公开(公告)号：US09722384B2

公开(公告)日：2017-08-01

申请号：US15145016

申请日：2016-05-03

Applicant: Gigaphoton Inc.

Inventor： Natsushi Suzuki ,  Osamu Wakabayashi ,  Hiroaki Tsushima ,  Masanori Yashiro

IPC: H01S3/036 ,  H01S3/104 ,  H01S3/225 ,  B01D53/34 ,  B01D53/82 ,  B01D53/04

CPC classification number: H01S3/036 ,  B01D53/0446 ,  B01D53/346 ,  B01D53/685 ,  B01D53/82 ,  B01D53/86 ,  B01D2251/404 ,  B01D2251/602 ,  B01D2253/108 ,  B01D2255/20753 ,  B01D2255/20761 ,  B01D2257/2027 ,  B01D2258/0216 ,  B01D2259/40003 ,  H01S3/104 ,  H01S3/225

Abstract: A gas laser apparatus may include: a laser chamber connected through a first control valve to a first laser gas supply source that supplies a first laser gas containing a halogen gas and connected through a second control valve to a second laser gas supply source that supplies a second laser gas having a lower halogen gas concentration than the first laser gas; a purification column that removes at least a part of the halogen gas and a halogen compound from at least a part of a gas exhausted from the laser chamber; a booster pump, connected through a third control valve to the laser chamber, which raises a pressure of a gas having passed through the purification column to a gas pressure that is higher than an operating gas pressure of the laser chamber; and a controller that calculates, on a basis of a first amount of a gas supplied from the booster pump through the third control valve to the laser chamber, a second amount of the first laser gas that is to be supplied to the laser chamber and controls the first control valve on a basis of a result of the calculation of the second amount.

公开(公告)号：US09578730B2

公开(公告)日：2017-02-21

申请号：US14995636

申请日：2016-01-14

Applicant: Gigaphoton Inc.

Inventor： Tamotsu Abe ,  Osamu Wakabayashi

IPC: H05G2/00

CPC classification number: H05G2/008 ,  H05G2/003

Abstract: An extreme ultraviolet light generation apparatus may include: a chamber; a target generation unit configured to output a target to a predetermined region inside the chamber; a focusing optical system configured to concentrate a pulse laser beam to the predetermined region; and a plurality of scattered light detectors each configured to detect scattered light from the target irradiated with the pulse laser beam. The extreme ultraviolet light generation apparatus may further include: an optical path changer configured to change an optical path of the pulse laser beam; and an optical path controller configured to control the optical path changer on a basis of results of detection by the plurality of scattered light detectors.

Abstract translation: 极紫外光发生装置可以包括：腔室; 目标产生单元，被配置为将目标输出到所述室内的预定区域; 配置成将脉冲激光束集中到所述预定区域的聚焦光学系统; 以及多个散射光检测器，每个散射光检测器被配置为检测由脉冲激光束照射的来自目标的散射光。 所述极紫外光发生装置还可以包括：光路变换器，被配置为改变所述脉冲激光束的光路; 以及光路控制器，被配置为基于多个散射光检测器的检测结果来控制光路变换器。

公开(公告)号：US09574935B2

公开(公告)日：2017-02-21

申请号：US15224894

申请日：2016-08-01

Applicant: Gigaphoton Inc.

Inventor： Masato Moriya ,  Osamu Wakabayashi

IPC: G01J1/20 ,  H05G2/00 ,  G01J1/42 ,  G01J1/44 ,  G03F7/20

CPC classification number: G01J1/4257 ,  G01J1/0429 ,  G01J1/429 ,  G01J1/44 ,  G01J9/00 ,  G03F7/70258 ,  H05G2/005 ,  H05G2/006 ,  H05G2/008

Abstract: A system for generating extreme ultraviolet light may include a chamber, a target supply device configured to supply a target material into the chamber, a laser apparatus configured to output a laser beam to irradiate the target material, a wavefront adjuster configured to adjust a wavefront of the laser beam, an imaging optical system configured to focus the laser beam reflected by the target material, an image detector configured to capture an image of the laser beam focused by the imaging optical system, and a controller configured to control the wavefront adjuster based on the captured image.

Abstract translation: 一种用于产生极紫外光的系统可以包括：室，被配置成将目标材料供应到所述室中的目标供应装置，被配置为输出激光束以照射所述目标材料的激光装置;波前调整器， 所述激光束，被配置为聚焦由所述目标材料反射的激光束的成像光学系统;被配置为捕获由所述成像光学系统聚焦的所述激光束的图像的图像检测器;以及控制器，被配置为基于 捕获的图像。

公开(公告)号：US09439275B2

公开(公告)日：2016-09-06

申请号：US14590833

申请日：2015-01-06

Applicant: GIGAPHOTON INC.

Inventor： Masato Moriya ,  Osamu Wakabayashi

IPC: H05G2/00 ,  G01J1/42 ,  G01J1/04 ,  G01J9/00

CPC classification number: G01J1/4257 ,  G01J1/0429 ,  G01J1/429 ,  G01J1/44 ,  G01J9/00 ,  G03F7/70258 ,  H05G2/005 ,  H05G2/006 ,  H05G2/008

Abstract: A system for generating extreme ultraviolet light may include a chamber, a target supply device configured to supply a target material into the chamber, a laser apparatus configured to output a laser beam to irradiate the target material, a wavefront adjuster configured to adjust a wavefront of the laser beam, an imaging optical system configured to focus the laser beam reflected by the target material, an image detector configured to capture an image of the laser beam focused by the imaging optical system, and a controller configured to control the wavefront adjuster based on the captured image.

公开(公告)号：US09363878B2

公开(公告)日：2016-06-07

申请号：US14327401

申请日：2014-07-09

Applicant: GIGAPHOTON INC.

Inventor： Masato Moriya ,  Osamu Wakabayashi

IPC: H05G2/00 ,  H01S3/13 ,  H01S3/10 ,  H01S3/00 ,  G02B19/00 ,  B23K26/06 ,  G03F7/20 ,  H01S3/23

CPC classification number: H05G2/008 ,  B23K26/06 ,  G02B19/009 ,  G03F7/70033 ,  H01S3/005 ,  H01S3/0071 ,  H01S3/2316

Abstract: A device is provided for controlling a laser beam. The device may include a first wavefront adjuster provided in a beam path of a laser beam outputted from a laser apparatus, a beam delivery unit provided in a beam path of the laser beam from the first wavefront adjuster, a second wavefront adjuster provided in a beam path of the laser beam from the beam delivery unit, a beam monitor provided in a beam path of the laser beam from the second wavefront adjuster, and a controller configured to control the first and second wavefront adjusters based on a detection result of the beam monitor. An extreme ultraviolet light apparatus including the device is also provided.

Abstract translation: 提供了一种用于控制激光束的装置。 该装置可以包括设置在从激光装置输出的激光束的光束路径中的第一波前调整器，设置在来自第一波前调整器的激光束的光束路径中的光束传递单元，设置在光束中的第二波前调整器 来自光束传送单元的激光束的路径，设置在来自第二波前调整器的激光束的光束路径中的光束监视器，以及控制器，被配置为基于光束监视器的检测结果来控制第一和第二波前调整器 。 还提供了包括该装置的极紫外光装置。

公开(公告)号：US09351388B2

公开(公告)日：2016-05-24

申请号：US14887450

申请日：2015-10-20

Applicant: GIGAPHOTON INC.

Inventor： Masaki Nakano ,  Osamu Wakabayashi

IPC: H05G2/00 ,  H01L21/66 ,  H01L21/268 ,  G03F7/20 ,  B05B17/06 ,  B05B12/02

CPC classification number: H05G2/006 ,  B05B9/002 ,  B05B12/02 ,  B05B17/0607 ,  B05B17/0615 ,  G03F7/70033 ,  G03F7/70041 ,  G03F7/7085 ,  H01L21/268 ,  H01L22/10 ,  H05G2/003 ,  H05G2/008

Abstract: A target supply device may include a reservoir configured to hold a target material in its interior in liquid form, a vibrating element configured to apply vibrations to the reservoir, a target sensor configured to detect droplets of the target material outputted from the reservoir, a control unit configured to set parameters based on a result of the detection performed by the target sensor, a function generator configured to generate an electrical signal having a waveform based on the parameters, and a power source configured to apply a driving voltage to the vibrating element in accordance with the electrical signal.

公开(公告)号：US09229192B2

公开(公告)日：2016-01-05

申请号：US14697260

申请日：2015-04-27

Applicant: GIGAPHOTON INC.

Inventor： Hiroshi Someya ,  Yukio Watanabe ,  Katsuhiko Wakana ,  Osamu Wakabayashi

IPC: G02B7/182 ,  G02B7/18 ,  G02B5/08 ,  G02B5/10

CPC classification number: G02B7/181 ,  G02B5/0891 ,  G02B5/10 ,  G03F7/70033 ,  G03F7/70175

Abstract: A mirror device may include: a mirror including a base plate, a reflective film on a first surface of the base plate, and a plurality of first protrusions on a second surface of the base plate; a plurality of support parts for respectively supporting the plurality of the first protrusions, each support part having a groove formed therein for guiding the first protrusion; and a plurality of clamps for respectively pressing the plurality of the first protrusions against the respective grooves in the plurality of the support parts.

公开(公告)号：US09153927B2

公开(公告)日：2015-10-06

申请号：US13956282

申请日：2013-07-31

Applicant: GIGAPHOTON INC.

Inventor： Krzysztof Nowak ,  Takashi Suganuma ,  Osamu Wakabayashi

IPC: H01S3/23 ,  H01S3/139 ,  H01S3/08 ,  H01S3/05 ,  B82Y20/00 ,  H01S3/22 ,  H01S5/042 ,  H01S5/06 ,  H01S3/03 ,  H01S3/223 ,  H01S5/14 ,  H01S5/34

CPC classification number: H01S3/05 ,  B82Y20/00 ,  H01S3/0315 ,  H01S3/08031 ,  H01S3/139 ,  H01S3/22 ,  H01S3/2232 ,  H01S3/2325 ,  H01S3/235 ,  H01S3/2366 ,  H01S3/2375 ,  H01S5/042 ,  H01S5/06 ,  H01S5/14 ,  H01S5/3401

Abstract: A regenerative amplifier according to one aspect of this disclosure is used in combination with a laser device, and the regenerative amplifier may include: a pair of resonator mirrors constituting an optical resonator; a slab amplifier provided between the pair of the resonator mirrors for amplifying a laser beam with a predetermined wavelength outputted from the laser device; and an optical system disposed to configure a multipass optical path along which the laser beam is reciprocated inside the slab amplifier, the optical system transferring an optical image of the laser beam at a first position as an optical image of the laser beam at a second position.

Abstract translation: 根据本公开的一个方面的再生放大器与激光装置组合使用，再生放大器可以包括：构成光谐振器的一对谐振器镜; 设置在所述一对所述谐振器镜之间用于放大从所述激光装置输出的预定波长的激光束的平板放大器; 以及光学系统，被配置为配置多个光路，激光束沿着该光路在所述平板放大器内部往复运动，所述光学系统将所述激光束的光学图像在第一位置处作为所述激光束的光学图像在第二位置 。

公开(公告)号：US09131589B2

公开(公告)日：2015-09-08

申请号：US14290483

申请日：2014-05-29

Applicant: GIGAPHOTON INC.

Inventor： Hideyuki Hayashi ,  Kazuhiro Suzuki ,  Osamu Wakabayashi

IPC: H05G2/00 ,  H01S3/10 ,  H01S3/23 ,  H01S3/00

CPC classification number: H05G2/008 ,  H01S3/005 ,  H01S3/10015 ,  H01S3/10038 ,  H01S3/2316 ,  H05G2/006

Abstract: An extreme ultraviolet light generation apparatus may include a chamber containing a plasma generation region irradiated by a pulse laser beam from a laser apparatus, a target supply device configured to supply a plurality of targets consecutively to the plasma generation region in the chamber, a target detection unit configured to detect a target outputted from the target supply device, and a laser controller configured to control the laser apparatus; the laser controller generating a light emission trigger instructing a laser device included in the laser apparatus to emit a pulse laser beam, and outputting the generated light emission trigger to the laser apparatus, in accordance with a detection signal from the target detection unit; and the laser controller adjusting generation of the light emission trigger outputted consecutively to the laser apparatus so that a time interval of the light emission trigger is within a predetermined range.

Abstract translation: 极紫外线发生装置可以包括：包含由来自激光装置的脉冲激光束照射的等离子体产生区域的室，被配置为连续地向室内的等离子体产生区域供给多个目标的目标供给装置，目标检测 被配置为检测从目标供给装置输出的目标的单元，以及被配置为控制所述激光装置的激光控制器; 所述激光控制器生成指示所述激光装置所具备的激光装置发射脉冲激光束的发光触发器，并且根据来自所述目标检测部的检测信号将所生成的发光触发信号输出到所述激光装置; 并且所述激光控制器调整所述发光触发器的产生，连续输出到所述激光装置，使得所述发光触发的时间间隔在预定范围内。

公开(公告)号：US09071036B2

公开(公告)日：2015-06-30

申请号：US13895524

申请日：2013-05-16

Applicant: Gigaphoton Inc.

Inventor： Takahito Kumazaki ,  Takashi Onose ,  Osamu Wakabayashi

IPC: H01S3/10 ,  H01S3/081 ,  H01S3/106 ,  H01S3/137 ,  H01S3/1055 ,  H01S3/225 ,  H01S3/08 ,  H01S3/13

CPC classification number: H01S3/10069 ,  H01S3/08004 ,  H01S3/08009 ,  H01S3/0805 ,  H01S3/0811 ,  H01S3/0812 ,  H01S3/1055 ,  H01S3/106 ,  H01S3/1306 ,  H01S3/137 ,  H01S3/225 ,  H01S3/2251 ,  H01S3/2256

Abstract: A laser apparatus may include an optical resonator, a laser chamber, an optical loss adjustment mechanism, and a spectral line width adjustment mechanism. The optical resonator includes a mirror configured to reflect a part of light and a grating. The laser chamber is provided in the optical resonator and contains a laser gain medium, configured to emit a laser beam. The optical loss adjustment mechanism is provided in the optical resonator and configured to adjust an optical loss of the laser beam. The spectral line width adjustment mechanism is provided in the optical resonator and configured to adjust a spectral line width of the laser beam.

Abstract translation: 激光装置可以包括光学谐振器，激光室，光学损失调整机构和光谱线宽度调节机构。 光学谐振器包括被配置为反射一部分光和光栅的反射镜。 激光室设置在光学谐振器中并且包含被配置为发射激光束的激光增益介质。 光损耗调整机构设置在光谐振器中并且被配置为调整激光束的光损失。 光谱线宽度调节机构设置在光学谐振器中并且被配置为调整激光束的谱线宽度。