公开(公告)号：US09664608B2

公开(公告)日：2017-05-30

申请号：US14464658

申请日：2014-08-20

Applicant: ADVANCED POLYMER MONITORING TECHNOLOGIES, INC.

Inventor： Wayne Frederick Reed ,  Michael Felix Drenski ,  Alex Wayne Reed

IPC: G01N15/02 ,  G01N21/51 ,  G01N21/75 ,  G01N33/68 ,  G01N21/53 ,  G01N21/47

CPC classification number: G01N15/0211 ,  G01N21/51 ,  G01N21/53 ,  G01N33/6803 ,  G01N2021/4711 ,  G01N2021/4719 ,  G01N2021/4726 ,  G01N2021/4792 ,  G01N2201/0612 ,  G01N2201/08 ,  G01N2201/1224

Abstract: Simultaneous Multiple Sample Light Scattering systems and methods can be used for polymer stability testing and for applying stressors to polymer or colloid solutions including heat stress, ultrasound, freeze/thaw cycles, shear stress and exposure to different substances and surfaces, among others, that create a polymer stress response used to characterize the polymer solution and stability.

公开(公告)号：US20150056710A1

公开(公告)日：2015-02-26

申请号：US14464658

申请日：2014-08-20

Applicant: ADVANCED POLYMER MONITORING TECHNOLOGIES, INC.

Inventor： Wayne Frederick Reed ,  Michael Felix Drenski ,  Alex Wayne Reed

IPC: G01N15/02 ,  G01N21/75 ,  G01N21/51

CPC classification number: G01N15/0211 ,  G01N21/51 ,  G01N21/53 ,  G01N33/6803 ,  G01N2021/4711 ,  G01N2021/4719 ,  G01N2021/4726 ,  G01N2021/4792 ,  G01N2201/0612 ,  G01N2201/08 ,  G01N2201/1224

Abstract: Simultaneous Multiple Sample Light Scattering systems and methods can be used to for polymer stability testing and for applying stressors to polymer or colloid solutions including heat stress, ultrasound, freeze/thaw cycles, shear stress and exposure to different substances and surfaces. among others, that create a polymer stress response used to characterize the polymer solution and stability.

Abstract translation: 同时多重样品光散射系统和方法可用于聚合物稳定性测试和将应激物施加到聚合物或胶体溶液，包括热应力，超声波，冻融循环，剪切应力和暴露于不同物质和表面。 其中，产生用于表征聚合物溶液和稳定性的聚合物应力响应。