Filter device and photoresist coating system

    公开(公告)号:US11609500B2

    公开(公告)日:2023-03-21

    申请号:US17043634

    申请日:2018-12-19

    Inventor: Huailiang He

    Abstract: The present disclosure provides a filter device and a photoresist coating system, and the filter device includes: a liquid storage tank, configured to hold photoresist to be filtered; a stirring structure, including a stirring tank and a stirring assembly at least partially received in the stirring tank; a first pipeline, one end of the first pipeline communicates with the liquid storage tank, and the other end of the first pipeline communicates with the stirring tank; a first filter assembly, provided on the first pipeline and located between the liquid storage tank and the stirring tank; a first pressure detection assembly, provided on the first pipeline and configured to detect a pressure of the photoresist in the first pipeline; and a second pipeline, one end of the second pipeline communicates with the stirring tank, and the other end of the second pipeline communicates with the coating device.

    SUPPLY DEVICE AND SUPPLY SYSTEM
    72.
    发明申请

    公开(公告)号:US20230081295A1

    公开(公告)日:2023-03-16

    申请号:US17942786

    申请日:2022-09-12

    Abstract: A supply device includes a collect tank which collects a process liquid from a substrate processing device and heats the collected liquid, and a supply tank connected to the collect tank and which supplies, to the substrate processing device, the process liquid heated in the collect tank. The collect tank includes a collect container that stores the process liquid, a first dividing plate that divides the collect container into a first region where the process liquid is introduced from the substrate processing device, and a second region that introduces the process liquid to the supply tank, piping that feeds, to the second region, the process liquid introduced in the first region, a first heater provided on a path through the piping and which heats the process liquid, and feed piping that feeds, to the supply tank, the process liquid in the second region and heated by the first heater.

    Coating apparatus
    74.
    发明授权

    公开(公告)号:US11596971B2

    公开(公告)日:2023-03-07

    申请号:US17291683

    申请日:2019-10-18

    Inventor: Yosuke Iwai

    Abstract: A coating apparatus includes a dispenser that includes a discharge port and a displacement sensor, the discharge port being configured to be capable of discharging liquid from a vertical direction the displacement sensor being configured to detect a distance in the vertical direction between the discharge port and the coating region, a drive device that drives the dispenser, a dispenser movement control unit that controls the drive device to move the dispenser along a predetermined coating path, a tilt detection unit that detects a tilt of the coating surface with respect to a reference plane based on the distance detected by the displacement sensor, and a coating path correction unit that corrects the coating path based on the tilt of the coating surface detected by the tilt detection unit.

    Coating Device
    75.
    发明申请

    公开(公告)号:US20230056116A1

    公开(公告)日:2023-02-23

    申请号:US17795347

    申请日:2021-01-08

    Applicant: Contiweb B.V.

    Inventor: Sjoerd Kappel

    Abstract: A coating device for supplying a liquid to a substrate, particularly in the form of an optionally printed web, foil, strip or sheet, comprises a reservoir for holding a quantity of liquid. Coating means are provided which are able and configured to take liquid from the reservoir and transfer it to the substrate. Supply means deliver the liquid into the reservoir during operation. The supply means are controllable and are able to lead a constant liquid flow into the reservoir. The reservoir is provided with level detecting means which are able and configured to detect a liquid level in the reservoir. Provided between the level detecting means and the coating means is a control which controls the coating means during operation on the basis of a detection (LS) of the liquid level in the reservoir in order to maintain the liquid level at a fixed value.

    APPLICATION DEVICE FOR APPLYING ADHESIVE, AND ADHESIVE APPLICATION METHOD

    公开(公告)号:US20230042593A1

    公开(公告)日:2023-02-09

    申请号:US17968751

    申请日:2022-10-18

    Inventor: Akira HOMMA

    Abstract: An application method for applying an adhesive to an object includes applying, prior to applying the adhesive to a specified part of the object, the adhesive to a part different from the specified part, calculating an application quantity of the adhesive applied to the part different from the specified part, making a first correction configured to correct an application condition of the adhesive based on basis of a result of the calculation, and applying the adhesive to the specified part using the application condition corrected in the first correction.

    SUBSTRATE PROCESSING APPARATUS
    77.
    发明申请

    公开(公告)号:US20230031209A1

    公开(公告)日:2023-02-02

    申请号:US17857888

    申请日:2022-07-05

    Abstract: Each of branch pipes has an internal space into which an atmosphere flows from a main pipe. A downstream damper is provided on the downstream side of an upstream damper in each of the branch pipes, and opens/closes the branch pipe. An upstream switching member switches a state of an upstream space between a state where the upstream space permits an inflow of an external atmosphere and a state where the upstream space prohibits the inflow of the external atmosphere. A downstream switching member switches a state of a downstream space between a state where the downstream space permits an inflow of the external atmosphere and a state where the downstream space prohibits the inflow of the external atmosphere.

    Systems and Methods of Controlling Adhesive Application

    公开(公告)号:US20230021607A1

    公开(公告)日:2023-01-26

    申请号:US17960288

    申请日:2022-10-05

    Inventor: Peter W. ESTELLE

    Abstract: Systems and methods for controlling adhesive application are disclosed. The systems and methods may include a controller and one or more sensors configured to measure an amount of adhesive applied to a plurality of substrates by a pump, detect a number of the substrates, determine an amount of adhesive applied per substrate, compare the adhesive applied per substrate to a target value, and adjust a pressure of the pump based on the comparison. The sensor(s) may include one or more of a valve sensor coupled to an adhesive supply, a flow rate sensor coupled to a manifold, a flow rate sensor coupled to one or more hoses, and a flow rate sensors coupled to a gun.

    Cooling of flat rolled material without post-running of the header

    公开(公告)号:US11548044B2

    公开(公告)日:2023-01-10

    申请号:US17440938

    申请日:2020-03-13

    Abstract: Device for cooling flat rolled material with a liquid coolant has at least one cooling bar, which is arranged above the conveying path and to which the liquid coolant is fed. A plurality of outlet tubes have, in a flow direction of the liquid coolant, an initial portion, which proceeds from the inlet opening and extends upward, a middle portion, which adjoins the initial portion, and an end portion, which adjoins the middle portion and extends downward and to the output opening. The middle portion contains a vertex at which the coolant flowing through the outlet tube in question reaches a highest point. The outlet openings are located above the cooling bar. A height distance (h1) of the inlet opening from the vertex is at least twice as large, in particular at least three times as large, as a height distance (h2) of the outlet opening from the vertex.

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