公开(公告)号：US08198793B2

公开(公告)日：2012-06-12

申请号：US12411797

申请日：2009-03-26

Applicant: Fu-Ching Tung ,  Tean-Mu Shen ,  Jung-Chen Ho ,  Pei-Shan Wu ,  Chia-Ming Chen ,  Kuan-Chou Chen ,  Jung-Chen Chien ,  Muh-Wang Liang

Inventor： Fu-Ching Tung ,  Tean-Mu Shen ,  Jung-Chen Ho ,  Pei-Shan Wu ,  Chia-Ming Chen ,  Kuan-Chou Chen ,  Jung-Chen Chien ,  Muh-Wang Liang

IPC: H01J17/26

CPC classification number: H01J37/32449 ,  H01J37/3244

Abstract: A cathode discharge device is provided. The cathode discharge apparatus includes an anode, a cathode and plural cathode chambers. The cathode is located inside the anode, where the cathode has plural flow channels and at least one flow channel hole, and the plural flow channels are connected to one another through the flow channel hole. The plural cathode chambers are located inside the cathode, wherein each of the cathode chambers has a chamber outlet and a chamber inlet connected with at least one of the flow channels.

Abstract translation: 提供阴极放电装置。 阴极放电装置包括阳极，阴极和多个阴极室。 阴极位于阳极的内部，其中阴极具有多个流动通道和至少一个流动通道孔，并且多个流动通道通过流动通道孔相互连接。 多个阴极室位于阴极内，其中每个阴极室具有腔室出口和与至少一个流动通道连接的室入口。

公开(公告)号：US20120132366A1

公开(公告)日：2012-05-31

申请号：US13157878

申请日：2011-06-10

Applicant: Pei-Shan Wu ,  Fu-Ching Tung ,  Jung-Chen Ho ,  Tean-Mu Shen ,  Chia-Ming Chen

Inventor： Pei-Shan Wu ,  Fu-Ching Tung ,  Jung-Chen Ho ,  Tean-Mu Shen ,  Chia-Ming Chen

IPC: C23F1/08 ,  C23C16/50 ,  C23C16/455

CPC classification number: H01J37/3244 ,  C23C16/45565 ,  C23C16/45574 ,  C23C16/45578 ,  C23C16/50 ,  C23C16/513 ,  H01J37/32357

Abstract: A plasma processing apparatus is disclosed, which includes: a cathode module comprising a plurality of first channels which generate plasma; an anode having a chamber which contains the cathode and having at least one plasma outlet corresponding to the first channels; an electrode connected to a high-frequency electrical power and the cathode; and a plurality of second channels penetrating through the anode; wherein each first channel and each second channel are disposed alternately. A first gas is introduced into the first channels ionized under high frequency electrical power. In the first channels, the free electrons collided brings high density of plasma. The generated plasma is expelled through the plasma outlet to form a plasma diffusion region. A second gas is introduced into the plasma diffusion region through the second channels to take part in the reaction of plasma.

Abstract translation: 公开了一种等离子体处理装置，其包括：阴极模块，包括产生等离子体的多个第一通道; 阳极，其具有容纳阴极并具有至少一个对应于第一通道的等离子体出口的室; 连接到高频电源的电极和阴极; 和穿过阳极的多个第二通道; 其中每个第一通道和每个第二通道交替设置。 将第一气体引入到在高频电力下离子化的第一通道。 在第一个通道中，自由电子碰撞带来了高密度的等离子体。 产生的等离子体通过等离子体出口排出以形成等离子体扩散区域。 通过第二通道将第二气体引入等离子体扩散区域以参与等离子体的反应。

公开(公告)号：US08146923B2

公开(公告)日：2012-04-03

申请号：US12615811

申请日：2009-11-10

Applicant: Kuan-Chou Chen ,  Fu-Ching Tung ,  Chia-Ming Chen ,  Pei-Shan Wu ,  Tean-Mu Shen ,  Jung-Chen Ho

Inventor： Kuan-Chou Chen ,  Fu-Ching Tung ,  Chia-Ming Chen ,  Pei-Shan Wu ,  Tean-Mu Shen ,  Jung-Chen Ho

IPC: F16J15/54

CPC classification number: F16C33/76 ,  F16C2300/62 ,  Y10S277/913

Abstract: A vacuum apparatus of rotary motion entry is disclosed, which comprises: a shaft sleeve, disposed on a cavity wall of a vacuum system; a rotary shaft, ensheathed by the shaft sleeve; and a transmission set, connected to the rotary shaft for driving the same; wherein, the rotary shaft is disposed passing through a hole formed on the base of the shaft sleeve while there are a first bearing, a second bearing, a sealing ring and a shaft seal being arranged separately inside the hole. Moreover, the shaft seal has a flake-like lip flange formed extending toward the center of the hole, that is capable of being extended away from the vacuum system by the inserting of the rotary shaft into the hole, and thereby, enabling the lip flange to engage with the rotary shaft tightly by the atmospheric pressure and thus isolating the outside world from the vacuum system.

Abstract translation: 公开了一种旋转运动进入的真空装置，其包括：设置在真空系统的空腔壁上的轴套; 旋转轴，由轴套套管; 以及与驱动该旋转轴的旋转轴连接的变速器组; 其特征在于，所述旋转轴设置成穿过形成在所述轴套的基部上的孔，同时在所述孔内分开设置有第一轴承，第二轴承，密封环和轴密封件。 此外，轴密封件具有形成为朝向孔中心延伸的片状唇缘凸缘，其能够通过将旋转轴插入孔而远离真空系统延伸，从而使得唇缘凸缘 与大气压力紧密地与旋转轴啮合，从而将外界与真空系统隔离开来。

公开(公告)号：US20110195186A1

公开(公告)日：2011-08-11

申请号：US13024010

申请日：2011-02-09

Applicant: Chien-Chih Chen ,  Ching-Chiun Wang ,  Ching-Huei Wu ,  Fu-Ching Tung

Inventor： Chien-Chih Chen ,  Ching-Chiun Wang ,  Ching-Huei Wu ,  Fu-Ching Tung

IPC: C23C16/44 ,  C23C16/00

CPC classification number: C23C14/56 ,  C23C14/24 ,  C23C14/246

Abstract: A manufacturing method and system using a plane-type film continuous evaporation source are disclosed, in which the manufacturing method comprises the steps of: providing a plane-type film continuous evaporation source, being a substrate having at least one evaporation material coated on a surface thereof while distributing the at least one evaporation material in a specific area of the substrate capable of covering all the plates to be processed by the evaporated evaporation material; arranging a heater inside the specific area to be used for enabling the at least one evaporation material to evaporate and thus spreading toward the processed plates. Thereby, the evaporated evaporation material can be controlled at the molecular/atomic level for enabling the same to form a film according to surface-nucleation, condensation and growth with superior evenness, nano-scale adjustability, specialized structure and function that can not be achieve by the films from conventional spray coating means.

Abstract translation: 公开了一种使用平面型膜连续蒸发源的制造方法和系统，其中制造方法包括以下步骤：提供平面型膜连续蒸发源，其为具有涂覆在表面上的至少一种蒸镀材料的基材 同时在衬底的特定区域中分配至少一种蒸发材料，其能够通过蒸发的蒸发材料覆盖待处理的所有板; 在特定区域内布置加热器以用于使至少一种蒸发材料蒸发并因此向加工板铺展。 因此，可以将蒸发的蒸发材料控制在分子/原子水平，以使其能够根据表面成核，冷凝和生长形成具有优异的均匀性，纳米级可调性，专门的结构和功能的薄膜，其不能实现 通过常规喷涂方式的薄膜。

公开(公告)号：US20100164381A1

公开(公告)日：2010-07-01

申请号：US12470776

申请日：2009-05-22

Applicant: CHIH-CHEN CHANG ,  TUNG-CHUAN WU ,  CHAN-HSING LO ,  CHING-HUEI WU ,  MUH-WANG LIANG ,  FU-CHING TUNG ,  SHIH-CHIN LIN ,  JEN-RONG HUANG

Inventor： CHIH-CHEN CHANG ,  TUNG-CHUAN WU ,  CHAN-HSING LO ,  CHING-HUEI WU ,  MUH-WANG LIANG ,  FU-CHING TUNG ,  SHIH-CHIN LIN ,  JEN-RONG HUANG

IPC: H05H1/46

CPC classification number: H05H1/46 ,  H01J37/32192 ,  H01J37/32229

Abstract: A long linear-type microwave plasma source using a variably-reduced-height rectangular waveguide as the plasma reactor has been developed. Microwave power is fed from the both sides of the waveguide and is coupled into plasma through a long slot cut on the broad side of the waveguide. The reduced height of the waveguide is variable in order to control the coupling between microwave and plasma so that the plasma uniformity can remain a high quality when extending the length of the linear-type plasma source.

Abstract translation: 已经开发了使用可变降低高度的矩形波导作为等离子体反应器的长线性型微波等离子体源。 微波功率从波导的两侧馈送，并通过在波导的宽侧切割的长槽耦合到等离子体中。 波导的降低的高度是可变的，以便控制微波和等离子体之间的耦合，使得当延伸线性型等离子体源的长度时，等离子体均匀性可以保持高质量。

公开(公告)号：US07615636B2

公开(公告)日：2009-11-10

申请号：US11939559

申请日：2007-11-14

Applicant: Ching-Yen Wei ,  Chao-Ining Yu ,  Fu-Ching Tung ,  Yun Chi ,  Hsing-Yi Chen ,  I-Hui Lin

Inventor： Ching-Yen Wei ,  Chao-Ining Yu ,  Fu-Ching Tung ,  Yun Chi ,  Hsing-Yi Chen ,  I-Hui Lin

IPC: C07F15/00 ,  H01L31/00

CPC classification number: C07D401/14 ,  C07F15/0053 ,  C09B57/10 ,  H01G9/2031 ,  H01G9/2059 ,  H01L51/0086 ,  Y02E10/542 ,  Y02E10/549

Abstract: A ruthenium complex is provided. The ruthenium complex is represented by the following Formula (I): in which, X is a monodentate anion ligand, R1, R2, R4 and R5 are the same or different substituents and represent alkyl, alkoxy, aminoalkyl, haloalkanes or substituted phenyl group, carboxylic acid group or acid radical salt thereof, sulfonic acid group or acid radical salt thereof, phosphoric acid group or acid radical salt thereof or hydrogen atom. R3 represents perhalogenated alkyl group, alkoxy, alkyl, amino, halogens, or hydrogen atom. The ruthenium complexes are suitable for being used as dye-sensitizers for fabricating dye-sensitized solar cells.

Abstract translation: 提供钌络合物。 钌络合物由下式（I）表示：其中X是单齿阴离子配体，R1，R2，R4和R5是相同或不同的取代基，代表烷基，烷氧基，氨基烷基，卤代烷基或取代的苯基， 羧酸基或其酸基盐，磺酸基或其酸酐盐，磷酸基或其酸酐盐或氢原子。 R3表示全卤代烷基，烷氧基，烷基，氨基，卤素或氢原子。 钌配合物适用于染料敏化剂制造染料敏化太阳能电池。

公开(公告)号：US06712926B2

公开(公告)日：2004-03-30

申请号：US10055993

申请日：2002-01-28

Applicant: Yuan-Yuan Chiang ,  Fu-Ching Tung ,  Janathan Wang ,  Peter L. Mahneke

Inventor： Yuan-Yuan Chiang ,  Fu-Ching Tung ,  Janathan Wang ,  Peter L. Mahneke

IPC: B05C1108

CPC classification number: H01L21/67017

Abstract: The present invention describes a chemical solution recycling apparatus in a spin etching and cleaning process chamber for manufacturing semiconductor devices. Modification of the exterior dimension and the main structure of the process chamber is not necessary. The recycling apparatus in accordance with the present invention may separate different chemical solutions into different vessels and recycle them thereafter. The recycling apparatus comprises a recycling ring moving up and down to collect the solution and a recycling circular tray for sorting the chemical solutions in different trenches and drains. Therefore, the chemical solutions may be collected by assigned vessels or may be recycled into the process chamber after necessary quality inspections.

Abstract translation: 本发明描述了用于制造半导体器件的旋转蚀刻和清洁处理室中的化学溶液回收设备。 改进外部尺寸和处理室的主要结构是不必要的。 根据本发明的回收设备可以将不同的化学溶液分离成不同的容器，然后再循环使用。 回收设备包括上下移动以收集溶液的回收环和用于将不同沟槽和排水沟中的化学溶液分类的回收圆形托盘。 因此，化学溶液可以由指定的容器收集，或者可以在进行必要的质量检查后再循环到处理室中。

公开(公告)号：US07721673B2

公开(公告)日：2010-05-25

申请号：US11700023

申请日：2007-01-31

Applicant: Chen-Chung Du ,  Ming-Tung Chiang ,  Fu-Ching Tung ,  Chin-Feng Cheng ,  Tean-Mu Shen

Inventor： Chen-Chung Du ,  Ming-Tung Chiang ,  Fu-Ching Tung ,  Chin-Feng Cheng ,  Tean-Mu Shen

IPC: C23C16/00 ,  C23F1/00 ,  H01L21/306

CPC classification number: H01J37/3244 ,  H01J37/32009 ,  H01J37/32596

Abstract: The present invention provides a hollow cathode discharging apparatus including a hollow anode electrode, a hollow cathode electrode insulatedly fixed in the hollow anode electrode, a gas distribution pipe fixed in the hollow cathode electrode. The hollow anode electrode and the hollow cathode electrode are formed with anode openings and cathode openings respectively. Defined by the gas distribution pipe and the hollow cathode electrode and along the axis thereof is a spiral pathway winding through the cathode openings, so as to form a plurality of continuous and communicated reaction chambers. The gas distribution pipe is disposed with gas separation apertures communicated and adapted to introduce a reactive gas into the reaction chambers. The communicated reaction chambers enable uniform distribution of the reactive gas and thereby facilitate scale-up of the apparatus in axial. Accordingly, the present invention overcomes drawbacks of the prior art.

Abstract translation: 本发明提供一种中空阴极喷射装置，其包括中空阳极电极，绝缘地固定在中空阳极电极中的中空阴极电极，固定在中空阴极电极中的气体分配管。 中空阳极电极和中空阴极电极分别形成有阳极开口和阴极开口。 由气体分配管和空心阴极电极及其轴线限定为通过阴极开口卷绕的螺旋路径，以形成多个连续且连通的反应室。 气体分配管设置有连通并适于将反应性气体引入反应室的气体分离孔。 所传送的反应室能够均匀分布反应气体，从而有助于装置在轴向上放大。 因此，本发明克服了现有技术的缺陷。

公开(公告)号：US07597186B2

公开(公告)日：2009-10-06

申请号：US11616252

申请日：2006-12-26

Applicant: Yun-Sheng Chung ,  Fu-Ching Tung ,  Hsin-Hung Huang

Inventor： Yun-Sheng Chung ,  Fu-Ching Tung ,  Hsin-Hung Huang

IPC: B65G35/00

CPC classification number: G03G15/6529 ,  B65G54/02

Abstract: A substrate transport device includes a chamber, a rotary wheel, a first magnet, a carrier, and a second magnet. The rotary wheel is disposed outside the chamber. The first magnet is disposed on the rotary wheel. The carrier is disposed in the chamber. The second magnet is disposed on the carrier.

Abstract translation: 基板输送装置包括室，旋转轮，第一磁体，载体和第二磁体。 旋转轮设置在室外。 第一磁铁设置在旋转轮上。 载体设置在腔室中。 第二磁体设置在载体上。

公开(公告)号：US20080106202A1

公开(公告)日：2008-05-08

申请号：US11700023

申请日：2007-01-31

Applicant: Chen-Chung Du ,  Ming-Tung Chiang ,  Fu-Ching Tung ,  Chin-Feng Cheng ,  Tean-Mu Shen

Inventor： Chen-Chung Du ,  Ming-Tung Chiang ,  Fu-Ching Tung ,  Chin-Feng Cheng ,  Tean-Mu Shen

IPC: H01J61/09

CPC classification number: H01J37/3244 ,  H01J37/32009 ,  H01J37/32596

Abstract: The present invention provides a hollow cathode discharging apparatus including a hollow anode electrode, a hollow cathode electrode insulatedly fixed in the hollow anode electrode, a gas distribution pipe fixed in the hollow cathode electrode. The hollow anode electrode and the hollow cathode electrode are formed with anode openings and cathode openings respectively. Defined by the gas distribution pipe and the hollow cathode electrode and along the axis thereof is a spiral pathway winding through the cathode openings, so as to form a plurality of continuous and communicated reaction chambers. The gas distribution pipe is disposed with gas separation apertures communicated and adapted to introduce a reactive gas into the reaction chambers. The communicated reaction chambers enable uniform distribution of the reactive gas and thereby facilitate scale-up of the apparatus in axial. Accordingly, the present invention overcomes drawbacks of the prior art.

Abstract translation: 本发明提供一种中空阴极喷射装置，其包括中空阳极电极，绝缘地固定在中空阳极电极中的中空阴极电极，固定在中空阴极电极中的气体分配管。 中空阳极电极和中空阴极电极分别形成有阳极开口和阴极开口。 由气体分配管和空心阴极电极及其轴线限定为通过阴极开口卷绕的螺旋路径，以形成多个连续且连通的反应室。 气体分配管设置有连通并适于将反应性气体引入反应室的气体分离孔。 所传送的反应室能够均匀分布反应气体，从而有助于装置在轴向上放大。 因此，本发明克服了现有技术的缺陷。