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    Thermally Stable Multilayer Mirror for the Euv Spectral Region
    83.
    发明申请
    Thermally Stable Multilayer Mirror for the Euv Spectral Region 有权
    用于Euv光谱区域的热稳定多层镜

    公开(公告)号：US20080088916A1

    公开(公告)日：2008-04-17

    申请号：US11793322

    申请日：2005-12-23

    Applicant: Nicolas Benoit ,  Torsten Feigl ,  Norbert Kaiser ,  Sergiy Yulin

    Inventor： Nicolas Benoit ,  Torsten Feigl ,  Norbert Kaiser ,  Sergiy Yulin

    IPC: G02B5/09

    CPC classification number: G02B5/0833 ,  B82Y10/00 ,  G02B5/0891 ,  G21K1/062 ,  G21K2201/067

    Abstract: In a multilayer mirror (1) for the reflection of EUV radiation containing a large number of alternating molybdenum layers (4) and silicon layers (3), a barrier layer (5) containing a silicon nitride or a silicon boride is included at a number of interfaces between the molybdenum layers (4) and the silicon layers (3). As a result of the barrier layers (5) of a silicon nitride or of a silicon boride, high thermal stability is achieved, in particular high long-term stability at temperatures of more than 300° C., whilst at the same time achieving high reflectivity in the multilayer mirror. A multilayer mirror (1) of this type can, in particular, be used as a heatable collector mirror for an EUV radiation source.

    Abstract translation: 在用于反射含有大量交替钼层（4）和硅层（3））的EUV辐射的多层反射镜（1）中，包含氮化硅或硼化硅的阻挡层（5）包括在数字 的钼层（4）和硅层（3）之间的界面。 作为氮化硅或硼硅化物的阻挡层（5）的结果，实现了高的热稳定性，特别是在高于300℃的温度下的高长期稳定性，同时达到高 多层反射镜的反射率。 这种类型的多层反射镜（1）特别可以用作EUV辐射源的可加热集光镜。

    Reflection mirror apparatus, exposure apparatus and device manufacturing method
    84.
    发明授权
    Reflection mirror apparatus, exposure apparatus and device manufacturing method 有权
    反射镜装置，曝光装置和装置的制造方法

    公开(公告)号：US07349063B2

    公开(公告)日：2008-03-25

    申请号：US10647376

    申请日：2003-08-26

    Applicant: Yoshikazu Miyajima

    Inventor： Yoshikazu Miyajima

    IPC: G03B27/52 ,  G03B27/42 ,  G03B27/54 ,  G02B7/195

    CPC classification number: G21K1/06 ,  G02B7/1815 ,  G03F7/70175 ,  G03F7/702 ,  G03F7/70233 ,  G03F7/70891 ,  G21K2201/065 ,  G21K2201/067

    Abstract: A reflection mirror apparatus, used in a reflection optical system of an exposure apparatus which performs exposure processing by guiding exposure light by reflection, has a mirror having a reflection surface to reflect the exposure light, and radiation plates for radiation-cooling provided in positions away from an outer surface of the mirror. The radiation plates are provided so as to ensure a passage area for the exposure light incident on and reflected from the reflection surface of the mirror. Further, the respective radiation plates are temperature-controlled by cooling liquid flowing through cooling pipes. Thus the temperature rise of the mirror used in the reflection optical system of the exposure apparatus can be suppressed, and the accuracy of surface form of the mirror reflection surface can be maintained.

    Abstract translation: 用于通过反射引导曝光来进行曝光处理的曝光装置的反射光学系统的反射镜装置具有反射面，以反射曝光光的反射镜和设置在远离位置的辐射冷却用辐射板 从镜子的外表面。 辐射板被设置成确保入射到反射镜的反射表面上并从其反射的曝光光的通过区域。 此外，通过冷却流经冷却管的液体对各个辐射板进行温度控制。 因此，可以抑制在曝光装置的反射光学系统中使用的反射镜的温度升高，并且可以保持镜面反射面的表面形状的精度。

    Reflector rack, fabrication method thereof, and narrow brand x-ray filter and system including same
    86.
    发明授权
    Reflector rack, fabrication method thereof, and narrow brand x-ray filter and system including same 失效
    反射架，其制造方法和窄品牌x射线滤波器及包括其的系统

    公开(公告)号：US07257197B2

    公开(公告)日：2007-08-14

    申请号：US11132305

    申请日：2005-05-19

    Applicant: Yong Min Cho

    Inventor： Yong Min Cho

    IPC: G21K3/00 ,  G02B5/28 ,  G02B5/26

    CPC classification number: G21K1/062 ,  B82Y10/00 ,  G21K1/10 ,  G21K2201/067

    Abstract: A stackable rack may comprise: at least two rails, a cross-section of each rail having a shape resembling a staircase, first step portion of which represents a first surface upon which a reflector can be disposed; and a second step portion of which represents a second surface which can support another rail. A method of making a narrow band x-ray filter may comprise: providing a substrate; and stacking one or more reflection units in succession upon the substrate, each reflection unit including a rack (such as mentioned above) and a reflector held by the rack. An apparatus to produce a substantially narrow band x-ray beam may include such a filter. An apparatus to make an x-ray image of a subject may include: the apparatus to produce a substantially narrow band x-ray beam, e.g., as set forth above, and an x-ray detector arranged to receive the narrow band x-ray.

    Abstract translation: 可堆叠的架可以包括：至少两个轨道，每个轨道的横截面具有类似楼梯的形状，其第一阶梯部分表示可以设置反射器的第一表面; 并且其第二台阶部分表示可以支撑另一轨道的第二表面。 制造窄带x射线滤光器的方法可以包括：提供衬底; 并且将一个或多个反射单元相继地堆叠在基板上，每个反射单元包括机架（如上所述）和由机架保持的反射器。 产生基本上窄带X射线束的装置可以包括这种滤光器。 用于制作受试者的X射线图像的装置可以包括：产生基本上窄带的X射线束的装置，例如如上所述，以及x射线检测器，被布置成接收窄带x射线 。

    EUV light source
    89.
    发明申请
    EUV light source 有权

    公开(公告)号：US20070125970A1

    公开(公告)日：2007-06-07

    申请号：US11646938

    申请日：2006-12-27

    Applicant: Igor Fomenkov ,  Alexander Ershov

    Inventor： Igor Fomenkov ,  Alexander Ershov

    IPC: G01J3/10

    CPC classification number: G03F7/70033 ,  B82Y10/00 ,  G03F7/70175 ,  G03F7/70916 ,  G21K1/062 ,  G21K2201/061 ,  G21K2201/065 ,  G21K2201/067 ,  H05G2/003 ,  H05G2/005 ,  H05G2/006 ,  H05G2/008

    Abstract: An apparatus and method for EUV light production is disclosed which may comprise a laser produced plasma (“LPP”) extreme ultraviolet (“EUV”) light source control system comprising a target delivery system adapted to deliver moving plasma initiation targets and an EUV light collection optic having a focus defining a desired plasma initiation site, comprising: a target tracking and feedback system comprising: at least one imaging device providing as an output an image of a target stream track, wherein the target stream track results from the imaging speed of the camera being too slow to image individual plasma formation targets forming the target stream imaged as the target stream track; a stream track error detector detecting an error in the position of the target stream track in at least one axis generally perpendicular to the target stream track from a desired stream track intersecting the desired plasma initiation site. At least one target crossing detector may be aimed at the target track and detecting the passage of a plasma formation target through a selected point in the target track. A drive laser triggering mechanism utilizing an output of the target crossing detector to determine the timing of a drive laser trigger in order for a drive laser output pulse to intersect the plasma initiation target at a selected plasma initiation site along the target track at generally its closest approach to the desired plasma initiation site. A plasma initiation detector may be aimed at the target track and detecting the location along the target track of a plasma initiation site for a respective target. An intermediate focus illuminator may illuminate an aperture formed at the intermediate focus to image the aperture in the at least one imaging device. The at least one imaging device may be at least two imaging devices each providing an error signal related to the separation of the target track from the vertical centerline axis of the image of the intermediate focus based upon an analysis of the image in the respective one of the at least two imaging devices. A target delivery feedback and control system may comprise a target delivery unit; a target delivery displacement control mechanism displacing the target delivery mechanism at least in an axis corresponding to a first displacement error signal derived from the analysis of the image in the first imaging device and at least in an axis corresponding to a second displacement error signal derived from the analysis of the image in the second imaging device.

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