公开(公告)号：US20180067397A1

公开(公告)日：2018-03-08

申请号：US15711377

申请日：2017-09-21

Applicant: NIKON CORPORATION

Inventor： Yasuo AOKI

IPC: G03F7/20 ,  H01L21/683

CPC classification number: G03F7/2037 ,  G03F7/201 ,  G03F7/707 ,  G03F7/70716 ,  G03F7/70775 ,  H01L21/6838

Abstract: An exposure apparatus that scans and exposes each of a plurality of areas on a glass substrate, by irradiating the substrate with an illumination light via a projection optical system and relatively driving the substrate with respect to the illumination light, is equipped with: a substrate holder that levitates and supports a first area of the substrate; a substrate carrier that holds the glass substrate levitated and supported by the substrate holder; an X coarse movement stage that drives the substrate holder; an X voice coil motor that drives the substrate carrier; and a controller that controls the X coarse movement stage and the X voice coil motor so that the substrate holder and the substrate carrier are driven, respectively, in scanning exposure. Accordingly, an exposure apparatus with improved position controllability of an object can be provided.

公开(公告)号：US09889640B2

公开(公告)日：2018-02-13

申请号：US15015744

申请日：2016-02-04

Applicant: Flint Group Germany GmbH

Inventor： Frank Boyksen

IPC: G03F7/20 ,  B41C1/10

CPC classification number: B41C1/10 ,  G03F7/201 ,  G03F7/2016 ,  G03F7/2018 ,  G03F7/202

Abstract: Described is a method for producing flexographic printing plates, using as starting material a photopolymerizable flexographic printing plate which contains a dimensionally stable support, a photopolymerizable, relief-forming layer, and a digitally imagable layer. A mask is produced by imaging the digitally imagable layer. The printing plate is exposed with actinic light through the mask. The image regions of the layer are photopolymerized. A plurality of UV-LEDs are arranged on at least one UV-LED strip which is moved relative to the surface of the flexographic printing plate for exposure. The photopolymerized layer is developed by washing out and drying or by thermal development. An ultrasonic sensor determines the thickness of the flexographic printing plate for exposure. The exposure is controlled as to number of exposure steps, exposure intensity, energy input per exposure step, duration of individual exposure steps, and/or overall duration of exposure.

公开(公告)号：US20180031973A1

公开(公告)日：2018-02-01

申请号：US15224979

申请日：2016-08-01

Applicant: MacDermid Printing Solutions, LLC

Inventor： Ryan W. Vest ,  Kyle P. Baldwin ,  Laurie A. Bryant

IPC: G03F7/20 ,  G03F7/09

CPC classification number: G03F7/027 ,  G03F7/033 ,  G03F7/035 ,  G03F7/038 ,  G03F7/201 ,  G03F7/2012

Abstract: A method of producing a flexographic printing plate using a continuous liquid interphase is provided herein. This method allows for significantly reduced production times and fewer preparation steps compared to standard non-continuous techniques and results in less waste than typical methods for preparing flexographic printing plates. The printing plate provided by using continuous liquid interphase production results in a printing plate with desirable elastomeric elongation, desirable hardness, plate thickness in the range of 0.030 inches to 0.250 inches, and comprises printing dots with desirable characteristics.

公开(公告)号：US20180004093A1

公开(公告)日：2018-01-04

申请号：US15536565

申请日：2015-12-16

Applicant: Flint Group Germany GmbH

Inventor： Peter FRONCZKIEWICZ ,  Thorben WENDLAND ,  Matthias BEYER

IPC: G03F7/36 ,  G03F7/20 ,  G03F7/32

CPC classification number: G03F7/36 ,  G03F7/027 ,  G03F7/2004 ,  G03F7/201 ,  G03F7/2016 ,  G03F7/202 ,  G03F7/203 ,  G03F7/32 ,  G03F7/325

Abstract: A method for producing flexographic printing plates, using as starting material a photopolymerizable flexographic printing element which at least comprises, arranged one atop another, a dimensionally stable support, and at least one photopolymerizable, relief-forming layer, at least comprising an elastomeric binding, an ethylenically unsaturated compound, and a photoinitiator, a digitally imagable layer, and the method comprises at least the following steps (a) producing a mask by imaging the digitally imagable layer, (b) exposing the photopolymerizable, relief-forming layer through the mask with actinic light, and photopolymerizing the image regions of the layer, and (c) developing the photopolymerized layer by washing out the unphotopolymerized regions of the relief-forming layer with an organic solvent, or by thermal development, characterized in that step (b) comprises two or more exposure cycles (b 1) to (b n) with actinic light with an intensity of 100 to 5000 mW/cm2 from a plurality of UV-LEDs, the energy input into the photopolymerizable, relief-forming layer per exposure cycle being 0.1 to 5 J/cm2.

公开(公告)号：US20170297358A1

公开(公告)日：2017-10-19

申请号：US15638878

申请日：2017-06-30

Applicant: MacDermid Printing Solutions, LLC

Inventor： David Recchia ,  Timothy Gotsick ,  Ryan Vest

IPC: B41N1/06

CPC classification number: B41N1/06 ,  B41C1/055 ,  B41M1/04 ,  B41N1/12 ,  G03F7/09 ,  G03F7/201 ,  G03F7/2012 ,  G03F7/202 ,  Y10T428/24521

Abstract: A method of making a relief image printing element from a photosensitive printing blank is provided. A photosensitive printing blank with a laser ablatable layer disposed on at least one photocurable layer is ablated with a laser to create an in situ mask. The printing blank is then exposed to at least one source of actinic radiation through the in situ mask to selectively cross link and cure portions of the photocurable layer. Diffusion of air into the at least one photocurable layer is limited during the exposing step and preferably at least one of the type, power and incident angle of illumination of the at least one source of actinic radiation is altered during the exposure step. The resulting relief image comprises a plurality of dots and a dot shape of the plurality of dots that provide optimal print performance on various substrates, including corrugated board.

公开(公告)号：US20170256418A1

公开(公告)日：2017-09-07

申请号：US15061860

申请日：2016-03-04

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor： SHU-HAO CHANG ,  KUO-CHANG KAU ,  KEVIN HUANG ,  JENG-HORNG CHEN

IPC: H01L21/311 ,  H01L21/687 ,  G03F7/20 ,  H01L21/027

CPC classification number: G03F7/70341 ,  B05D1/60 ,  B05D3/06 ,  B05D3/061 ,  B05D3/068 ,  G03F7/0042 ,  G03F7/038 ,  G03F7/11 ,  G03F7/167 ,  G03F7/2004 ,  G03F7/201 ,  G03F7/2037 ,  G03F7/2039 ,  G03F7/38 ,  G03F7/40 ,  G03F7/70325 ,  H01L21/02118 ,  H01L21/02277 ,  H01L21/0271 ,  H01L21/0274 ,  H01L21/0277 ,  H01L21/31111 ,  H01L21/31133 ,  H01L21/31144 ,  H01L21/687 ,  H01L21/68764

Abstract: Disclosed is a method for lithography patterning. The method includes providing a substrate, forming a deposition enhancement layer (DEL) over the substrate, and flowing an organic gas near a surface of the DEL. During the flowing of the organic gas, the method further includes irradiating the DEL and the organic gas with a patterned radiation. Elements of the organic gas polymerize upon the patterned radiation, thereby forming a resist pattern over the DEL. The method further includes etching the DEL with the resist pattern as an etch mask, thereby forming a patterned DEL.

公开(公告)号：US09612534B2

公开(公告)日：2017-04-04

申请号：US14801703

申请日：2015-07-16

Applicant: Tokyo Electron Limited

Inventor： Mark L. Schattenburg ,  Rudolf H. Hendel ,  Michael Carcasi

IPC: G03F7/20 ,  C07K14/47

CPC classification number: G03F7/2004 ,  C07K14/47 ,  G03F7/201 ,  G03F7/2022

Abstract: A substrate may be disposed on a substrate support in a flood exposure treatment system. A flood exposure dose profile may be selected. The substrate may be exposed to flood irradiation from a source, and the flood irradiation may be terminated when the selected flood exposure dose profile is achieved. Exposing the substrate to flood irradiation may comprise controlling at least one of a substrate rotation rate, a source scanning rate, a substrate scanning rate, a source power setting, a distance from the source to the substrate, a source aperture setting, an angle of incidence of flood irradiation on the substrate, and a source focus position to achieve the selected flood exposure dose profile.

公开(公告)号：US20160223913A1

公开(公告)日：2016-08-04

申请号：US14902044

申请日：2014-06-16

Applicant: V TECHNOLOGY CO., LTD.

Inventor： Koichi KAJIMAYA ,  Michinobu MIZUMURA ,  Makoto HATANAKA

IPC: G03F7/20

CPC classification number: G03F7/7015 ,  G03F7/201 ,  G03F7/70275

Abstract: The present invention relates to an exposure device which forms an image of a pattern on a mask onto a substrate with microlens arrays to expose the substrate, and reduces a size of an lighting unit which emits an exposure light. Microlens arrays include plural microlenses which are arranged two-dimensionally and arranged in a direction intersecting a movement direction. Lighting unit includes an LD array bar in which plural laser diodes are arranged, and lighting optical system which transforms plural emitted lights emitted from the plural laser diodes into an exposure flux having a slit form. The slit form spreads across plural pieces of the microlenses, and which, with respect to the movement direction, is limited in an area not reaching a microlens arranged in an adjacent row in the movement direction, and illuminates plural microlenses arranged in a row with an exposure light by the exposure light flux.

Abstract translation: 曝光装置技术领域本发明涉及一种曝光装置，其将具有微透镜阵列的掩模上的图案的图案形成为露出基板，并且减小了发出曝光光的照明单元的尺寸。 微透镜阵列包括多个微透镜，其被二维布置并且沿与移动方向相交的方向布置。 照明单元包括其中布置有多个激光二极管的LD阵列，以及将从多个激光二极管发射的多个发射光变换为具有狭缝形式的曝光通量的照明光学系统。 狭缝形式分布在多个微透镜上，并且相对于移动方向被限制在没有到达移动方向上的相邻行中的微透镜的区域中，并且将具有排列在一起的多个微透镜照射 曝光光通过曝光光通量。

公开(公告)号：US09104111B2

公开(公告)日：2015-08-11

申请号：US13669791

申请日：2012-11-06

Applicant: GM GLOBAL TECHNOLOGY OPERATIONS, INC.

Inventor： Jeffrey A. Rock

IPC: G03B27/54 ,  G03F1/50 ,  G03F7/20 ,  G02B6/12

CPC classification number: G03F1/50 ,  G02B2006/1219 ,  G03F7/201 ,  G03F7/2041

Abstract: A system for fabricating a radiation-cured structure is provided. The system includes a radiation-sensitive material having a first refractive index; a mask formed from a mask material having a second refractive index; and a radiation source. The mask is disposed between the radiation source and the radiation-sensitive material, and has a plurality of substantially radiation transparent apertures. The radiation source is configured to generate radiation beams for at least one of initiating, polymerizing, and crosslinking the radiation-sensitive material. The system includes at least one of a) an at least one normalizing surface disposed between the radiation source and the mask, b) a refractive fluid having a third refractive index disposed between the radiation source and the mask, and c) the refractive fluid having the third refractive index disposed between the mask and the radiation-sensitive material. A method for fabricating the radiation-cured structure is also provided.

Abstract translation: 提供了一种用于制造辐射固化结构的系统。 该系统包括具有第一折射率的辐射敏感材料; 由具有第二折射率的掩模材料形成的掩模; 和辐射源。 掩模设置在辐射源和辐射敏感材料之间，并且具有多个基本上辐射的透明孔。 辐射源被配置为产生用于使辐射敏感材料起始，聚合和交联中的至少一个的辐射束。 所述系统包括以下至少一个：a）设置在所述辐射源和所述掩模之间的至少一个归一化表面，b）具有设置在所述辐射源和所述掩模之间的具有第三折射率的折射流体，以及c）所述折射流体具有 设置在掩模和辐射敏感材料之间的第三折射率。 还提供了一种制造辐射固化结构的方法。

公开(公告)号：US09036133B2

公开(公告)日：2015-05-19

申请号：US13218657

申请日：2011-08-26

Applicant: Harun H. Solak ,  Christian Dais ,  Francis Clube

Inventor： Harun H. Solak ,  Christian Dais ,  Francis Clube

IPC: G03B27/32 ,  G03B27/54 ,  G03B27/58 ,  G03F7/20

CPC classification number: G03B27/58 ,  G03B27/54 ,  G03F7/201 ,  G03F7/70325 ,  G03F7/7035 ,  G03F7/70408

Abstract: A lithographic method related to Talbot imaging for printing a desired pattern of features that is periodic or quasi-periodic in at least one direction onto a substrate surface, which method includes providing a mask bearing a pattern of mask features, arranging the substrate parallel and in proximity to the mask, providing an illumination source having a central wavelength and a spectral bandwidth, forming from said source an illumination beam with an angular distribution of intensity, arranging the distance of the substrate from the mask and exposing the mask pattern to said beam so that each angular component of illumination exposes the substrate to substantially the entire range of lateral intensity distributions that occur between successive Talbot image planes for the illumination wavelengths, wherein the angular distribution of the beam is designed in conjunction with the pattern of features in the mask and the distance of the substrate from the mask.

Abstract translation: 与Talbot成像相关的平版印刷方法，用于将至少一个方向上周期性或准周期性的所需特征图案打印到基底表面上，该方法包括提供具有掩模特征图案的掩模，将基片平行放置 靠近掩模，提供具有中心波长和光谱带宽的照明源，从所述源形成具有强度角度分布的照明光束，将衬底距离掩模布置并将掩模图案暴露于所述光束，从而 照明的每个角度分量使衬底基本上暴露在用于照明波长的连续Talbot像面之间出现的横向强度分布的整个范围内，其中光束的角分布结合掩模中的特征图案设计， 衬底与掩模的距离。