公开(公告)号：US20100322380A1

公开(公告)日：2010-12-23

申请号：US12866744

申请日：2009-02-09

Applicant: Christian Baeumer ,  Klaus Juergen Engel ,  Christoph Herrmann

Inventor： Christian Baeumer ,  Klaus Juergen Engel ,  Christoph Herrmann

IPC: G01N23/04 ,  G01J1/00

CPC classification number: G21K1/06 ,  G21K2201/067 ,  G21K2207/005

Abstract: The invention relates to an X-ray detector (30) that comprises an array of sensitive elements (Pi−1,b, Pia, Pib, Pi+1,a, Pi+1,b) and at least two analyzer gratings (G2a, G2b) disposed with different phase and/or periodicity in front of two different sensitive elements. Preferably, the sensitive elements are organized in macro-pixels (IIi) of e.g. four adjacent sensitive elements, where analyzer gratings with mutually different phases are disposed in front said sensitive elements. The detector (30) can particularly be applied in an X-ray device (100) for generating phase contrast images because it allows to sample an intensity pattern (I) generated by such a device simultaneously at different positions.

Abstract translation: 本发明涉及一种X射线检测器（30），它包括一组敏感元件（Pi-1，b，Pia，Pib，Pi + 1，a，Pi + 1，b）和至少两个分析器光栅 ，G2b），其在两个不同的敏感元件前面具有不同的相位和/或周期性。 优选地，敏感元件被组织在例如微处理器的宏像素（IIi）中。 四个相邻的敏感元件，其中具有相互不同相位的分析器光栅设置在所述敏感元件的前面。 检测器（30）可以特别地应用于用于生成相位对比图像的X射线装置（100）中，因为它允许在不同位置同时采样由这种装置产生的强度图案（I）。

公开(公告)号：US20100290590A1

公开(公告)日：2010-11-18

申请号：US12842937

申请日：2010-07-23

Applicant: Chidane Ouchi ,  Kentaro Nagai ,  Toru Den ,  Hidenosuke Itoh

Inventor： Chidane Ouchi ,  Kentaro Nagai ,  Toru Den ,  Hidenosuke Itoh

IPC: G01N23/04

CPC classification number: G06T7/0002 ,  A61B6/4291 ,  A61B6/484 ,  G01J9/02 ,  G01N23/04 ,  G01N23/20075 ,  G01N2223/401 ,  G21K1/06 ,  G21K2201/06 ,  G21K2201/067

Abstract: An X-ray imaging apparatus includes a phase grating, an absorption grating, a detector, and an arithmetic unit. The arithmetic unit executes a Fourier transform step of performing Fourier transform for an intensity distribution of a Moiré acquired by the detector, and acquiring a spatial frequency spectrum. Also, the arithmetic unit executes a phase retrieval step of separating a spectrum corresponding to a carrier frequency from a spatial frequency spectrum acquired in the Fourier transform step, performing inverse Fourier transform for the separated spectrum, and acquiring a differential phase image.

Abstract translation: X射线成像装置包括相位光栅，吸收光栅，检测器和运算单元。 算术单元执行对由检测器获取的莫尔的强度分布执行傅里叶变换并获取空间频谱的傅里叶变换步骤。 此外，运算单元执行相位检索步骤，从傅里叶变换步骤中获取的空间频谱中分离出与载波频率对应的频谱，对分离的频谱进行傅里叶逆变换，获取差分相位图像。

公开(公告)号：US07820990B2

公开(公告)日：2010-10-26

申请号：US12000298

申请日：2007-12-11

Applicant: Wayne K. Schroeder ,  Mark A. Turner ,  Brett A. Williams

Inventor： Wayne K. Schroeder ,  Mark A. Turner ,  Brett A. Williams

IPC: G01R31/26

CPC classification number: H05H6/00 ,  G21K1/06 ,  G21K1/08 ,  G21K2201/067

Abstract: Systems and methods are disclosed for emitting electromagnetic (EM) energy. A source emits EM energy that is incident on a first material. The first material transmits EM energy to a second material. The second material can have a first surface adjacent to the first material and a thickness and shape selected to stimulate surface plasmon polaritons on the first surface of the second material to resonate the EM energy transmitted from the first material such that the resonated EM energy has an EM wavelength in a narrow field of view with substantially no sidelobes.

Abstract translation: 公开了用于发射电磁（EM）能量的系统和方法。 源发射入射在第一材料上的EM能量。 第一种材料将EM能量传输到第二种材料。 第二材料可以具有与第一材料相邻的第一表面，并且选择的厚度和形状来刺激第二材料的第一表面上的表面等离子体激元，以共振从第一材料传递的EM能量，使得共振的EM能量具有 EM波长在窄视野内，基本上没有旁瓣。

公开(公告)号：US07736821B2

公开(公告)日：2010-06-15

申请号：US11566883

申请日：2006-12-05

Applicant: Kazuyuki Hayashi ,  Takashi Sugiyama ,  Masaki Mikami

Inventor： Kazuyuki Hayashi ,  Takashi Sugiyama ,  Masaki Mikami

IPC: G03F1/00

CPC classification number: G03F1/24 ,  B82Y10/00 ,  B82Y40/00 ,  G03F1/38 ,  G21K2201/067 ,  Y10T428/31616

Abstract: To provide a substrate with a conductive film for an EUV mask blank having an increased surface hardness, and a substrate with a reflective multilayer film and an EUV mask blank using such a substrate with a conductive film.A substrate with a conductive film to be used for production of a reflective mask blank for EUV lithography, characterized in that the chief material of the conductive film is at least one member selected from the group consisting of Cr, Ti, Zr, Nb, Ni and V, and the conductive film contains B (boron) at an average concentration of from 1 to 70 at %.

Abstract translation: 为了提供具有增加表面硬度的EUV掩模坯料用导电膜的基板，以及使用这种具有导电膜的基板的具有反射多层膜的基板和EUV掩模坯料。 一种具有用于生产用于EUV光刻的反射掩模板的导电膜的基板，其特征在于，导电膜的主要材料是选自Cr，Ti，Zr，Nb，Ni中的至少一种 和V，导电膜含有平均浓度为1-70原子％的B（硼）。

公开(公告)号：US20100124723A1

公开(公告)日：2010-05-20

申请号：US10818586

申请日：2004-04-05

Applicant: Philip A. Grunow ,  Wayne M. Clift ,  Leonard E. Klebanoff

Inventor： Philip A. Grunow ,  Wayne M. Clift ,  Leonard E. Klebanoff

IPC: G03F7/20

CPC classification number: G03F7/70958 ,  B82Y10/00 ,  G03F7/70983 ,  G21K1/062 ,  G21K2201/067

Abstract: A coating for the protection of optical surfaces exposed to a high energy erosive plasma. A gas that can be decomposed by the high energy plasma, such as the xenon plasma used for extreme ultraviolet lithography (EUVL), is injected into the EUVL machine. The decomposition products coat the optical surfaces with a protective coating maintained at less than about 100 Å thick by periodic injections of the gas. Gases that can be used include hydrocarbon gases, particularly methane, PH3 and H2S. The use of PH3 and H2S is particularly advantageous since films of the plasma-induced decomposition products S and P cannot grow to greater than 10 Å thick in a vacuum atmosphere such as found in an EUVL machine.

Abstract translation: 用于保护暴露于高能侵蚀性等离子体的光学表面的涂层。 可以通过高能等离子体分解的气体，例如用于极紫外光刻（EUVL）的氙等离子体）注入到EUVL机器中。 通过定期注射气体，分解产物用保护涂层保持在小于约厚厚的光学表面上。 可使用的气体包括烃类气体，特别是甲烷，PH3和H2S。 使用PH3和H2S是特别有利的，因为等离子体诱导的分解产物S和P的膜在真空气氛中不能生长至大于10埃，例如在EUVL机中发现。

公开(公告)号：US07711092B2

公开(公告)日：2010-05-04

申请号：US12064388

申请日：2006-08-17

Applicant: Thomas Baumann

Inventor： Thomas Baumann

IPC: G21K1/00

CPC classification number: G21K1/06 ,  G21K2201/067

Abstract: An X-ray lens assembly, a device including the X-ray lens assembly and a method of manufacturing the X-ray lens assembly are described. The X-ray assembly comprises a tube member (50) including an inlet opening (90) for X-rays and an outlet opening (94) for X-rays. Additionally, the assembly comprises a capillary X-ray lens (28) mounted inside the tube member (50). The X-ray lens (28) may be mounted inside the tube member (50) by a stabilizing agent and/or by one or more separate mounting structures (96A, 96B).

Abstract translation: 描述了X射线透镜组件，包括X射线透镜组件的装置和制造X射线透镜组件的方法。 X射线组件包括管构件（50），其包括用于X射线的入口（90）和用于X射线的出口（94）。 另外，组件包括安装在管构件（50）内的毛细管X射线透镜（28）。 X射线透镜（28）可以通过稳定剂和/或通过一个或多个单独的安装结构（96A，96B）安装在管构件（50）的内部。

公开(公告)号：US20100068632A1

公开(公告)日：2010-03-18

申请号：US12582847

申请日：2009-10-21

Applicant: Motoshi ONO ,  Mitsuru Watanabe ,  Mika Yokoyama

Inventor： Motoshi ONO ,  Mitsuru Watanabe ,  Mika Yokoyama

IPC: G03F1/00 ,  B29D11/00 ,  G02B1/12 ,  G02B5/08

CPC classification number: B82Y40/00 ,  B82Y10/00 ,  C03C23/0025 ,  C03C2204/08 ,  G03F1/24 ,  G03F1/60 ,  G21K2201/067

Abstract: The present invention provides a method for smoothing an optical surface of an optical component for EUVL. Specifically, the present invention provides a method for smoothing an optical surface of an optical component for EUVL made of a silica glass material containing TiO2 and comprising SiO2 as a main component with a laser having an oscillation wavelength, to which the optical component for EUVL has an absorption coefficient of 0.01 μm−1 or more, at a fluence of 0.3 to 1.5 J/cm2 in an atmosphere having a water vapor partial pressure of 3.6 mmHg or less.

Abstract translation: 本发明提供了一种用于平滑EUVL的光学部件的光学表面的方法。 具体地说，本发明提供了一种用于EUVL的光学部件的光学部件的光学部件的光学部件的平滑化的方法，所述光学部件由含有TiO 2的二氧化硅玻璃材料制成，并且包含SiO 2作为主要成分，具有用于EUVL的光学部件具有振荡波长的激光 在水蒸汽分压为3.6mmHg以下的气氛中，以0.3〜1.5J / cm 2的流量计，吸收系数为0.01μm-1以上。

公开(公告)号：US20100061508A1

公开(公告)日：2010-03-11

申请号：US12585283

申请日：2009-09-10

Applicant: Kenji Takahashi

Inventor： Kenji Takahashi

IPC: G01T1/36

CPC classification number: A61B6/4014 ,  A61B6/00 ,  A61B6/032 ,  A61B6/4233 ,  A61B6/466 ,  A61B6/484 ,  G03B42/026 ,  G21K1/06 ,  G21K2201/06 ,  G21K2201/064 ,  G21K2201/067 ,  G21K2207/005

Abstract: A radiation phase image radiographing apparatus, including a radiation emission unit having multiple radiation sources for emitting radiation onto a subject, the radiation sources being distributed such that radiation emitted from each of the radiation sources and transmitted through the subject forms a part of a projected image of the subject, a first diffraction grating configured to be exposed to the radiation emitted from the multiple radiation sources of the radiation emission unit and to produce a Talbot effect by the exposure, a second diffraction grating for diffracting the radiation diffracted by the first diffraction grating, and a radiation image detector for detecting the radiation diffracted by the second diffraction grating.

Abstract translation: 一种辐射相位图像摄影装置，包括具有用于向对象发射辐射的多个辐射源的辐射发射单元，辐射源被分布成使得从每个辐射源发射并透射通过对象的辐射形成投影图像的一部分 被配置为暴露于从辐射发射单元的多个辐射源发射的辐射并且通过曝光产生Talbot效应的第一衍射光栅，用于衍射由第一衍射光栅衍射的辐射的第二衍射光栅 以及用于检测由第二衍射光栅衍射的辐射的放射线图像检测器。

公开(公告)号：US20090288448A1

公开(公告)日：2009-11-26

申请号：US12512436

申请日：2009-07-30

Applicant: Shigeru MAIDA ,  Motoyuki YAMADA

Inventor： Shigeru MAIDA ,  Motoyuki YAMADA

IPC: C03C17/23

CPC classification number: C03B19/1407 ,  B82Y10/00 ,  B82Y40/00 ,  C03B19/1415 ,  C03B19/1446 ,  C03B19/1453 ,  C03B19/1484 ,  C03B2201/42 ,  C03C3/06 ,  C03C2201/11 ,  C03C2201/21 ,  C03C2201/23 ,  C03C2201/42 ,  G03F1/24 ,  G03F1/60 ,  G21K2201/067

Abstract: A titania-doped quartz glass containing 3-12 wt % of titania at a titania concentration gradient less than or equal to 0.01 wt %/μm and having an apparent transmittance to 440 nm wavelength light of at least 30% at a thickness of 6.35 mm is of such homogeneity that it provides a high surface accuracy as required for EUV lithographic members, typically EUV lithographic photomask substrates.

Abstract translation: 在二氧化钛浓度梯度小于或等于0.01重量％/重量的情况下，含有3-12重量％的二氧化钛的二氧化钛掺杂的石英玻璃，并且对于440nm波长具有至多30％的表观透射率，厚度为6.35mm 具有这样的同质性，其提供了EUV光刻元件（通常为EUV光刻光掩模基板）所需的高表面精度。

公开(公告)号：US20090284725A1

公开(公告)日：2009-11-19

申请号：US12466185

申请日：2009-05-14

Applicant: Wouter Anthon SOER ,  Maarten Marinus Johannes Wilhelmus VAN HERPEN

Inventor： Wouter Anthon SOER ,  Maarten Marinus Johannes Wilhelmus VAN HERPEN

IPC: G03B27/54 ,  G02B27/44

CPC classification number: G02B27/44 ,  G02B5/1838 ,  G02B5/1876 ,  G02B27/4244 ,  G02F1/061 ,  G03F7/70191 ,  G21K1/06 ,  G21K2201/067

Abstract: A zone plate includes a plurality of consecutively arranged, adjacent, and alternating first and second regions. The first regions are arranged to be substantially transparent to a first predetermined wavelength of radiation and a second predetermined wavelength of radiation that is different from the first predetermined wavelength of radiation. The second regions are arranged to be substantially opaque, diffractive, or reflective to the first predetermined wavelength of radiation and substantially transparent to the second predetermined wavelength of radiation.

Abstract translation: 区域板包括多个连续布置的，相邻的和交替的第一和第二区域。 第一区域被布置成对于辐射的第一预定波长和不同于第一预定波长辐射的第二预定波长的辐射基本上是透明的。 第二区域被布置为基本上不透明，衍射或反射到第一预定波长的辐射并且对第二预定波长的辐射基本透明。