公开(公告)号：US09979586B2

公开(公告)日：2018-05-22

申请号：US15513121

申请日：2015-06-22

Applicant: CITIZEN WATCH CO., LTD.

Inventor： Ayano Tanabe

IPC: G02B21/00 ,  H04L27/38 ,  H04L27/36 ,  G02B21/08 ,  H01J3/14

CPC classification number: H04L27/389 ,  G02B21/00 ,  G02B21/0028 ,  G02B21/0032 ,  G02B21/0036 ,  G02B21/0072 ,  G02B21/0076 ,  G02B21/0088 ,  G02B21/082 ,  G02B26/06 ,  G02B27/0068 ,  G02F1/13 ,  G02F2203/18 ,  G02F2203/50 ,  H01J3/14 ,  H04L27/361

Abstract: The phase modulation device (3) includes a first phase modulation element (11) which modulates a phase of a light flux in accordance with a voltage applied to each of a plurality of first electrodes in accordance with a first ratio of a second aberration component to a first aberration component of a wave front aberration generated by an optical system including an objective lens (4); a second phase modulation element (12) which modulates a phase of a light flux in accordance with a voltage applied to each of a plurality of second electrodes in accordance with a second ratio of the second aberration component to the first aberration component; and a control circuit (3) which controls voltages applied to each of first electrodes and each of second electrodes in accordance with a distance from the objective lens to a light focusing position of the light flux.

公开(公告)号：US20160225573A1

公开(公告)日：2016-08-04

申请号：US14610981

申请日：2015-01-30

Applicant: VARIAN MEDICAL SYSTEMS, INC.

Inventor： Paul D. Moore ,  Kasey Otho Greenland

IPC: H01J35/14 ,  H01J29/58 ,  H01J35/10

CPC classification number: H01J35/14 ,  H01J3/14 ,  H01J35/06 ,  H01J35/26

Abstract: An example embodiment includes a cathode assembly. The cathode assembly includes a cathode head, a filament, a focusing structure, and a non-rectilinear focusing aperture. The cathode head defines a filament slot. The filament is positioned in the filament slot that is capable of emitting electrons by thermionic emission. The focusing structure is positioned at least partially between the filament and an anode. The non-rectilinear focusing aperture is defined in the focusing structure. The non-rectilinear focusing aperture is configured to shape an emission profile of electrons emitted by the filament.

Abstract translation: 示例实施例包括阴极组件。 阴极组件包括阴极头，灯丝，聚焦结构和非直线聚焦孔。 阴极头限定灯丝槽。 灯丝位于能够通过热电子发射发射电子的灯丝槽中。 聚焦结构至少部分地定位在灯丝和阳极之间。 非直线聚焦孔径定义在聚焦结构中。 非直线聚焦孔被配置成对由灯丝发射的电子的发射谱进行整形。

公开(公告)号：US08921805B2

公开(公告)日：2014-12-30

申请号：US14218563

申请日：2014-03-18

Applicant: Carl Zeiss Microscopy GmbH

Inventor： Josef Biberger ,  Ralph Pulwey ,  Andreas Adolf

IPC: H01J3/14 ,  H01J3/26 ,  H01J37/147 ,  H01J37/28 ,  H01J37/317

CPC classification number: H01J3/26 ,  H01J3/14 ,  H01J37/1477 ,  H01J37/28 ,  H01J37/317 ,  H01J2237/303 ,  H01J2237/31749

Abstract: An ion beam system comprises a voltage supply system 7 and at least one beam deflector 39 having at least one first deflection electrode 51a, 51b, 51c and plural second deflection electrodes 52a, 52b, 52c, wherein the voltage supply system is configured to supply different adjustable deflection voltages to the plural second deflection electrodes such that electric deflection fields between the plural second deflection electrodes and the opposite at least one first deflection electrode have a common orientation. The system has a high kinetic energy mode in which a distribution of the electric deflection field has a greater width, a low kinetic energy mode in which a distribution of the electric deflection field has a smaller width.

Abstract translation: 离子束系统包括电压供应系统7和至少一个具有至少一个第一偏转电极51a，51b，51c和多个第二偏转电极52a，52b，52c的光束偏转器39，其中电压供应系统被配置为提供不同的 可变偏转电压到多个第二偏转电极，使得多个第二偏转电极和相对的至少一个第一偏转电极之间的电偏转场具有共同的取向。 该系统具有高动能模式，其中电偏转场的分布具有较大的宽度，其中电偏转场的分布具有较小宽度的低动能模式。

公开(公告)号：US20140224997A1

公开(公告)日：2014-08-14

申请号：US14180350

申请日：2014-02-13

Applicant: Industry-University Cooperation Foundation Sunmoon University

Inventor： Tae Sik OH ,  Ho Seob KIM ,  Dae Wook KIM ,  Seung Joon AHN

IPC: H01J3/26 ,  H01J3/14

CPC classification number: H01J3/26 ,  H01J3/021 ,  H01J3/12 ,  H01J3/14 ,  H01J3/18 ,  H01J3/30 ,  H01J37/04 ,  H01J2237/1205

Abstract: An ultra-miniaturized electron optical microcolumn is provided. The electron optical microcolumn includes an electron-emitting source emitting electrons using a field emission principle, an extraction electrode causing the emission of electrons from the electron-emitting source, a focusing electrode to which voltage is flexibly applied in response to a working distance to a target for regulating a focusing force of electron beams emitted from the electron-emitting source, an acceleration electrode accelerating electrons emitted by the extraction electrode, a limit electrode regulating an amount and a size of electron beams using electrons accelerated by the acceleration electrode, and a deflector deflecting electron beams towards the target.

Abstract translation: 提供超小型电子光学微柱。 电子光学微柱包括使用场致发射原理发射电子的电子发射源，引起来自电子发射源的电子的引出电极，响应于工作距离而被柔性施加电压的聚焦电极 用于调节从电子发射源发射的电子束的聚焦力的目标，加速由引出电极发射的电子的加速电极，限制电极使用由加速电极加速的电子来调节电子束的量和尺寸，以及 偏转器偏转电子束朝向目标。

公开(公告)号：US08803069B2

公开(公告)日：2014-08-12

申请号：US12562202

申请日：2009-09-18

Applicant: James R. Kesler ,  Douglas M. Trout ,  Gary W. Scheer

Inventor： James R. Kesler ,  Douglas M. Trout ,  Gary W. Scheer

IPC: H01L31/00 ,  G01J1/04

CPC classification number: H02H1/0023 ,  H01J3/14

Abstract: An electro-optical (EO) radiation collector for collecting and/or transmitting EO radiation (which may include EO radiation in the visible wavelengths) for transmission to an EO sensor. The EO radiation collector may be used with an arc flash detection device or other protective system, such as an intelligent electronic device (IED). The arc flash detection device may detect an arc flash event based upon EO radiation collected by and/or transmitted from the EO radiation collector. The EO radiation collector may receive an EO conductor cable, an end of which may be configured to receive EO radiation. A portion of the EO radiation received by the EO radiation collector may be transmitted into the EO conductor cable and transmitted to the arc flash detection device. The EO radiation collector may be adapted to receive a second EO conductor cable, which may be used to provide redundant EO transmission and/or self-test capabilities.

公开(公告)号：US08729491B2

公开(公告)日：2014-05-20

申请号：US13789434

申请日：2013-03-07

Applicant: Hitachi High-Technologies Corporation

Inventor： Hideto Dohi ,  Akira Ikegami ,  Hideyuki Kazumi

IPC: H01J37/147 ,  H01J3/26 ,  H01J29/58

CPC classification number: H01J3/26 ,  H01J3/14 ,  H01J37/1478 ,  H01J37/153 ,  H01J37/28 ,  H01J2237/1501 ,  H01J2237/1508

Abstract: The present invention provides a charged particle beam apparatus which is provided with a tilting deflector which is disposed between a charged particle source and an objective lens and tilts a charged particle beam, wherein a first optical element includes an electromagnetic quadrupole which generates dispersion to suppress the dispersion which is generated by deflection by the tilting deflector, and a second optical element is composed of a deflector for deflecting the charged particle beam which enters the first optical element or an electromagnetic quadrupole which causes the charged particle beam to generate a dispersion different from the dispersion generated by the first optical element.

Abstract translation: 本发明提供一种具有倾斜偏转器的带电粒子束装置，该倾斜偏转器设置在带电粒子源和物镜之间并使带电粒子束倾斜，其中第一光学元件包括电磁四极杆，其产生分散体以抑制 由倾斜偏转器偏转产生的色散，第二光学元件由用于偏转进入第一光学元件的电荷粒子束或电磁四极杆的偏转器组成，导致带电粒子束产生不同于 由第一光学元件产生的色散。

公开(公告)号：US08658961B2

公开(公告)日：2014-02-25

申请号：US13198902

申请日：2011-08-05

Applicant: Chih-Cheng Chen ,  Jin-Shan Pan

Inventor： Chih-Cheng Chen ,  Jin-Shan Pan

IPC: H01J3/14

CPC classification number: H01J3/14 ,  H01L31/167 ,  H01L33/486 ,  H01L2224/48091 ,  H01L2924/00014

Abstract: A submount is used for disposing an illuminant element or a light-receiving element having an optical axis. The submount is disposed at a plane and has a main body. The main body includes a first surface and a second surface. The first surface is approximately parallel to the plane and far away from the plane. The second surface is approximately parallel to the plane and adjacent to the plane. A disposing part of the first surface is tilted with respect to the second surface at a predetermined angle. The illuminant element or the light-receiving element is disposed on the disposing part. The optical axis of the illuminant element or the light-receiving element is tiled with respect to a normal of the second surface at the predetermined angle.

Abstract translation: 基座用于设置具有光轴的光源元件或光接收元件。 底座设置在平面上并具有主体。 主体包括第一表面和第二表面。 第一表面大致平行于平面并远离平面。 第二表面大致平行于平面并与平面相邻。 第一表面的设置部分以预定角度相对于第二表面倾斜。 照明元件或光接收元件设置在配置部上。 光源元件或光接收元件的光轴相对于第二表面的法线以预定角度被平铺。

公开(公告)号：US08581215B2

公开(公告)日：2013-11-12

申请号：US13481923

申请日：2012-05-28

Applicant: Vladimir Balakin

Inventor： Vladimir Balakin

IPC: A61N5/00

CPC classification number: H05H7/10 ,  A61N5/1048 ,  A61N5/1067 ,  A61N2005/1087 ,  H01J3/04 ,  H01J3/14 ,  H05H13/04

Abstract: The invention comprises a patient positioning method and apparatus used in conjunction with multi-axis charged particle or proton beam radiation therapy of cancerous tumors. The patient positioning system is used to translate the patient and/or rotate the patient into a zone where the proton beam can scan the tumor using a targeting system. The patient positioning system is optionally used in conjunction with systems used to constrain movement of the patient, such as semi-vertical, sitting, or laying positioning systems.

Abstract translation: 本发明包括与多轴带电粒子或癌肿瘤的质子束放射治疗结合使用的患者定位方法和装置。 患者定位系统用于翻译患者和/或将患者旋转到质子束可以使用靶向系统扫描肿瘤的区域。 患者定位系统可选地与用于限制患者的运动的系统结合使用，例如半垂直，坐着或铺设定位系统。

公开(公告)号：US20130277569A1

公开(公告)日：2013-10-24

申请号：US13887086

申请日：2013-05-03

Applicant: Uwe BEHRENS ,  Thomas STEPHANI

Inventor： Uwe BEHRENS ,  Thomas STEPHANI

IPC: H01J3/14

CPC classification number: H05H7/02 ,  A61N5/10 ,  A61N5/1077 ,  A61N2005/1087 ,  H01J3/14 ,  H05H13/005 ,  H05H2007/122 ,  H05H2277/11

Abstract: Systems and methods are provided to perform efficient, automatic adjustment of cyclotron beam currents within a wide range for multiple treatment layers within the same patient and treatment session. In one embodiment, efficient adjustment is achieved by using beam current attenuation by an electrostatic vertical deflector installed in the inner center of the cyclotron. The beam current may, for example, be adjusted by the high voltage applied to the electrostatic vertical deflector. In front of each treatment the attenuation curve of the vertical deflector is recorded. Based on this attenuation curve, the vertical deflector voltage for the needed beam current of each irradiation layer is interpolated. With this procedure the beam current could be automatically adjusted in minimal time over a wide range while maintaining a high level of precision.

Abstract translation: 提供系统和方法以在相同的患者和治疗期间内的多个处理层的宽范围内对回旋加速器束电流进行有效的自动调节。 在一个实施例中，通过使用安装在回旋加速器的内部中心的静电垂直偏转器来使用束流衰减来实现有效的调节。 例如，束电流可以通过施加到静电垂直偏转器的高电压来调节。 在每次处理前，记录垂直偏转器的衰减曲线。 基于该衰减曲线，对每个照射层所需的束电流的垂直偏转器电压进行插值。 通过该程序，可以在很宽的范围内以最小的时间自动调整光束电流，同时保持高精度。

公开(公告)号：US20130134323A1

公开(公告)日：2013-05-30

申请号：US13723269

申请日：2012-12-21

Applicant: ATTI INTERNATIONAL SERVICES COMPANY, INC.

Inventor： Artush A. Abgaryan ,  Eli Levi ,  Thomas Leddy

IPC: H01J3/26

CPC classification number: H01J3/14 ,  H01J3/26 ,  H01J37/244 ,  H01J2237/2446 ,  H01J2237/24507 ,  H01J2237/24514 ,  H01J2237/24542

Abstract: Electron beam profile testing and analysis method is introduced using the MOMS apparatus. The MOMS apparatus includes a Faraday Cup with a knife-wires scanning system which together perform simultaneous measurements. The scanning system has a five-dimensional processing mechanism for measuring different cross sections of an e-beam profile in a path of the e-beam. Measurements are conducted using the scanning system by virtually dividing each cross section into a plurality of subsections and measuring independent current values of at least one wire of the scanning system through which the electron beam passes from every pixel in each of the plurality of subsections. By providing relative movement between the scanning system and e-beam, the measured independent current values are analyzed to obtain the functional form of distribution of current density of the cross-section of the e-beam. The Faraday cup enables simultaneous measurement of the total value of the current.

Abstract translation: 使用MOMS仪器引入电子束剖面测试和分析方法。 MOMS装置包括具有刀线扫描系统的法拉第杯，它们一起执行同时测量。 扫描系统具有用于测量电子束的路径中的电子束轮廓的不同横截面的五维处理机构。 使用扫描系统进行测量，通过将每个横截面实际上划分成多个子部分并且测量扫描系统的至少一根导线的独立电流值，电子束通过该电子束从多个子部分中的每一个中的每个像素通过。 通过提供扫描系统和电子束之间的相对运动，分析测量的独立电流值以获得电子束横截面的电流密度分布的功能形式。 法拉第杯可以同时测量电流的总值。