PREPARATION METHOD OF PATTERNED FILM, DISPLAY SUBSTRATE AND DISPLAY DEVICE
    63.
    发明申请
    PREPARATION METHOD OF PATTERNED FILM, DISPLAY SUBSTRATE AND DISPLAY DEVICE 有权
    图案片的制作方法,显示基板和显示装置

    公开(公告)号:US20150382475A1

    公开(公告)日:2015-12-31

    申请号:US14527134

    申请日:2014-10-29

    Abstract: Embodiments of the present invention provide a preparation method of a patterned film, a display substrate and a display device, avoiding falling off of a film layer occurring in the process of peeling off a photoresist layer. The preparation method of the patterned film comprises: forming a preset film layer on a surface of a preset substrate; covering the preset film layer with an isolation layer; forming a photoresist layer on a surface of the isolation layer and forming a pattern of the isolation layer with a patterning process; then removing the preset film layer which is not covered by the pattern of the isolation layer, peeling off the photoresist layer and removing the remaining, isolation layer to form a pattern of the preset film layer.

    Abstract translation: 本发明的实施方式提供了图案化膜,显示基板和显示装置的制备方法,避免了在剥离光致抗蚀剂层的过程中发生的膜层脱落。 图案化膜的制备方法包括:在预设衬底的表面上形成预定的膜层; 用隔离层覆盖预置的膜层; 在隔离层的表面上形成光致抗蚀剂层,并用图案化工艺形成隔离层的图案; 然后除去未被隔离层的图案覆盖的预定膜层,剥离光致抗蚀剂层并除去剩余的隔离层以形成预设膜层的图案。

    TOUCH PANEL AND MANUFACTURING METHOD OF TOUCH PANEL
    64.
    发明申请
    TOUCH PANEL AND MANUFACTURING METHOD OF TOUCH PANEL 审中-公开
    触控面板和触控面板的制造方法

    公开(公告)号:US20150370377A1

    公开(公告)日:2015-12-24

    申请号:US14836273

    申请日:2015-08-26

    Inventor: Takanori OHARA

    Abstract: A touch panel includes a transparent substrate, a wiring formed on at least one surface of the transparent substrate, a conductive layer formed on the wiring and the transparent substrate, and a protective layer formed on the conductive layer. The wiring transmits a signal from the conductive layer. The conductive layer is transparent and has a pattern formed by patterning a material formed on the wiring.

    Abstract translation: 触摸面板包括透明基板,形成在透明基板的至少一个表面上的布线,形成在布线和透明基板上的导电层以及形成在导电层上的保护层。 布线从导电层传输信号。 导电层是透明的,并且具有通过图案化形成在布线上的材料形成的图案。

    STRUCTURE WITH A METAL SILICIDE TRASPARENT CONDUCTIVE ELECTRODE AND A METHOD OF FORMING THE STRUCTURE
    67.
    发明申请
    STRUCTURE WITH A METAL SILICIDE TRASPARENT CONDUCTIVE ELECTRODE AND A METHOD OF FORMING THE STRUCTURE 审中-公开
    具有金属硅溶液导电电极的结构和形成结构的方法

    公开(公告)号:US20150357512A1

    公开(公告)日:2015-12-10

    申请号:US14828663

    申请日:2015-08-18

    Abstract: Disclosed are embodiments of a structure with a metal silicide transparent conductive electrode, which is commercially viable, robust and safe to use and, thus, optimal for incorporation into devices, such as flat panel displays, touch panels, solar cells, light emitting diodes (LEDs), organic optoelectronic devices, etc. Specifically, the structure can comprise a substrate (e.g., a glass or plastic substrate) and a transparent conducting film on that substrate. The transparent conducting film can comprise a metal silicide nanowire network. For example, in one embodiment, the metal silicide nanowire network can comprise multiple metal silicide nanowires fused together in a disorderly arrangement so that they form a mesh. In another embodiment, the metal silicide nanowire network can comprise multiple metal silicide nanowires patterned so that they form a grid. Also disclosed herein are various different method embodiments for forming such a structure.

    Abstract translation: 公开了具有金属硅化物透明导电电极的结构的实施例,其具有商业上可行性,稳健且安全使用,并且因此最佳地结合到诸如平板显示器,触摸面板,太阳能电池,发光二极管 LED),有机光电子器件等。具体地,该结构可以包括衬底(例如,玻璃或塑料衬底)和该衬底上的透明导电膜。 透明导电膜可以包括金属硅化物纳米线网络。 例如,在一个实施例中,金属硅化物纳米线网络可以包括以无序布置融合在一起的多个金属硅化物纳米线,使得它们形成网状物。 在另一个实施例中,金属硅化物纳米线网络可以包括图案化的多个金属硅化物纳米线,使得它们形成网格。 本文还公开了用于形成这种结构的各种不同的方法实施例。

    METHOD OF MANUFACTURING MICROSTRUCTURES OF METAL LINES
    69.
    发明申请
    METHOD OF MANUFACTURING MICROSTRUCTURES OF METAL LINES 审中-公开
    制造金属线微结构的方法

    公开(公告)号:US20150345042A1

    公开(公告)日:2015-12-03

    申请号:US14329009

    申请日:2014-07-11

    Abstract: A method of manufacturing a metal line microstructure is provided. Firstly, a substrate is provided. Then, a seed layer is formed on a surface of the substrate. Then, a photoresist layer is formed on a surface of the seed layer, and a photolithography and etching process is performed to form a trench in the photoresist layer, wherein the trench has a specified width. Then, an electroplating process is performed to fill a conductive layer into the trench. Afterwards, the photoresist layer and a portion of the seed layer uncovered by the conductive layer are removed, so that the metal line microstructure is produced.

    Abstract translation: 提供一种制造金属线微结构的方法。 首先,提供基板。 然后,在基板的表面上形成种子层。 然后,在种子层的表面上形成光致抗蚀剂层,并且进行光刻和蚀刻处理以在光致抗蚀剂层中形成沟槽,其中沟槽具有指定的宽度。 然后,执行电镀工艺以将导电层填充到沟槽中。 之后,去除未被导电层覆盖的光致抗蚀剂层和种子层的一部分,从而产生金属线微结构。

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