公开(公告)号：US20230195072A1

公开(公告)日：2023-06-22

申请号：US17559061

申请日：2021-12-22

Applicant: APPLIED MATERIALS, INC.

Inventor： Atilla Kilicarslan ,  Raechel Chu-Hui Tan ,  Brooke Elise Montgomery ,  Paul Z. Wirth

IPC: G05B19/18

CPC classification number: G05B19/188 ,  G05B2219/45031

Abstract: A method includes receiving first sensor data associated with a first iteration of a first recipe operation of a substrate processing recipe. The method further includes determining disturbance data, the disturbance data being a difference between the first sensor data and first setpoint data of the first recipe operation. The method further includes determining, based at least in part on the disturbance data, a first actuation value associated with one or more components of a processing chamber. Actuation of the one or more components according to the first actuation value compensates for the disturbance data. The method further includes causing the actuation of the one or more components based on the first actuation value during a subsequent iteration of the first recipe operation of the substrate processing recipe to compensate for the disturbance data.

公开(公告)号：US12130606B2

公开(公告)日：2024-10-29

申请号：US17559061

申请日：2021-12-22

Applicant: APPLIED MATERIALS, INC.

Inventor： Atilla Kilicarslan ,  Raechel Chu-Hui Tan ,  Brooke Elise Montgomery ,  Paul Z. Wirth

IPC: G05B19/18

CPC classification number: G05B19/188 ,  G05B2219/45031

Abstract: A method includes receiving first sensor data associated with a first iteration of a first recipe operation of a substrate processing recipe. The method further includes determining disturbance data, the disturbance data being a difference between the first sensor data and first setpoint data of the first recipe operation. The method further includes determining, based at least in part on the disturbance data, a first actuation value associated with one or more components of a processing chamber. Actuation of the one or more components according to the first actuation value compensates for the disturbance data. The method further includes causing the actuation of the one or more components based on the first actuation value during a subsequent iteration of the first recipe operation of the substrate processing recipe to compensate for the disturbance data.

公开(公告)号：US20250004438A1

公开(公告)日：2025-01-02

申请号：US18882059

申请日：2024-09-11

Applicant: APPLIED MATERIALS, INC.

Inventor： Atilla Kilicarslan ,  Raechel Chu-Hui Tan ,  Brooke Elise Montgomery ,  Paul Z. Wirth

IPC: G05B19/18

Abstract: A method includes determining, based at least in part on disturbance data, an actuation value associated with compensating for disturbance in a processing chamber. The method further includes associating the actuation value with an identifier corresponding to a recipe operation. The actuation value is to be retrieved, via the identifier, for subsequent execution of the recipe operation. The method further includes causing, based on retrieval of the actuation value via the identifier, actuation of one or more components of the processing chamber during a subsequent execution of the recipe operation to compensate for the disturbance.

公开(公告)号：US11772958B2

公开(公告)日：2023-10-03

申请号：US17475294

申请日：2021-09-14

Applicant: APPLIED MATERIALS, INC.

Inventor： Nir Merry ,  Paul Wirth ,  Ming Xu ,  Sushant Koshti ,  Raechel Chu-Hui Tan

IPC: B81B3/00 ,  G01F1/684 ,  G01F1/72 ,  G01F1/86 ,  G05D7/06

CPC classification number: B81B3/0018 ,  G01F1/6845 ,  G01F1/72 ,  G01F1/86 ,  G05D7/0623 ,  G05D7/0647 ,  B81B2201/0292 ,  B81B2203/01 ,  B81B2203/0315 ,  B81B2203/0338 ,  B81B2207/11

Abstract: Disclosed herein are embodiments of a mass flow control apparatus, systems incorporating the same, and methods using the same. In one embodiment, a mass flow control apparatus comprises a flow modulating valve configured to modulate gas flow in a gas flow channel, a sensor device, such as a micro-electromechanical (MEMS) device, configured to generate a signal responsive to a condition of the gas flow, and a processing device operatively coupled to the flow modulating valve and the sensor device to control the flow modulating valve based on a signal received from the sensor device.

公开(公告)号：US20230048337A1

公开(公告)日：2023-02-16

申请号：US17886748

申请日：2022-08-12

Applicant: Applied Materials, Inc.

Inventor： Robert A. Medure ,  Raechel Chu-Hui Tan ,  Changgong Wang ,  Yuanhong Guo ,  Sai Padhy ,  Ashley M. Okada ,  Kenneth Le ,  Atilla Kilicarslan ,  Dean C. Hruzek

IPC: F24F3/167 ,  F24F11/00 ,  F24F11/49 ,  F24F11/74

Abstract: Disclosed are implementations for minimizing substrate contamination during pressure changes in substrate processing systems. Over a duration of a pressure change (increase or decrease) in a chamber of a substrate processing system, a flow rate is adjusted multiple times to reduce occurrence of contaminant particles in an environment of the chamber. In some instances, the flow rate is changed continuously using at least one dynamic valve that enable continuous control over the pressure dynamics of the chamber.

公开(公告)号：US20220083081A1

公开(公告)日：2022-03-17

申请号：US17475294

申请日：2021-09-14

Applicant: APPLIED MATERIALS, INC.

Inventor： Nir Merry ,  Paul Wirth ,  Ming Xu ,  Sushant Koshti ,  Raechel Chu-Hui Tan

IPC: G05D7/06 ,  G01F1/86 ,  G01F1/72 ,  G01F1/684

Abstract: Disclosed herein are embodiments of a mass flow control apparatus, systems incorporating the same, and methods using the same. In one embodiment, a mass flow control apparatus comprises a flow modulating valve configured to modulate gas flow in a gas flow channel, a sensor device, such as a micro-electromechanical (MEMS) device, configured to generate a signal responsive to a condition of the gas flow, and a processing device operatively coupled to the flow modulating valve and the sensor device to control the flow modulating valve based on a signal received from the sensor device.