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    Developing apparatus and developing method
    1.
    发明授权
    Developing apparatus and developing method 有权
    开发设备和开发方法

    公开(公告)号：US09195140B2

    公开(公告)日：2015-11-24

    申请号：US13053946

    申请日：2011-03-22

    Applicant: Tsuyoshi Mitsuhashi ,  Kenji Sugimoto

    Inventor： Tsuyoshi Mitsuhashi ,  Kenji Sugimoto

    IPC: G03D5/00 ,  G03F7/30 ,  H01L21/67

    CPC classification number: G03F7/3021 ,  H01L21/67051 ,  H01L21/67253

    Abstract: A joint nozzle that delivers a developer, a rinsing liquid and nitrogen gas is disposed adjacent the spin center of a substrate in plan view. A controller operates electromagnetic switch valves to continue supply of the developer, while spinning the substrate, in a developing process, and to start supply of the rinsing liquid in a rinsing process, immediately after the supply of the developer ends, thereby achieving a shortened period of the developing process. A switching is made to a drying process by starting supply of the nitrogen gas immediately after completion of the rinsing process. Thus, even if the substrate has a large angle of contact, formation of droplets of the rinsing liquid is inhibited to prevent post-develop defects.

    Abstract translation: 在平面图中，与基板的旋转中心相邻地设置输送显影剂，冲洗液和氮气的接合喷嘴。 控制器在显影过程中操作电磁切换阀以继续供应显影剂，同时旋转基底，并且在显影剂供应结束后立即在漂洗过程中开始供应冲洗液，从而实现缩短的周期 的发展过程。 通过在完成漂洗处理之后立即开始供应氮气，进行干燥过程的切换。 因此，即使基板具有大的接触角，也可以抑制漂洗液的液滴的形成，防止显影后的缺陷。

    Substrate processing apparatus and substrate processing method
    2.
    发明授权
    Substrate processing apparatus and substrate processing method 有权
    基板加工装置及基板处理方法

    公开(公告)号：US08585830B2

    公开(公告)日：2013-11-19

    申请号：US12698870

    申请日：2010-02-02

    Applicant: Shuichi Yasuda ,  Masashi Kanaoka ,  Koji Kaneyama ,  Tadashi Miyagi ,  Kazuhito Shigemori ,  Toru Asano ,  Yukio Toriyama ,  Takashi Taguchi ,  Tsuyoshi Mitsuhashi ,  Tsuyoshi Okumura

    Inventor： Shuichi Yasuda ,  Masashi Kanaoka ,  Koji Kaneyama ,  Tadashi Miyagi ,  Kazuhito Shigemori ,  Toru Asano ,  Yukio Toriyama ,  Takashi Taguchi ,  Tsuyoshi Mitsuhashi ,  Tsuyoshi Okumura

    IPC: B08B3/00 ,  H01L21/31 ,  G03F7/00 ,  G03F1/00

    CPC classification number: G03F7/70991 ,  G03F7/70341

    Abstract: A method of processing a substrate in a substrate processing apparatus that is arranged adjacent to an exposure device and includes first, second and third processing units, includes the steps of: forming a photosensitive film made of a photosensitive material on the substrate by said first processing unit before exposure processing by said exposure device. The method also includes applying washing processing to the substrate by said second processing unit after the formation of said photosensitive film by said first processing unit and before the exposure processing by said exposure device and transporting the substrate after the washing processing to said exposure device. The method further includes transporting the substrate from said exposure device and applying development processing by said third processing unit to the substrate transported after the exposure processing by said exposure device.

    Abstract translation: 一种在与曝光装置相邻并且包括第一，第二和第三处理单元的基板处理装置中处理基板的方法，包括以下步骤：通过所述第一处理在基板上形成由感光材料制成的感光膜 所述曝光装置进行曝光处理之前的单元。 该方法还包括在由所述第一处理单元形成所述感光膜之后并且在所述曝光装置进行曝光处理之前，通过所述第二处理单元对所述基板进行洗涤处理，并将所述基板在所述清洗处理之后传送到所述曝光装置。 所述方法还包括从所述曝光装置运送所述基板并将所述第三处理单元的显影处理应用于由所述曝光装置进行曝光处理之后运送的所述基板。

    Substrate treating apparatus with inter-unit buffers
    3.
    发明授权
    Substrate treating apparatus with inter-unit buffers 有权
    具有单位间缓冲液的基板处理装置

    公开(公告)号：US08545118B2

    公开(公告)日：2013-10-01

    申请号：US12324794

    申请日：2008-11-26

    Applicant: Hiroyuki Ogura ,  Tsuyoshi Mitsuhashi ,  Yoshiteru Fukutomi ,  Kenya Morinishi ,  Yasuo Kawamatsu ,  Hiromichi Nagashima

    Inventor： Hiroyuki Ogura ,  Tsuyoshi Mitsuhashi ,  Yoshiteru Fukutomi ,  Kenya Morinishi ,  Yasuo Kawamatsu ,  Hiromichi Nagashima

    IPC: G03D5/00

    CPC classification number: B05C13/00 ,  H01L21/67196 ,  H01L21/67201 ,  H01L21/67225

    Abstract: The invention provides coating units, heat-treating units, and a first main transport mechanism for transporting substrates to each of these treating units. The substrates are transferred from the first main transport mechanism to a second main transport mechanism through a receiver. When a substrate cannot be placed on the receiver, this substrate is placed on a buffer. Thus, the first main transport mechanism can continue transporting other substrates. The other substrates in the treating units are transported between the treating units without delay, to receive a series of treatments including coating treatment and heat treatment as scheduled. This prevents lowering of the quality of treatment for forming film on the substrates.

    Abstract translation: 本发明提供涂覆单元，热处理单元和用于将基底输送到这些处理单元中的每一个的第一主输送机构。 基板通过接收器从第一主输送机构传送到第二主输送机构。 当基板不能放置在接收器上时，将该基板放置在缓冲器上。 因此，第一主输送机构可以继续输送其它基板。 处理单元中的其它基材在处理单元之间没有延迟地输送，以接收包括涂覆处理和热处理的一系列处理。 这防止了在基板上形成膜的处理质量的降低。

    DEVELOPING APPARATUS AND DEVELOPING METHOD
    4.
    发明申请
    DEVELOPING APPARATUS AND DEVELOPING METHOD 有权
    开发设备和开发方法

    公开(公告)号：US20110170855A1

    公开(公告)日：2011-07-14

    申请号：US13053946

    申请日：2011-03-22

    Applicant: Tsuyoshi MITSUHASHI ,  Kenji Sugimoto

    Inventor： Tsuyoshi MITSUHASHI ,  Kenji Sugimoto

    IPC: G03D5/00

    CPC classification number: G03F7/3021 ,  H01L21/67051 ,  H01L21/67253

    Abstract: A joint nozzle that delivers a developer, a rinsing liquid and nitrogen gas is disposed adjacent the spin center of a substrate in plan view. A controller operates electromagnetic switch valves to continue supply of the developer, while spinning the substrate, in a developing process, and to start supply of the rinsing liquid in a rinsing process, immediately after the supply of the developer ends, thereby achieving a shortened period of the developing process. A switching is made to a drying process by starting supply of the nitrogen gas immediately after completion of the rinsing process. Thus, even if the substrate has a large angle of contact, formation of droplets of the rinsing liquid is inhibited to prevent post-develop defects.

    Abstract translation: 在平面图中，与基板的旋转中心相邻地设置输送显影剂，冲洗液和氮气的接合喷嘴。 控制器在显影过程中操作电磁切换阀以继续供应显影剂，同时旋转基底，并且在显影剂供应结束后立即在漂洗过程中开始供应冲洗液，从而实现缩短的周期 的发展过程。 通过在完成漂洗处理之后立即开始供应氮气，进行干燥过程的切换。 因此，即使基板具有大的接触角，也可以抑制漂洗液的液滴的形成，防止显影后的缺陷。

    SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
    5.
    发明申请
    SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD 有权
    基板处理装置和基板处理方法

    公开(公告)号：US20100136492A1

    公开(公告)日：2010-06-03

    申请号：US12698870

    申请日：2010-02-02

    Applicant: Shuichi Yasuda ,  Masashi Kanaoka ,  Koji Kaneyama ,  Tadashi Miyagi ,  Kazuhito Shigemori ,  Toru Asano ,  Yukio Toriyama ,  Takashi Taguchi ,  Tsuyoshi Mitsuhashi ,  Tsuyoshi Okumura

    Inventor： Shuichi Yasuda ,  Masashi Kanaoka ,  Koji Kaneyama ,  Tadashi Miyagi ,  Kazuhito Shigemori ,  Toru Asano ,  Yukio Toriyama ,  Takashi Taguchi ,  Tsuyoshi Mitsuhashi ,  Tsuyoshi Okumura

    IPC: G03F7/20

    CPC classification number: G03F7/70991 ,  G03F7/70341

    Abstract: A method of processing a substrate in a substrate processing apparatus that is arranged adjacent to an exposure device and includes first, second and third processing units, includes the steps of: forming a photosensitive film made of a photosensitive material on the substrate by said first processing unit before exposure processing by said exposure device. The method also includes applying washing processing to the substrate by said second processing unit after the formation of said photosensitive film by said first processing unit and before the exposure processing by said exposure device and transporting the substrate after the washing processing to said exposure device. The method further includes transporting the substrate from said exposure device and applying development processing by said third processing unit to the substrate transported after the exposure processing by said exposure device.

    Abstract translation: 一种在与曝光装置相邻并且包括第一，第二和第三处理单元的基板处理装置中处理基板的方法，包括以下步骤：通过所述第一处理在基板上形成由感光材料制成的感光膜 所述曝光装置进行曝光处理之前的单元。 该方法还包括在由所述第一处理单元形成所述感光膜之后并且在所述曝光装置进行曝光处理之前，通过所述第二处理单元对所述基板进行洗涤处理，并将所述基板在所述清洗处理之后传送到所述曝光装置。 所述方法还包括从所述曝光装置运送所述基板并将所述第三处理单元的显影处理应用于由所述曝光装置进行曝光处理之后运送的所述基板。

    MULTI-LINE SUBSTRATE TREATING APPARATUS
    6.
    发明申请
    MULTI-LINE SUBSTRATE TREATING APPARATUS 审中-公开
    多线基板处理设备

    公开(公告)号：US20090139833A1

    公开(公告)日：2009-06-04

    申请号：US12324788

    申请日：2008-11-26

    Applicant: Hiroyuki Ogura ,  Tsuyoshi Mitsuhashi ,  Yoshiteru Fukutomi ,  Kenya Morinishi ,  Yasuo Kawamatsu ,  Hiromichi Nagashima

    Inventor： Hiroyuki Ogura ,  Tsuyoshi Mitsuhashi ,  Yoshiteru Fukutomi ,  Kenya Morinishi ,  Yasuo Kawamatsu ,  Hiromichi Nagashima

    IPC: B65G43/08

    CPC classification number: H01L21/67178 ,  H01L21/6715 ,  H01L21/67173 ,  H01L21/67276 ,  H01L21/67742

    Abstract: A substrate treating apparatus includes substrate treatment lines arranged one over another, each for treating substrates while transporting the substrates substantially horizontally. The apparatus further includes an interface section for transporting the substrates between the substrate treatment lines and an exposing machine having a plurality of exposing stages, the exposing machine being provided separately from the apparatus, and a controller for controlling transport of the substrates in the interface section to cause all the substrates similarly treated in each of the substrate treatment lines to be exposed on one of the exposing stages. This apparatus can uniform the quality of treatment among a plurality of substrates receiving the same type of treatment in the same substrate treating line.

    Abstract translation: 基板处理装置包括彼此重叠布置的基板处理线，每个基板处理线基本上水平地输送基板，用于处理基板。 该装置还包括用于在基板处理线之间输送基板的接口部分和具有多个曝光台的曝光机，所述曝光机与所述装置分开设置，以及用于控制所述基板在所述界面部分中的传送的控制器 使得在每个基板处理线中类似地处理的所有基板在一个曝光阶段上暴露。 该装置可以在同一基板处理线中接收相同类型处理的多个基板之间使处理质量均匀。

    Silver salt photothermographic imaging material
    10.
    发明授权
    Silver salt photothermographic imaging material 失效
    银盐光热成像材料

    公开(公告)号：US06649338B2

    公开(公告)日：2003-11-18

    申请号：US10164021

    申请日：2002-06-05

    Applicant: Tsuyoshi Mitsuhashi

    Inventor： Tsuyoshi Mitsuhashi

    IPC: G03C1498

    CPC classification number: G03C1/49863 ,  G03C1/04 ,  G03C1/061 ,  G03C1/09 ,  G03C1/46 ,  G03C1/498 ,  G03C1/49845 ,  G03C2001/096 ,  G03C2200/26

    Abstract: A silver salt photohermographic material is disclosed, comprising a support having provided thereon a light-sensitive layer containing light-sensitive silver halide, a light-insensitive organic silver salt and a binder, wherein the photohermographic material exhibits a gradation of 2.0 to 5.0 within the density region of 0.5 and 2.0 on a photographic characteristic curve obtained when the photothermographic material is subjected to exposure of 50 &mgr;J/cm2 and thermal development at 124° C. for 16 sec.; the light-sensitive layer comprises lower and upper layers and a glass transition temperature of a binder contained in the lower layer being higher than that of a binder contained in the upper layer.

    Abstract translation: 公开了一种银盐光刻胶材料，其包括在其上设置有含有感光卤化银的感光层，不透光有机银盐和粘合剂的载体，其中该光蚀刻材料在该 当光热敏成像材料暴露于50μJ/ cm 2且在124℃的热显影16秒时获得的照相特征曲线上的密度区域为0.5和2.0。 感光层包括下层和上层，并且下层中包含的粘合剂的玻璃化转变温度高于上层中所含的粘合剂的玻璃化转变温度。

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