公开(公告)号：US06664737B1

公开(公告)日：2003-12-16

申请号：US10064219

申请日：2002-06-21

Applicant: Ivan Berry ,  Alan C. Janos ,  Michael Bruce Colson

Inventor： Ivan Berry ,  Alan C. Janos ,  Michael Bruce Colson

IPC: H01J724

CPC classification number: H01J37/32009

Abstract: A dielectric barrier discharge apparatus for treating a substrate includes a first planar electrode; a dielectric layer disposed on a surface of the first planar electrode; a porous planar electrode spaced above and in a parallel plane with the dielectric layer, wherein the porous planar electrode has a geometric transmission factor greater than 70 percent; and a power supply in electrical communication with the first electrode and the second electrode. A process for treating a substrate includes exposing the substrate surface to reactants produced by the dielectric barrier discharge apparatus.

Abstract translation: 用于处理衬底的电介质阻挡层放电装置包括：第一平面电极; 设置在所述第一平面电极的表面上的电介质层; 多孔平面电极与电介质层隔开并平行于其间，其中多孔平面电极具有大于70％的几何透过系数; 以及与第一电极和第二电极电连通的电源。 用于处理基板的方法包括将基板表面暴露于由电介质阻挡放电装置产生的反应物。

公开(公告)号：US07338575B2

公开(公告)日：2008-03-04

申请号：US10937946

申请日：2004-09-10

Applicant: Richard E. Pingree, Jr. ,  Michael Bruce Colson ,  Michael Silbert

Inventor： Richard E. Pingree, Jr. ,  Michael Bruce Colson ,  Michael Silbert

IPC: C23C16/00 ,  C23F1/00 ,  H01L21/306

CPC classification number: H01J37/32357 ,  C09K5/10 ,  H01J37/32192 ,  H05H1/46

Abstract: A process and apparatus for cooling a plasma tube generally includes flowing a hydrocarbon dielectric heat transfer fluid into a space defined by the plasma tube and a concentric tube surrounding the plasma tube. In one embodiment, the hydrocarbon fluid is selected to have a dissipation factor less than 0.002 and a thermal efficiency coefficient greater than or equal to 1.30 kJ/kg*K.

Abstract translation: 用于冷却等离子体管的方法和装置通常包括将烃介电传热流体流入由等离子体管和围绕等离子体管的同心管限定的空间。 在一个实施例中，烃流体被选择为具有小于0.002的耗散因数和大于或等于1.30kJ / kg * K的热效率系数。

公开(公告)号：US06796711B2

公开(公告)日：2004-09-28

申请号：US10113554

申请日：2002-03-29

Applicant: Michael Bruce Colson ,  Aseem Kumar Srivastava

Inventor： Michael Bruce Colson ,  Aseem Kumar Srivastava

IPC: G01K706

CPC classification number: G01K1/143

Abstract: A contact measurement probe for measuring a temperature of a substrate in a process environment includes a probe head having a contact surface made of a ceramic material or a polymeric material for contacting the substrate. The contact measurement probe eliminates electrical biasing effects in process environments that include an ion source, thereby providing greater accuracy and reproducibility in temperature measurement.

Abstract translation: 用于在工艺环境中测量衬底的温度的接触式测量探头包括具有由陶瓷材料制成的接触表面的探头或用于接触衬底的聚合材料。 接触式测量探头消除了包括离子源在内的工艺环境中的电气偏置效应，从而在温度测量中提供更高的精度和重复性。