公开(公告)号：US20110073785A1

公开(公告)日：2011-03-31

申请号：US12996029

申请日：2009-06-04

Applicant: Renaud Mercier-Ythier ,  Roland Geyl

Inventor： Renaud Mercier-Ythier ,  Roland Geyl

IPC: G21K1/06

CPC classification number: B82Y10/00 ,  G02B17/061 ,  G02B17/0694 ,  G02B19/0023 ,  G02B19/0047 ,  G02B19/0095 ,  G03F7/70166 ,  G21K1/062 ,  G21K2201/061 ,  G21K2201/064 ,  G21K2201/067

Abstract: The invention relates to a radiation collector (10) designed to concentrate part of the radiation produced by a source on a spot (100). The collector includes a primary concave mirror (1) and a secondary convex mirror (2), each being rotationally symmetrical about an optical axis (X-X) of the collector. The primary mirror is configured to reflect the radiation collected with an angle of incidence (i) that is substantially constant between different points on said main mirror. Such a collector is particularly suitable for use with a discharge produced plasma source.

Abstract translation: 本发明涉及一种设计用于将由源产生的辐射的一部分集中在点（100）上的辐射收集器（10）。 收集器包括一个初级凹面镜（1）和一个副凸面镜（2），它们都围绕收集器的光轴（X-X）旋转对称。 主镜被配置成以在所述主镜上的不同点之间基本上恒定的入射角（i）反射所收集的辐射。 这种集电器特别适用于放电产生的等离子体源。

公开(公告)号：US20110058652A1

公开(公告)日：2011-03-10

申请号：US12879922

申请日：2010-09-10

Applicant: Gerald Todd Seidler

Inventor： Gerald Todd Seidler

IPC: G01T1/36 ,  G01N23/00 ,  G02B5/18

CPC classification number: G21K1/062 ,  B33Y80/00 ,  B82Y10/00 ,  G01N23/2076 ,  G02B5/0891 ,  G21K2201/061 ,  G21K2201/062 ,  G21K2201/064

Abstract: A spectrometer includes a rigid body having a first planar face with an orientation and a second planar face with a different orientation than the first planar face. The first and second planar faces are configured to position Bragg diffraction elements, and the orientation of the first planar face and the different orientation of the second planar face are arranged to convey a predetermined spectral range of the electromagnetic radiation to non-overlapping regions of the sensor location via the diffraction elements.

Abstract translation: 光谱仪包括具有具有取向的第一平面和具有不同于第一平面的取向的第二平面的刚体。 第一和第二平面被配置为布置布拉格衍射元件，并且第一平面的取向和第二平面的不同取向被布置成将电磁辐射的预定光谱范围传送到非重叠区域 通过衍射元件的传感器位置。

公开(公告)号：US20110033025A1

公开(公告)日：2011-02-10

申请号：US12910605

申请日：2010-10-22

Applicant: DONG-GUN LEE ,  Seong-sue Kim

Inventor： DONG-GUN LEE ,  Seong-sue Kim

IPC: G21K5/00

CPC classification number: G21K1/062 ,  B82Y10/00 ,  B82Y40/00 ,  G03F1/24 ,  G03F1/84 ,  G21K2201/061

Abstract: An apparatus for measuring an image of a pattern to be formed on a semiconductor by scanning the pattern using a scanner, the apparatus including an EUV mask including the pattern, a zoneplate lens on a first side of the EUV mask and adapted to focus EUV light on a portion of the EUV mask at a same angle as an angle at which the scanner will be disposed with respect to a normal line of the EUV mask, and a detector arranged on another side of the EUV mask and adapted to sense energy of the EUV light from the EUV mask, wherein NAzoneplate=NAscanner/n and NAdetector=NAscanner/n*σ, where NAzoneplate denotes a NA of the zoneplate lens, NAdetector denotes a NA of the detector, and NAscanner denotes a NA of the scanner, σ denotes an off-axis degree of the scanner, and n denotes a reduction magnification of the scanner.

Abstract translation: 一种用于通过使用扫描仪扫描图案来测量要在半导体上形成的图案的图像的装置，该装置包括包含该图案的EUV掩模，在EUV掩模的第一侧上的偏光透镜，并且适于聚焦EUV光 在EUV掩模的一部分上以与扫描仪将相对于EUV掩模的法线配置的角度相同的角度，以及检测器，布置在EUV掩模的另一侧上，并且适于感测 来自EUV掩模的EUV光，其中NAzoneplate = NAscanner / n和NAdetector = NAscanner / n *＆sgr;其中NAzoneplate表示该区域透镜的NA，NAdetector表示检测器的NA，NAscanner表示扫描仪的NA， ＆sgr 表示扫描仪的离轴度，n表示扫描仪的缩小倍率。

公开(公告)号：US07821714B1

公开(公告)日：2010-10-26

申请号：US12659261

申请日：2010-03-02

Applicant: Dong-gun Lee ,  Seong-sue Kim

Inventor： Dong-gun Lee ,  Seong-sue Kim

IPC: G02B27/44 ,  G03F7/20 ,  G21K1/06

CPC classification number: G21K1/062 ,  B82Y10/00 ,  B82Y40/00 ,  G03F1/24 ,  G03F1/84 ,  G21K2201/061

Abstract: An apparatus for measuring an image of a pattern to be formed on a semiconductor by scanning the pattern using a scanner, the apparatus including an EUV mask including the pattern, a zoneplate lens on a first side of the EUV mask and adapted to focus EUV light on a portion of the EUV mask at a same angle as an angle at which the scanner will be disposed with respect to a normal line of the EUV mask, and a detector arranged on another side of the EUV mask and adapted to sense energy of the EUV light from the EUV mask, wherein NAzoneplate=NAscanner/n and NAdetector=NAscanner/n*σ, where NAzoneplate denotes a NA of the zoneplate lens, NAdetector denotes a NA of the detector, and NAscanner denotes a NA of the scanner, σ denotes an off-axis degree of the scanner, and n denotes a reduction magnification of the scanner.

Abstract translation: 一种用于通过使用扫描仪扫描图案来测量要在半导体上形成的图案的图像的装置，该装置包括包含图案的EUV掩模，在EUV掩模的第一侧上的偏光透镜，并且适于聚焦EUV光 在EUV掩模的一部分上以与扫描仪将相对于EUV掩模的法线配置的角度相同的角度，以及检测器，布置在EUV掩模的另一侧上，并且适于感测 来自EUV掩模的EUV光，其中NAzoneplate = NAscanner / n和NAdetector = NAscanner / n *＆sgr;其中NAzoneplate表示该区域透镜的NA，NAdetector表示检测器的NA，NAscanner表示扫描仪的NA， ＆sgr 表示扫描仪的离轴度，n表示扫描仪的缩小倍率。

公开(公告)号：US07742566B2

公开(公告)日：2010-06-22

申请号：US11952498

申请日：2007-12-07

Applicant: Forrest Frank Hopkins ,  Susanne Madeline Lee ,  Peter Michael Edic

Inventor： Forrest Frank Hopkins ,  Susanne Madeline Lee ,  Peter Michael Edic

IPC: G21K1/06 ,  G21K3/00

CPC classification number: G21K1/062 ,  B82Y10/00 ,  G21K1/10 ,  G21K2201/061 ,  G21K2201/064 ,  G21K2201/067 ,  H01J35/16 ,  H01J2235/183

Abstract: A multi-energy imaging system and method for selectively generating high-energy X-rays and low-energy X-ray beams are described. A pair of optic devices are used, one optic device being formed to emit high X-ray energies and the other optic device being formed to emit low X-ray energies. A selective filtering mechanism is used to filter the high X-ray energies from the low X-ray energies. The optic devices have at least a first solid phase layer having a first index of refraction with a first photon transmission property and a second solid phase layer having a second index of refraction with a second photon transmission property. The first and second layers are conformal to each other.

Abstract translation: 描述了用于选择性地生成高能量X射线和低能量X射线束的多能量成像系统和方法。 使用一对光学器件，一个光学器件形成为发射高X射线能量，另一个光学器件形成为发射低X射线能量。 选择性过滤机制用于从低X射线能量过滤高X射线能量。 光学器件具有至少第一固相层，其具有第一光子透射特性的第一折射率和具有第二光子透射特性的第二折射率的第二固相层。 第一层和第二层彼此共形。

公开(公告)号：US07646849B2

公开(公告)日：2010-01-12

申请号：US11774138

申请日：2007-07-06

Applicant: Yoshio Iwasaki ,  Yutaka Yokozawa

Inventor： Yoshio Iwasaki ,  Yutaka Yokozawa

IPC: G01N23/201 ,  G01N23/20

CPC classification number: G01N23/201 ,  B82Y10/00 ,  G21K2201/061

Abstract: An ultra-small angle X-ray scattering measuring apparatus includes a detector for detecting X-rays emitted from a sample, an X-ray collimating mirror arranged between the X-ray real focus and the sample, a monochromator arranged between the X-ray collimating mirror and the sample and an analyzer arranged between the sample and the detector. The X-ray collimating mirror includes a pair of X-ray mirrors that are arranged orthogonally relative to each other. The X-ray mirrors are multilayer film mirrors and their X-ray reflection surfaces are paraboloidal. The interplanar spacing of lattice planes of each of the multilayer films is continuously changed along the paraboloid so as to meet the Bragg's condition. The monochromator and the analyzer are formed by using a channel-cut crystal. The analyzer is driven to rotate for scanning around a 2θ-axial line and diffracted rays reduced to a spectrum by the analyzer are detected by the detector.

Abstract translation: 一种超小角度X射线散射测定装置，具备检测从样本发出的X射线的检测器，配置在X射线实际焦点与样本之间的X射线准直镜，配置在X射线 准直镜和样品以及布置在样品和检测器之间的分析仪。 X射线准直镜包括相对于彼此正交布置的一对X射线镜。 X射线镜是多层膜反射镜，它们的X射线反射面是抛物面的。 每个多层膜的晶格面的平面间距沿着抛物面连续变化，以满足布拉格条件。 单色仪和分析器通过使用通道切割晶体形成。 分析仪被驱动旋转以围绕2θ轴线进行扫描，并由检测器检测由分析仪降低到光谱的衍射光线。

公开(公告)号：US20090225948A1

公开(公告)日：2009-09-10

申请号：US12397504

申请日：2009-03-04

Applicant: John H. BURDETT, JR. ,  Adam BAILEY ,  Zewu CHEN ,  R. Scott SEMKEN ,  Kai XIN

Inventor： John H. BURDETT, JR. ,  Adam BAILEY ,  Zewu CHEN ,  R. Scott SEMKEN ,  Kai XIN

IPC: G21K1/06

CPC classification number: G21K1/06 ,  B82Y10/00 ,  G21K1/062 ,  G21K2201/061 ,  G21K2201/062 ,  G21K2201/064 ,  G21K2201/067

Abstract: An x-ray analysis apparatus for illuminating a sample spot with an x-ray beam. An x-ray tube is provided having a source spot from which a diverging x-ray beam is produced, the source spot requiring alignment along a transmission axis passing through the sample spot. A first housing section is provided, to which the x-ray tube is attached, including mounting features for adjustably mounting the x-ray tube therein such that the source spot coincides with the transmission axis. A second housing section includes a second axis coinciding with the transmission axis; and at least one x-ray optic attached to the second housing section for receiving the diverging x-ray beam and directing the beam toward the sample spot. Complimentary mating surfaces may be provided to align the first and second sections, and the optics, to the transmission axis. A third housing section may also be provided, including an aperture through which the x-ray beam passes, and to which a detector may be attached.

Abstract translation: 一种用X射线束照射样品斑点的X射线分析装置。 提供了具有产生发散X射线束的源极点的X射线管，源点需要沿着穿过样品斑点的透射轴对准。 提供了第一容纳部分，X射线管被附接到该第一壳体部分，包括用于可调节地将x射线管安装在其中的安装特征，使得源点与透射轴一致。 第二壳体部分包括与传动轴线重合的第二轴线; 以及附接到第二壳体部分的至少一个x射线光学器件，用于接收发散的X射线束并将光束引向样品斑点。 可以提供免费配合表面以将第一和第二部分以及光学元件对准到透射轴线。 还可以设置第三壳体部分，其包括x射线束通过的孔，并且可以附接检测器。

公开(公告)号：US20090191475A1

公开(公告)日：2009-07-30

申请号：US12383640

申请日：2009-03-26

Applicant: Myoung-soo Lee ,  Young-su Sung ,  Hee-bom Kim ,  Min-kyung Lee ,  Dong-gun Lee

Inventor： Myoung-soo Lee ,  Young-su Sung ,  Hee-bom Kim ,  Min-kyung Lee ,  Dong-gun Lee

IPC: G03F1/00

CPC classification number: G21K1/062 ,  B82Y10/00 ,  G03F1/70 ,  G03F7/70625 ,  G21K2201/061

Abstract: A method of manufacturing a photomask includes: providing a photomask; exposing the photomask to obtain an aerial image of the photomask and evaluating the photomask using the aerial image; and altering an optical parameter of the photomask associated with the aerial image according to the result of evaluation.

Abstract translation: 制造光掩模的方法包括：提供光掩模; 曝光光掩模以获得光掩模的空间图像，并使用空中图像评估光掩模; 以及根据评估结果改变与空中图像相关联的光掩模的光学参数。

公开(公告)号：US07456408B2

公开(公告)日：2008-11-25

申请号：US12009984

申请日：2008-01-23

Applicant: Hans-Juergen Mann ,  Wolfgang Singer ,  Joerg Schultz ,  Johannes Wangler ,  Karl-Heinz Schuster ,  Udo Dinger ,  Martin Antoni ,  Wilhelm Ulrich

Inventor： Hans-Juergen Mann ,  Wolfgang Singer ,  Joerg Schultz ,  Johannes Wangler ,  Karl-Heinz Schuster ,  Udo Dinger ,  Martin Antoni ,  Wilhelm Ulrich

IPC: G02B27/14 ,  G02B5/30 ,  G02B17/00

CPC classification number: B82Y10/00 ,  G02B13/143 ,  G02B17/0657 ,  G02B17/0663 ,  G03F7/70066 ,  G03F7/70075 ,  G03F7/70083 ,  G03F7/70108 ,  G03F7/70166 ,  G03F7/70175 ,  G03F7/70191 ,  G03F7/702 ,  G03F7/70233 ,  G03F7/70358 ,  G21K1/06 ,  G21K5/00 ,  G21K5/04 ,  G21K2201/061

Abstract: There is provided an illumination system for microlithography. The illumination system includes an optical element having a plurality of field raster elements, a plane in which a field is illuminated, and a grazing incidence mirror situated in a light path from the optical element to the plane, after the optical element. The illumination system has no other grazing incidence mirror in the light path, after the optical element and before the plane.

公开(公告)号：US07450299B2

公开(公告)日：2008-11-11

申请号：US10499968

申请日：2002-12-25

Applicant: Yoshiyuki Takizawa ,  Yoshiyuki Takahashi ,  Hirohiko Shimizu ,  Chiko Otani ,  Toshikazu Ebisuzaki

Inventor： Yoshiyuki Takizawa ,  Yoshiyuki Takahashi ,  Hirohiko Shimizu ,  Chiko Otani ,  Toshikazu Ebisuzaki

IPC: G02B23/06

CPC classification number: B82Y10/00 ,  G02B23/02 ,  G02B23/06 ,  G21K2201/061

Abstract: The light of a broad energy band can be observed by reflecting the light of the broad energy band, for example, the light from the visible light region to the x-ray region at a high reflectance respectively, by a composite telescope including a normal incidence optical system and an oblique incidence optical system. A broadband telescope comprise an oblique incidence optical system unit in which the light is obliquely incident on a surface part for reflecting the incident light, a normal incidence optical system unit in which the light is substantially vertically incident on a surface part for reflecting the incident light, and an analyzer for spectrum analysis of the light reflected by the surface part of the obliquely incidence optical system unit and the light reflected by the surface part of the normal incidence optical system unit.

Abstract translation: 通过复合望远镜，通过将包括正常入射的宽能带的光例如以可见光区域的光反射到高反射率的X射线区域，能够观察到宽能带的光 光学系统和倾斜入射光学系统。 宽带望远镜包括倾斜入射光学系统单元，其中光倾斜地入射在用于反射入射光的表面部分上;法线入射光学系统单元，其中光基本垂直地入射在表面部分上以反射入射光 以及用于对由倾斜入射光学系统单元的表面部分反射的光和由入射光学系统单元的表面部分反射的光进行光谱分析的分析仪。