Abstract:
An ellipsometer for determining thickness and ellipsometric parameters (Ψ and Δ) of a thin film material. The apparatus includes a light source emitting light, a transmitting optical system that has a polarizer, modulator and an optical compensator for conveying polarized modulated light for incidence on a film, and a receiving optical system that has an analyzer and conveys the reflected light to a photodetector device. The apparatus is used for full range measurement of ellipsometric parameters by applying two-phase detection method. It also determines thickness of thin films with a high degree of accuracy.
Abstract:
A photodiode device including a photosensitive diffusion junction within a single layer. The photodiode device further includes a resonant grating located within the single layer. The photosensitive diffusion junction is located within the resonant grating.
Abstract:
In an evaluation device (1), an analyzer (42) is rotated so that the azimuth of the transmission axis of the analyzer (42) has an inclination angle of 90 degrees±3 degrees with respect to the transmission axis of a polarizer (32), an imaging camera (44) captures a regularly reflected image of a wafer (10) under each condition, and an image processing unit (50) evaluates the shape of a repeating pattern and detects dose defects and focus defects on the basis of the two images of the wafer (10) captured by the imaging camera (44).
Abstract:
A polarimeter based on coherent detection and a method for measuring the optical rotation of a polarized light beam by an optically active substance, while enabling the subtraction of background signals, are provided.
Abstract:
A lithographic apparatus includes an illumination system configured to condition a radiation beam; a polarization sensor configured at least in part to couple to a reticle stage, wherein components of the reticle polarization sensor can be loaded and unloaded in the lithographic apparatus in the manner used for conventional reticles. In one configuration an active reticle tool includes a rotatable retarder configured to vary the retardation applied to polarized light received from a field point in the illumination system. In another configuration, a passive reticle tool is configured as an array of polarization sensor modules, where the amount of retardation applied to received light by fixed retarders varies according to position of the polarization sensor module. Accordingly, a plurality of retardation conditions for light received at a given field point can be measured, wherein a complete determination of a polarization state of the light at the given field point can be determined. In another configuration, the polarization sensor is configured to measure the effect of a projection lens on a polarization state of light passing through the projection lens.
Abstract:
The subject of the invention is a polarimetric imaging system exhibiting an optical axis, and comprising means (35) for the detection and analysis of the light backscattered by an object illuminated by a light source and at least one programmable waveplate (33), wherein the programmable waveplate comprises a material with an isotropic electrooptic tensor and a set of at least three electrodes disposed along the directions parallel to the optical axis of the imaging system.
Abstract:
A reading machine includes an image input device including a lens and a polarizer disposed over the lens, a flash and a second polarizer disposed over the flash. The image input device also includes a computing device coupled to the image input device for capturing images, the computing device, including a processor to execute instructions and a computer program product residing on a computer readable medium, the computer program product comprising instructions for causing the processor to process the captured images to recognize features in the captured images.
Abstract:
A surface inspection apparatus (100) comprises a light (10) source for emitting a light beam L0, an optical illumination system (30) for projecting the light beam on an inspected surface (220) formed by a film 210, an optical detection system (50) having lenses to spatially split reflection lights and an aperture stop (60) having apertures disposed with polarization elements (61–64) for transilluminating mutually different polarized light components, a light intensity detection device (41–44) for individually detecting the light intensities of the respective reflection lights passed through the respective polarization elements, a scanning device (20), and an arithmetic processing device (70) for detecting the polarization conditions of the respective reflection lights and obtaining a film thickness of the film and at least one of the physical properties of the film.
Abstract:
The present invention relates to a multi-energy system that generates and/or forms images of targets/structures by applying Mueller matrix imaging principles and/or Stokes polarimetric parameter imaging principles to data obtained by the multi-energy system. In one embodiment, the present invention utilizes at least one energy or light source to generate two or more Mueller matrix and/or Stokes polarization parameters images of a target/structure, and evaluates the Mueller matrix/Stokes polarization parameters multi-spectral difference(s) between the two or more images of the target/structure. As a result, high contrast, high specificity images can be obtained. Additional information can be obtained by and/or from the present invention through the application of image, Mueller matrix decomposition, and/or image reconstruction techniques that operate directly on the Mueller matrix and/or Stokes polarization parameters.
Abstract:
A variably-polarizing optical probe assembly. The assembly includes an optical probe having one or more optical light delivery channels that emit incident light from the sample end of the probe toward a sample being investigated, and one or more optical light-receiving channels that receive incident light from the sample. A variably-polarizing substrate assembly is coupled to the sample end of the probe. The substrate assembly includes an optically transmitting substrate and one or more discrete polarizer areas on a face of the substrate, each such polarizer area defining a polarization orientation, with the polarizer areas together defining one or more different polarization orientations. The substrate assembly is arranged relative to the probe such that one polarizer area covers at least one light delivery channel and one polarizer area covers at least one light-receiving channel.