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公开(公告)号：US20250004438A1
公开(公告)日：2025-01-02
申请号：US18882059
申请日：2024-09-11
Applicant: APPLIED MATERIALS, INC.
Inventor： Atilla Kilicarslan , Raechel Chu-Hui Tan , Brooke Elise Montgomery , Paul Z. Wirth
IPC: G05B19/18
Abstract: A method includes determining, based at least in part on disturbance data, an actuation value associated with compensating for disturbance in a processing chamber. The method further includes associating the actuation value with an identifier corresponding to a recipe operation. The actuation value is to be retrieved, via the identifier, for subsequent execution of the recipe operation. The method further includes causing, based on retrieval of the actuation value via the identifier, actuation of one or more components of the processing chamber during a subsequent execution of the recipe operation to compensate for the disturbance.
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公开(公告)号：US20230195072A1
公开(公告)日：2023-06-22
申请号：US17559061
申请日：2021-12-22
Applicant: APPLIED MATERIALS, INC.
Inventor： Atilla Kilicarslan , Raechel Chu-Hui Tan , Brooke Elise Montgomery , Paul Z. Wirth
IPC: G05B19/18
CPC classification number: G05B19/188 , G05B2219/45031
Abstract: A method includes receiving first sensor data associated with a first iteration of a first recipe operation of a substrate processing recipe. The method further includes determining disturbance data, the disturbance data being a difference between the first sensor data and first setpoint data of the first recipe operation. The method further includes determining, based at least in part on the disturbance data, a first actuation value associated with one or more components of a processing chamber. Actuation of the one or more components according to the first actuation value compensates for the disturbance data. The method further includes causing the actuation of the one or more components based on the first actuation value during a subsequent iteration of the first recipe operation of the substrate processing recipe to compensate for the disturbance data.
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公开(公告)号：US20230048337A1
公开(公告)日：2023-02-16
申请号：US17886748
申请日：2022-08-12
Applicant: Applied Materials, Inc.
Inventor： Robert A. Medure , Raechel Chu-Hui Tan , Changgong Wang , Yuanhong Guo , Sai Padhy , Ashley M. Okada , Kenneth Le , Atilla Kilicarslan , Dean C. Hruzek
Abstract: Disclosed are implementations for minimizing substrate contamination during pressure changes in substrate processing systems. Over a duration of a pressure change (increase or decrease) in a chamber of a substrate processing system, a flow rate is adjusted multiple times to reduce occurrence of contaminant particles in an environment of the chamber. In some instances, the flow rate is changed continuously using at least one dynamic valve that enable continuous control over the pressure dynamics of the chamber.
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公开(公告)号：US12130606B2
公开(公告)日：2024-10-29
申请号：US17559061
申请日：2021-12-22
Applicant: APPLIED MATERIALS, INC.
Inventor： Atilla Kilicarslan , Raechel Chu-Hui Tan , Brooke Elise Montgomery , Paul Z. Wirth
IPC: G05B19/18
CPC classification number: G05B19/188 , G05B2219/45031
Abstract: A method includes receiving first sensor data associated with a first iteration of a first recipe operation of a substrate processing recipe. The method further includes determining disturbance data, the disturbance data being a difference between the first sensor data and first setpoint data of the first recipe operation. The method further includes determining, based at least in part on the disturbance data, a first actuation value associated with one or more components of a processing chamber. Actuation of the one or more components according to the first actuation value compensates for the disturbance data. The method further includes causing the actuation of the one or more components based on the first actuation value during a subsequent iteration of the first recipe operation of the substrate processing recipe to compensate for the disturbance data.
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