method. Accordingly, a nanofilm with a low dielectric constant and excellent hydrophobicity is formed on the substrate surface.

公开(公告)号：US20240052490A1

公开(公告)日：2024-02-15

申请号：US17641792

申请日：2020-09-11

Applicant: VERSUM MATERIALS US, LLC

Inventor： MANCHAO XIAO ,  WILLIAM ROBERT ENTLEY ,  DANIEL P. SPENCE ,  RAYMOND NICHOLAS VRTIS ,  JENNIFER LYNN ANNE ACHTYL ,  ROBERT GORDON RIDGEWAY ,  XINJIAN LEI

IPC: C23C16/50 ,  C23C16/44 ,  C23C16/40 ,  B05D1/00

CPC classification number: C23C16/50 ,  C23C16/4414 ,  C23C16/402 ,  B05D1/62

Abstract: A method for making a dense organosilicon film with improved mechanical properties, the method comprising the steps of: providing a substrate within a reaction chamber; introducing into the reaction chamber a gaseous composition comprising a novel mono- or dialkoxysilane; and applying energy to the gaseous composition comprising the novel mono- or dialkoxysilane in the reaction chamber to induce reaction of the gaseous composition comprising the novel mono- or dialkoxysilane to deposit an organosilicon film on the substrate, wherein the organosilicon film has a dielectric constant of from about 2.8 to about 3.3, an elastic modulus of from about 7 to about 30 GPa, and an at. % carbon of from about 10 to about 30 as measured by XPS.

公开(公告)号：US11695125B2

公开(公告)日：2023-07-04

申请号：US16037920

申请日：2018-07-17

Applicant: Amprius Technologies, Inc.

Inventor： Ronald J. Mosso ,  Ghyrn E. Loveness

IPC: H01M6/40 ,  H01M4/04 ,  H01M4/139 ,  H01M4/38 ,  B05D1/00 ,  H01M4/36 ,  B82Y40/00 ,  C23C16/02 ,  C23C16/52 ,  C23C16/54 ,  C23C16/56 ,  C23C16/04 ,  C23C16/22 ,  C23C16/24 ,  C23C16/26 ,  C23C16/42

CPC classification number: H01M6/40 ,  C23C16/0209 ,  C23C16/0272 ,  C23C16/042 ,  C23C16/22 ,  C23C16/24 ,  C23C16/26 ,  C23C16/42 ,  C23C16/52 ,  C23C16/545 ,  C23C16/56 ,  H01M4/0421 ,  H01M4/139 ,  H01M4/386 ,  B05D1/62 ,  B05D2252/02 ,  B05D2252/10 ,  B82Y40/00 ,  H01M4/366 ,  Y10S977/843 ,  Y10S977/897

Abstract: Apparatuses and methods for depositing materials on both sides of a web while it passes a substantially vertical direction are provided. In particular embodiments, a web does not contact any hardware components during the deposition. A web may be supported before and after the deposition chamber but not inside the deposition chamber. At such support points, the web may be exposed to different conditions (e.g., temperature) than during the deposition. Also provided are substrates having materials deposited on both sides that may be fabricated by the methods and apparatuses.

公开(公告)号：US20230201871A1

公开(公告)日：2023-06-29

申请号：US18068759

申请日：2022-12-20

Applicant: COMMISSARIAT A L'ENERGIE ATOMIQUE ET AUX ENERGIES ALTERNATIVES

Inventor： Pierre BRIANCEAU ,  Nicolas POSSEME ,  Elisa VERMANDE

IPC: B05D3/14 ,  B05D1/00

CPC classification number: B05D3/145 ,  B05D1/62 ,  B05D2203/30

Abstract: A method for activating an exposed layer of a structure including a provision of a structure including an exposed layer, and before or after the provision of the structure, a deposition in the reaction chamber of a layer based on a material of chemical formula CxHyFz, at least x and z being non-zero. The method further includes a treatment, in the presence of the structure, of the layer based on a material of chemical formula CxHyFz by an activation plasma based on at least one from among oxygen and nitrogen. The treatment by the activation plasma is configured to consume at least partially the layer based on the material of chemical formula CxHyFz so as to activate the exposed layer of the structure.

公开(公告)号：US20230201429A1

公开(公告)日：2023-06-29

申请号：US18175628

申请日：2023-02-28

Applicant: SUZHOU INNOTECH MEDICAL TECHNOLOGY CO.,LTD.

Inventor： Chen SHI ,  Robbie Yi SUN

IPC: A61L31/08 ,  C23C22/22 ,  B05D1/00 ,  B05D3/10 ,  A61L31/02 ,  A61L31/16 ,  A61L31/10

CPC classification number: A61L31/086 ,  A61L31/10 ,  A61L31/16 ,  A61L31/022 ,  B05D1/62 ,  B05D3/102 ,  C23C22/22 ,  A61L2420/02 ,  A61L2420/08 ,  A61L2430/02

Abstract: A coating with strong adhesion for medical magnesium alloys, including a magnesium phosphate or calcium phosphate layer as an inner layer and a hydrophobic polymer layer as an outer layer. The inner layer is attached to the medical magnesium alloy; and the outer layer is attached to the inner layer. A preparation method of the coating is also provided, including: (S1) carrying out surface treatment on a medical magnesium alloy substrate; (S2) preparing a solution including magnesium salt/calcium salt and phosphoric acid/phosphate followed by pH adjustment and heating; (S3) soaking the medical magnesium alloy substrate in the solution followed by washing and drying to obtain a magnesium phosphate/calcium phosphate layer-coated medical magnesium alloy sample; and (S4) depositing a hydrophobic polymer layer on the medical magnesium alloy sample through chemical vapor deposition (CVD).

公开(公告)号：US10058889B2

公开(公告)日：2018-08-28

申请号：US14774318

申请日：2014-03-10

Applicant: Kettering University

Inventor： Mary Gilliam ,  Susan Farhat ,  Ali Zand

IPC: B05D1/00 ,  B05D3/14 ,  A61L27/16 ,  A61L27/34 ,  C08L33/12 ,  A61L31/10 ,  B05D1/02

CPC classification number: B05D1/62 ,  A61L27/16 ,  A61L27/34 ,  A61L31/10 ,  A61L2420/02 ,  B05D1/02 ,  B05D3/144 ,  B05D3/147 ,  B05D3/148 ,  C08L33/12

Abstract: A method of forming a biocompatible or biologically inert article for use in an application in which the article will make contact with at least one tissue, organ, or fluid within a human or animal body is provided. The method generally comprises providing an article having an external surface; selecting chemical precursors; using a means to direct one or more chemical precursors towards or to apply such chemical precursors to the external surface; activating the chemical precursors by exposing said precursors to atmospheric pressure plasma; and grafting and/or cross-linking the chemical precursors to form a solid coating adjacent to the external surface of the article.

公开(公告)号：US09999901B2

公开(公告)日：2018-06-19

申请号：US14434809

申请日：2013-10-02

Applicant: Luxembourg Institute of Science And Technology (LIST)

Inventor： Nicolas Boscher ,  David Duday ,  Patrick Choquet ,  Stephane Verdier

IPC: H05H1/24 ,  B05D1/00 ,  B05D5/00 ,  B05D5/08 ,  C09D5/00 ,  C09D5/16 ,  C09D183/04

CPC classification number: B05D1/62 ,  B05D5/00 ,  B05D5/08 ,  B05D2350/38 ,  C09D5/00 ,  C09D5/1681 ,  C09D183/04 ,  Y10T428/24355

Abstract: The invention is directed to a method for manufacturing a hydrophobic or superhydrophobic surface comprising the steps of: (a) providing a substrate with a surface roughness Ra between 0.1 and 1.0 μm and (b) exposing the substrate to a filamentary atmospheric pressure dielectric barrier discharge plasma which is fed by a reaction gas and siloxane-forming material in order to form a superhydrophobic siloxane layer over at least a portion of the surface of the substrate. Step (b) is operated with an electrical excitation frequency of 15,000 Hz to 35,000 Hz and a power density between 0.5 to 10 W·cm−2. The siloxane layer produced in step (b) shows thereby a micro-structure and a nano-structure with droplet “sticking” properties (high water sliding angle).

公开(公告)号：US09939556B2

公开(公告)日：2018-04-10

申请号：US15008392

申请日：2016-01-27

Applicant: Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V.

Inventor： Ulrike Schulz ,  Friedrich Rickelt ,  Peter Munzert ,  Hanno Heiβe ,  Heiko Knopf ,  Kevin Füchsel ,  Norbert Kaiser

IPC: G02B1/10 ,  G02B1/118 ,  B29C59/14 ,  G02B1/111 ,  G02B1/14 ,  B05D1/00 ,  B05D3/14 ,  C23C14/28 ,  C23C14/06 ,  C23C14/10 ,  C23C14/12 ,  C23C14/32

CPC classification number: G02B1/118 ,  B05D1/60 ,  B05D1/62 ,  B05D3/145 ,  B05D3/148 ,  B29C59/14 ,  C23C14/06 ,  C23C14/10 ,  C23C14/12 ,  C23C14/28 ,  C23C14/32 ,  G02B1/111 ,  G02B1/14

Abstract: A method for producing a reflection-reducing layer system on a substrate and a reflection-reducing layer system are disclosed. According to an embodiment the method includes depositing a refractive index gradient layer on the substrate by co-evaporation of an inorganic material and an organic material, wherein the refractive index gradient layer has a refractive index which decreases in a growth direction, depositing an organic layer above the refractive index gradient layer, and producing a nanostructure in the organic layer by a plasma etching process.

公开(公告)号：US09907352B2

公开(公告)日：2018-03-06

申请号：US14661247

申请日：2015-03-18

Applicant: GEOX S.p.A.

Inventor： Mario Polegato Moretti ,  Antonio Ferrarese ,  Bruno Mattioni

IPC: A43B7/08 ,  A43B7/12 ,  A43B7/00 ,  A43B9/02 ,  A43B13/02 ,  A43B13/12 ,  A43B7/06 ,  A43B23/02 ,  B05D1/00

CPC classification number: A43B7/125 ,  A43B7/06 ,  A43B7/08 ,  A43B7/087 ,  A43B9/02 ,  A43B13/026 ,  A43B13/12 ,  A43B13/125 ,  A43B23/0235 ,  B05D1/62 ,  Y10T428/249986

Abstract: A waterproof breathable sole for shoes, which comprises, for at least part of its extension, at least two structural layers, a lower one provided with a supporting structure so as to form the tread, and an upper one that is permeable to water vapor. The lower layer has portions that are open onto the upper layer. A coating obtained by means of a plasma deposition treatment for waterproofing is provided on the upper layer. A layer is thus obtained that has structural functions and characteristics of resistance to damage and is at the same time waterproof and breathable.

公开(公告)号：US20180044793A1

公开(公告)日：2018-02-15

申请号：US15552992

申请日：2016-02-10

Applicant: SIDEL PARTICIPATIONS

Inventor： Thierry DEAU

IPC: C23C16/52 ,  C23C16/26 ,  H01J37/32 ,  C23C16/511 ,  C23C16/04

CPC classification number: C23C16/52 ,  B05D1/62 ,  B05D7/02 ,  B05D7/20 ,  B29C59/142 ,  C23C16/045 ,  C23C16/26 ,  C23C16/511 ,  G01N21/8422 ,  G01N21/9081 ,  G01N25/72 ,  H01J37/32192 ,  H01J37/32394 ,  H01J37/32816 ,  H01J37/3299 ,  H05H2001/4607 ,  H05H2245/123

Abstract: Disclosed is a process for treating a container with plasma, for depositing a barrier layer on an internal face of the container. This process includes: after the plasma has been extinguished, obtaining a thermal image of the container; comparing the thermal image of the container with a reference thermal image stored in memory; and, if the thermal image of the container differs from the reference thermal image, modifying at least one of the following parameters: internal pressure, external pressure, precursor gas flow rate, microwave frequency, microwave power, duration of the treatment.