公开(公告)号：US20080273663A1

公开(公告)日：2008-11-06

申请号：US11768096

申请日：2007-06-25

Applicant: Ke Zhang ,  Gerold Rosenbaum

Inventor： Ke Zhang ,  Gerold Rosenbaum

IPC: G21K3/00

CPC classification number: G01N23/223 ,  B82Y10/00 ,  G01N2223/076 ,  G01N2223/316 ,  G01N2223/5015 ,  G21K2201/061

Abstract: A detector apparatus is disclosed that includes a housing and a multilayer disposed within the housing. The multilayer defining a leading edge and a trailing edge and is adapted to interact with a plurality of high-energy photons, impingent from the leading edge, to permit passage of photons of at least one selected energy. The multilayer is secured to a first securement adjacent to the leading edge. The multilayer is secured to a second securement bracket adjacent to the trailing edge. At least one detector is disposed adjacent to the trailing edge of the multilayer to detect the impingent high-energy photons. An adjustment mechanism operatively connects to the second securement bracket to adjust the position of the second securement bracket, thereby altering an angular position of the multilayer.

Abstract translation: 公开了一种检测器装置，其包括设置在壳体内的壳体和多层。 所述多层限定前缘和后缘，并且适于与从所述前缘碰撞的多个高能光子相互作用以允许至少一个选定能量的光子通过。 多层被固定到邻近前缘的第一固定件。 多层被固定到邻近后缘的第二固定支架上。 至少一个检测器设置在多层的后缘附近，以检测有害的高能光子。 调节机构可操作地连接到第二固定支架以调节第二固定支架的位置，从而改变多层的角位置。

公开(公告)号：US07439492B1

公开(公告)日：2008-10-21

申请号：US11344044

申请日：2006-02-01

Applicant: Gene E. Ice

Inventor： Gene E. Ice

IPC: G21C11/06

CPC classification number: G21K1/062 ,  B82Y10/00 ,  G21K1/06 ,  G21K2201/061 ,  G21K2201/064 ,  G21K2201/067 ,  G21K2201/068

Abstract: This invention extends the Kirkpatrick-Baez (KB) mirror focusing geometry to allow nondispersive focusing of neutrons with a convergence on a sample much larger than is possible with existing KB optical schemes by establishing an array of at least three mirrors and focusing neutrons by appropriate multiple deflections via the array. The method may be utilized with supermirrors, multilayer mirrors, or total external reflection mirrors. Because high-energy x-rays behave like neutrons in their absorption and reflectivity rates, this method may be used with x-rays as well as neutrons.

Abstract translation: 本发明扩展了Kirkpatrick-Baez（KB）反射镜聚焦几何，以允许中子在非常分散的聚集上比采用现有的KB光学方案大得多的样品，通过建立至少三个反射镜的阵列并通过适当的多重聚焦中子 通过阵列的偏转。 该方法可以与超镜，多层反射镜或全部外部反射镜一起使用。 由于高能x射线在吸收和反射率方面表现得像中子，所以该方法可以与x射线以及中子一起使用。

公开(公告)号：US07430277B2

公开(公告)日：2008-09-30

申请号：US10518284

申请日：2003-06-19

Applicant: Peter Hoghoj ,  Aurélien Dariel ,  Sergio Rodrigues

Inventor： Peter Hoghoj ,  Aurélien Dariel ,  Sergio Rodrigues

IPC: G21K1/06

CPC classification number: B82Y10/00 ,  G21K1/06 ,  G21K2201/061 ,  G21K2201/062 ,  G21K2201/064

Abstract: The invention relates to an optical device intended to treat an incident X-ray beam. The optical device comprises a monochromator and an optical element for conditioning the incident beam. The reflective surface of the optical element is able to produce a two-dimensional optical effect in order to adapt a beam in destination of the monochromator. The reflective surface of the optical element comprises a multilayer structure type surface that is reflective to X-rays. In particular, the reflective surface consists of a single surface shaped according to two curvatures corresponding to two different directions.

Abstract translation: 本发明涉及一种旨在处理入射的X射线束的光学装置。 光学装置包括单色器和用于调节入射光束的光学元件。 光学元件的反射表面能够产生二维光学效果，以使光束适应单色仪的目的地。 光学元件的反射表面包括反射X射线的多层结构型表面。 特别地，反射表面由根据对应于两个不同方向的两个曲率成形的单个表面组成。

公开(公告)号：US20080225258A1

公开(公告)日：2008-09-18

申请号：US12072592

申请日：2008-02-27

Applicant: Wolfgang Singer ,  Martin Antoni ,  Johannes Wangler

Inventor： Wolfgang Singer ,  Martin Antoni ,  Johannes Wangler

IPC: G03B27/54

CPC classification number: B82Y10/00 ,  G03B27/54 ,  G03F7/70083 ,  G03F7/70166 ,  G03F7/702 ,  G03F7/70233 ,  G21K2201/061

Abstract: There is provided an illumination system. The illumination system includes a source of light having a wavelength of less than or equal to about 193 nm, a first facet, a second facet, and a reflective element. The light is incident on the first facet via a first path, propagates from the first facet to the second facet via a second path, and propagates from the second facet to the reflective element via a third path. The second path and the third path are in substantially opposite directions from one another and substantially parallel to each other.

Abstract translation: 提供照明系统。 照明系统包括波长小于或等于约193nm的光源，第一刻面，第二刻面和反射元件。 光通过第一路径入射在第一刻面上，经由第二路径从第一刻面传播到第二刻面，并且经由第三路径从第二面传播到反射元件。 第二路径和第三路径彼此基本上相反的方向并且基本上彼此平行。

公开(公告)号：US07411203B2

公开(公告)日：2008-08-12

申请号：US11647016

申请日：2006-12-27

Applicant: Igor V. Fomenkov ,  Alexander I. Ershov

Inventor： Igor V. Fomenkov ,  Alexander I. Ershov

IPC: H01J49/00

CPC classification number: G03F7/70033 ,  B82Y10/00 ,  G03F7/70175 ,  G03F7/70916 ,  G21K1/062 ,  G21K2201/061 ,  G21K2201/065 ,  G21K2201/067 ,  H05G2/003 ,  H05G2/005 ,  H05G2/006 ,  H05G2/008

Abstract: An apparatus and method for EUV light production is disclosed which may comprise a laser produced plasma (“LPP”) extreme ultraviolet (“EUV”) light source control system comprising a target delivery system adapted to deliver moving plasma initiation targets and an EUV light collection optic having a ibeus defining a desired plasma initiation site, comprising; a target tracking and feedback system comprising: at least one imaging device providing as an output an image of a target stream track, wherein the target stream track results from the imaging speed of the camera being too slow to image individual plasma formation targets forming the target stream imaged as the target stream track; a stream track error detector detecting an error in the position of the target stream track in at least one axis genemily perpendicular to the target stream track from a desired stream truck intersecting the desired plasma initiation site.

Abstract translation: 公开了一种用于EUV光产生的装置和方法，其可以包括激光产生的等离子体（“LPP”）极紫外（“EUV”）光源控制系统，其包括适于递送移动等离子体引发靶的目标传送系统和EUV光收集 光学元件具有限定期望的等离子体起始位置的ibeus，包括： 目标跟踪和反馈系统，包括：至少一个成像装置，其提供目标流轨迹的图像作为输出，其中所述目标流轨迹由所述摄像机的成像速度导致太慢以不能成像形成所述目标的各个等离子体形成目标 流成像为目标流轨道; 流轨迹误差检测器，从与期望的等离子体起始位置相交的期望的流动车辆，在垂直于目标流轨迹的至少一个轴中至少一个轴上检测目标流轨迹的位置的误差。

公开(公告)号：US20080143981A1

公开(公告)日：2008-06-19

申请号：US11854621

申请日：2007-09-13

Applicant: Dirk Heinrich EHM ,  Annemieke van de Runstraat ,  Bastiaan Theodoor Wolschrijn ,  Arnoldus Jan Storm ,  Thomas Stein ,  Marco G. H. Meijerink ,  A. G. Ton M. Bastein ,  Esther L. J. van Soest-Vercammen ,  Norbertus Benedictus Koster ,  Frits G. H. M. Gubbels ,  Peter J. Oprel ,  Michiel Nienoord ,  Michel Riepen ,  Johannes Hubertus Josephina Moors

Inventor： Dirk Heinrich EHM ,  Annemieke van de Runstraat ,  Bastiaan Theodoor Wolschrijn ,  Arnoldus Jan Storm ,  Thomas Stein ,  Marco G. H. Meijerink ,  A. G. Ton M. Bastein ,  Esther L. J. van Soest-Vercammen ,  Norbertus Benedictus Koster ,  Frits G. H. M. Gubbels ,  Peter J. Oprel ,  Michiel Nienoord ,  Michel Riepen ,  Johannes Hubertus Josephina Moors

IPC: G03B27/52 ,  G21K5/00

CPC classification number: G03F7/70958 ,  B82Y10/00 ,  G03F7/70316 ,  G03F7/70891 ,  G03F7/70925 ,  G21K1/062 ,  G21K2201/061 ,  G21K2201/067

Abstract: An optical arrangement, in particular a projection system, illumination system or beam shaping system for EUV lithography, including at least one optical element that is arranged in a beam path of the optical arrangement and that reflects radiation in the soft X-ray- or EUV wavelength range, wherein at least during operation of the optical arrangement at least one of, preferably each of, the reflective optical elements in the beam path, at least at the optical surface, has an operating temperature of approximately 30° C. or more, preferably of approximately 100° C. or more, particularly preferably of approximately 150° C. or more, and even more preferably of approximately 250° C. or more, and wherein the optical design of the at least one reflective optical element is selected such that its optical characteristics are optimised for operation at the operating temperature. Also presented is a method for providing a reflective optical element with such an optical design.

Abstract translation: 一种用于EUV光刻的光学装置，特别是投影系统，照明系统或光束整形系统，包括布置在光学装置的光束路径中并且反射软X射线或EUV中的辐射的至少一个光学元件 波长范围，其中至少在所述光学装置的操作期间，所述光束路径中至少在所述光学表面处的所述反射光学元件中的至少一个优选地各自具有大约30℃或更高的工作温度， 优选为约100℃以上，特别优选为约150℃以上，甚至更优选为约250℃以上，并且其中选择所述至少一个反射型光学元件的光学设计 其光学特性被优化以在操作温度下操作。 还提出了一种用于提供具有这种光学设计的反射光学元件的方法。

公开(公告)号：US07355191B2

公开(公告)日：2008-04-08

申请号：US11288868

申请日：2005-11-28

Applicant: Alexander N. Bykanov ,  William F. Marx

Inventor： Alexander N. Bykanov ,  William F. Marx

IPC: G01J3/10

CPC classification number: G21K1/06 ,  B08B7/0071 ,  B82Y10/00 ,  G01N21/15 ,  G03F7/70916 ,  G03F7/70925 ,  G21K2201/061 ,  G21K2201/064 ,  G21K2201/067 ,  H05G2/001

Abstract: Systems and methods are disclosed for cleaning a chamber window of an extreme ultraviolet (EUV) light source. The window may have an inside surface facing a chamber interior and an opposed outside surface and the light source may generate debris by plasma formation. For the system, a subsystem may be positioned outside the chamber and may be operable to pass energy through the window to heat debris accumulating on the inside surface of the window. In a first embodiment, the subsystem may place a flowing, heated gas in contact with the outside surface of the window. In another embodiment, electromagnetic radiation may be passed through the window.

Abstract translation: 公开了用于清洁极紫外（EUV）光源的室窗的系统和方法。 窗口可以具有面向室内部和相对的外表面的内表面，并且光源可以通过等离子体形成而产生碎屑。 对于该系统，子系统可以定位在室外，并且可操作以将能量传递通过窗口以加热积聚在窗口内表面上的碎屑。 在第一实施例中，子系统可以使流动的加热气体与窗口的外表面接触。 在另一个实施例中，电磁辐射可以通过窗口。

公开(公告)号：US07348565B2

公开(公告)日：2008-03-25

申请号：US11649199

申请日：2007-01-03

Applicant: Hans-Juergen Mann ,  Wolfgang Singer ,  Joerg Schultz ,  Johannes Wangler ,  Karl-Heinz Schuster ,  Udo Dinger ,  Martin Antoni ,  Wilhelm Ulrich

Inventor： Hans-Juergen Mann ,  Wolfgang Singer ,  Joerg Schultz ,  Johannes Wangler ,  Karl-Heinz Schuster ,  Udo Dinger ,  Martin Antoni ,  Wilhelm Ulrich

IPC: G02B27/14 ,  G02B5/30 ,  G02B17/00

CPC classification number: B82Y10/00 ,  G02B13/143 ,  G02B17/0657 ,  G02B17/0663 ,  G03F7/70066 ,  G03F7/70075 ,  G03F7/70083 ,  G03F7/70108 ,  G03F7/70166 ,  G03F7/70175 ,  G03F7/70191 ,  G03F7/702 ,  G03F7/70233 ,  G03F7/70358 ,  G21K1/06 ,  G21K5/00 ,  G21K5/04 ,  G21K2201/061

Abstract: There is provided a projection exposure apparatus for microlithography using a wavelength less than or equal to 193 nm. The apparatus includes an optical element with a pupil raster element, and a projection objective with a real entrance pupil. The optical element is situated in or near a plane defined by the real entrance pupil.

Abstract translation: 提供了使用波长小于或等于193nm的微光刻的投影曝光装置。 该装置包括具有光瞳光栅元件的光学元件和具有真实入射光瞳的投影物镜。 光学元件位于由真正的入射光瞳限定的平面内或附近。

公开(公告)号：US07298822B2

公开(公告)日：2007-11-20

申请号：US11491462

申请日：2006-07-21

Applicant: Reiner Dietsch ,  Thomas Holz

Inventor： Reiner Dietsch ,  Thomas Holz

IPC: G21K1/02

CPC classification number: G21K1/06 ,  B82Y10/00 ,  G21K2201/061 ,  G21K2201/064

Abstract: An X-ray optical element for and influencing of X-ray beam characteristics in two dimensions includes two reflective, curved elements arranged side-by-side to receive X-ray radiation from an X-ray beam source so that the radiation is directed onto both reflective elements and then reflected from one element onto the other element, wherein the two reflective elements are curved at different angles and have different focal lengths.

Abstract translation: 用于并影响X射线光束特性的X射线光学元件在二维中包括并排布置的两个反射弯曲元件，以接收来自X射线束源的X射线辐射，使得辐射被引导到 两个反射元件然后从一个元件反射到另一个元件上，其中两个反射元件以不同的角度弯曲并且具有不同的焦距。

公开(公告)号：US20070158596A1

公开(公告)日：2007-07-12

申请号：US11647007

申请日：2006-12-27

Applicant: I. Oliver ,  William Partlo ,  Igor Fomenkov ,  Alexander Ershov ,  Norbert Bowering ,  John Viatella ,  Dave Myers

Inventor： I. Oliver ,  William Partlo ,  Igor Fomenkov ,  Alexander Ershov ,  Norbert Bowering ,  John Viatella ,  Dave Myers

IPC: G01J3/10

CPC classification number: G03F7/70033 ,  B82Y10/00 ,  G03F7/70175 ,  G03F7/70916 ,  G21K1/062 ,  G21K2201/061 ,  G21K2201/065 ,  G21K2201/067 ,  H05G2/003 ,  H05G2/005 ,  H05G2/006 ,  H05G2/008

Abstract: An apparatus and method is described which may comprise a plasma produced extreme ultraviolet (“EUV”) light source multilayer collector which may comprise a plasma formation chamber; a shell within the plasma formation chamber in the form of a collector shape having a focus; the shell having a sufficient size and thermal mass to carry operating heat away from the multilayer reflector and to radiate the heat from the surface of the shell on a side of the shell opposite from the focus. The material of the shell may comprise a material selected from a group which may comprise silicon carbide, silicon, Zerodur or ULE glass, aluminum, beryllium, molybdenum, copper and nickel. The apparatus and method may comprise at least one radiative heater directed at the shell to maintain the steady state temperature of the shell within a selected range of operating temperatures.

Abstract translation: 描述了可以包括可以包括等离子体形成室的等离子体产生的极紫外（“EUV”）光源多层收集器的装置和方法; 等离子体形成室内的壳体，具有焦点的收集器形状; 壳体具有足够的尺寸和热质量以将工作热量从多层反射器散开，并且在壳体的与焦点相对的一侧上从壳体的表面辐射热量。 壳的材料可以包括选自可以包括碳化硅，硅，Zerodur或ULE玻璃，铝，铍，钼，铜和镍的组的材料。 装置和方法可以包括指向壳体的至少一个辐射加热器，以将壳体的稳态温度维持在所选择的工作温度范围内。