公开(公告)号：US09305740B2

公开(公告)日：2016-04-05

申请号：US13920284

申请日：2013-06-18

Applicant: Jürgen Frosien ,  Benjamin John Cook

Inventor： Jürgen Frosien ,  Benjamin John Cook

IPC: H01J37/04 ,  H01J37/147 ,  H01J37/153 ,  H01J37/26

CPC classification number: H01J37/045 ,  H01J37/1478 ,  H01J37/153 ,  H01J37/263 ,  H01J2237/1534 ,  H01J2237/281 ,  H01J2237/2815

Abstract: A charged particle beam device is described. In one aspect, the charged particle beam device includes a charged particle beam source, and a switchable multi-aperture for generating two or more beam bundles from a charged particle beam which includes: two or more aperture openings, wherein each of the two or more aperture openings is provided for generating a corresponding beam bundle of the two or more beam bundles; a beam blanker arrangement configured for individually blanking the two or more beam bundles; and a stopping aperture for blocking beam bundles. The device further includes a control unit configured to control the individual blanking of the two or more beam bundles for switching of the switchable multi-aperture and an objective lens configured for focusing the two or more beam bundles on a specimen or wafer.

Abstract translation: 描述带电粒子束装置。 一方面，带电粒子束装置包括带电粒子束源和用于从带电粒子束产生两束或更多束束的可切换多孔，该多束光束包括：两个或更多孔径开口，其中两个或更多个 提供孔径开口以产生两个或更多束束的相应束束; 束消除器配置，其被配置为单独地消隐所述两个或更多个束束; 以及用于阻挡束束的止动孔。 该装置还包括控制单元，该控制单元被配置为控制用于切换可切换多孔的两个或更多束束的单独消隐，以及被配置用于将两束或更多束束聚焦在样本或晶片上的物镜。

公开(公告)号：US20140367586A1

公开(公告)日：2014-12-18

申请号：US13920284

申请日：2013-06-18

Applicant: Jürgen FROSIEN ,  Benjamin John COOK

Inventor： Jürgen FROSIEN ,  Benjamin John COOK

IPC: H01J37/04

CPC classification number: H01J37/045 ,  H01J37/1478 ,  H01J37/153 ,  H01J37/263 ,  H01J2237/1534 ,  H01J2237/281 ,  H01J2237/2815

Abstract: A charged particle beam device is described. In one aspect, the charged particle beam device includes a charged particle beam source, and a switchable multi-aperture for generating two or more beam bundles from a charged particle beam which includes: two or more aperture openings, wherein each of the two or more aperture openings is provided for generating a corresponding beam bundle of the two or more beam bundles; a beam blanker arrangement configured for individually blanking the two or more beam bundles; and a stopping aperture for blocking beam bundles. The device further includes a control unit configured to control the individual blanking of the two or more beam bundles for switching of the switchable multi-aperture and an objective lens configured for focusing the two or more beam bundles on a specimen or wafer.

Abstract translation: 描述带电粒子束装置。 一方面，带电粒子束装置包括带电粒子束源和用于从带电粒子束产生两个或更多个束束的可切换多孔，其包括：两个或更多个孔口，其中两个或更多个 提供孔径开口以产生两个或更多束束的相应束束; 束消除器配置，其被配置为单独地消隐所述两个或更多个束束; 以及用于阻挡束束的止动孔。 该装置还包括控制单元，该控制单元被配置为控制用于切换可切换多孔的两个或更多束束的单独消隐，以及被配置用于将两束或更多束束聚焦在样本或晶片上的物镜。

公开(公告)号：US08569712B2

公开(公告)日：2013-10-29

申请号：US13269385

申请日：2011-10-07

Applicant: Guido Martinus Henricus Knippels ,  Fredericus Bernardus Kiewiet ,  Hendrik Nicolaas Slingerland ,  Pieter Kruit ,  Benjamin John Cook ,  Jacques Nonhebel

Inventor： Guido Martinus Henricus Knippels ,  Fredericus Bernardus Kiewiet ,  Hendrik Nicolaas Slingerland ,  Pieter Kruit ,  Benjamin John Cook ,  Jacques Nonhebel

IPC: G21K1/08

CPC classification number: H01J37/045 ,  H01J2237/0432

Abstract: The invention relates to an electrostatic beam blanker for a particle-optical apparatus, in which the blanker is used to generate a train of pulses with a fixed repetition rate. Such pulse trains with a sub-picosecond pulse length are for example used in the study of chemistry in the femtosecond scale.The beam blanker according to the invention uses a resonant structure, as a result of which the voltage is amplified by the quality factor Q of the resonant structure. During each zero-crossing of the signal, thus twice per period of the resonant frequency, the beam is transmitted, and the beam is blanked during the rest of the time. In a preferred embodiment the resonant structure comprises a transmission line. Impedance matching of signal source and resonant structure may be performed by tuning stubs.

Abstract translation: 本发明涉及一种用于粒子光学装置的静电束消除器，其中消隐器用于产生具有固定重复率的脉冲串。 例如，在飞秒级的化学研究中使用了具有亚皮秒脉冲长度的脉冲序列。 根据本发明的光束消除器使用谐振结构，其结果是电压被谐振结构的质量因子Q放大。 在信号的每个过零期间，因此每个谐振频率的周期是两次，波束被传输，并且光束在剩余的时间内被消隐。 在优选实施例中，谐振结构包括传输线。 信号源和谐振结构的阻抗匹配可以通过调谐短截线进行。

公开(公告)号：US20120261586A1

公开(公告)日：2012-10-18

申请号：US13269385

申请日：2011-10-07

Applicant: Guido Martinus Henricus Knippels ,  Fredericus Bernardus Kiewiet ,  Hendrik Nicolaas Slingerland ,  Pieter Kruit ,  Benjamin John Cook ,  Jacques Nonhebel

Inventor： Guido Martinus Henricus Knippels ,  Fredericus Bernardus Kiewiet ,  Hendrik Nicolaas Slingerland ,  Pieter Kruit ,  Benjamin John Cook ,  Jacques Nonhebel

IPC: H01J3/26

CPC classification number: H01J37/045 ,  H01J2237/0432

Abstract: The invention relates to an electrostatic beam blanker for a particle-optical apparatus, in which the blanker is used to generate a train of pulses with a fixed repetition rate. Such pulse trains with a sub-picosecond pulse length are for example used in the study of chemistry in the femtosecond scale.The beam blanker according to the invention uses a resonant structure, as a result of which the voltage is amplified by the quality factor Q of the resonant structure. During each zero-crossing of the signal, thus twice per period of the resonant frequency, the beam is transmitted, and the beam is blanked during the rest of the time. In a preferred embodiment the resonant structure comprises a transmission line. Impedance matching of signal source and resonant structure may be performed by tuning stubs.

Abstract translation: 本发明涉及一种用于粒子光学装置的静电束消除器，其中消隐器用于产生具有固定重复率的脉冲串。 例如，在飞秒级的化学研究中使用了具有亚皮秒脉冲长度的脉冲序列。 根据本发明的光束消除器使用谐振结构，其结果是电压被谐振结构的质量因子Q放大。 在信号的每个过零期间，因此每个谐振频率的周期是两次，波束被传输，并且光束在剩余的时间内被消隐。 在优选实施例中，谐振结构包括传输线。 信号源和谐振结构的阻抗匹配可以通过调谐短截线进行。