公开(公告)号：US20100211230A1

公开(公告)日：2010-08-19

申请号：US12701813

申请日：2010-02-08

Applicant: Albert BULLIARD ,  Benoit FRAGNIÈRE ,  Joël OEHEN ,  Olivier CARDOU

Inventor： Albert BULLIARD ,  Benoit FRAGNIÈRE ,  Joël OEHEN ,  Olivier CARDOU

IPC: G06F1/28

CPC classification number: H02H3/38 ,  H01J37/32045 ,  H01J37/3444 ,  H02H1/06

Abstract: A power supply device for plasma processing, wherein electric arcs may occur, comprises a power supply circuit for generating a voltage across output terminals, and a first switch connected between the power supply circuit and one of the output terminals.According to a first aspect the power supply device comprises a recovery energy circuit connected to the output terminals and to the power supply circuit.According to a second aspect the power supply device comprises an inductance circuit including an inductor and a second switch connected parallel to the inductor.According to a third aspect the power supply device comprises a controller for causing the power supply circuit and the first switch to be switched on and off. The controller is configured to determine a quenching time interval by means of a self-adaptive process. The quenching time interval defines the time interval during which, in an event of an arc, no voltage is generated across the output terminals.

Abstract translation: 一种用于等离子体处理的电源装置，其中可能发生电弧，包括用于在输出端子之间产生电压的电源电路和连接在电源电路和其中一个输出端子之间的第一开关。 根据第一方面，电源装置包括连接到输出端子和电源电路的恢复能量电路。 根据第二方面，电源装置包括电感电路，其包括电感器和与电感器并联连接的第二开关。 根据第三方面，电源装置包括用于使电源电路和第一开关被接通和断开的控制器。 控制器被配置为通过自适应过程来确定淬灭时间间隔。 淬火时间间隔定义了在电弧的情况下在输出端子之间不产生电压的时间间隔。

公开(公告)号：US20100194280A1

公开(公告)日：2010-08-05

申请号：US12685142

申请日：2010-01-11

Applicant: Thomas Kirchmeier ,  Michael Glueck

Inventor： Thomas Kirchmeier ,  Michael Glueck

IPC: H05H1/24

CPC classification number: G01R21/06 ,  G01R23/02 ,  H01J37/32045 ,  H02M7/003 ,  H02M7/5383 ,  H03H7/40 ,  H05B41/2806 ,  H05H1/46 ,  Y02B20/22

Abstract: A plasma supply device generates an output power greater than 500 W at an essentially constant basic frequency greater than 3 MHz and powers a plasma process to which is supplied the generated output power, and from which reflected power is returned to the plasma supply device. The plasma supply device includes at least one inverter connected to a DC power supply, which inverter has at least one switching element, and an output network, wherein the at least one output network includes at least one inductance that has at least one magnetic field strengthening element that is a Perminvar ferrite.

Abstract translation: 等离子体供给装置以大于3MHz的基本上恒定的基本频率产生大于500W的输出功率，并对供给所产生的输出功率的等离子体处理进行供电，并从反射功率返回到等离子体供应装置。 等离子体供给装置包括至少一个连接到DC电源的逆变器，该逆变器具有至少一个开关元件和输出网络，其中至少一个输出网络包括至少一个具有至少一个磁场强化的电感 元素是Perminvar铁氧体。

公开(公告)号：US20100171428A1

公开(公告)日：2010-07-08

申请号：US12687483

申请日：2010-01-14

Applicant: Thomas Kirchmeier ,  Michael Glueck ,  Hans-Juergen Windisch ,  Hanns-Joachim Knaus

Inventor： Thomas Kirchmeier ,  Michael Glueck ,  Hans-Juergen Windisch ,  Hanns-Joachim Knaus

IPC: H05B31/00

CPC classification number: G01R21/06 ,  G01R23/02 ,  H01J37/32045 ,  H02M7/003 ,  H02M7/5383 ,  H03H7/40 ,  H05B41/2806 ,  H05H1/46 ,  Y02B20/22

Abstract: Operation of a plasma supply device having at least one switching bridge with at least two switching elements, and configured to deliver a high frequency output signal having a power of >500 W and a substantially constant fundamental frequency>3 MHz to a plasma load is accomplished by determining at least one operating parameter, at least one environmental parameter of at least one switching element and/or a switching bridge parameter, determining individual drive signals for the switching elements taking into account the at least one operating parameter, the at least one environmental parameter and/or the switching bridge parameter, and individually driving the switching elements with a respective drive signal.

Abstract translation: 具有至少一个具有至少两个开关元件的开关桥的等离子体供给装置的操作被实现，其被配置为将具有大于500W的功率和基本恒定的基频> 3MHz的高频输出信号传送到等离子体负载 通过确定至少一个操作参数，至少一个开关元件和/或开关桥接参数的至少一个环境参数，确定考虑了至少一个操作参数的开关元件的各个驱动信号，所述至少一个环境 参数和/或开关桥接参数，并用相应的驱动信号分别驱动开关元件。

公开(公告)号：US20100171427A1

公开(公告)日：2010-07-08

申请号：US12686023

申请日：2010-01-12

Applicant: Thomas Kirchmeier ,  Michael Glueck

Inventor： Thomas Kirchmeier ,  Michael Glueck

IPC: H05B31/00

CPC classification number: G01R21/06 ,  G01R23/02 ,  H01J37/32045 ,  H02M7/003 ,  H02M7/5383 ,  H03H7/40 ,  H05B41/2806 ,  H05H1/46 ,  Y02B20/22

Abstract: In one aspect, protecting high frequency (HF) amplifiers of a plasma supply device configured to deliver >500 W at a substantially constant fundamental frequency >3 MHz is accomplished by: driving two HF amplifiers with two drive signals having a common frequency and a predetermined phase shift with respect to one another; generating two HF source signals using the HF amplifiers, the HF source signals coupled in a coupler to form a HF output signal; transmitting the HF output signal to the plasma load; measuring electrical variables related to the load impedances seen by the two HF amplifiers; determining whether the load impedance seen by one of the HF amplifiers lies outside a predetermined range; and adjusting the phase shift of the two drive signals, wherein neither of the load impedances seen by the HF amplifiers lies outside the predetermined range.

Abstract translation: 在一个方面，保护等离子体供给装置的高频（HF）放大器被配置为以基本恒定的基本频率> 3MHz输送大于500W的等离子体供给装置，其特征在于：通过驱动具有共同频率和预定的两个驱动信号的两个HF放大器 相移相对; 使用HF放大器产生两个HF源信号，HF源信号耦合在耦合器中以形成HF输出信号; 将HF输出信号发送到等离子体负载; 测量与两个HF放大器所看到的负载阻抗有关的电气变量; 确定由一个HF放大器看到的负载阻抗是否在预定范围之外; 以及调整两个驱动信号的相移，其中由HF放大器看到的负载阻抗都不在预定范围之外。

公开(公告)号：US07633242B2

公开(公告)日：2009-12-15

申请号：US11873868

申请日：2007-10-17

Applicant: Noboru Kuriyama

Inventor： Noboru Kuriyama

IPC: G05F1/00

CPC classification number: C23C14/564 ,  H01J37/32045 ,  H01J37/32082 ,  H01J37/32935 ,  H01J2237/0206 ,  H01L21/67069

Abstract: In a method of detecting arc discharge in a glow-discharge apparatus GD that has a high-frequency power source PS, a cutting pulse is output for time T1 to the high-frequency power source PS to stop a supply of power to the glow-discharge apparatus GD, when dVr/dt−dVf/dt increases over a first level, where Vf and Vr are a traveling-wave voltage and a reflected-wave voltage applied to the glow-discharge apparatus GD, respectively. Arc discharge is determined to have developed in the glow-discharge apparatus, when Vr/Vf increases to a second level or a higher level within a preset time To after the supply of power to the glow-discharge apparatus is stopped.

Abstract translation: 在具有高频电源PS的辉光放电装置GD中检测电弧放电的方法中，向高频电源PS输出时间T1的切断脉冲，停止向辉光放电装置供电， 放电装置GD，当dVr / dt-dVf / dt在第一电平上增加时，其中Vf和Vr分别是施加到辉光放电装置GD的行波电压和反射波电压。 在辉光放电装置的电力供给停止之后，当预定时间T0内Vr / Vf增加到第二电平或更高电平时，电弧放电被确定为在辉光放电装置中产生。

公开(公告)号：US20090230089A1

公开(公告)日：2009-09-17

申请号：US12047492

申请日：2008-03-13

Applicant: KALLOL BERA ,  SHAHID RAUF ,  AJIT BALAKRISHNA ,  KENNETH S. COLLINS ,  KARTIK RAMASWAMY ,  HIROJI HANAWA

Inventor： KALLOL BERA ,  SHAHID RAUF ,  AJIT BALAKRISHNA ,  KENNETH S. COLLINS ,  KARTIK RAMASWAMY ,  HIROJI HANAWA

IPC: B01J19/08 ,  C23F1/00

CPC classification number: H01J37/32174 ,  H01J37/32009 ,  H01J37/32045 ,  H01J37/32091

Abstract: A method and apparatus for controlling plasma uniformity is disclosed. When etching a substrate, a non-uniform plasma may lead to uneven etching of the substrate. Impedance circuits may alleviate the uneven plasma to permit more uniform etching. The impedance circuits may be disposed between the chamber wall and ground, the showerhead and ground, and the cathode can and ground. The impedance circuits may comprise one or more of an inductor and a capacitor. The inductance of the inductor and the capacitance of the capacitor may be predetermined to ensure the plasma is uniform. Additionally, the inductance and capacitance may be adjusted during processing or between processing steps to suit the needs of the particular process.

Abstract translation: 公开了一种用于控制等离子体均匀性的方法和装置。 当蚀刻基板时，不均匀的等离子体可能导致基板的不均匀蚀刻。 阻抗电路可以减轻不均匀的等离子体以允许更均匀的蚀刻。 阻抗电路可以设置在室壁和地面之间，淋浴头和地面以及阴极罐和地面之间。 阻抗电路可以包括电感器和电容器中的一个或多个。 电感器的电感和电容器的电容可以被预先确定，以确保等离子体是均匀的。 此外，可以在处理期间或在处理步骤之间调整电感和电容以适应特定工艺的需要。

公开(公告)号：US20090026181A1

公开(公告)日：2009-01-29

申请号：US12178372

申请日：2008-07-23

Applicant: Thomas Kirchmeier ,  Hans-Juergen Windisch ,  Hanns-Joachim Knaus ,  Michael Glueck

Inventor： Thomas Kirchmeier ,  Hans-Juergen Windisch ,  Hanns-Joachim Knaus ,  Michael Glueck

IPC: B23K9/00

CPC classification number: G01R21/06 ,  G01R23/02 ,  H01J37/32045 ,  H02M7/003 ,  H02M7/5383 ,  H03H7/40 ,  H05B41/2806 ,  H05H1/46 ,  Y02B20/22

Abstract: A plasma supply device includes a full bridge circuit that is connected to a DC power supply and that has two half bridges each with two series connected switching elements. The plasma supply device further includes a primary winding of a power transformer connected to centers of the half bridges between the switching elements. The primary winding includes a tapping connectable to an alternating current center between the potentials of the DC power supply.

Abstract translation: 等离子体供给装置包括全桥电路，其连接到直流电源并且具有两个半桥，每个具有两个串联的开关元件。 等离子体供给装置还包括连接到开关元件之间的半桥的中心的电力变压器的初级绕组。 初级绕组包括可连接到直流电源的电位之间的交流中心的抽头。

公开(公告)号：US20080216745A1

公开(公告)日：2008-09-11

申请号：US11381842

申请日：2006-05-05

Applicant: Peter Wiedemuth ,  Markus Bannwarth ,  Lothar Wolf

Inventor： Peter Wiedemuth ,  Markus Bannwarth ,  Lothar Wolf

IPC: C23C16/00 ,  H02H9/00

CPC classification number: H01J37/32045 ,  H01J37/32036 ,  H01J2237/0206

Abstract: An arc suppression arrangement suppresses arcs in a gas discharge device that is operated with an alternating voltage from a power supply. The arc suppression arrangement includes an arc suppression device and an arc identification device that controls the arc suppression device. The arc suppression device includes at least one controllable resistor that is connected in series in an electrical line that extends from an alternating voltage source to an electrode of the gas discharge device. An arc can thereby be prevented from being provided with energy.

Abstract translation: 电弧抑制装置抑制在从电源的交流电压下操作的气体放电装置中的电弧。 电弧抑制装置包括电弧抑制装置和控制灭弧装置的电弧识别装置。 电弧抑制装置包括至少一个可控电阻器，其串联连接在从交流电压源延伸到气体放电装置的电极的电线中。 由此可以防止电弧被提供能量。

公开(公告)号：US07399944B2

公开(公告)日：2008-07-15

申请号：US11202366

申请日：2005-08-12

Applicant: Hindrik Willem DeVries ,  Yoichiro Kamiyama ,  Jan Bastiaan Bouwstra ,  Mauritius Cornelius Maria Van de Sanden ,  Eugen Aldea ,  Paul Peeters

Inventor： Hindrik Willem DeVries ,  Yoichiro Kamiyama ,  Jan Bastiaan Bouwstra ,  Mauritius Cornelius Maria Van de Sanden ,  Eugen Aldea ,  Paul Peeters

IPC: B23K10/00

CPC classification number: H01J37/32018 ,  H01J37/32045 ,  H05H1/46 ,  H05H2001/4682 ,  H05H2001/4697

Abstract: The present invention is directed to a method and arrangement for controlling a glow discharge plasma in a gas or gas mixture under atmospheric conditions, in a plasma discharge space comprising at least two spaced electrodes in which at least one plasma pulse having an absolute pulse maximum is generated by applying an AC plasma energizing voltage to the electrodes causing a plasma current and a displacement current. The plasma is controlled by providing a relative decrease of the displacement current after the pulse maximum. In a preferred embodiment, the energizing voltage is applied through a series circuit including a choke coil and a non-saturable inductor.

Abstract translation: 本发明涉及一种在大气条件下控制气体或气体混合物中的辉光放电等离子体的方法和装置，其中等离子体放电空间包括至少两个间隔开的电极，其中至少一个具有绝对脉冲最大值的等离子体脉冲是 通过对电极施加AC等离子体激励电压而产生，产生等离子体电流和位移电流。 通过在脉冲最大值之后提供相对减小的位移电流来控制等离子体。 在优选实施例中，通过包括扼流线圈和不可饱和电感器的串联电路施加通电电压。

公开(公告)号：US20080036392A1

公开(公告)日：2008-02-14

申请号：US11873863

申请日：2007-10-17

Applicant: Noboru Kuriyama

Inventor： Noboru Kuriyama

IPC: G01R31/00 ,  H05B41/16

CPC classification number: C23C14/564 ,  H01J37/32045 ,  H01J37/32082 ,  H01J37/32935 ,  H01J2237/0206 ,  H01L21/67069

Abstract: In a method of detecting arc discharge in a glow-discharge apparatus GD that has a high-frequency power source PS, a cutting pulse is output for time T1 to the high-frequency power source PS to stop a supply of power to the glow-discharge apparatus GD, when dVr/dt−dVf/dt increases over a first level, where Vf and Vr are a traveling-wave voltage and a reflected-wave voltage applied to the glow-discharge apparatus GD, respectively. Arc discharge is determined to have developed in the glow-discharge apparatus, when Vr/Vf increases to a second level or a higher level within a preset time To after the supply of power to the glow-discharge apparatus is stopped.

Abstract translation: 在具有高频电源PS的辉光放电装置GD中检测电弧放电的方法中，向高频电源PS输出时间T 1的切断脉冲，停止对发光的供电 - 当dVr / dt-dVf / dt在第一电平上增加时，其中Vf和Vr分别是施加到辉光放电装置GD的行波电压和反射波电压。 在辉光放电装置的电力供给停止之后，当预定时间T0内Vr / Vf增加到第二电平或更高电平时，电弧放电被确定为在辉光放电装置中产生。